JP2000112130A5 - - Google Patents
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- Publication number
- JP2000112130A5 JP2000112130A5 JP1998280030A JP28003098A JP2000112130A5 JP 2000112130 A5 JP2000112130 A5 JP 2000112130A5 JP 1998280030 A JP1998280030 A JP 1998280030A JP 28003098 A JP28003098 A JP 28003098A JP 2000112130 A5 JP2000112130 A5 JP 2000112130A5
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- photosensitive resin
- positive photosensitive
- general formula
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 claims 3
- 239000002253 acid Substances 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 125000004432 carbon atoms Chemical group C* 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- -1 nitrogen containing basic compound Chemical class 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
Claims (3)
- （Ａ）環状脂肪族炭化水素骨格を有し、酸の作用により分解しアルカリ可溶性となる重合体、
（Ｂ）下記一般式（Ｉ）で表される化合物、
（Ｃ）活性光線の照射により酸を発生する化合物、
（Ｄ）含窒素塩基性化合物、
（Ｅ）フッ素系及び／またはシリコシ系界面活性剤、並びに
（Ｆ）溶剤を含有することを特徴とするポジ型感光性樹脂組成物。
- 活性光線として、２２０ｎｍ以下の波長の遠紫外光を使用することを特徴とする請求項１に記載のポジ型感光性樹脂組成物。
- 請求項１又は２に記載のポジ型感光性樹脂組成物により膜を形成し、当該膜を露光、現像することを特徴とするパターン形成方法。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28003098A JP3841379B2 (ja) | 1998-10-01 | 1998-10-01 | ポジ型感光性樹脂組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28003098A JP3841379B2 (ja) | 1998-10-01 | 1998-10-01 | ポジ型感光性樹脂組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000112130A JP2000112130A (ja) | 2000-04-21 |
| JP2000112130A5 true JP2000112130A5 (ja) | 2005-02-24 |
| JP3841379B2 JP3841379B2 (ja) | 2006-11-01 |
Family
ID=17619329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28003098A Expired - Fee Related JP3841379B2 (ja) | 1998-10-01 | 1998-10-01 | ポジ型感光性樹脂組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3841379B2 (ja) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3802732B2 (ja) * | 2000-05-12 | 2006-07-26 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| SG100729A1 (en) * | 2000-06-16 | 2003-12-26 | Jsr Corp | Radiation-sensitive resin composition |
| JP2002006483A (ja) * | 2000-06-20 | 2002-01-09 | Sumitomo Chem Co Ltd | フォトレジスト組成物 |
| US6627391B1 (en) | 2000-08-16 | 2003-09-30 | International Business Machines Corporation | Resist compositions containing lactone additives |
| KR101175818B1 (ko) | 2006-11-27 | 2012-08-24 | 코오롱인더스트리 주식회사 | 노보넨계 중합체 또는 공중합체와 그 제조방법 |
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1998
- 1998-10-01 JP JP28003098A patent/JP3841379B2/ja not_active Expired - Fee Related