JP2001509647A5 - - Google Patents

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Publication number
JP2001509647A5
JP2001509647A5 JP2000502528A JP2000502528A JP2001509647A5 JP 2001509647 A5 JP2001509647 A5 JP 2001509647A5 JP 2000502528 A JP2000502528 A JP 2000502528A JP 2000502528 A JP2000502528 A JP 2000502528A JP 2001509647 A5 JP2001509647 A5 JP 2001509647A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2000502528A
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JP2001509647A (ja
JP4371572B2 (ja
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Publication date
Priority claimed from US08/893,813 external-priority patent/US6045620A/en
Application filed filed Critical
Publication of JP2001509647A publication Critical patent/JP2001509647A/ja
Publication of JP2001509647A5 publication Critical patent/JP2001509647A5/ja
Application granted granted Critical
Publication of JP4371572B2 publication Critical patent/JP4371572B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2000502528A 1997-07-11 1998-07-09 真空処理システムにおける２ピース式スリットバルブインサート Expired - Lifetime JP4371572B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/893,813 1997-07-11
US08/893,813 US6045620A (en) 1997-07-11 1997-07-11 Two-piece slit valve insert for vacuum processing system
PCT/US1998/014281 WO1999003136A1 (en) 1997-07-11 1998-07-09 Two-piece slit valve insert for vacuum processing system

Publications (3)

Publication Number Publication Date
JP2001509647A JP2001509647A (ja) 2001-07-24
JP2001509647A5 true JP2001509647A5 (ja) 2009-09-17
JP4371572B2 JP4371572B2 (ja) 2009-11-25

Family

ID=25402145

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000502528A Expired - Lifetime JP4371572B2 (ja) 1997-07-11 1998-07-09 真空処理システムにおける２ピース式スリットバルブインサート

Country Status (5)

Country Link
US (1) US6045620A (ja)
EP (1) EP1002332A1 (ja)
JP (1) JP4371572B2 (ja)
KR (1) KR20010021746A (ja)
WO (1) WO1999003136A1 (ja)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6192827B1 (en) * 1998-07-03 2001-02-27 Applied Materials, Inc. Double slit-valve doors for plasma processing
US6347918B1 (en) * 1999-01-27 2002-02-19 Applied Materials, Inc. Inflatable slit/gate valve
JP3998386B2 (ja) * 2000-01-26 2007-10-24 三菱電機株式会社 液晶表示装置の製造装置および液晶表示装置の製造方法
US6764265B2 (en) 2002-01-07 2004-07-20 Applied Materials Inc. Erosion resistant slit valve
US6800172B2 (en) * 2002-02-22 2004-10-05 Micron Technology, Inc. Interfacial structure for semiconductor substrate processing chambers and substrate transfer chambers and for semiconductor substrate processing chambers and accessory attachments, and semiconductor substrate processor
US6824343B2 (en) * 2002-02-22 2004-11-30 Applied Materials, Inc. Substrate support
US6814813B2 (en) 2002-04-24 2004-11-09 Micron Technology, Inc. Chemical vapor deposition apparatus
US6858264B2 (en) * 2002-04-24 2005-02-22 Micron Technology, Inc. Chemical vapor deposition methods
US7018517B2 (en) * 2002-06-21 2006-03-28 Applied Materials, Inc. Transfer chamber for vacuum processing system
US6926775B2 (en) 2003-02-11 2005-08-09 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
CN100408902C (zh) * 2003-05-13 2008-08-06 应用材料股份有限公司 密封一处理室一开口的方法与装置
KR100441875B1 (ko) * 2003-06-02 2004-07-27 주성엔지니어링(주) 분리형 이송 챔버
US7235138B2 (en) 2003-08-21 2007-06-26 Micron Technology, Inc. Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces
US7056806B2 (en) * 2003-09-17 2006-06-06 Micron Technology, Inc. Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces
US7282239B2 (en) * 2003-09-18 2007-10-16 Micron Technology, Inc. Systems and methods for depositing material onto microfeature workpieces in reaction chambers
US7323231B2 (en) * 2003-10-09 2008-01-29 Micron Technology, Inc. Apparatus and methods for plasma vapor deposition processes
US7647886B2 (en) * 2003-10-15 2010-01-19 Micron Technology, Inc. Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers
US7258892B2 (en) * 2003-12-10 2007-08-21 Micron Technology, Inc. Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition
US7906393B2 (en) * 2004-01-28 2011-03-15 Micron Technology, Inc. Methods for forming small-scale capacitor structures
US20050160992A1 (en) * 2004-01-28 2005-07-28 Applied Materials, Inc. Substrate gripping apparatus
US7584942B2 (en) * 2004-03-31 2009-09-08 Micron Technology, Inc. Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers
US8133554B2 (en) 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
US7841582B2 (en) * 2004-06-02 2010-11-30 Applied Materials, Inc. Variable seal pressure slit valve doors for semiconductor manufacturing equipment
CN101866828B (zh) * 2004-06-02 2013-03-20 应用材料公司 电子装置制造室及其形成方法
US7699932B2 (en) * 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
US20050268857A1 (en) * 2004-06-02 2005-12-08 Applied Materials, Inc. Uniformly compressed process chamber gate seal for semiconductor processing chamber
US20060201074A1 (en) * 2004-06-02 2006-09-14 Shinichi Kurita Electronic device manufacturing chamber and methods of forming the same
US7784164B2 (en) * 2004-06-02 2010-08-31 Applied Materials, Inc. Electronic device manufacturing chamber method
CN2888643Y (zh) * 2004-06-02 2007-04-11 应用材料股份有限公司 电子装置制造室
US7422653B2 (en) * 2004-07-13 2008-09-09 Applied Materials, Inc. Single-sided inflatable vertical slit valve
US20060165873A1 (en) * 2005-01-25 2006-07-27 Micron Technology, Inc. Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processes
US20060162658A1 (en) * 2005-01-27 2006-07-27 Applied Materials, Inc. Ruthenium layer deposition apparatus and method
US20060237138A1 (en) * 2005-04-26 2006-10-26 Micron Technology, Inc. Apparatuses and methods for supporting microelectronic devices during plasma-based fabrication processes
TWI295816B (en) 2005-07-19 2008-04-11 Applied Materials Inc Hybrid pvd-cvd system
JP4821314B2 (ja) * 2005-12-26 2011-11-24 ダイキン工業株式会社 半導体製造装置用バルブの弁体およびその製造方法
US8047231B2 (en) * 2006-06-19 2011-11-01 Nippon Val-Qua Industries, Ltd. Valve element unit and gate valve apparatus
KR101196504B1 (ko) * 2007-03-01 2012-11-01 어플라이드 머티어리얼스, 인코포레이티드 이송 챔버 인터페이스용 플로팅 슬릿 밸브
US10541157B2 (en) 2007-05-18 2020-01-21 Brooks Automation, Inc. Load lock fast pump vent
JP5795162B2 (ja) 2007-05-18 2015-10-14 ブルックス オートメーション インコーポレイテッド ロードロック高速排気および通気
US8377213B2 (en) 2008-05-05 2013-02-19 Applied Materials, Inc. Slit valve having increased flow uniformity
US20100127201A1 (en) * 2008-11-21 2010-05-27 Applied Materials, Inc. Interlocking valve chamber and lid
US20100304027A1 (en) * 2009-05-27 2010-12-02 Applied Materials, Inc. Substrate processing system and methods thereof
EP2293321A1 (en) * 2009-09-08 2011-03-09 Applied Materials, Inc. Mechanical modularity chambers
US20110180097A1 (en) * 2010-01-27 2011-07-28 Axcelis Technologies, Inc. Thermal isolation assemblies for wafer transport apparatus and methods of use thereof
JP2011035415A (ja) * 2010-10-18 2011-02-17 Hitachi High-Technologies Corp 真空処理装置
US9717147B2 (en) * 2013-09-26 2017-07-25 Applied Materials, Inc. Electronic device manufacturing system
US10090174B2 (en) 2016-03-01 2018-10-02 Lam Research Corporation Apparatus for purging semiconductor process chamber slit valve opening
US11527426B2 (en) 2017-03-24 2022-12-13 Tokyo Electron Limited Substrate processing device
JP6972852B2 (ja) * 2017-05-23 2021-11-24 東京エレクトロン株式会社 真空搬送モジュール及び基板処理装置
CN108933097B (zh) 2017-05-23 2023-06-23 东京毅力科创株式会社 真空输送组件和基片处理装置
KR102585595B1 (ko) * 2017-07-31 2023-10-10 어플라이드 머티어리얼스, 인코포레이티드 배플을 갖는 가스 공급 부재
US11049740B1 (en) * 2019-12-05 2021-06-29 Applied Materials, Inc. Reconfigurable mainframe with replaceable interface plate

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4116419A (en) * 1977-10-21 1978-09-26 Acf Industries, Incorporated Limited float seat construction for expanding gate valve
US4257447A (en) * 1979-01-29 1981-03-24 The Clarkson Company Gate valve
US4534389A (en) * 1984-03-29 1985-08-13 Hewlett-Packard Company Interlocking door latch for dockable interface for integrated circuit processing
US4616683A (en) * 1983-09-28 1986-10-14 Hewlett-Packard Company Particle-free dockable interface for integrated circuit processing
US4674939A (en) * 1984-07-30 1987-06-23 Asyst Technologies Sealed standard interface apparatus
US4917556A (en) * 1986-04-28 1990-04-17 Varian Associates, Inc. Modular wafer transport and processing system
US4724874A (en) * 1986-05-01 1988-02-16 Asyst Technologies Sealable transportable container having a particle filtering system
US5076205A (en) * 1989-01-06 1991-12-31 General Signal Corporation Modular vapor processor system
EP0453867B1 (en) * 1990-04-20 1994-08-10 Applied Materials, Inc. Slit valve apparatus and method
US5020776A (en) * 1990-06-04 1991-06-04 Warman International, Inc. Split seat gate valve
JP2525284B2 (ja) * 1990-10-22 1996-08-14 ティーディーケイ株式会社 クリ―ン搬送方法及び装置
JPH04162709A (ja) * 1990-10-26 1992-06-08 Fujitsu Ltd 半導体製造装置および反応処理方法
US5286296A (en) * 1991-01-10 1994-02-15 Sony Corporation Multi-chamber wafer process equipment having plural, physically communicating transfer means
US5143348A (en) * 1991-08-23 1992-09-01 Dwight Baker Easy-opening, high pressure gate valve
JP2751975B2 (ja) * 1991-12-20 1998-05-18 株式会社日立製作所 半導体処理装置のロードロック室
US5462080A (en) * 1993-08-31 1995-10-31 Applied Materials, Inc. Heated removable throttle valve
JP3394293B2 (ja) * 1993-09-20 2003-04-07 株式会社日立製作所 試料の搬送方法および半導体装置の製造方法
TW295677B (ja) * 1994-08-19 1997-01-11 Tokyo Electron Co Ltd
US5730801A (en) * 1994-08-23 1998-03-24 Applied Materials, Inc. Compartnetalized substrate processing chamber
US5653565A (en) * 1995-07-05 1997-08-05 Asyst Technologies, Inc. SMIF port interface adaptor
US5640751A (en) * 1995-07-17 1997-06-24 Thermionics Laboratories, Inc. Vacuum flange
CH691376A5 (de) * 1995-10-17 2001-07-13 Unaxis Balzers Ag Vakuumanlage zur Oberflächenbearbeitung von Werkstücken.
US5746434A (en) * 1996-07-09 1998-05-05 Lam Research Corporation Chamber interfacing O-rings and method for implementing same

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