JP2001237169A5 - - Google Patents

Download PDF

Info

Publication number
JP2001237169A5
JP2001237169A5 JP2000047359A JP2000047359A JP2001237169A5 JP 2001237169 A5 JP2001237169 A5 JP 2001237169A5 JP 2000047359 A JP2000047359 A JP 2000047359A JP 2000047359 A JP2000047359 A JP 2000047359A JP 2001237169 A5 JP2001237169 A5 JP 2001237169A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000047359A
Other languages
Japanese (ja)
Other versions
JP2001237169A (ja
JP4289755B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000047359A priority Critical patent/JP4289755B2/ja
Priority claimed from JP2000047359A external-priority patent/JP4289755B2/ja
Priority to US09/790,866 priority patent/US6803991B2/en
Publication of JP2001237169A publication Critical patent/JP2001237169A/ja
Publication of JP2001237169A5 publication Critical patent/JP2001237169A5/ja
Application granted granted Critical
Publication of JP4289755B2 publication Critical patent/JP4289755B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2000047359A 2000-02-24 2000-02-24 露光量制御方法、デバイス製造方法および露光装置 Expired - Fee Related JP4289755B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000047359A JP4289755B2 (ja) 2000-02-24 2000-02-24 露光量制御方法、デバイス製造方法および露光装置
US09/790,866 US6803991B2 (en) 2000-02-24 2001-02-23 Exposure amount control method in exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000047359A JP4289755B2 (ja) 2000-02-24 2000-02-24 露光量制御方法、デバイス製造方法および露光装置

Publications (3)

Publication Number Publication Date
JP2001237169A JP2001237169A (ja) 2001-08-31
JP2001237169A5 true JP2001237169A5 (enExample) 2007-04-12
JP4289755B2 JP4289755B2 (ja) 2009-07-01

Family

ID=18569615

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000047359A Expired - Fee Related JP4289755B2 (ja) 2000-02-24 2000-02-24 露光量制御方法、デバイス製造方法および露光装置

Country Status (2)

Country Link
US (1) US6803991B2 (enExample)
JP (1) JP4289755B2 (enExample)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000277413A (ja) * 1999-03-24 2000-10-06 Canon Inc 露光量制御方法、露光装置およびデバイス製造方法
TW552805B (en) * 2001-05-17 2003-09-11 Koninkl Philips Electronics Nv Output stabilization for a laser matrix
JP3673731B2 (ja) * 2001-05-22 2005-07-20 キヤノン株式会社 露光装置及び方法
US7095497B2 (en) * 2001-06-27 2006-08-22 Canon Kabushiki Kaisha Beam splitting apparatus, transmittance measurement apparatus, and exposure apparatus
EP1316847A1 (en) * 2001-11-30 2003-06-04 Degraf s.r.l. "Machine for the uv exposure of flexographic plates"
JP2003295459A (ja) * 2002-04-02 2003-10-15 Nikon Corp 露光装置及び露光方法
US20040021831A1 (en) * 2002-07-31 2004-02-05 Canon Kabushiki Kaisha, Tokyo, Japan Projection type image display apparatus and image display system
JP2005109304A (ja) 2003-10-01 2005-04-21 Canon Inc 照明光学系及び露光装置
US20050117861A1 (en) * 2003-12-02 2005-06-02 Jung-Yen Hsu Structure of a diffusing film and prism film in LCD screen
US7061586B2 (en) * 2004-03-02 2006-06-13 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP2006043029A (ja) * 2004-08-03 2006-02-16 Matsushita Electric Ind Co Ltd 生体判別装置およびそれを用いた認証装置ならびに生体判別方法
US7583362B2 (en) * 2004-11-23 2009-09-01 Infineon Technologies Ag Stray light feedback for dose control in semiconductor lithography systems
JP4765313B2 (ja) * 2004-12-27 2011-09-07 株式会社ニコン 露光装置
US7428039B2 (en) * 2005-11-17 2008-09-23 Coherent, Inc. Method and apparatus for providing uniform illumination of a mask in laser projection systems
WO2007094470A1 (ja) * 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
JP2008016516A (ja) 2006-07-03 2008-01-24 Canon Inc 露光装置
JP2008047673A (ja) * 2006-08-14 2008-02-28 Canon Inc 露光装置及びデバイス製造方法
JP4816367B2 (ja) 2006-09-27 2011-11-16 ウシオ電機株式会社 光照射器およびインクジェットプリンタ
DE102007025340B4 (de) * 2007-05-31 2019-12-05 Globalfoundries Inc. Immersionslithograpieprozess unter Anwendung einer variablen Abtastgeschwindigkeit und Lithographiesystem
JP2009034831A (ja) * 2007-07-31 2009-02-19 Ushio Inc 光照射器及びこの光照射器を使用したプリンタ
JP2009206373A (ja) * 2008-02-28 2009-09-10 Canon Inc 露光装置及びデバイス製造方法
JP2009302399A (ja) * 2008-06-16 2009-12-24 Canon Inc 露光装置およびデバイス製造方法
NL2003204A1 (nl) * 2008-08-14 2010-02-16 Asml Netherlands Bv Lithographic apparatus and method.
DE102008042463B3 (de) * 2008-09-30 2010-04-22 Carl Zeiss Smt Ag Optische Messvorrichtung für eine Projektionsbelichtungsanlage
JP5134732B2 (ja) * 2008-10-31 2013-01-30 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖマイクロリソグラフィ用の照明光学系
JP2010114266A (ja) * 2008-11-06 2010-05-20 Canon Inc 露光装置およびその制御方法、ならびにデバイス製造方法
JPWO2012137842A1 (ja) * 2011-04-04 2014-07-28 株式会社ニコン 照明装置、露光装置、デバイス製造方法、導光光学素子及び導光光学素子の製造方法
JP6116457B2 (ja) * 2013-09-26 2017-04-19 株式会社Ｓｃｒｅｅｎホールディングス 描画装置
CN107966882B (zh) * 2017-08-10 2020-10-16 上海微电子装备（集团）股份有限公司 曝光设备和曝光方法
CN115128907A (zh) * 2021-03-25 2022-09-30 上海微电子装备（集团）股份有限公司 曝光剂量控制系统及曝光系统
CN115236940A (zh) * 2021-04-22 2022-10-25 上海微电子装备（集团）股份有限公司 曝光系统以及光刻设备
KR20250045750A (ko) * 2023-09-26 2025-04-02 삼성전자주식회사 레티클 마스킹 장치, 이를 포함하는 기판 처리 장치 및 이를 이용한 기판 처리 방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5475491A (en) * 1989-02-10 1995-12-12 Canon Kabushiki Kaisha Exposure apparatus
US5815248A (en) 1993-04-22 1998-09-29 Nikon Corporation Illumination optical apparatus and method having a wavefront splitter and an optical integrator
JP3376690B2 (ja) * 1994-04-28 2003-02-10 株式会社ニコン 露光装置、及び該装置を用いた露光方法
JP3391940B2 (ja) * 1995-06-26 2003-03-31 キヤノン株式会社 照明装置及び露光装置
KR100210569B1 (ko) * 1995-09-29 1999-07-15 미따라이 하지메 노광방법 및 노광장치, 그리고 이를 이용한 디바이스제조방법
JPH1092722A (ja) * 1996-09-18 1998-04-10 Nikon Corp 露光装置
AU6853598A (en) * 1997-04-18 1998-11-13 Nikon Corporation Aligner, exposure method using the aligner, and method of manufacture of circuitdevice
DE19724903A1 (de) 1997-06-12 1998-12-17 Zeiss Carl Fa Lichtintensitätsmeßanordnung
DE69933903T2 (de) * 1998-04-14 2007-05-24 Asml Netherlands B.V. Lithograpischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung
EP0950924B1 (en) 1998-04-14 2006-11-08 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
JP2001267239A (ja) * 2000-01-14 2001-09-28 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
TW546699B (en) * 2000-02-25 2003-08-11 Nikon Corp Exposure apparatus and exposure method capable of controlling illumination distribution

Similar Documents

Publication Publication Date Title
BE2013C060I2 (enExample)
BE2013C048I2 (enExample)
BE2012C016I2 (enExample)
BRPI0113420B8 (enExample)
BRPI0113085B8 (enExample)
BRPI0110940B8 (enExample)
BE2014C025I2 (enExample)
BRPI0113372A8 (enExample)
BR0112866A2 (enExample)
BRPI0003419A (enExample)
BY5768C1 (enExample)
FR2784557A3 (enExample)
CN3135488S (enExample)
CN3139852S (enExample)
AU2000273097A8 (enExample)
AU2000271150A8 (enExample)
AU2000270908A8 (enExample)
AU2000270757A8 (enExample)
BY7030C1 (enExample)
CN3148468S (enExample)
CL45687B (enExample)
CN3133951S (enExample)
CN3134542S (enExample)
CN3135469S (enExample)
CN3135563S (enExample)