JP2001007020A - 露光方法及び露光装置 - Google Patents

露光方法及び露光装置

Info

Publication number
JP2001007020A
JP2001007020A JP2000158941A JP2000158941A JP2001007020A JP 2001007020 A JP2001007020 A JP 2001007020A JP 2000158941 A JP2000158941 A JP 2000158941A JP 2000158941 A JP2000158941 A JP 2000158941A JP 2001007020 A JP2001007020 A JP 2001007020A
Authority
JP
Japan
Prior art keywords
exposure
pattern
beam interference
projection
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000158941A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001007020A5 (enrdf_load_stackoverflow
Inventor
Mitsuo Sugita
充朗 杉田
Akiyoshi Suzuki
章義 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000158941A priority Critical patent/JP2001007020A/ja
Publication of JP2001007020A publication Critical patent/JP2001007020A/ja
Publication of JP2001007020A5 publication Critical patent/JP2001007020A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2000158941A 2000-01-01 2000-05-29 露光方法及び露光装置 Pending JP2001007020A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000158941A JP2001007020A (ja) 2000-01-01 2000-05-29 露光方法及び露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000158941A JP2001007020A (ja) 2000-01-01 2000-05-29 露光方法及び露光装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP09304232A Division JP3101594B2 (ja) 1997-11-06 1997-11-06 露光方法及び露光装置

Publications (2)

Publication Number Publication Date
JP2001007020A true JP2001007020A (ja) 2001-01-12
JP2001007020A5 JP2001007020A5 (enrdf_load_stackoverflow) 2005-07-07

Family

ID=18663340

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000158941A Pending JP2001007020A (ja) 2000-01-01 2000-05-29 露光方法及び露光装置

Country Status (1)

Country Link
JP (1) JP2001007020A (enrdf_load_stackoverflow)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7161684B2 (en) 2000-02-15 2007-01-09 Asml Holding, N.V. Apparatus for optical system coherence testing
US7242464B2 (en) 1999-06-24 2007-07-10 Asml Holdings N.V. Method for characterizing optical systems using holographic reticles
US7440078B2 (en) 2005-12-20 2008-10-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units
US7443514B2 (en) 2006-10-02 2008-10-28 Asml Holding N.V. Diffractive null corrector employing a spatial light modulator
US7561252B2 (en) 2005-12-29 2009-07-14 Asml Holding N.V. Interferometric lithography system and method used to generate equal path lengths of interfering beams
US7751030B2 (en) 2005-02-01 2010-07-06 Asml Holding N.V. Interferometric lithographic projection apparatus
KR101002156B1 (ko) 2008-03-31 2010-12-17 다이니폰 스크린 세이조우 가부시키가이샤 패턴 묘화 장치 및 패턴 묘화 방법
US8264667B2 (en) 2006-05-04 2012-09-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using interferometric and other exposure
US8934084B2 (en) 2006-05-31 2015-01-13 Asml Holding N.V. System and method for printing interference patterns having a pitch in a lithography system

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62279628A (ja) * 1986-05-28 1987-12-04 Hitachi Ltd 樹脂膜の形成方法
JPH01134919A (ja) * 1987-11-19 1989-05-26 Nec Corp 光学投影露光装置
JPH04287908A (ja) * 1990-10-03 1992-10-13 Fujitsu Ltd 露光装置および露光方法
JPH04355910A (ja) * 1991-02-27 1992-12-09 Nikon Corp マスク及び露光方法及び露光装置
JPH06275492A (ja) * 1993-03-19 1994-09-30 Fujitsu Ltd 半導体装置の製造方法
JPH06291017A (ja) * 1992-04-17 1994-10-18 Canon Inc 半導体製造装置
JPH07192988A (ja) * 1993-12-27 1995-07-28 Nikon Corp 照明光学装置
JPH07226362A (ja) * 1994-02-10 1995-08-22 Ricoh Co Ltd フォトレジストパターン形成方法
JPH1167640A (ja) * 1997-08-20 1999-03-09 Nec Corp 露光方法及び露光用マスク

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62279628A (ja) * 1986-05-28 1987-12-04 Hitachi Ltd 樹脂膜の形成方法
JPH01134919A (ja) * 1987-11-19 1989-05-26 Nec Corp 光学投影露光装置
JPH04287908A (ja) * 1990-10-03 1992-10-13 Fujitsu Ltd 露光装置および露光方法
JPH04355910A (ja) * 1991-02-27 1992-12-09 Nikon Corp マスク及び露光方法及び露光装置
JPH06291017A (ja) * 1992-04-17 1994-10-18 Canon Inc 半導体製造装置
JPH06275492A (ja) * 1993-03-19 1994-09-30 Fujitsu Ltd 半導体装置の製造方法
JPH07192988A (ja) * 1993-12-27 1995-07-28 Nikon Corp 照明光学装置
JPH07226362A (ja) * 1994-02-10 1995-08-22 Ricoh Co Ltd フォトレジストパターン形成方法
JPH1167640A (ja) * 1997-08-20 1999-03-09 Nec Corp 露光方法及び露光用マスク

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7242464B2 (en) 1999-06-24 2007-07-10 Asml Holdings N.V. Method for characterizing optical systems using holographic reticles
US7804601B2 (en) 1999-06-24 2010-09-28 Asml Holding N.V. Methods for making holographic reticles for characterizing optical systems
US7161684B2 (en) 2000-02-15 2007-01-09 Asml Holding, N.V. Apparatus for optical system coherence testing
US7751030B2 (en) 2005-02-01 2010-07-06 Asml Holding N.V. Interferometric lithographic projection apparatus
US7440078B2 (en) 2005-12-20 2008-10-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units
US7561252B2 (en) 2005-12-29 2009-07-14 Asml Holding N.V. Interferometric lithography system and method used to generate equal path lengths of interfering beams
US8264667B2 (en) 2006-05-04 2012-09-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using interferometric and other exposure
US8934084B2 (en) 2006-05-31 2015-01-13 Asml Holding N.V. System and method for printing interference patterns having a pitch in a lithography system
US7443514B2 (en) 2006-10-02 2008-10-28 Asml Holding N.V. Diffractive null corrector employing a spatial light modulator
KR101002156B1 (ko) 2008-03-31 2010-12-17 다이니폰 스크린 세이조우 가부시키가이샤 패턴 묘화 장치 및 패턴 묘화 방법

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