JP2001156246A - Mounting structure and mounting method for integrated circuit chip - Google Patents

Mounting structure and mounting method for integrated circuit chip

Info

Publication number
JP2001156246A
JP2001156246A JP33401999A JP33401999A JP2001156246A JP 2001156246 A JP2001156246 A JP 2001156246A JP 33401999 A JP33401999 A JP 33401999A JP 33401999 A JP33401999 A JP 33401999A JP 2001156246 A JP2001156246 A JP 2001156246A
Authority
JP
Japan
Prior art keywords
integrated circuit
circuit chip
chip
wiring board
lsi
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP33401999A
Other languages
Japanese (ja)
Other versions
JP3414342B2 (en
Inventor
Hironobu Ikeda
博伸 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP33401999A priority Critical patent/JP3414342B2/en
Priority to US09/667,522 priority patent/US6518666B1/en
Publication of JP2001156246A publication Critical patent/JP2001156246A/en
Application granted granted Critical
Publication of JP3414342B2 publication Critical patent/JP3414342B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0271Arrangements for reducing stress or warp in rigid printed circuit boards, e.g. caused by loads, vibrations or differences in thermal expansion
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3735Laminates or multilayers, e.g. direct bond copper ceramic substrates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0216Reduction of cross-talk, noise or electromagnetic interference
    • H05K1/023Reduction of cross-talk, noise or electromagnetic interference using auxiliary mounted passive components or auxiliary substances
    • H05K1/0231Capacitors or dielectric substances
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73253Bump and layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01019Potassium [K]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19106Disposition of discrete passive components in a mirrored arrangement on two different side of a common die mounting substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress
    • H01L2924/3511Warping
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/06Thermal details
    • H05K2201/068Thermal details wherein the coefficient of thermal expansion is important
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10431Details of mounted components
    • H05K2201/10507Involving several components
    • H05K2201/10545Related components mounted on both sides of the PCB
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10613Details of electrical connections of non-printed components, e.g. special leads
    • H05K2201/10621Components characterised by their electrical contacts
    • H05K2201/10674Flip chip
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/20Details of printed circuits not provided for in H05K2201/01 - H05K2201/10
    • H05K2201/2009Reinforced areas, e.g. for a specific part of a flexible printed circuit
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0058Laminating printed circuit boards onto other substrates, e.g. metallic substrates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/284Applying non-metallic protective coatings for encapsulating mounted components

Abstract

PROBLEM TO BE SOLVED: To easily suppress warpage of an LSI when a plurality of LSIs are mounted on a circuit board. SOLUTION: The mounting structure of the integrated circuit chip comprises a circuit board 2 and a plurality of integrated circuit chips (LSI1) mounted on the board 2. At least one of the chips is flip-chip mounted on the main surface of the board 2, and the flip-chip mounted part is resin-sealed. Further, a plate member (flat plate 5) is adhered onto the rear surface of the board 2 oppositely to the flip-chip mounted integrated circuit chips through a resin (sealing resin 3).

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、集積回路チップの
実装構造および実装方法に関し、特にCOB(Chip On
Board )等の集積回路チップの実装構造および実装方法
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mounting structure and a mounting method for an integrated circuit chip, and more particularly to a COB (Chip On Chip).
The present invention relates to a mounting structure and a mounting method of an integrated circuit chip such as a board.

【0002】[0002]

【従来の技術】従来、配線基板上に集積回路チップ(以
下、LSIという)をフリップチップ実装し、LSI接
合部を封止樹脂で充填する構造においては、配線基板の
材料として柔らかいプリント配線基板を使用すると、L
SI搭載部がLSI搭載側に凸形状に変形しやすいとい
う問題点があった。
2. Description of the Related Art Conventionally, in a structure in which an integrated circuit chip (hereinafter, referred to as LSI) is flip-chip mounted on a wiring board and an LSI joint is filled with a sealing resin, a soft printed wiring board is used as a material of the wiring board. When used, L
There is a problem that the SI mounting portion is easily deformed into a convex shape on the LSI mounting side.

【0003】図17は、従来のCOBを示す斜視図であ
る。同図に示すように、一枚の配線基板102上にLS
I101、ドライバIC112等の能動素子やチップコ
ンデンサ112、タンタル・コンデンサ112a等の受
動素子、コネクタ112cが搭載されてCOB100が
構成されている。LSI101と配線基板102との隙
間には封止樹脂103が注入されており、LSI101
上には放熱のためのヒートシンク110が熱伝導部材を
介して取り付けられている。また、配線基板102上に
は各LSI101のバイパスコンデンサとして機能する
チップコンデンサ112がはんだ付けされている。コネ
クタ112c内の各端子は、配線基板102の表面また
は内部に設けられた配線を介して、LSI101等と接
続されている。したがって、COB100は、このコネ
クタ112cを介して外部機器と電気的に接続されるこ
とになる。
FIG. 17 is a perspective view showing a conventional COB. As shown in FIG.
The COB 100 is configured by mounting an active element such as I101, a driver IC 112, a passive element such as a chip capacitor 112, a tantalum capacitor 112a, and a connector 112c. A sealing resin 103 is injected into a gap between the LSI 101 and the wiring board 102, and the LSI 101
A heat sink 110 for heat dissipation is mounted on the upper side via a heat conducting member. A chip capacitor 112 functioning as a bypass capacitor of each LSI 101 is soldered on the wiring board 102. Each terminal in the connector 112c is connected to the LSI 101 or the like via wiring provided on the surface or inside of the wiring board 102. Therefore, the COB 100 is electrically connected to an external device via the connector 112c.

【0004】図18は、LSIの裏面にヒートシンクを
取り付けた様子を示す断面図である。同図に示すよう
に、この状態でLSIの裏面にヒートシンクを取り付け
ようとする場合、熱伝導部材9の厚みが均一にならず、
外周へ行くほどヒートシンク10とLSI1との距離が
遠くなり、熱抵抗が高くなるため放熱効果が悪化すると
いう問題がある。また、LSIの動作中の温度変化によ
って、LSIの反りが大きくなったり小さくなったりす
るという現象が発生し、熱伝導部材9の剥離やはみ出し
等が発生したり、さらに反りが大きくなるとLSIにク
ラックが発生して破壊されてしまったりする危険性があ
る。この問題を解決するためには、LSIの反りが変化
しにくい構造を実現することである。
FIG. 18 is a sectional view showing a state where a heat sink is attached to the back surface of the LSI. As shown in the figure, when attaching a heat sink to the back surface of the LSI in this state, the thickness of the heat conducting member 9 is not uniform,
There is a problem that the distance between the heat sink 10 and the LSI 1 becomes farther toward the outer periphery and the thermal resistance becomes higher, so that the heat radiation effect is deteriorated. In addition, a phenomenon in which the warpage of the LSI increases or decreases due to a temperature change during the operation of the LSI, and peeling or protrusion of the heat conducting member 9 occurs, and when the warpage further increases, cracks may occur in the LSI. There is a risk of being destroyed by the occurrence. In order to solve this problem, it is necessary to realize a structure in which the warpage of the LSI hardly changes.

【0005】[0005]

【発明が解決しようとする課題】このように、従来にお
いては放熱効果および反りなどの問題点があった。そこ
で、このような問題点を解決すべく、特開平10−22
9102号公報(電子製品)には、配線基板上に搭載し
たLSIチップと対向して配線基板の裏面に別のLSI
チップを搭載ことにより、LSIチップの反りを防止す
る技術が開示されている。しかしながら、この技術は、
同一形状の2個のLSIチップを一組として実装する場
合にしか適用できない。
As described above, conventionally, there have been problems such as a heat radiation effect and warpage. In order to solve such a problem, Japanese Patent Laid-Open Publication No.
No. 9102 (electronic product) discloses that another LSI is provided on the back surface of a wiring board so as to face an LSI chip mounted on the wiring board.
There is disclosed a technology for mounting a chip to prevent warpage of an LSI chip. However, this technology
This is applicable only when two LSI chips having the same shape are mounted as a set.

【0006】また、一般的にLSIチップには数百から
千個を超える多数のはんだバンプが設けられていること
から、配線基板の両面にLSIチップを搭載する場合、
同様に電極パッドも配線基板の両面に設ける必要があ
る。そのため、配線基板の構造が非常に複雑なものとな
り、製造が困難となる。今後、CPU等の大規模集積回
路においては、チップサイズが大きくなるとともに、そ
の端子数はますます増加する傾向にあり、配線基板を製
造する観点からしても、上記公報に開示された技術をL
SIの反り防止のために採用することは得策でない。本
発明は、このような課題を解決するためのものであり、
配線基板上に複数のLSIを搭載する際にLSIの反り
を容易に抑制することができる集積回路チップの実装構
造および実装方法を提供することを目的とする。
In general, since a large number of solder bumps of hundreds to thousands are provided on an LSI chip, when the LSI chip is mounted on both sides of a wiring board,
Similarly, electrode pads need to be provided on both sides of the wiring board. Therefore, the structure of the wiring board becomes very complicated, and the manufacturing becomes difficult. In the future, in large-scale integrated circuits such as CPUs, as the chip size becomes larger, the number of terminals tends to increase more and more. L
It is not advisable to employ it to prevent SI warpage. The present invention is to solve such a problem,
An object of the present invention is to provide a mounting structure and a mounting method of an integrated circuit chip that can easily suppress warpage of an LSI when mounting a plurality of LSIs on a wiring board.

【0007】[0007]

【課題を解決するための手段】このような目的を達成す
るために、本発明に係る集積回路チップの実装構造は、
配線基板と、この配線基板上に搭載された複数の集積回
路チップとを備えた集積回路チップの実装構造におい
て、前記集積回路チップのうちの少なくとも一つは、前
記配線基板の主表面にフリップチップ実装されるととも
に、このフリップチップ実装された部分が樹脂封止さ
れ、さらに前記フリップチップ実装された集積回路チッ
プと対向して前記配線基板の裏面に樹脂を介して板部材
が接着されている。
In order to achieve such an object, the mounting structure of the integrated circuit chip according to the present invention is as follows.
In a mounting structure of an integrated circuit chip including a wiring substrate and a plurality of integrated circuit chips mounted on the wiring substrate, at least one of the integrated circuit chips is flip-chip mounted on a main surface of the wiring substrate. While being mounted, the flip-chip mounted portion is resin-sealed, and a plate member is adhered to the back surface of the wiring board via a resin so as to face the flip-chip mounted integrated circuit chip.

【0008】また、本発明はその他の態様として以下に
示す構造を含む。すなわち、前記板部材は、その熱膨張
係数が前記配線基板のものよりも小さくかつ前記集積回
路チップのものよりも大きくてもよい。また、前記板部
材は、その大きさが前記集積回路チップの外形の80〜
120%以内であってもよい。また、前記板部材は、そ
の材料がアルミナ、42アロイ合金、ジルコニアまたは
フォルステライトの何れかであってもよい。また、前記
集積回路チップの裏面に、熱伝導部材を介してヒートシ
ンクが設けられていてもよい。また、前記板部材と前記
配線基板との間における前記配線基板上に、複数のチッ
プコンデンサが設けられていてもよい。また、前記板部
材と前記配線基板との間における前記配線基板上に、複
数のチップ抵抗が設けられていてもよい。
Further, the present invention includes the following structure as another embodiment. That is, the plate member may have a coefficient of thermal expansion smaller than that of the wiring board and larger than that of the integrated circuit chip. Further, the plate member has a size of 80 to 80 times the outer shape of the integrated circuit chip.
It may be within 120%. Further, the material of the plate member may be any one of alumina, a 42 alloy alloy, zirconia and forsterite. Further, a heat sink may be provided on the back surface of the integrated circuit chip via a heat conducting member. Further, a plurality of chip capacitors may be provided on the wiring board between the plate member and the wiring board. Further, a plurality of chip resistors may be provided on the wiring board between the plate member and the wiring board.

【0009】また、前記複数のチップコンデンサは、前
記集積回路チップの中央部付近よりもその周縁部付近に
密集するようにして配置されていてもよい。また、前記
複数のチップ抵抗は、前記集積回路チップの中央部付近
よりもその周縁部付近に密集するようにして配置されて
いてもよい。また、前記複数のチップコンデンサは、前
記集積回路チップの中央部付近に薄いものが配置され、
前記集積回路チップの周縁部付近に厚いものが配置され
ていてもよい。
[0009] Further, the plurality of chip capacitors may be arranged so as to be closer to a periphery of the integrated circuit chip than to a center of the integrated circuit chip. Further, the plurality of chip resistors may be arranged so as to be closer to a periphery of the integrated circuit chip than to a center of the integrated circuit chip. Further, the plurality of chip capacitors are disposed thin near the center of the integrated circuit chip,
Thick ones may be arranged near the periphery of the integrated circuit chip.

【0010】また、前記複数のチップ抵抗は、前記集積
回路チップの中央部付近に薄いものが配置され、前記集
積回路チップの周縁部付近に厚いものが配置されていて
もよい。また、前記配線基板は、エポキシ系の有機樹脂
からなる基板、セラミック基板またはセラミック基板上
に薄膜配線層を持つ基板の何れかであってもよい。さら
に、前記集積回路チップと前記配線基板との接続は、前
記集積回路チップ側に設けられたAuのボールバンプ
と、前記配線基板側に設けられた導電性樹脂もしくはI
n/Sn系はんだまたはAg/Sn系はんだとの接合に
よって実現されていてもよい。
The plurality of chip resistors may be thin near the center of the integrated circuit chip and thick near the periphery of the integrated circuit chip. Further, the wiring substrate may be any one of a substrate made of an epoxy-based organic resin, a ceramic substrate, and a substrate having a thin film wiring layer on a ceramic substrate. Further, the connection between the integrated circuit chip and the wiring substrate is performed by connecting an Au ball bump provided on the integrated circuit chip side to a conductive resin or an I.V.
It may be realized by bonding with n / Sn-based solder or Ag / Sn-based solder.

【0011】次に、本発明に係る集積回路チップの実装
方法は、配線基板上に複数の集積回路チップを実装する
方法において、前記集積回路チップのうちの少なくとも
一つを、前記配線基板の主表面にフリップチップ実装す
るとともに、このフリップチップ実装された部分を樹脂
封止し、さらに前記フリップチップ実装された集積回路
チップと対向して前記配線基板の裏面に樹脂を介して板
部材を接着するものである。また、本発明のその他の態
様として、上述の実装構造の発明と同様の限定を加えて
もよい。
Next, according to a method of mounting an integrated circuit chip according to the present invention, in a method of mounting a plurality of integrated circuit chips on a wiring board, at least one of the integrated circuit chips is connected to a main board of the wiring board. Flip-chip mounting is performed on the front surface, the portion on which the flip-chip is mounted is resin-sealed, and a plate member is bonded to the back surface of the wiring board via a resin in opposition to the flip-chip mounted integrated circuit chip. Things. Further, as other aspects of the present invention, the same limitations as those of the above-described mounting structure may be added.

【0012】このように構成することにより本発明は、
LSIの反りを抑えることが可能となり、ヒートシンク
とLSIの接合面に設ける熱伝導部材を薄く均一化でき
ることによって、放熱効果の高いLSIパッケージ構造
を得ることができる。また、上記構造において、裏面平
板と配線基板の間隙の配線基板上にチップコンデンサを
配置することによって、LSIの急激な電圧変動を抑え
ることが可能となり、高速動作を実現することが可能と
なる。
With this configuration, the present invention provides:
The warpage of the LSI can be suppressed, and the heat conductive member provided on the joint surface between the heat sink and the LSI can be made thin and uniform, so that an LSI package structure having a high heat radiation effect can be obtained. Further, in the above structure, by arranging the chip capacitor on the wiring board in the gap between the rear flat plate and the wiring board, it is possible to suppress a sudden voltage fluctuation of the LSI and realize a high-speed operation.

【0013】[0013]

【発明の実施の形態】次に、本発明の実施の形態につい
て図を参照しながら説明する。本発明は、図17で示し
たCOBに適用可能な集積回路チップの実装構造等に関
するものであり、以下においては発明のポイントである
集積回路チップの周辺構造を重点的に説明する。
Next, an embodiment of the present invention will be described with reference to the drawings. The present invention relates to a mounting structure of an integrated circuit chip applicable to the COB shown in FIG. 17, and the following mainly describes a peripheral structure of the integrated circuit chip, which is a point of the present invention.

【0014】[第1の実施の形態]図1は、本発明の第
1の実施の形態を示す断面図である。同図に示すよう
に、配線基板2上にはLSI1の電極の配置に対応した
パッドが設けられており、LSI1の電極と配線基板2
のパッドとがフリップチップ接続されている。電極はL
SIの外周もしくは格子状に配置されており、はんだ等
の導電性材料により接続されている。さらにLSI接合
部には、封止樹脂3が充填されており、LSI接合部を
機械的に補強すると共に外部からの水分の浸入を抑制し
腐食を防止する役目を果たしている。LSI1が搭載さ
れている配線基板2の裏面には、LSI1と対向するよ
うに平板5が配置されており、封止樹脂13によって固
着されている。なお、配線基板2の裏面に配置する平板
5は、その熱膨張係数が配線基板2と同等もしくは小さ
く、外形はLSI1の大きさと略同一もしくは大きくす
るとよい。具体的には、LSI1の外形の80〜120
%以内であればよいことが、本願発明者の実験によって
確認されている。LSI1が20mm□であれば、平板
5は16〜24mm□とすればよい。
[First Embodiment] FIG. 1 is a sectional view showing a first embodiment of the present invention. As shown in the figure, pads corresponding to the arrangement of the electrodes of the LSI 1 are provided on the wiring board 2, and the electrodes of the LSI 1 and the wiring board 2 are provided.
Pads are flip-chip connected. The electrode is L
They are arranged on the outer periphery of the SI or in a grid, and are connected by a conductive material such as solder. Further, the LSI bonding portion is filled with a sealing resin 3, which serves to mechanically reinforce the LSI bonding portion and to suppress intrusion of moisture from the outside to prevent corrosion. On the back surface of the wiring board 2 on which the LSI 1 is mounted, a flat plate 5 is arranged so as to face the LSI 1, and is fixed by a sealing resin 13. Note that the flat plate 5 disposed on the back surface of the wiring board 2 preferably has a coefficient of thermal expansion equal to or smaller than that of the wiring board 2 and an outer shape substantially equal to or larger than the size of the LSI 1. Specifically, 80 to 120 of the outer shape of the LSI 1
% Has been confirmed by experiments by the present inventor. If the LSI 1 is 20 mm square, the flat plate 5 may be 16 to 24 mm square.

【0015】一般的に、LSIの熱膨張係数に対し配線
基板の熱膨張係数は大きいため、従来例のように配線基
板2の裏面に平板が配置されない状態では、配線基板2
とLSI1との熱膨張係数の差により、LSI搭載側に
凸形状の反りが発生する。本実施の形態のように、配線
基板の熱膨張係数と同等の材料の平板を配線基板の裏面
に固着することによって、配線基板の見かけ上の厚みが
大きくなり、基板の剛性が向上するためLSIの反りを
小さくすることができる。
Generally, the thermal expansion coefficient of the wiring board is larger than the thermal expansion coefficient of the LSI. Therefore, when the flat plate is not arranged on the back surface of the wiring board 2 as in the conventional example, the wiring board 2
Due to the difference between the thermal expansion coefficients of the LSI and LSI1, a convex warpage occurs on the LSI mounting side. By fixing a flat plate made of a material equivalent to the thermal expansion coefficient of the wiring board to the back surface of the wiring board as in the present embodiment, the apparent thickness of the wiring board is increased, and the rigidity of the board is improved. Warpage can be reduced.

【0016】次に、本実施の形態の製造工程について図
2〜5を参照しながら説明する。図2は、配線基板2上
にLSI1をフリップチップ実装した構造を示す断面図
である。同図に示すように、配線基板2上にはLSI1
の電極と同じ配置のパッドが設けられており、LSI1
の電極とはんだ付け等によって電気的に接続されてい
る。工法としてはLSI1の電極に予め球状のはんだバ
ンプ(例えばSn63/Pb37wt%やSn5 /Pb95
t%)を設けておき、配線基板2のパッド上に予めクリ
ームはんだ(例えばSn63/Pb37wt%)を印刷して
おき、配線基板2のパッドとLSI1のはんだバンプが
対向するようにLSI1を搭載し、熱風炉等による加熱
リフロー(例えば210℃加熱)を行い、冷却すること
により配線基板2とLSI1との接続が完了する。
Next, the manufacturing process of this embodiment will be described with reference to FIGS. FIG. 2 is a cross-sectional view showing a structure in which the LSI 1 is flip-chip mounted on the wiring board 2. As shown in FIG.
Pads having the same arrangement as the electrodes of
And is electrically connected by soldering or the like. As a construction method, a spherical solder bump (for example, Sn 63 / Pb 37 wt% or Sn 5 / Pb 95 w
t%), cream solder (for example, Sn 63 / Pb 37 wt%) is printed on the pads of the wiring board 2 in advance, and the LSI 1 is mounted such that the pads of the wiring board 2 and the solder bumps of the LSI 1 face each other. Is mounted, and a heating reflow (for example, heating at 210 ° C.) is performed by a hot air oven or the like, and the connection between the wiring board 2 and the LSI 1 is completed by cooling.

【0017】このとき、LSI1と配線基板2の熱膨張
係数に差があると、LSI搭載側が凸形状となるように
小さな反り6が発生する。LSIの材料はSi(シリコ
ン)であるため熱膨張係数は約3ppm/℃であるのに
対し、エポキシ系の有機材料で製造された配線基板の熱
膨張係数は概ね12〜20ppm/℃である。はんだ付
けにおける加熱リフロー時では、はんだは溶融してお
り、LSIと配線基板それぞれ外部からの応力は受けな
いので変形することはないが、はんだの固相点(例えば
Sn63/Pb37wt%のはんだの場合は183℃)より
温度が低くなった時点でLSI1と配線基板2は機械的
に固定される。高温時から常温(例えば25℃)に戻る
間に、LSI1と配線基板2は収縮するが、配線基板2
の熱膨張係数はLSI1の熱膨張係数より大きいため収
縮量も大きく、温度が下がるに従ってLSI搭載面側に
凸形状の反りが発生する。配線基板2とLSI1との熱
膨張係数差による熱ストレスはLSI接合部4に集中す
るが、はんだ接続の場合、はんだは比較的柔らかい材料
であるため変形もすることになり、結果的に小さな反り
6が発生することになる。
At this time, if there is a difference between the thermal expansion coefficients of the LSI 1 and the wiring board 2, a small warp 6 is generated so that the LSI mounting side has a convex shape. Since the material of the LSI is Si (silicon), the coefficient of thermal expansion is about 3 ppm / ° C., whereas the coefficient of thermal expansion of a wiring board made of an epoxy-based organic material is about 12 to 20 ppm / ° C. At the time of heating reflow in soldering, the solder is not deformed because the LSI and the wiring board are not subjected to stresses from the outside, however, the solid phase point of the solder (for example, Sn 63 / Pb 37 wt% When the temperature becomes lower than 183 ° C. in the case of solder), the LSI 1 and the wiring board 2 are mechanically fixed. While returning from a high temperature to a normal temperature (for example, 25 ° C.), the LSI 1 and the wiring board 2 shrink.
The thermal expansion coefficient is larger than the thermal expansion coefficient of the LSI 1, so that the amount of shrinkage is large. As the temperature decreases, a convex warpage occurs on the LSI mounting surface side. Although the thermal stress due to the difference in thermal expansion coefficient between the wiring board 2 and the LSI 1 concentrates on the LSI joint 4, in the case of the solder connection, the solder is a relatively soft material and is deformed, resulting in a small warpage. 6 will occur.

【0018】図3は、LSI1がフリップチップ実装さ
れた配線基板2のLSI接合部4に封止樹脂3が充填さ
れた構造を示す断面図である。同図に示すように、LS
I接合部を洗浄後、液状の封止樹脂をLSI1の外周か
ら充填する。封止樹脂はエポキシ系もしくは熱可塑性の
絶縁樹脂であり、LSI1と配線基板2の狭い間隙に充
填するため封止樹脂の流動性が良い温度(例えば60
℃)で充填する。LSI接合部4の接続信頼性を確保す
るためには封止樹脂をすき間無く充填する必要があり、
通常LSIの1辺もしくは隣り合う2辺から充填し、気
泡がLSI接合部に存在しないように注意する。充填が
完了後、封止樹脂を硬化させるため加熱する(例えば1
50℃/30分)。加熱中、LSI1や配線基板2は再
び熱膨張するため、存在していたLSI側の凸形状の反
りは減少し、平坦に近づく。しかしながら硬化後常温に
戻るとき、再び熱収縮が起こり、LSI1と配線基板2
は封止樹脂3によって完全に固着されているため、LS
I側に凸形状の大きな反り8が発生する。例えば、LS
Iの外形が10mm×10mm、配線基板の材料がFR
4(ガラスエポキシ基板)で厚み1mmの場合、約50
〜100μmの反りが発生することがある。
FIG. 3 is a sectional view showing a structure in which a sealing resin 3 is filled in an LSI joint 4 of a wiring board 2 on which an LSI 1 is flip-chip mounted. As shown in FIG.
After cleaning the I junction, a liquid sealing resin is filled from the outer periphery of the LSI 1. The sealing resin is an epoxy-based or thermoplastic insulating resin, and is used to fill a narrow gap between the LSI 1 and the wiring board 2 at a temperature at which the sealing resin has good fluidity (for example, 60 ° C.).
C). In order to ensure the connection reliability of the LSI joint 4, it is necessary to fill the sealing resin without any gaps.
Normally, filling is performed from one side or two adjacent sides of the LSI, and care is taken so that air bubbles do not exist at the LSI junction. After the filling is completed, heating is performed to cure the sealing resin (for example, 1
50 ° C./30 minutes). During the heating, the LSI 1 and the wiring board 2 thermally expand again, so that the existing convex warpage on the LSI side is reduced and becomes closer to flat. However, when the temperature returns to room temperature after curing, heat shrinkage occurs again, and the LSI 1 and the wiring board 2
Is completely fixed by the sealing resin 3 so that LS
A large convex-shaped warp 8 occurs on the I side. For example, LS
The outer shape of I is 10mm x 10mm, and the material of the wiring board is FR
4 (glass epoxy board) with a thickness of 1 mm, about 50
Warpage of about 100 μm may occur.

【0019】図4は、LSI1が配線基板2にフリップ
チップ実装され、LSI接合部4に封止樹脂が充填さ
れ、配線基板2のLSI1搭載部裏面に平板5が配置さ
れている構造を示す断面図である。同図に示すように、
配線基板2の裏面が上面になるようにひっくり返し、L
SI搭載部中央に封止樹脂13をポッティングし、その
上から平板を押しつけ、その状態で加熱硬化を行う。封
止樹脂13の材料に、LSI接合部4の充填に使用した
封止樹脂3を使用した場合、加熱硬化温度は150℃で
あるので、LSI1と配線基板2は再び熱膨張を起こ
し、150℃到達時点で反りは平坦に近づく。この状態
で封止樹脂13は硬化するため、冷却後の反り量は平板
の材料に起因することになる。
FIG. 4 is a cross-sectional view showing a structure in which the LSI 1 is flip-chip mounted on the wiring board 2, the LSI bonding portion 4 is filled with a sealing resin, and the flat plate 5 is arranged on the back surface of the LSI 1 mounting portion of the wiring board 2. FIG. As shown in the figure,
Turn over so that the back surface of the wiring board 2 faces the top,
The sealing resin 13 is potted at the center of the SI mounting portion, a flat plate is pressed from above, and heat curing is performed in that state. When the sealing resin 3 used for filling the LSI joint 4 is used as the material of the sealing resin 13, the heat curing temperature is 150 ° C., so that the LSI 1 and the wiring board 2 undergo thermal expansion again and reach 150 ° C. At that point, the warp approaches flat. In this state, the sealing resin 13 is hardened, so that the amount of warpage after cooling depends on the material of the flat plate.

【0020】平板5の材料として、例えばLSI1と同
じ材料となるSi(シリコン)を使用した場合、配線基
板2は2枚のSiに挟まれる形となるため、反りが発生
する方向の力は相殺され、反りはほぼゼロに近い状態に
なる。平板の他の材料として、配線基板2より熱膨張係
数の小さい材料(例えばアルミナセラミックス(約7p
pm/℃)や42アロイ(Alloy)合金(約6pp
m/℃))、ジルコニア(約11ppm/℃)、フォル
ステライト(約10ppm/℃)等を用いることによ
り、反りを小さくすることが可能である。また、平板5
の材料として、配線基板2と同等の熱膨張係数の材料を
用いた場合、熱膨張係数の小さな材料を用いた場合ほど
反りを小さくする効果は無いが、配線基板の厚みが見か
け上大きくなるため、配線基板の剛性が高くなり、少し
ではあるが反りを小さくする効果が得られる。平板5の
外形はLSI1の外形より小さくした場合、LSI1の
外周部に熱ストレスが集中し、封止樹脂3の破壊やLS
I接合部4の破断等の不具合が生じる危険があるため好
ましくない。平板5の外形はLSI1より大きくするこ
とによってLSI接合部4の信頼性を向上させることが
可能となるが、もっとも良い構造は、LSI1の外形と
平板5の外形を略同一にする構造である。
When, for example, Si (silicon), which is the same material as the LSI 1, is used as the material of the flat plate 5, the wiring board 2 is sandwiched between two pieces of Si, so that the force in the direction in which warpage occurs is offset. And the warpage becomes almost zero. As another material of the flat plate, a material having a smaller coefficient of thermal expansion than the wiring board 2 (for example, alumina ceramics (about 7
pm / ° C) and 42 alloy (about 6 pp
m / ° C.), zirconia (about 11 ppm / ° C.), forsterite (about 10 ppm / ° C.), etc., can reduce the warpage. In addition, flat plate 5
When a material having a thermal expansion coefficient equivalent to that of the wiring board 2 is used as the material of the wiring board 2, the effect of reducing the warpage is not so large as when a material having a small thermal expansion coefficient is used, but the thickness of the wiring board becomes apparently large Thus, the rigidity of the wiring board is increased, and the effect of slightly reducing the warpage can be obtained. If the outer shape of the flat plate 5 is made smaller than the outer shape of the LSI 1, thermal stress concentrates on the outer peripheral portion of the
It is not preferable because there is a risk that a failure such as breakage of the I-joined portion 4 occurs. By making the outer shape of the flat plate 5 larger than that of the LSI 1, it is possible to improve the reliability of the LSI joint portion 4. However, the best structure is to make the outer shape of the LSI 1 and the outer shape of the flat plate 5 substantially the same.

【0021】図5は、LSI裏面にヒートシンクを取り
付けた構造の断面図である。ヒートシンク10の材料
は、放熱特性に優れたアルミニウム等が好ましく、LS
I1の裏面に熱伝導部材9を介して取り付けられてい
る。熱伝導部材9は熱伝導性に優れた材料から成ってお
り、例えばAg(銀)フィラー入りのエポキシ樹脂や、
アルミナセラミックスフィラー入りのシリコーンコンパ
ウンド等が使用される。LSI1の裏面は、平板5の効
果により反りの小さな面となっているため、LSI1の
熱をヒートシンク10へ伝達する熱伝導部材の厚みを薄
く均一にでき、効率の良い放熱効果を得ることができ
る。
FIG. 5 is a sectional view of a structure in which a heat sink is attached to the back surface of the LSI. The material of the heat sink 10 is preferably aluminum or the like having excellent heat radiation characteristics.
It is attached to the back surface of I1 via a heat conducting member 9. The heat conductive member 9 is made of a material having excellent heat conductivity, such as an epoxy resin containing Ag (silver) filler,
A silicone compound containing an alumina ceramic filler is used. Since the back surface of the LSI 1 has a small warpage due to the effect of the flat plate 5, the thickness of the heat conducting member for transmitting the heat of the LSI 1 to the heat sink 10 can be made thin and uniform, and an efficient heat radiation effect can be obtained. .

【0022】以上の説明から明らかなように、配線基板
上にLSIがフリップチップ実装され、LSI接合部に
封止樹脂が充填されている構造において、LSI搭載部
の配線基板裏面に平板を配置することによって、LSI
の反りを抑えることが可能となり、ヒートシンクとLS
Iの接合面に設ける熱伝導部材を薄く均一化できること
によって、放熱効果の高いLSIパッケージ構造を得る
ことができる。
As is clear from the above description, in a structure in which the LSI is flip-chip mounted on the wiring board and the sealing portion is filled in the LSI bonding portion, a flat plate is arranged on the back surface of the wiring board in the LSI mounting portion. By using LSI
Of the heat sink and LS
Since the heat conducting member provided on the bonding surface of I can be made thin and uniform, an LSI package structure having a high heat radiation effect can be obtained.

【0023】次に、本発明のその他の形態について説明
する。 [第2の実施の形態]図6は、本発明の第2の実施の形
態を示す断面図である。同図に示すように、配線基板2
上にはLSI1の電極の配置に対応したパッドが設けら
れており、LSI1の電極と配線基板2のパッドとが電
気的にフリップチップ接続されている。電極はLSIの
外周もしくは格子状に配置されており、はんだ付け等の
導電性材料により接続されている。さらにLSI接合部
には、封止樹脂が充填されており、LSI接合部を機械
的に補強すると共に外部からの水分の浸入を抑制し腐食
を防止する役目を果たしている。LSI1が搭載されて
いる配線基板2の裏面には、LSI1の外形と略同一の
エリア内にチップコンデンサ12を搭載するパッドが設
けられており、前記パッド上にチップコンデンサ12が
電気的に接続されており、さらにチップコンデンサ12
上に平板5が配置されており、封止樹脂13によって配
線基板2と平板5の間隙が充填、固着されている。チッ
プコンデンサ12は、電源ラインおよびグランドライン
に生じるノイズ電圧を低減するために設けられたバイパ
スコンデンサ(パスコン)として機能し、電源Vccと
グランドGNDとの間に設けられている。
Next, another embodiment of the present invention will be described. [Second Embodiment] FIG. 6 is a sectional view showing a second embodiment of the present invention. As shown in FIG.
Pads corresponding to the arrangement of the electrodes of the LSI 1 are provided on the upper side, and the electrodes of the LSI 1 and the pads of the wiring board 2 are electrically flip-chip connected. The electrodes are arranged on the outer periphery of the LSI or in a lattice, and are connected by a conductive material such as soldering. Further, the LSI bonding portion is filled with a sealing resin, and serves to mechanically reinforce the LSI bonding portion and to suppress intrusion of moisture from the outside to prevent corrosion. On the back surface of the wiring board 2 on which the LSI 1 is mounted, a pad for mounting the chip capacitor 12 is provided in an area substantially the same as the outer shape of the LSI 1, and the chip capacitor 12 is electrically connected to the pad. And the chip capacitor 12
The flat plate 5 is disposed thereon, and the gap between the wiring board 2 and the flat plate 5 is filled and fixed by the sealing resin 13. The chip capacitor 12 functions as a bypass capacitor (pass capacitor) provided to reduce a noise voltage generated in the power supply line and the ground line, and is provided between the power supply Vcc and the ground GND.

【0024】この構造では、図1に示すチップコンデン
サの無い構造と同様にLSIの反りをゼロに近づける効
果があると共に、LSI搭載部の真裏にチップコンデン
サを配置しているため、LSIの電圧変動を抑える効果
が非常に高く、高速動作に適した構造となる。
This structure has the effect of making the warpage of the LSI close to zero similarly to the structure having no chip capacitor shown in FIG. 1, and the chip capacitor is arranged directly behind the LSI mounting portion, so that the voltage fluctuation of the LSI The effect is extremely high, and the structure is suitable for high-speed operation.

【0025】組立工程としては、配線基板2のLSI搭
載側裏面に設けられたチップコンデンサ搭載用パッドに
クリームはんだを印刷し、チップコンデンサ12をクリ
ームはんだ上に搭載、その後加熱リフローを行うことに
よりチップコンデンサ12のはんだ付けが完了する。後
の工程は図2に示す、チップコンデンサが無いLSIパ
ッケージ構造と同じでよい。LSIの動作中の電圧変動
を抑える手段として、LSIの近傍にコンデンサを配置
することが一般的であるが、高速動作中の電圧変動を抑
える手段としては、できるだけLSIに近い位置にコン
デンサを配置した方が効果が高くなる。LSIの回路面
全面に電極が配置されたフリップチップ実装構造では、
配線基板のLSI搭載部裏面にコンデンサを配置するこ
とがもっとも効果が高いといえる。
In the assembling process, cream solder is printed on a chip capacitor mounting pad provided on the back surface of the wiring board 2 on the LSI mounting side, the chip capacitor 12 is mounted on the cream solder, and then heat reflow is performed. The soldering of the capacitor 12 is completed. The subsequent steps may be the same as the LSI package structure without a chip capacitor shown in FIG. As a means for suppressing voltage fluctuation during operation of the LSI, it is general to arrange a capacitor near the LSI. However, as a means for suppressing voltage fluctuation during high-speed operation, a capacitor is disposed at a position as close as possible to the LSI. The effect is higher. In a flip-chip mounting structure in which electrodes are arranged on the entire circuit surface of an LSI,
It can be said that arranging a capacitor on the back surface of the LSI mounting portion of the wiring board is the most effective.

【0026】また、図6の構造では、チップコンデンサ
12の上面に平板を配置しているが、図1のチップコン
デンサの無い構造と同様、LSI1の反りを抑える効果
は同様に得られ、図7に示すように、ヒートシンク10
をLSI1の裏面に取り付ける構造においても、熱伝導
部材9の厚みを薄く均一にでき、効率の良い放熱効果を
得ることができる。なお、ここで採用する平板材料とし
ては、チップコンデンサ12上に配置するため、導電性
材料ではチップコンデンサ12の電極間をショートさせ
る危険があり、絶縁性の材料(例えばアルミナ)や、金
属材料の場合は絶縁被覆処理(例えばポリイミドコート
等)を施した材料を使用することが好ましい。
In the structure of FIG. 6, a flat plate is arranged on the upper surface of the chip capacitor 12, but the effect of suppressing the warpage of the LSI 1 is obtained similarly as in the structure without the chip capacitor of FIG. As shown in FIG.
Also, in the structure in which the heat conductive member 9 is attached to the back surface of the LSI 1, the thickness of the heat conductive member 9 can be made thin and uniform, and an efficient heat radiation effect can be obtained. The flat plate material used here is disposed on the chip capacitor 12, so there is a danger of short-circuiting between the electrodes of the chip capacitor 12 with a conductive material, and there is a danger of insulating material (for example, alumina) or metal material. In this case, it is preferable to use a material which has been subjected to an insulating coating treatment (for example, a polyimide coat or the like).

【0027】図8は、チップコンデンサのレイアウトを
示す平面図である。ここで、図8(b)に示すレイアウ
トについて説明する。ここでは、LSIおよび平板の外
形を10mm□とし、チップコンデンサの外形を1.6
mm×0.8mmとするとともに、その厚みを0.5m
mとしている。チップコンデンサは3×5=15個配列
している。チップコンデンサの形状は全て同一とし、貼
り付ける平板の材料に対するLSIの反り量を図9に示
す。なお、平板の厚みは0.5mmに統一している。
FIG. 8 is a plan view showing a layout of a chip capacitor. Here, the layout shown in FIG. 8B will be described. Here, the outer shape of the LSI and the flat plate is 10 mm square, and the outer shape of the chip capacitor is 1.6 mm.
mm x 0.8mm and the thickness is 0.5m
m. 3 × 5 = 15 chip capacitors are arranged. The shape of the chip capacitors is all the same, and the warpage of the LSI with respect to the material of the flat plate to be attached is shown in FIG. The thickness of the flat plate is unified to 0.5 mm.

【0028】図10は、平板の厚みに対するLSIの反
り量を示すグラフである。なお、平板の材料はアルミナ
に統一している。厚みが0.5mmを超えると、剛性が
高くなり、反り量は平衡状態になる。
FIG. 10 is a graph showing the warpage of the LSI with respect to the thickness of the flat plate. The material of the flat plate is unified to alumina. When the thickness exceeds 0.5 mm, the rigidity increases, and the amount of warpage is in an equilibrium state.

【0029】図11は、チップコンデンサの数量(密
度)に対するLSIの反り量を示すグラフである。な
お、平板の材料はアルミナ(7ppm/℃)とし、厚み
は0.5mmに統一している。チップコンデンサの密度
が高くなると、基板自身の剛性が高くなり、反り量が小
さくなっていることがわかる。チップコンデンサは、容
量の違いや、精度の違いによって、形状が異なることが
ある。例えば、「1608」と称する外形1.6mm×
0.8mmのチップコンデンサにおいても、その厚みは約
0.5mmであったり、0.8mmであったりまちまち
である。このようなチップコンデンサを混載して搭載す
る場合、チップコンデンサの上面に貼り付ける平板が安
定するように、厚みの大きなチップコンデンサは四隅や
外周に配置することが望ましい。なお、ここではチップ
コンデンサを配置する例を示したが、他の受動素子(例
えばチップ抵抗、チョークコイル等)を同様に配置する
ことも可能である。さらには、単なるセラミック片、樹
脂片または金属片の何れか一種類または複数種類を組み
合わせて用いてもよいし、上記受動素子と混載して用い
てもよい。
FIG. 11 is a graph showing the amount of warpage of the LSI with respect to the number (density) of chip capacitors. The material of the flat plate is alumina (7 ppm / ° C.), and the thickness is unified to 0.5 mm. It can be seen that as the density of the chip capacitor increases, the rigidity of the substrate itself increases and the amount of warpage decreases. Chip capacitors may have different shapes due to differences in capacitance and accuracy. For example, an outer shape of 1.6 mm × “1608”
Even a chip capacitor of 0.8 mm has a thickness of about 0.5 mm or 0.8 mm. When such chip capacitors are mounted in a mixed manner, it is desirable to arrange thick chip capacitors at the four corners and the outer periphery so that a flat plate stuck on the upper surface of the chip capacitor is stabilized. Although an example in which a chip capacitor is arranged is shown here, other passive elements (for example, a chip resistor, a choke coil, and the like) can be similarly arranged. Further, any one or a combination of simple ceramic pieces, resin pieces, and metal pieces may be used, or may be used in combination with the passive element.

【0030】図12に、いくつかの受動素子配置例を示
す。図12(a)の配列Dは、「1608」のチップコ
ンデンサを4×6=24個等間隔で搭載し、四隅のチッ
プコンデンサは厚みの大きいもの(0.8mm)、その
他の20個は厚みの小さいもの(0.5mm)を搭載し
ている。図12(b)の配列Eは、配列Dの中央部の間
隙を十字状に広げた配置である。図12(c)の配列F
は、配列Eの中央部の4個をチップ抵抗とした場合であ
る。チップ抵抗の厚みは、厚みの小さなチップコンデン
サ12とほぼ同じ形状である。
FIG. 12 shows examples of some passive element arrangements. In the array D of FIG. 12A, 4 × 6 = 24 chip capacitors of “1608” are mounted at equal intervals, and the chip capacitors at the four corners have a large thickness (0.8 mm), and the other 20 capacitors have a thickness of 0.8 mm. (0.5 mm) is mounted. Array E in FIG. 12B is an arrangement in which the gap at the center of array D is expanded in a cross shape. Array F in FIG.
Shows the case where the four central resistors of the array E are chip resistors. The thickness of the chip resistor is almost the same as that of the chip capacitor 12 having a small thickness.

【0031】図13は、各配列に対するLSIの反り量
を示すグラフである。なお、平板の材料はジルコニア
(10ppm/℃)とし、厚みは0.5mmに統一して
いる。配列D〜Fは、四隅のチップコンデンサの厚みが
大きいため、中央付近の封止樹脂の厚みが大きくなるた
め、充填後の加熱硬化工程において樹脂収縮が起こり、
平板と配線基板が引き合う現象が発生し、同一高さのチ
ップコンデンサを均一に配置した配列CよりもLSIの
反り方向がマイナス側に寄ることになる。
FIG. 13 is a graph showing the amount of LSI warpage for each array. The material of the flat plate is zirconia (10 ppm / ° C.), and the thickness is unified to 0.5 mm. In the arrangements D to F, since the thickness of the chip capacitor at the four corners is large, the thickness of the sealing resin near the center is large, so that resin shrinkage occurs in the heat curing step after filling,
A phenomenon occurs in which the flat plate and the wiring board are attracted to each other, so that the warping direction of the LSI is shifted to the minus side from the arrangement C in which chip capacitors of the same height are uniformly arranged.

【0032】ここで、第2の実施の形態の製造工程につ
いて図を参照して説明する。図14、図15および図1
6は、第2の実施の形態の製造工程を示す断面図であ
り、熱処理等の条件は第1の実施の形態の場合と同様で
ある。まず、図14(a)に示すように、配線基板2上
には複数の電極パッド2bが予め設けられている。次い
で、図14(b)、(c)に示すように、配線基板2上
に、複数の貫通孔20aの開いたステンレス製のマスク
20を載置する。各貫通孔20aは、配線基板2上の電
極パッド2bと一致するように設けられている。したが
って、マスク20を載置すると、電極パッド2bのみが
貫通孔20aの底部に露出することになり、ゴム製のス
キージ22を使ってクリームはんだ21を広げることに
より、電極パッド2b上にのみクリームはんだ21を載
せることができる。
Here, the manufacturing process of the second embodiment will be described with reference to the drawings. 14, 15, and 1
FIG. 6 is a cross-sectional view showing the manufacturing process of the second embodiment, in which conditions such as heat treatment are the same as in the first embodiment. First, as shown in FIG. 14A, a plurality of electrode pads 2b are provided on the wiring board 2 in advance. Next, as shown in FIGS. 14B and 14C, a stainless steel mask 20 having a plurality of through holes 20 a is placed on the wiring board 2. Each through hole 20 a is provided so as to coincide with the electrode pad 2 b on the wiring board 2. Therefore, when the mask 20 is placed, only the electrode pad 2b is exposed at the bottom of the through-hole 20a, and the cream solder 21 is spread using the rubber squeegee 22. 21 can be placed.

【0033】次いで、図14(d)、(e)に示すよう
に、予めはんだバンプ4aを設けておいたLSI1を配
線基板2上に載置し、加熱リフローすることにより、溶
けたはんだによってLSI接合部4が形成されて、配線
基板2とLSI1とは電気的に接続される。次いで、図
15(f)、(g)に示すように、ディスペンサ23を
使って、液状の樹脂3aをLSI1と配線基板2との間
に流し込むことにより、樹脂3aは毛細管現象によって
LSI1と配線基板2との間に広がる。次いで、図15
(h)に示すように、キュアして樹脂3aを硬化させる
ことにより、LSI1と配線基板2との隙間を樹脂封止
することができる。その際、封止樹脂3aの体積が若干
減少することにより、LSI1および配線基板2は変形
し、LSI1側に凸形状の反りが生じる。次いで、図1
5(i)に示すように、LSI1の搭載された側を下に
して、LSI1の搭載されていない側の配線基板2上
に、LSI1の場合と同様にしてチップコンデンサ12
を搭載する。
Next, as shown in FIGS. 14D and 14E, the LSI 1 on which the solder bumps 4a are provided in advance is placed on the wiring board 2 and is heated and reflowed, so that the LSI 1 The bonding portion 4 is formed, and the wiring board 2 and the LSI 1 are electrically connected. Next, as shown in FIGS. 15F and 15G, the liquid resin 3a is poured between the LSI 1 and the wiring board 2 using the dispenser 23, so that the resin 3a is connected to the LSI 1 and the wiring board by a capillary phenomenon. Spread between two. Then, FIG.
As shown in (h), by curing and curing the resin 3a, the gap between the LSI 1 and the wiring board 2 can be sealed with resin. At this time, the LSI 1 and the wiring board 2 are deformed due to a slight decrease in the volume of the sealing resin 3a, and a convex warpage is generated on the LSI 1 side. Then, FIG.
As shown in FIG. 5 (i), the chip capacitor 12 is mounted on the wiring board 2 on the side where the LSI 1 is not mounted, with the side on which the LSI 1 is mounted down, in the same manner as in the case of the LSI 1.
With.

【0034】次いで、図16(j)に示すように、チッ
プコンデンサ12上にLSI1と同等の大きさの平板5
を載置してから、平板5と配線基板2との間に樹脂13
aを流し込む。次いで、図16(k)に示すように、キ
ュアして樹脂13aを硬化させることにより、平板5と
配線基板2との隙間を樹脂封止する。その際、上記同様
に樹脂13aが収縮するが、先ほどの反りとは逆方向に
反りが生じるため、全体として釣り合いがとれて平坦に
なる。最後に、図16(l)に示すように、LSI1の
裏面に熱伝導部材9を介してヒートシンク10を固定す
ることにより、本実施の形態に係る実装構造ができあが
る。
Next, as shown in FIG. 16 (j), a flat plate 5 of the same size as the LSI 1 is placed on the chip capacitor 12.
Is placed, and the resin 13 is placed between the flat plate 5 and the wiring board 2.
pour a. Next, as shown in FIG. 16 (k), the gap between the flat plate 5 and the wiring board 2 is sealed with a resin by curing the resin 13a by curing. At this time, the resin 13a shrinks in the same manner as described above, but the resin 13a is warped in a direction opposite to the above-described warpage, so that the resin 13a is balanced and flat as a whole. Finally, as shown in FIG. 16 (l), the mounting structure according to the present embodiment is completed by fixing the heat sink 10 to the back surface of the LSI 1 via the heat conducting member 9.

【0035】[第3の実施の形態]配線基板の種類とし
ては、エポキシ系の有機樹脂によるプリント配線基板以
外に、セラミック基板や、セラミック基板上に薄膜配線
層を持つ基板等が考えられる。1枚の基板上に複数のL
SIがフリップチップ実装されるLSIパッケージ構造
の場合、パッケージ全体の反りが非常に大きくなること
が予想されるが、本発明の平板を各LSI搭載個所毎に
配置することによって、LSIパッケージ全体の反りを
抑えることが可能となる。上記第1および第2の実施の
形態では、LSI接合部としてはんだ付け構造を記載し
たが、LSI側にAu(金)のボールバンプを配置し、
配線基板側に導電性接着剤やIn/Sn系はんだ、Ag
/Sn系はんだを使用した構造も考えられる。平板の形
状としては、平板形状以外に、チップコンデンサを収容
できる凹部を備えた形状や、チップコンデンサとの接触
を防ぐために四隅に突起を有する形状も考えられる。
[Third Embodiment] As a type of a wiring board, a ceramic board, a board having a thin film wiring layer on a ceramic board, and the like can be considered in addition to a printed wiring board made of an epoxy-based organic resin. Multiple L on one substrate
In the case of an LSI package structure in which the SI is flip-chip mounted, it is expected that the warpage of the entire package will be very large. However, by arranging the flat plate of the present invention at each LSI mounting position, the warpage of the entire LSI package is expected. Can be suppressed. In the first and second embodiments, the soldering structure is described as the LSI joint, but Au (gold) ball bumps are arranged on the LSI side.
Conductive adhesive, In / Sn solder, Ag on the wiring board side
A structure using a / Sn-based solder is also conceivable. As the shape of the flat plate, in addition to the flat plate shape, a shape having a concave portion capable of accommodating a chip capacitor and a shape having projections at four corners to prevent contact with the chip capacitor are also conceivable.

【0036】[0036]

【発明の効果】以上の説明から明らかなように、配線基
板上にLSIがフリップチップ実装され、LSI接合部
に封止樹脂が充填されている構造において、LSI搭載
部の配線基板裏面に平板を接着することによって、LS
Iの反りを抑えることが可能となり、ヒートシンクとL
SIの接合面に設ける熱伝導部材を薄く均一化できるこ
とによって、放熱効果の高いLSIパッケージ構造を得
ることができる。また、上記構造において、裏面平板と
配線基板の間隙の配線基板上にチップコンデンサを配置
することによって、LSIの急激な電圧変動を抑えるこ
とが可能となり、高速動作を実現することが可能とな
る。なお、本発明は配線基板上に複数の集積回路チップ
が搭載された、いわゆるCOBに適用したものであり、
少なくとも一つの集積回路チップがフリップチップ実装
されていれば、そのチップに対して適用できる。もちろ
ん、複数のフリップチップ実装されたチップに対して適
用してもよい。また、複数ある集積回路チップのうちの
いくつかは、QFP(Quad Flat Package )やSOP
(Small Outline Package )のようなものであってもよ
い。これらのチップは例えば温度センサやこのセンサを
制御するためのドライバIC等として用いられる。さら
に、集積回路チップだけでなくチップコンデンサやチッ
プ抵抗等の受動素子が一緒に搭載されていても構わな
い。
As is apparent from the above description, in a structure in which an LSI is flip-chip mounted on a wiring board and a sealing resin is filled in an LSI bonding portion, a flat plate is formed on the back surface of the wiring board in the LSI mounting portion. By bonding, LS
I can suppress the warpage of the heat sink and the heat sink and L
Since the heat conductive member provided on the bonding surface of the SI can be made thin and uniform, an LSI package structure having a high heat radiation effect can be obtained. Further, in the above structure, by arranging the chip capacitor on the wiring board in the gap between the rear flat plate and the wiring board, it is possible to suppress a sudden voltage fluctuation of the LSI and realize a high-speed operation. The present invention is applied to a so-called COB in which a plurality of integrated circuit chips are mounted on a wiring board,
If at least one integrated circuit chip is flip-chip mounted, it can be applied to that chip. Of course, the present invention may be applied to a plurality of flip-chip mounted chips. Some of the plurality of integrated circuit chips are QFP (Quad Flat Package) or SOP.
(Small Outline Package). These chips are used, for example, as a temperature sensor or a driver IC for controlling the sensor. Further, not only an integrated circuit chip but also passive elements such as a chip capacitor and a chip resistor may be mounted together.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の第1の実施の形態を示す断面図であ
る。
FIG. 1 is a cross-sectional view showing a first embodiment of the present invention.

【図2】 図1に係るパッケージ構造の製造工程を示す
断面図である。
FIG. 2 is a sectional view showing a manufacturing step of the package structure according to FIG. 1;

【図3】 図1に係るパッケージ構造の製造工程を示す
断面図である。
FIG. 3 is a sectional view showing a manufacturing step of the package structure according to FIG. 1;

【図4】 図1に係るパッケージ構造の製造工程を示す
断面図である。
FIG. 4 is a sectional view showing a manufacturing step of the package structure according to FIG. 1;

【図5】 図1に係るパッケージ構造の製造工程を示す
断面図である。
FIG. 5 is a sectional view showing a manufacturing step of the package structure according to FIG. 1;

【図6】 本発明の第2の実施の形態を示す断面図であ
る。
FIG. 6 is a sectional view showing a second embodiment of the present invention.

【図7】 本発明の第2の実施の形態を示す断面図であ
る。
FIG. 7 is a sectional view showing a second embodiment of the present invention.

【図8】 チップコンデンサのレイアウトを示すを平面
図である。
FIG. 8 is a plan view showing a layout of a chip capacitor.

【図9】 平板の熱膨張係数とLSIの反りとの関係を
示すグラフである。
FIG. 9 is a graph showing a relationship between a thermal expansion coefficient of a flat plate and LSI warpage.

【図10】 平板の厚みとLSIの反りとの関係を示す
グラフである。
FIG. 10 is a graph showing the relationship between the thickness of a flat plate and the warpage of an LSI.

【図11】 チップコンデンサの個数とLSIの反りと
の関係を示すグラフである。
FIG. 11 is a graph showing the relationship between the number of chip capacitors and LSI warpage.

【図12】 チップコンデンサのレイアウトを示すを平
面図である。
FIG. 12 is a plan view showing a layout of a chip capacitor.

【図13】 チップコンデンサのレイアウトとLSIの
反りとの関係を示すグラフである。
FIG. 13 is a graph showing the relationship between the layout of a chip capacitor and the warpage of an LSI.

【図14】 図7に係る実装構造の製造工程を示す断面
図である。
FIG. 14 is a sectional view showing a manufacturing step of the mounting structure according to FIG. 7;

【図15】 図14の続きの工程を示す断面図である。FIG. 15 is a sectional view showing a step continued from FIG. 14;

【図16】 図15の続きの工程を示す断面図である。FIG. 16 is a sectional view showing a step continued from FIG. 15;

【図17】 一般的なCOBを示す斜視図である。FIG. 17 is a perspective view showing a general COB.

【図18】 従来例を示す断面図である。FIG. 18 is a sectional view showing a conventional example.

【符号の説明】[Explanation of symbols]

1…LSI、2…配線基板、2a…配線、2b…電極パ
ッド、3…封止樹脂、3a…樹脂、4…LSI接合部、
4a…はんだバンプ、5…平板、6…小さな反り、8…
大きな反り、9…熱伝導部材、10…ヒートシンク、1
1…隙間、12…チップコンデンサ、13…封止樹脂、
13a…樹脂、14…チップコンデンサ、15…チップ
抵抗、20…マスク、20a…貫通孔、21…クリーム
はんだ、。
DESCRIPTION OF SYMBOLS 1 ... LSI, 2 ... wiring board, 2a ... wiring, 2b ... electrode pad, 3 ... sealing resin, 3a ... resin, 4 ... LSI joining part,
4a: solder bump, 5: flat plate, 6: small warpage, 8:
Large warp, 9: heat conductive member, 10: heat sink, 1
1: gap, 12: chip capacitor, 13: sealing resin,
13a: resin, 14: chip capacitor, 15: chip resistor, 20: mask, 20a: through hole, 21: cream solder.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05K 1/18 H01L 23/12 L 3/32 23/36 M 3/34 507 Fターム(参考) 5E319 AA03 AB05 BB05 BB11 CC33 CC61 CD45 5E336 AA04 BB01 CC31 CC53 CC58 EE03 GG03 5F036 AA01 BB01 BB08 BD01 5F044 KK02 KK04 LL01 LL07 RR10 RR18 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H05K 1/18 H01L 23/12 L 3/32 23/36 M 3/34 507 F term (Reference) 5E319 AA03 AB05 BB05 BB11 CC33 CC61 CD45 5E336 AA04 BB01 CC31 CC53 CC58 EE03 GG03 5F036 AA01 BB01 BB08 BD01 5F044 KK02 KK04 LL01 LL07 RR10 RR18

Claims (26)

【特許請求の範囲】[Claims] 【請求項1】 配線基板と、この配線基板上に搭載され
た複数の集積回路チップとを備えた集積回路チップの実
装構造において、 前記集積回路チップのうちの少なくとも一つは、前記配
線基板の主表面にフリップチップ実装されるとともに、
このフリップチップ実装された部分が樹脂封止され、さ
らに前記フリップチップ実装された集積回路チップと対
向して前記配線基板の裏面に樹脂を介して板部材が接着
されていることを特徴とする集積回路チップの実装構
造。
1. An integrated circuit chip mounting structure comprising a wiring board and a plurality of integrated circuit chips mounted on the wiring board, wherein at least one of the integrated circuit chips is mounted on the wiring board. While being flip-chip mounted on the main surface,
The flip-chip mounted portion is sealed with a resin, and a plate member is bonded to the back surface of the wiring substrate via a resin in opposition to the flip-chip mounted integrated circuit chip. Circuit chip mounting structure.
【請求項2】 請求項1において、 前記板部材は、その熱膨張係数が前記配線基板のものよ
りも小さくかつ前記集積回路チップのものよりも大きい
ことを特徴とする集積回路チップの実装構造。
2. The integrated circuit chip mounting structure according to claim 1, wherein the plate member has a coefficient of thermal expansion smaller than that of the wiring substrate and larger than that of the integrated circuit chip.
【請求項3】 請求項1において、 前記板部材は、その大きさが前記集積回路チップの外形
の80〜120%以内であることを特徴とする集積回路
チップの実装構造。
3. The mounting structure of an integrated circuit chip according to claim 1, wherein the size of the plate member is within 80 to 120% of the outer shape of the integrated circuit chip.
【請求項4】 請求項1において、 前記板部材は、その材料がアルミナ、42アロイ合金、
ジルコニアまたはフォルステライトの何れかであること
を特徴とする集積回路チップの実装構造。
4. The plate member according to claim 1, wherein a material of the plate member is alumina, a 42 alloy alloy,
A mounting structure of an integrated circuit chip, which is one of zirconia and forsterite.
【請求項5】 請求項1において、 前記集積回路チップの裏面に、熱伝導部材を介してヒー
トシンクが設けられていることを特徴とする集積回路チ
ップの実装構造。
5. The integrated circuit chip mounting structure according to claim 1, wherein a heat sink is provided on a back surface of the integrated circuit chip via a heat conductive member.
【請求項6】 請求項1において、 前記板部材と前記配線基板との間における前記配線基板
上に、複数のチップコンデンサが設けられていることを
特徴とする集積回路チップの実装構造。
6. The integrated circuit chip mounting structure according to claim 1, wherein a plurality of chip capacitors are provided on the wiring board between the plate member and the wiring board.
【請求項7】 請求項1において、 前記板部材と前記配線基板との間における前記配線基板
上に、複数のチップ抵抗が設けられていることを特徴と
する集積回路チップの実装構造。
7. The mounting structure of an integrated circuit chip according to claim 1, wherein a plurality of chip resistors are provided on the wiring board between the plate member and the wiring board.
【請求項8】 請求項6において、 前記複数のチップコンデンサは、前記集積回路チップの
中央部付近よりもその周縁部付近に密集するようにして
配置されていることを特徴とする集積回路チップの実装
構造。
8. The integrated circuit chip according to claim 6, wherein the plurality of chip capacitors are arranged closer to a peripheral portion of the integrated circuit chip than to a central portion thereof. Mounting structure.
【請求項9】 請求項7において、 前記複数のチップ抵抗は、前記集積回路チップの中央部
付近よりもその周縁部付近に密集するようにして配置さ
れていることを特徴とする集積回路チップの実装構造。
9. The integrated circuit chip according to claim 7, wherein the plurality of chip resistors are arranged closer to a peripheral portion than to a central portion of the integrated circuit chip. Mounting structure.
【請求項10】 請求項6において、 前記複数のチップコンデンサは、前記集積回路チップの
中央部付近に薄いものが配置され、前記集積回路チップ
の周縁部付近に厚いものが配置されていることを特徴と
する集積回路チップの実装構造。
10. The plurality of chip capacitors according to claim 6, wherein a thin one is arranged near a central part of the integrated circuit chip, and a thick one is arranged near a peripheral part of the integrated circuit chip. Characteristic integrated circuit chip mounting structure.
【請求項11】 請求項7において、 前記複数のチップ抵抗は、前記集積回路チップの中央部
付近に薄いものが配置され、前記集積回路チップの周縁
部付近に厚いものが配置されていることを特徴とする集
積回路チップの実装構造。
11. The integrated circuit chip according to claim 7, wherein the plurality of chip resistors are thin near the center of the integrated circuit chip and thick near the periphery of the integrated circuit chip. Characteristic integrated circuit chip mounting structure.
【請求項12】 請求項1において、 前記配線基板は、エポキシ系の有機樹脂からなる基板、
セラミック基板またはセラミック基板上に薄膜配線層を
持つ基板の何れかであることを特徴とする集積回路チッ
プの実装構造。
12. The wiring board according to claim 1, wherein the wiring board is a board made of an epoxy-based organic resin,
An integrated circuit chip mounting structure, which is a ceramic substrate or a substrate having a thin film wiring layer on a ceramic substrate.
【請求項13】 請求項1において、 前記集積回路チップと前記配線基板との接続は、前記集
積回路チップ側に設けられたAuのボールバンプと、前
記配線基板側に設けられた導電性樹脂もしくはIn/S
n系はんだまたはAg/Sn系はんだとの接合によって
実現されていることを特徴とする集積回路チップの実装
構造。
13. The connection between the integrated circuit chip and the wiring board according to claim 1, wherein the connection between the integrated circuit chip and the wiring board is made of an Au ball bump provided on the integrated circuit chip side and a conductive resin provided on the wiring board side. In / S
An integrated circuit chip mounting structure realized by bonding with an n-based solder or an Ag / Sn-based solder.
【請求項14】 配線基板上に複数の集積回路チップを
実装する方法において、 前記集積回路チップのうちの少なくとも一つを、前記配
線基板の主表面にフリップチップ実装するとともに、こ
のフリップチップ実装された部分を樹脂封止し、さらに
前記フリップチップ実装された集積回路チップと対向し
て前記配線基板の裏面に樹脂を介して板部材を接着する
ことを特徴とする集積回路チップの実装方法。
14. A method of mounting a plurality of integrated circuit chips on a wiring board, wherein at least one of the integrated circuit chips is flip-chip mounted on a main surface of the wiring board, and the flip-chip mounting is performed. A resin member, and bonding a plate member via a resin to the back surface of the wiring board in opposition to the flip-chip mounted integrated circuit chip.
【請求項15】 請求項14において、 前記板部材は、その熱膨張係数が前記配線基板のものよ
りも小さくかつ前記集積回路チップのものよりも大きい
ことを特徴とする集積回路チップの実装方法。
15. The method according to claim 14, wherein the plate member has a coefficient of thermal expansion smaller than that of the wiring board and larger than that of the integrated circuit chip.
【請求項16】 請求項14において、 前記板部材は、その大きさが前記集積回路チップの外形
の80〜120%以内であることを特徴とする集積回路
チップの実装方法。
16. The method according to claim 14, wherein the size of the plate member is within 80 to 120% of the outer shape of the integrated circuit chip.
【請求項17】 請求項14において、 前記板部材は、その材料がアルミナ、42アロイ合金、
ジルコニアまたはフォルステライトの何れかであること
を特徴とする集積回路チップの実装方法。
17. The plate member according to claim 14, wherein a material of the plate member is alumina, a 42 alloy alloy,
A method for mounting an integrated circuit chip, which is one of zirconia and forsterite.
【請求項18】 請求項14において、 前記集積回路チップの裏面に、熱伝導部材を介してヒー
トシンクが設けられていることを特徴とする集積回路チ
ップの実装方法。
18. The method for mounting an integrated circuit chip according to claim 14, wherein a heat sink is provided on a back surface of the integrated circuit chip via a heat conductive member.
【請求項19】 請求項14において、 前記板部材と前記配線基板との間における前記配線基板
上に、複数のチップコンデンサが設けられていることを
特徴とする集積回路チップの実装方法。
19. The method according to claim 14, wherein a plurality of chip capacitors are provided on the wiring board between the plate member and the wiring board.
【請求項20】 請求項14において、 前記板部材と前記配線基板との間における前記配線基板
上に、複数のチップ抵抗が設けられていることを特徴と
する集積回路チップの実装方法。
20. The method for mounting an integrated circuit chip according to claim 14, wherein a plurality of chip resistors are provided on the wiring board between the plate member and the wiring board.
【請求項21】 請求項19において、 前記複数のチップコンデンサは、前記集積回路チップの
中央部付近よりもその周縁部付近に密集するようにして
配置されていることを特徴とする集積回路チップの実装
方法。
21. The integrated circuit chip according to claim 19, wherein the plurality of chip capacitors are arranged closer to a periphery of the integrated circuit chip than to a center of the integrated circuit chip. Implementation method.
【請求項22】 請求項20において、 前記複数のチップ抵抗は、前記集積回路チップの中央部
付近よりもその周縁部付近に密集するようにして配置さ
れていることを特徴とする集積回路チップの実装方法。
22. The integrated circuit chip according to claim 20, wherein the plurality of chip resistors are arranged closer to a periphery of the integrated circuit chip than to a center of the integrated circuit chip. Implementation method.
【請求項23】 請求項19において、 前記複数のチップコンデンサは、前記集積回路チップの
中央部付近に薄いものが配置され、前記集積回路チップ
の周縁部付近に厚いものが配置されていることを特徴と
する集積回路チップの実装方法。
23. The multi-chip capacitor according to claim 19, wherein the plurality of chip capacitors are thin near the center of the integrated circuit chip and thick near the periphery of the integrated circuit chip. Characteristic integrated circuit chip mounting method.
【請求項24】 請求項20において、 前記複数のチップ抵抗は、前記集積回路チップの中央部
付近に薄いものが配置され、前記集積回路チップの周縁
部付近に厚いものが配置されていることを特徴とする集
積回路チップの実装方法。
24. The semiconductor device according to claim 20, wherein the plurality of chip resistors are thin near the center of the integrated circuit chip and thick near the periphery of the integrated circuit chip. Characteristic integrated circuit chip mounting method.
【請求項25】 請求項14において、 前記配線基板は、エポキシ系の有機樹脂からなる基板、
セラミック基板またはセラミック基板上に薄膜配線層を
持つ基板の何れかであることを特徴とする集積回路チッ
プの実装方法。
25. The wiring board according to claim 14, wherein the wiring board is made of an epoxy-based organic resin.
A method of mounting an integrated circuit chip, which is either a ceramic substrate or a substrate having a thin film wiring layer on a ceramic substrate.
【請求項26】 請求項14において、 前記集積回路チップと前記配線基板との接続は、前記集
積回路チップ側に設けられたAuのボールバンプと、前
記配線基板側に設けられた導電性樹脂もしくはIn/S
n系はんだまたはAg/Sn系はんだとの接合によって
実現されていることを特徴とする集積回路チップの実装
方法。
26. The connection between the integrated circuit chip and the wiring board according to claim 14, wherein the connection between the integrated circuit chip and the wiring board is made of an Au ball bump provided on the integrated circuit chip side and a conductive resin provided on the wiring board side. In / S
A method for mounting an integrated circuit chip, which is realized by bonding with an n-based solder or an Ag / Sn-based solder.
JP33401999A 1999-11-25 1999-11-25 Mounting structure and mounting method of integrated circuit chip Expired - Fee Related JP3414342B2 (en)

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JP5708489B2 (en) * 2009-08-20 2015-04-30 日本電気株式会社 Semiconductor device having metallic power supply side and ground side reinforcing members insulated from each other
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