JP2001311799A5 - - Google Patents
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- JP2001311799A5 JP2001311799A5 JP2000404229A JP2000404229A JP2001311799A5 JP 2001311799 A5 JP2001311799 A5 JP 2001311799A5 JP 2000404229 A JP2000404229 A JP 2000404229A JP 2000404229 A JP2000404229 A JP 2000404229A JP 2001311799 A5 JP2001311799 A5 JP 2001311799A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US466217 | 1999-12-17 | ||
| US09/466,217 US6469310B1 (en) | 1999-12-17 | 1999-12-17 | Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007155698A Division JP4195071B2 (ja) | 1999-12-17 | 2007-06-12 | 平版投影装置用の照射源 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001311799A JP2001311799A (ja) | 2001-11-09 |
| JP2001311799A5 true JP2001311799A5 (enExample) | 2007-07-26 |
| JP3992432B2 JP3992432B2 (ja) | 2007-10-17 |
Family
ID=23850950
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000404229A Expired - Lifetime JP3992432B2 (ja) | 1999-12-17 | 2000-12-14 | 平版投影装置用の照射源 |
| JP2007155698A Expired - Lifetime JP4195071B2 (ja) | 1999-12-17 | 2007-06-12 | 平版投影装置用の照射源 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007155698A Expired - Lifetime JP4195071B2 (ja) | 1999-12-17 | 2007-06-12 | 平版投影装置用の照射源 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6469310B1 (enExample) |
| JP (2) | JP3992432B2 (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6661018B1 (en) * | 2000-04-25 | 2003-12-09 | Northrop Grumman Corporation | Shroud nozzle for gas jet control in an extreme ultraviolet light source |
| US6972421B2 (en) * | 2000-06-09 | 2005-12-06 | Cymer, Inc. | Extreme ultraviolet light source |
| US6711233B2 (en) * | 2000-07-28 | 2004-03-23 | Jettec Ab | Method and apparatus for generating X-ray or EUV radiation |
| US6912267B2 (en) * | 2002-11-06 | 2005-06-28 | University Of Central Florida Research Foundation | Erosion reduction for EUV laser produced plasma target sources |
| US6770895B2 (en) * | 2002-11-21 | 2004-08-03 | Asml Holding N.V. | Method and apparatus for isolating light source gas from main chamber gas in a lithography tool |
| DE10256663B3 (de) * | 2002-12-04 | 2005-10-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungslampe für EUV-Strahlung |
| DE10306668B4 (de) * | 2003-02-13 | 2009-12-10 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Plasmas |
| US7605385B2 (en) * | 2004-07-28 | 2009-10-20 | Board of Regents of the University and Community College System of Nevada, on behlaf of the University of Nevada | Electro-less discharge extreme ultraviolet light source |
| JP5004473B2 (ja) * | 2006-01-16 | 2012-08-22 | 学校法人日本大学 | プラズマ発生装置 |
| US7696492B2 (en) * | 2006-12-13 | 2010-04-13 | Asml Netherlands B.V. | Radiation system and lithographic apparatus |
| US7838853B2 (en) * | 2006-12-14 | 2010-11-23 | Asml Netherlands B.V. | Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing method |
| US8901521B2 (en) * | 2007-08-23 | 2014-12-02 | Asml Netherlands B.V. | Module and method for producing extreme ultraviolet radiation |
| US7763871B2 (en) * | 2008-04-02 | 2010-07-27 | Asml Netherlands B.V. | Radiation source |
| JP2011508442A (ja) * | 2007-12-27 | 2011-03-10 | エーエスエムエル ネザーランズ ビー．ブイ． | 極端紫外線放射源および極端紫外線放射を生成する方法 |
| JP2011054376A (ja) * | 2009-09-01 | 2011-03-17 | Ihi Corp | Ｌｐｐ方式のｅｕｖ光源とその発生方法 |
| JP5212917B2 (ja) * | 2009-09-01 | 2013-06-19 | 株式会社Ｉｈｉ | プラズマ光源 |
| EP2475229A4 (en) * | 2009-09-01 | 2015-03-18 | Ihi Corp | PLASMA LIGHT SOURCE |
| JP5212918B2 (ja) * | 2009-09-01 | 2013-06-19 | 株式会社Ｉｈｉ | プラズマ光源 |
| KR20140036538A (ko) * | 2012-09-17 | 2014-03-26 | 삼성전자주식회사 | 극자외선 생성 장치, 이를 포함하는 노광 장치 및 이러한 노광 장치를 사용해서 제조된 전자 디바이스 |
| KR102115543B1 (ko) * | 2013-04-26 | 2020-05-26 | 삼성전자주식회사 | 극자외선 광원 장치 |
| US9585236B2 (en) | 2013-05-03 | 2017-02-28 | Media Lario Srl | Sn vapor EUV LLP source system for EUV lithography |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4494043A (en) | 1981-07-02 | 1985-01-15 | Physics International Company | Imploding plasma device |
| JPS60175351A (ja) | 1984-02-14 | 1985-09-09 | Nippon Telegr & Teleph Corp <Ntt> | Ｘ線発生装置およびｘ線露光法 |
| DE3688946T2 (de) | 1985-04-30 | 1994-01-13 | Nippon Telegraph & Telephone | Röntgenstrahlungsquelle. |
| US4663567A (en) | 1985-10-28 | 1987-05-05 | Physics International Company | Generation of stable linear plasmas |
| US5577092A (en) | 1995-01-25 | 1996-11-19 | Kublak; Glenn D. | Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources |
| DE69701934T2 (de) * | 1996-02-15 | 2000-11-30 | Koninklijke Philips Electronics N.V., Eindhoven | Methode zur bestimmung der strahlungsmenge in einem lithographischen gerät; test-maske und gerät ihrer durchführung |
| SE510133C2 (sv) * | 1996-04-25 | 1999-04-19 | Jettec Ab | Laser-plasma röntgenkälla utnyttjande vätskor som strålmål |
| US6031241A (en) | 1997-03-11 | 2000-02-29 | University Of Central Florida | Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications |
| US5763930A (en) | 1997-05-12 | 1998-06-09 | Cymer, Inc. | Plasma focus high energy photon source |
| US6075838A (en) * | 1998-03-18 | 2000-06-13 | Plex Llc | Z-pinch soft x-ray source using diluent gas |
| US6105885A (en) | 1998-04-03 | 2000-08-22 | Advanced Energy Systems, Inc. | Fluid nozzle system and method in an emitted energy system for photolithography |
| US6065203A (en) | 1998-04-03 | 2000-05-23 | Advanced Energy Systems, Inc. | Method of manufacturing very small diameter deep passages |
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1999
- 1999-12-17 US US09/466,217 patent/US6469310B1/en not_active Expired - Lifetime
-
2000
- 2000-12-14 JP JP2000404229A patent/JP3992432B2/ja not_active Expired - Lifetime
-
2007
- 2007-06-12 JP JP2007155698A patent/JP4195071B2/ja not_active Expired - Lifetime