JP2000178712A5 - - Google Patents

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Publication number
JP2000178712A5
JP2000178712A5 JP1998356826A JP35682698A JP2000178712A5 JP 2000178712 A5 JP2000178712 A5 JP 2000178712A5 JP 1998356826 A JP1998356826 A JP 1998356826A JP 35682698 A JP35682698 A JP 35682698A JP 2000178712 A5 JP2000178712 A5 JP 2000178712A5
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JP
Japan
Prior art keywords
cathode
access opening
reaction chamber
closing lid
substrate support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998356826A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000178712A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP10356826A priority Critical patent/JP2000178712A/ja
Priority claimed from JP10356826A external-priority patent/JP2000178712A/ja
Publication of JP2000178712A publication Critical patent/JP2000178712A/ja
Publication of JP2000178712A5 publication Critical patent/JP2000178712A5/ja
Pending legal-status Critical Current

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JP10356826A 1998-12-16 1998-12-16 成膜装置およびカソードメンテナンス方法 Pending JP2000178712A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10356826A JP2000178712A (ja) 1998-12-16 1998-12-16 成膜装置およびカソードメンテナンス方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10356826A JP2000178712A (ja) 1998-12-16 1998-12-16 成膜装置およびカソードメンテナンス方法

Publications (2)

Publication Number Publication Date
JP2000178712A JP2000178712A (ja) 2000-06-27
JP2000178712A5 true JP2000178712A5 (enExample) 2006-02-09

Family

ID=18450972

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10356826A Pending JP2000178712A (ja) 1998-12-16 1998-12-16 成膜装置およびカソードメンテナンス方法

Country Status (1)

Country Link
JP (1) JP2000178712A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6432936B2 (ja) * 2014-12-02 2018-12-05 国立研究開発法人産業技術総合研究所 小型装置保守機構
JP7662351B2 (ja) * 2021-02-18 2025-04-15 キヤノントッキ株式会社 成膜装置、電子デバイスの製造方法及び成膜源のメンテナンス方法

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