JP2000178712A - 成膜装置およびカソードメンテナンス方法 - Google Patents

成膜装置およびカソードメンテナンス方法

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Publication number
JP2000178712A
JP2000178712A JP10356826A JP35682698A JP2000178712A JP 2000178712 A JP2000178712 A JP 2000178712A JP 10356826 A JP10356826 A JP 10356826A JP 35682698 A JP35682698 A JP 35682698A JP 2000178712 A JP2000178712 A JP 2000178712A
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JP
Japan
Prior art keywords
cathode
closing
maintenance
access opening
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10356826A
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English (en)
Japanese (ja)
Other versions
JP2000178712A5 (enExample
Inventor
Takashi Sueyoshi
貴志 末吉
Yoshiyuki Nakano
喜之 中野
Hatsuhiko Shibazaki
初彦 柴崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP10356826A priority Critical patent/JP2000178712A/ja
Publication of JP2000178712A publication Critical patent/JP2000178712A/ja
Publication of JP2000178712A5 publication Critical patent/JP2000178712A5/ja
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
JP10356826A 1998-12-16 1998-12-16 成膜装置およびカソードメンテナンス方法 Pending JP2000178712A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10356826A JP2000178712A (ja) 1998-12-16 1998-12-16 成膜装置およびカソードメンテナンス方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10356826A JP2000178712A (ja) 1998-12-16 1998-12-16 成膜装置およびカソードメンテナンス方法

Publications (2)

Publication Number Publication Date
JP2000178712A true JP2000178712A (ja) 2000-06-27
JP2000178712A5 JP2000178712A5 (enExample) 2006-02-09

Family

ID=18450972

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10356826A Pending JP2000178712A (ja) 1998-12-16 1998-12-16 成膜装置およびカソードメンテナンス方法

Country Status (1)

Country Link
JP (1) JP2000178712A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016108577A (ja) * 2014-12-02 2016-06-20 国立研究開発法人産業技術総合研究所 小型装置保守機構
CN114959597A (zh) * 2021-02-18 2022-08-30 佳能特机株式会社 成膜装置、电子器件的制造方法及成膜源的维护方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016108577A (ja) * 2014-12-02 2016-06-20 国立研究開発法人産業技術総合研究所 小型装置保守機構
CN114959597A (zh) * 2021-02-18 2022-08-30 佳能特机株式会社 成膜装置、电子器件的制造方法及成膜源的维护方法
JP2022126050A (ja) * 2021-02-18 2022-08-30 キヤノントッキ株式会社 成膜装置、電子デバイスの製造方法及び成膜源のメンテナンス方法
JP7662351B2 (ja) 2021-02-18 2025-04-15 キヤノントッキ株式会社 成膜装置、電子デバイスの製造方法及び成膜源のメンテナンス方法

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