JP2000223269A5 - - Google Patents

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Publication number
JP2000223269A5
JP2000223269A5 JP1999019292A JP1929299A JP2000223269A5 JP 2000223269 A5 JP2000223269 A5 JP 2000223269A5 JP 1999019292 A JP1999019292 A JP 1999019292A JP 1929299 A JP1929299 A JP 1929299A JP 2000223269 A5 JP2000223269 A5 JP 2000223269A5
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JP
Japan
Prior art keywords
container
evaporation
film forming
chamber
evaporating
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Application number
JP1999019292A
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English (en)
Japanese (ja)
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JP2000223269A (ja
JP4312289B2 (ja
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Priority to JP01929299A priority Critical patent/JP4312289B2/ja
Priority claimed from JP01929299A external-priority patent/JP4312289B2/ja
Publication of JP2000223269A publication Critical patent/JP2000223269A/ja
Publication of JP2000223269A5 publication Critical patent/JP2000223269A5/ja
Application granted granted Critical
Publication of JP4312289B2 publication Critical patent/JP4312289B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP01929299A 1999-01-28 1999-01-28 有機薄膜形成装置 Expired - Fee Related JP4312289B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP01929299A JP4312289B2 (ja) 1999-01-28 1999-01-28 有機薄膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP01929299A JP4312289B2 (ja) 1999-01-28 1999-01-28 有機薄膜形成装置

Publications (3)

Publication Number Publication Date
JP2000223269A JP2000223269A (ja) 2000-08-11
JP2000223269A5 true JP2000223269A5 (enExample) 2006-04-13
JP4312289B2 JP4312289B2 (ja) 2009-08-12

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ID=11995369

Family Applications (1)

Application Number Title Priority Date Filing Date
JP01929299A Expired - Fee Related JP4312289B2 (ja) 1999-01-28 1999-01-28 有機薄膜形成装置

Country Status (1)

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JP (1) JP4312289B2 (enExample)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6770562B2 (en) 2000-10-26 2004-08-03 Semiconductor Energy Laboratory Co., Ltd. Film formation apparatus and film formation method
KR100462046B1 (ko) * 2001-11-05 2004-12-16 네오뷰코오롱 주식회사 유기물 디스플레이의 무기물막 증착 장치
TWI262034B (en) 2002-02-05 2006-09-11 Semiconductor Energy Lab Manufacturing system, manufacturing method, method of operating a manufacturing apparatus, and light emitting device
JP4558277B2 (ja) * 2002-02-22 2010-10-06 株式会社半導体エネルギー研究所 発光装置の作製方法
TWI286044B (en) 2002-02-22 2007-08-21 Semiconductor Energy Lab Light-emitting device and method of manufacturing the same, and method of operating manufacturing apparatus
SG113448A1 (en) 2002-02-25 2005-08-29 Semiconductor Energy Lab Fabrication system and a fabrication method of a light emitting device
US20040035360A1 (en) * 2002-05-17 2004-02-26 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
TWI336905B (en) 2002-05-17 2011-02-01 Semiconductor Energy Lab Evaporation method, evaporation device and method of fabricating light emitting device
JP4634698B2 (ja) * 2002-05-17 2011-02-16 株式会社半導体エネルギー研究所 蒸着装置
TWI277363B (en) 2002-08-30 2007-03-21 Semiconductor Energy Lab Fabrication system, light-emitting device and fabricating method of organic compound-containing layer
JP4515060B2 (ja) * 2002-08-30 2010-07-28 株式会社半導体エネルギー研究所 製造装置および有機化合物を含む層の作製方法
KR100889758B1 (ko) 2002-09-03 2009-03-20 삼성모바일디스플레이주식회사 유기박막 형성장치의 가열용기
KR101006938B1 (ko) * 2002-09-20 2011-01-10 가부시키가이샤 한도오따이 에네루기 켄큐쇼 제조 시스템 및 발광장치 제작방법
JP2004146369A (ja) * 2002-09-20 2004-05-20 Semiconductor Energy Lab Co Ltd 製造装置および発光装置の作製方法
US7211461B2 (en) * 2003-02-14 2007-05-01 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
JP4493926B2 (ja) * 2003-04-25 2010-06-30 株式会社半導体エネルギー研究所 製造装置
US8123862B2 (en) * 2003-08-15 2012-02-28 Semiconductor Energy Laboratory Co., Ltd. Deposition apparatus and manufacturing apparatus
US7238389B2 (en) * 2004-03-22 2007-07-03 Eastman Kodak Company Vaporizing fluidized organic materials
KR100656181B1 (ko) * 2004-08-09 2006-12-12 두산디앤디 주식회사 유기 el소자의 연속 증착 시스템
KR100651258B1 (ko) * 2004-10-11 2006-11-29 두산디앤디 주식회사 유기 박막 증착 공정용 멀티 노즐 도가니 장치
KR100637896B1 (ko) 2005-05-04 2006-10-24 주식회사 대우일렉트로닉스 유기물 진공 증착 장치
WO2007135870A1 (ja) * 2006-05-19 2007-11-29 Ulvac, Inc. 有機蒸着材料用蒸着装置、有機薄膜の製造方法
KR100758692B1 (ko) 2006-05-22 2007-09-13 세메스 주식회사 박막 증착을 위한 증발원 장치
EP2109899A4 (en) 2006-12-19 2012-12-12 Veeco Instr Inc SOURCES OF VAPOR DEPOSITION AND METHODS
JP4830847B2 (ja) * 2006-12-25 2011-12-07 パナソニック電工株式会社 真空蒸着装置
JP5180469B2 (ja) * 2006-12-25 2013-04-10 パナソニック株式会社 真空蒸着装置
EP2423348A4 (en) * 2009-04-21 2015-11-11 Ulvac Inc STEERING SYSTEM AND STEAMING PROCEDURE
KR101240419B1 (ko) 2011-03-16 2013-03-11 엘아이지에이디피 주식회사 유기발광소자 양산용 클러스터 타입 증착장비
JP6025591B2 (ja) * 2012-02-17 2016-11-16 株式会社半導体エネルギー研究所 成膜装置
JP5879594B2 (ja) * 2012-03-02 2016-03-08 株式会社昭和真空 成膜装置
KR101456186B1 (ko) * 2012-12-28 2014-10-31 엘아이지에이디피 주식회사 유기물질 증착장비
KR101469092B1 (ko) * 2012-12-28 2014-12-04 엘아이지에이디피 주식회사 유기물질 증착장비
JP6578367B2 (ja) * 2015-10-06 2019-09-18 株式会社アルバック 材料供給装置および蒸着装置
DE102019104988A1 (de) * 2019-02-27 2020-08-27 VON ARDENNE Asset GmbH & Co. KG Versorgungsvorrichtung, Verfahren und Prozessieranordnung
JP7088891B2 (ja) * 2019-09-26 2022-06-21 キヤノントッキ株式会社 蒸発源装置及び蒸着装置
CN112899621B (zh) * 2021-01-19 2022-12-27 京东方科技集团股份有限公司 一种蒸发源装置和蒸镀设备
CN112877649B (zh) * 2021-04-01 2024-12-20 宁波星河材料科技有限公司 一种便于更换坩埚的高通量薄膜制备装置及其应用
CN113061849B (zh) * 2021-04-01 2024-11-22 杭州星河材料科技有限公司 一种高通量热蒸发薄膜制备装置及其应用

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