JP2000196095A5 - - Google Patents
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- Publication number
- JP2000196095A5 JP2000196095A5 JP1998371429A JP37142998A JP2000196095A5 JP 2000196095 A5 JP2000196095 A5 JP 2000196095A5 JP 1998371429 A JP1998371429 A JP 1998371429A JP 37142998 A JP37142998 A JP 37142998A JP 2000196095 A5 JP2000196095 A5 JP 2000196095A5
- Authority
- JP
- Japan
- Prior art keywords
- gate insulating
- film
- insulating film
- polycrystalline silicon
- silicon film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010408 film Substances 0.000 claims description 56
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 20
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 19
- 239000012535 impurity Substances 0.000 claims description 15
- 239000010409 thin film Substances 0.000 claims description 15
- 229910052759 nickel Inorganic materials 0.000 claims description 10
- 239000003870 refractory metal Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- 230000004888 barrier function Effects 0.000 claims description 6
- 238000005247 gettering Methods 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 4
- 238000002844 melting Methods 0.000 claims description 3
- 230000008018 melting Effects 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000002347 injection Methods 0.000 claims description 2
- 239000007924 injection Substances 0.000 claims description 2
- 239000011810 insulating material Substances 0.000 claims description 2
- 229910000510 noble metal Inorganic materials 0.000 claims description 2
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 2
- 238000002513 implantation Methods 0.000 claims 5
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 230000001747 exhibiting effect Effects 0.000 claims 2
- 229910021332 silicide Inorganic materials 0.000 claims 2
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims 2
- 239000012528 membrane Substances 0.000 description 3
- 229910021419 crystalline silicon Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10371429A JP2000196095A (ja) | 1998-12-25 | 1998-12-25 | 薄膜トランジスタ及びその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10371429A JP2000196095A (ja) | 1998-12-25 | 1998-12-25 | 薄膜トランジスタ及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000196095A JP2000196095A (ja) | 2000-07-14 |
| JP2000196095A5 true JP2000196095A5 (enrdf_load_stackoverflow) | 2005-04-07 |
Family
ID=18498706
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10371429A Pending JP2000196095A (ja) | 1998-12-25 | 1998-12-25 | 薄膜トランジスタ及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000196095A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100265179B1 (ko) | 1995-03-27 | 2000-09-15 | 야마자끼 순페이 | 반도체장치와 그의 제작방법 |
| JP2003077832A (ja) * | 2001-08-30 | 2003-03-14 | Sharp Corp | 半導体装置及びその製造方法 |
| JP4954047B2 (ja) * | 2007-12-17 | 2012-06-13 | シャープ株式会社 | 半導体装置及びその製造方法 |
-
1998
- 1998-12-25 JP JP10371429A patent/JP2000196095A/ja active Pending
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