JP2001221278A5 - - Google Patents
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- Publication number
- JP2001221278A5 JP2001221278A5 JP2000031342A JP2000031342A JP2001221278A5 JP 2001221278 A5 JP2001221278 A5 JP 2001221278A5 JP 2000031342 A JP2000031342 A JP 2000031342A JP 2000031342 A JP2000031342 A JP 2000031342A JP 2001221278 A5 JP2001221278 A5 JP 2001221278A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000031342A JP4416250B2 (ja) | 2000-02-09 | 2000-02-09 | アクティブ除振装置及び露光装置 |
| TW090102620A TW535227B (en) | 2000-02-09 | 2001-02-07 | Active anti-vibration apparatus and exposure apparatus |
| EP01301082A EP1124078B1 (en) | 2000-02-09 | 2001-02-07 | Active anti-vibration apparatus and exposure apparatus |
| US09/777,955 US6684132B2 (en) | 2000-02-09 | 2001-02-07 | Active anti-vibration apparatus and exposure apparatus |
| DE60114260T DE60114260T2 (de) | 2000-02-09 | 2001-02-07 | Aktive, schwingungsdämpfende Einrichtung und Beleuchtungseinrichtung |
| KR1020010006294A KR20010078795A (ko) | 2000-02-09 | 2001-02-09 | 액티브제진장치 및 노광장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000031342A JP4416250B2 (ja) | 2000-02-09 | 2000-02-09 | アクティブ除振装置及び露光装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001221278A JP2001221278A (ja) | 2001-08-17 |
| JP2001221278A5 true JP2001221278A5 (ja) | 2007-03-29 |
| JP4416250B2 JP4416250B2 (ja) | 2010-02-17 |
Family
ID=18556109
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000031342A Expired - Fee Related JP4416250B2 (ja) | 2000-02-09 | 2000-02-09 | アクティブ除振装置及び露光装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6684132B2 (ja) |
| EP (1) | EP1124078B1 (ja) |
| JP (1) | JP4416250B2 (ja) |
| KR (1) | KR20010078795A (ja) |
| DE (1) | DE60114260T2 (ja) |
| TW (1) | TW535227B (ja) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3670575B2 (ja) * | 2000-01-12 | 2005-07-13 | Ｔｄｋ株式会社 | コイル封入圧粉コアの製造方法およびコイル封入圧粉コア |
| JP2003202051A (ja) * | 2002-01-04 | 2003-07-18 | Canon Inc | 除振装置 |
| US7108497B2 (en) * | 2004-01-12 | 2006-09-19 | Omnimold, Llc | Interchangeable blow mold parison closing apparatus |
| JP2005282696A (ja) * | 2004-03-29 | 2005-10-13 | Canon Inc | 除振マウント装置、露光装置及びデバイス製造方法 |
| JP4290172B2 (ja) * | 2006-03-30 | 2009-07-01 | キヤノン株式会社 | 伝達特性算出装置及び伝達特性算出方法並びに露光装置 |
| JP4906416B2 (ja) * | 2006-07-11 | 2012-03-28 | 日本碍子株式会社 | 物体の通過検出装置 |
| JP4970904B2 (ja) * | 2006-11-06 | 2012-07-11 | 倉敷化工株式会社 | アクティブ除振装置 |
| EP2119938A1 (en) * | 2008-05-15 | 2009-11-18 | Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO | A vibration sensor and a system to isolate vibrations. |
| US20140293251A1 (en) * | 2008-08-18 | 2014-10-02 | Asml Netherlands B.V. | Projection System, Lithographic Apparatus, Method of Projecting a Beam of Radiation onto a Target and Device Manufacturing Method |
| TWI391703B (zh) * | 2008-12-03 | 2013-04-01 | Asia Optical Co Inc | 光學防手震系統之增益調整裝置及其方法 |
| JP6151927B2 (ja) * | 2012-02-17 | 2017-06-21 | キヤノン株式会社 | アクティブ除振装置 |
| JP5747129B2 (ja) | 2012-06-26 | 2015-07-08 | 株式会社日立ハイテクノロジーズ | ステージ装置および試料観察装置 |
| JP6152001B2 (ja) * | 2012-08-03 | 2017-06-21 | キヤノン株式会社 | アクティブ除振装置、除振方法、加工装置、検査装置、露光装置及びワークの製造方法 |
| EP2846062B1 (de) * | 2013-09-10 | 2017-05-31 | Integrated Dynamics Engineering GmbH | Schwingungsisolationssystem mit in Teilbereiche unterteilter Auflage sowie Verfahren zu dessen Regelung |
| US10310392B2 (en) | 2015-11-23 | 2019-06-04 | Asml Netherlands B.V. | Positioning device, lithographic apparatus and device manufacturing method |
| US10578983B2 (en) | 2015-12-21 | 2020-03-03 | Asml Netherlands B.V. | Lithographic apparatus having an active base frame support |
| JP6556196B2 (ja) | 2017-07-27 | 2019-08-07 | 倉敷化工株式会社 | アクティブ除振装置 |
| US11169450B2 (en) | 2018-04-25 | 2021-11-09 | Asml Netherlands B.V. | Pneumatic support device and lithographic apparatus with pneumatic support device |
| CN111692264B (zh) * | 2019-09-20 | 2021-08-03 | 苏州维斯勒姆智能科技有限公司 | 基于振动补偿的大型机器用共振消除装置 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3217522B2 (ja) | 1992-03-02 | 2001-10-09 | キヤノン株式会社 | 精密位置決め装置 |
| JP3184044B2 (ja) | 1994-05-24 | 2001-07-09 | キヤノン株式会社 | 微動位置決め制御装置 |
| JP3224489B2 (ja) | 1995-03-28 | 2001-10-29 | キヤノン株式会社 | 空気バネ式除振装置 |
| US5812420A (en) | 1995-09-05 | 1998-09-22 | Nikon Corporation | Vibration-preventive apparatus and exposure apparatus |
| JP3807516B2 (ja) | 1995-09-05 | 2006-08-09 | 株式会社ニコン | 除振装置、除振方法及び露光装置 |
| JPH09326362A (ja) | 1996-04-05 | 1997-12-16 | Nikon Corp | 除振装置及び露光装置 |
| JP3733174B2 (ja) | 1996-06-19 | 2006-01-11 | キヤノン株式会社 | 走査型投影露光装置 |
| JP3581499B2 (ja) | 1996-09-27 | 2004-10-27 | キヤノン株式会社 | 除振装置及びその制御方法 |
| JPH10141428A (ja) | 1996-11-08 | 1998-05-29 | Canon Inc | 能動除振装置 |
| US6128552A (en) * | 1996-11-08 | 2000-10-03 | Canon Kabushiki Kaisha | Anti-vibration apparatus and method |
| US6170622B1 (en) | 1997-03-07 | 2001-01-09 | Canon Kabushiki Kaisha | Anti-vibration apparatus and anti-vibration method thereof |
| JP3286201B2 (ja) | 1997-03-07 | 2002-05-27 | キヤノン株式会社 | 能動的除振装置 |
| JPH10261561A (ja) | 1997-03-18 | 1998-09-29 | Toshiba Corp | 露光制御方法及びその装置 |
| JPH10311364A (ja) | 1997-05-09 | 1998-11-24 | Canon Inc | 能動的除振制振装置 |
| JP2002505596A (ja) | 1997-05-23 | 2002-02-19 | トランサージカル，インコーポレイテッド | Ｍｒｉ誘導治療装置及び方法 |
| JP4313865B2 (ja) | 1998-01-14 | 2009-08-12 | キヤノン株式会社 | 除振装置 |
| JP4109747B2 (ja) | 1998-05-07 | 2008-07-02 | キヤノン株式会社 | アクティブ除振装置および露光装置 |
-
2000
- 2000-02-09 JP JP2000031342A patent/JP4416250B2/ja not_active Expired - Fee Related
-
2001
- 2001-02-07 US US09/777,955 patent/US6684132B2/en not_active Expired - Lifetime
- 2001-02-07 EP EP01301082A patent/EP1124078B1/en not_active Expired - Lifetime
- 2001-02-07 DE DE60114260T patent/DE60114260T2/de not_active Expired - Fee Related
- 2001-02-07 TW TW090102620A patent/TW535227B/zh not_active IP Right Cessation
- 2001-02-09 KR KR1020010006294A patent/KR20010078795A/ko not_active Application Discontinuation