JP2001111060A5 - - Google Patents

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Publication number
JP2001111060A5
JP2001111060A5 JP2000221386A JP2000221386A JP2001111060A5 JP 2001111060 A5 JP2001111060 A5 JP 2001111060A5 JP 2000221386 A JP2000221386 A JP 2000221386A JP 2000221386 A JP2000221386 A JP 2000221386A JP 2001111060 A5 JP2001111060 A5 JP 2001111060A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2000221386A
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Japanese (ja)
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JP4801241B2 (ja
JP2001111060A (ja
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Publication date
Application filed filed Critical
Priority to JP2000221386A priority Critical patent/JP4801241B2/ja
Priority claimed from JP2000221386A external-priority patent/JP4801241B2/ja
Publication of JP2001111060A publication Critical patent/JP2001111060A/ja
Publication of JP2001111060A5 publication Critical patent/JP2001111060A5/ja
Application granted granted Critical
Publication of JP4801241B2 publication Critical patent/JP4801241B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000221386A 1999-07-22 2000-07-21 半導体装置およびその作製方法 Expired - Fee Related JP4801241B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000221386A JP4801241B2 (ja) 1999-07-22 2000-07-21 半導体装置およびその作製方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP11-206938 1999-07-22
JP1999206938 1999-07-22
JP20693899 1999-07-22
JP2000221386A JP4801241B2 (ja) 1999-07-22 2000-07-21 半導体装置およびその作製方法

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2010237285A Division JP4801790B2 (ja) 1999-07-22 2010-10-22 半導体装置
JP2011077995A Division JP5292434B2 (ja) 1999-07-22 2011-03-31 半導体装置

Publications (3)

Publication Number Publication Date
JP2001111060A JP2001111060A (ja) 2001-04-20
JP2001111060A5 true JP2001111060A5 (pt) 2007-09-20
JP4801241B2 JP4801241B2 (ja) 2011-10-26

Family

ID=26515970

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000221386A Expired - Fee Related JP4801241B2 (ja) 1999-07-22 2000-07-21 半導体装置およびその作製方法

Country Status (1)

Country Link
JP (1) JP4801241B2 (pt)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5046452B2 (ja) 2000-10-26 2012-10-10 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP4954366B2 (ja) 2000-11-28 2012-06-13 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2003045874A (ja) * 2001-07-27 2003-02-14 Semiconductor Energy Lab Co Ltd 金属配線およびその作製方法、並びに金属配線基板およびその作製方法
US6876350B2 (en) 2001-08-10 2005-04-05 Semiconductor Energy Laboratory Co., Ltd. Display device and electronic equipment using the same
US6773944B2 (en) 2001-11-07 2004-08-10 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a semiconductor device
KR100504537B1 (ko) * 2002-04-17 2005-08-01 엘지.필립스 엘시디 주식회사 박막 트랜지스터의 제조 방법
JP4689155B2 (ja) * 2002-08-29 2011-05-25 株式会社半導体エネルギー研究所 半導体装置の作製方法
US8125601B2 (en) * 2003-01-08 2012-02-28 Samsung Electronics Co., Ltd. Upper substrate and liquid crystal display device having the same
KR100675636B1 (ko) * 2004-05-31 2007-02-02 엘지.필립스 엘시디 주식회사 Goldd구조 및 ldd구조의 tft를 동시에포함하는 구동회로부 일체형 액정표시장치
US8878177B2 (en) * 2011-11-11 2014-11-04 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing semiconductor device
JP5906132B2 (ja) 2012-05-09 2016-04-20 株式会社ジャパンディスプレイ 表示装置
CN106469750A (zh) * 2015-08-19 2017-03-01 昆山工研院新型平板显示技术中心有限公司 薄膜晶体管及其制造方法
JP2016054306A (ja) * 2015-11-13 2016-04-14 株式会社半導体エネルギー研究所 表示装置、表示モジュール及び電子機器
JP6139730B2 (ja) * 2016-03-18 2017-05-31 株式会社ジャパンディスプレイ 表示装置及びその製造方法
JP6553114B2 (ja) * 2017-04-10 2019-07-31 株式会社半導体エネルギー研究所 半導体装置、表示モジュール及び電子機器
CN107104108B (zh) * 2017-05-19 2020-08-21 京东方科技集团股份有限公司 一种阵列基板及其制作方法、平板探测器及影像设备
JP2020074442A (ja) * 2020-01-21 2020-05-14 株式会社半導体エネルギー研究所 半導体装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3883706B2 (ja) * 1998-07-31 2007-02-21 シャープ株式会社 エッチング方法、及び薄膜トランジスタマトリックス基板の製造方法

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