JP2001157879A - 水溶液のｐＨ制御の方法及びその装置 - Google Patents

水溶液のｐＨ制御の方法及びその装置

Info

Publication number
JP2001157879A
JP2001157879A JP2000305498A JP2000305498A JP2001157879A JP 2001157879 A JP2001157879 A JP 2001157879A JP 2000305498 A JP2000305498 A JP 2000305498A JP 2000305498 A JP2000305498 A JP 2000305498A JP 2001157879 A JP2001157879 A JP 2001157879A
Authority
JP
Japan
Prior art keywords
gas
aqueous solution
substrate
water
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000305498A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001157879A5 (enExample
Inventor
Ikunori Yokoi
生憲 横井
Toshihiro Ii
稔博 伊井
Tadahiro Omi
忠弘 大見
Takehisa Nitta
雄久 新田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UCT Corp
Original Assignee
UCT Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UCT Corp filed Critical UCT Corp
Priority to JP2000305498A priority Critical patent/JP2001157879A/ja
Publication of JP2001157879A publication Critical patent/JP2001157879A/ja
Publication of JP2001157879A5 publication Critical patent/JP2001157879A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Physical Water Treatments (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2000305498A 1999-08-31 2000-08-31 水溶液のｐＨ制御の方法及びその装置 Pending JP2001157879A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000305498A JP2001157879A (ja) 1999-08-31 2000-08-31 水溶液のｐＨ制御の方法及びその装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP28585199 1999-08-31
JP11-285851 1999-08-31
JP2000305498A JP2001157879A (ja) 1999-08-31 2000-08-31 水溶液のｐＨ制御の方法及びその装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010002909A Division JP2010135810A (ja) 1999-08-31 2010-01-08 水溶液のｐＨ及び酸化還元電位の制御方法及びその装置

Publications (2)

Publication Number Publication Date
JP2001157879A true JP2001157879A (ja) 2001-06-12
JP2001157879A5 JP2001157879A5 (enExample) 2007-10-11

Family

ID=26556046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000305498A Pending JP2001157879A (ja) 1999-08-31 2000-08-31 水溶液のｐＨ制御の方法及びその装置

Country Status (1)

Country Link
JP (1) JP2001157879A (enExample)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004016729A3 (en) * 2002-08-19 2005-06-30 Bioprocessors Corp SYSTEMS AND METHODS FOR CONTROL OF pH AND OTHER REACTOR ENVIRONMENTAL CONDITIONS
JP2010046570A (ja) * 2008-08-19 2010-03-04 Japan Organo Co Ltd 超音波処理装置用供給液の製造装置、超音波処理装置用供給液の製造方法及び超音波処理システム
JP2013045961A (ja) * 2011-08-25 2013-03-04 Dainippon Screen Mfg Co Ltd 基板洗浄方法、基板洗浄液および基板処理装置
JP2014151270A (ja) * 2013-02-08 2014-08-25 Yukinobu Mori 水素水製造装置及び水素水の製造方法
WO2018179493A1 (ja) * 2017-03-30 2018-10-04 栗田工業株式会社 ｐＨ・酸化還元電位調整水の製造装置
JP2018171610A (ja) * 2018-02-14 2018-11-08 栗田工業株式会社 ｐＨ・酸化還元電位調整水の製造装置
WO2019167289A1 (ja) * 2018-02-27 2019-09-06 栗田工業株式会社 ｐＨ・酸化還元電位調整水の製造装置
JP2021087957A (ja) * 2021-03-11 2021-06-10 栗田工業株式会社 水質調整水の製造方法及び装置
CN113406176A (zh) * 2021-07-05 2021-09-17 深圳科瑞德健康科技有限公司 一种附带机械搅拌的水溶液氧化还原电位值快速测试装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10128254A (ja) * 1996-10-29 1998-05-19 Japan Organo Co Ltd 電子部品部材類の洗浄方法及び洗浄装置
JPH1129795A (ja) * 1997-07-08 1999-02-02 Kurita Water Ind Ltd 電子材料用洗浄水、その製造方法及び電子材料の洗浄方法
JPH11219927A (ja) * 1998-02-02 1999-08-10 Kurita Water Ind Ltd 電子材料洗浄方法及び電子材料用洗浄水

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10128254A (ja) * 1996-10-29 1998-05-19 Japan Organo Co Ltd 電子部品部材類の洗浄方法及び洗浄装置
JPH1129795A (ja) * 1997-07-08 1999-02-02 Kurita Water Ind Ltd 電子材料用洗浄水、その製造方法及び電子材料の洗浄方法
JPH11219927A (ja) * 1998-02-02 1999-08-10 Kurita Water Ind Ltd 電子材料洗浄方法及び電子材料用洗浄水

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004016729A3 (en) * 2002-08-19 2005-06-30 Bioprocessors Corp SYSTEMS AND METHODS FOR CONTROL OF pH AND OTHER REACTOR ENVIRONMENTAL CONDITIONS
JP2010046570A (ja) * 2008-08-19 2010-03-04 Japan Organo Co Ltd 超音波処理装置用供給液の製造装置、超音波処理装置用供給液の製造方法及び超音波処理システム
JP2013045961A (ja) * 2011-08-25 2013-03-04 Dainippon Screen Mfg Co Ltd 基板洗浄方法、基板洗浄液および基板処理装置
JP2014151270A (ja) * 2013-02-08 2014-08-25 Yukinobu Mori 水素水製造装置及び水素水の製造方法
US11339065B2 (en) 2017-03-30 2022-05-24 Kurita Water Industries Ltd. Apparatus for producing aqueous pH- and redox potential-adjusting solution
WO2018179493A1 (ja) * 2017-03-30 2018-10-04 栗田工業株式会社 ｐＨ・酸化還元電位調整水の製造装置
JP2018167245A (ja) * 2017-03-30 2018-11-01 栗田工業株式会社 ｐＨ・酸化還元電位調整水の製造装置
JP2018171610A (ja) * 2018-02-14 2018-11-08 栗田工業株式会社 ｐＨ・酸化還元電位調整水の製造装置
WO2019167289A1 (ja) * 2018-02-27 2019-09-06 栗田工業株式会社 ｐＨ・酸化還元電位調整水の製造装置
JP2021087957A (ja) * 2021-03-11 2021-06-10 栗田工業株式会社 水質調整水の製造方法及び装置
JP7147898B2 (ja) 2021-03-11 2022-10-05 栗田工業株式会社 水質調整水の製造方法及び装置
CN113406176A (zh) * 2021-07-05 2021-09-17 深圳科瑞德健康科技有限公司 一种附带机械搅拌的水溶液氧化还原电位值快速测试装置
CN113406176B (zh) * 2021-07-05 2022-03-22 深圳科瑞德健康科技有限公司 一种附带机械搅拌的水溶液氧化还原电位值快速测试装置

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