JP2001326171A - 照明装置 - Google Patents

照明装置

Info

Publication number
JP2001326171A
JP2001326171A JP2000146365A JP2000146365A JP2001326171A JP 2001326171 A JP2001326171 A JP 2001326171A JP 2000146365 A JP2000146365 A JP 2000146365A JP 2000146365 A JP2000146365 A JP 2000146365A JP 2001326171 A JP2001326171 A JP 2001326171A
Authority
JP
Japan
Prior art keywords
light
collimator
optical
optical means
lamps
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000146365A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001326171A5 (https=
Inventor
Haruna Kawashima
春名 川島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000146365A priority Critical patent/JP2001326171A/ja
Priority to KR10-2001-0026978A priority patent/KR100456436B1/ko
Publication of JP2001326171A publication Critical patent/JP2001326171A/ja
Publication of JP2001326171A5 publication Critical patent/JP2001326171A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70641—Focus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
JP2000146365A 2000-05-18 2000-05-18 照明装置 Pending JP2001326171A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000146365A JP2001326171A (ja) 2000-05-18 2000-05-18 照明装置
KR10-2001-0026978A KR100456436B1 (ko) 2000-05-18 2001-05-17 조명장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000146365A JP2001326171A (ja) 2000-05-18 2000-05-18 照明装置

Publications (2)

Publication Number Publication Date
JP2001326171A true JP2001326171A (ja) 2001-11-22
JP2001326171A5 JP2001326171A5 (https=) 2007-07-12

Family

ID=18652738

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000146365A Pending JP2001326171A (ja) 2000-05-18 2000-05-18 照明装置

Country Status (2)

Country Link
JP (1) JP2001326171A (https=)
KR (1) KR100456436B1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010118383A (ja) * 2008-11-11 2010-05-27 Nikon Corp 照明装置、露光装置、及びデバイス製造方法
KR20150144711A (ko) 2014-06-17 2015-12-28 캐논 가부시끼가이샤 조명 장치, 노광 장치, 조정 방법 및 물품의 제조 방법

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5806479B2 (ja) * 2011-02-22 2015-11-10 キヤノン株式会社 照明光学系、露光装置及びデバイス製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05283317A (ja) * 1992-03-31 1993-10-29 Canon Inc 照明装置及びそれを用いた投影露光装置
JPH05325896A (ja) * 1992-05-21 1993-12-10 Matsushita Electric Ind Co Ltd 照明光学装置
JPH0836180A (ja) * 1994-05-16 1996-02-06 Matsushita Electric Ind Co Ltd 投写型表示装置
JPH09274253A (ja) * 1996-02-09 1997-10-21 Toshiba Corp 投射型表示装置および空間光変調素子
JP2000137290A (ja) * 1998-10-29 2000-05-16 Canon Inc 照明装置およびそれを用いた投射型表示装置
JP2001043701A (ja) * 1999-07-28 2001-02-16 Ricoh Co Ltd 照明光学装置およびそれを用いた投写装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100319216B1 (ko) * 1993-06-30 2002-06-28 시마무라 테루오 노광장치
JPH07159977A (ja) * 1993-12-01 1995-06-23 Nippon Telegr & Teleph Corp <Ntt> ホトマスク検査装置
JPH0933852A (ja) * 1995-07-19 1997-02-07 Nikon Corp 照明装置および該装置を備えた投影露光装置
KR20010042098A (ko) * 1998-03-24 2001-05-25 오노 시게오 조명 장치, 노광 방법 및 장치와 디바이스 제조 방법
DE19903807A1 (de) * 1998-05-05 1999-11-11 Zeiss Carl Fa Beleuchtungssystem insbesondere für die EUV-Lithographie
JP2001110707A (ja) * 1999-10-08 2001-04-20 Orc Mfg Co Ltd 周辺露光装置の光学系

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05283317A (ja) * 1992-03-31 1993-10-29 Canon Inc 照明装置及びそれを用いた投影露光装置
JPH05325896A (ja) * 1992-05-21 1993-12-10 Matsushita Electric Ind Co Ltd 照明光学装置
JPH0836180A (ja) * 1994-05-16 1996-02-06 Matsushita Electric Ind Co Ltd 投写型表示装置
JPH09274253A (ja) * 1996-02-09 1997-10-21 Toshiba Corp 投射型表示装置および空間光変調素子
JP2000137290A (ja) * 1998-10-29 2000-05-16 Canon Inc 照明装置およびそれを用いた投射型表示装置
JP2001043701A (ja) * 1999-07-28 2001-02-16 Ricoh Co Ltd 照明光学装置およびそれを用いた投写装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010118383A (ja) * 2008-11-11 2010-05-27 Nikon Corp 照明装置、露光装置、及びデバイス製造方法
KR20150144711A (ko) 2014-06-17 2015-12-28 캐논 가부시끼가이샤 조명 장치, 노광 장치, 조정 방법 및 물품의 제조 방법
JP2016004921A (ja) * 2014-06-17 2016-01-12 キヤノン株式会社 照明装置、露光装置、調整方法、及び、物品の製造方法
CN105278258A (zh) * 2014-06-17 2016-01-27 佳能株式会社 照明器件、曝光装置、调整方法和用于制造物品的方法
US9632423B2 (en) 2014-06-17 2017-04-25 Canon Kabushiki Kaisha Illumination device, exposure apparatus, adjusting method, and method for manufacturing object

Also Published As

Publication number Publication date
KR100456436B1 (ko) 2004-11-10
KR20010105250A (ko) 2001-11-28

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