JP2000077005A5 - - Google Patents

Download PDF

Info

Publication number
JP2000077005A5
JP2000077005A5 JP1999220978A JP22097899A JP2000077005A5 JP 2000077005 A5 JP2000077005 A5 JP 2000077005A5 JP 1999220978 A JP1999220978 A JP 1999220978A JP 22097899 A JP22097899 A JP 22097899A JP 2000077005 A5 JP2000077005 A5 JP 2000077005A5
Authority
JP
Japan
Prior art keywords
central portion
legs
comprised
coil
magnetic field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP1999220978A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000077005A (ja
Filing date
Publication date
Priority claimed from US09/130,662 external-priority patent/US6204508B1/en
Application filed filed Critical
Publication of JP2000077005A publication Critical patent/JP2000077005A/ja
Publication of JP2000077005A5 publication Critical patent/JP2000077005A5/ja
Ceased legal-status Critical Current

Links

JP11220978A 1998-08-07 1999-08-04 プラズマ発生装置及びそのためのフィラメント Ceased JP2000077005A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/130,662 US6204508B1 (en) 1998-08-07 1998-08-07 Toroidal filament for plasma generation
US130662 1998-08-07

Publications (2)

Publication Number Publication Date
JP2000077005A JP2000077005A (ja) 2000-03-14
JP2000077005A5 true JP2000077005A5 (https=) 2006-07-20

Family

ID=22445746

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11220978A Ceased JP2000077005A (ja) 1998-08-07 1999-08-04 プラズマ発生装置及びそのためのフィラメント

Country Status (7)

Country Link
US (1) US6204508B1 (https=)
EP (1) EP0980088B1 (https=)
JP (1) JP2000077005A (https=)
KR (1) KR100479372B1 (https=)
DE (1) DE69911869T2 (https=)
SG (1) SG74159A1 (https=)
TW (1) TW430853B (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100672835B1 (ko) * 2001-05-21 2007-01-22 삼성전자주식회사 이온 임플랜터의 이온 발생 장치
JP3842159B2 (ja) 2002-03-26 2006-11-08 株式会社半導体エネルギー研究所 ドーピング装置
KR100505040B1 (ko) * 2003-12-19 2005-07-29 삼성전자주식회사 이온 소스 및 이를 갖는 이온 주입 장치
US7446326B2 (en) * 2005-08-31 2008-11-04 Varian Semiconductor Equipment Associates, Inc. Technique for improving ion implanter productivity
KR100706799B1 (ko) * 2005-10-07 2007-04-12 삼성전자주식회사 필라멘트 부재 및 이를 가지는 이온 주입 장치의 이온 소스
JP2010153095A (ja) * 2008-12-24 2010-07-08 Showa Shinku:Kk イオンガン
JP6219594B2 (ja) * 2013-05-15 2017-10-25 Hoya株式会社 薄膜形成装置、及び薄膜形成方法
US9070538B2 (en) * 2013-10-25 2015-06-30 Varian Semiconductor Equipment Associates, Inc. Pinched plasma bridge flood gun for substrate charge neutralization
US9401266B2 (en) * 2014-07-25 2016-07-26 Bruker Daltonics, Inc. Filament for mass spectrometric electron impact ion source
CN217933703U (zh) * 2022-09-05 2022-11-29 台湾积体电路制造股份有限公司 离子源灯丝结构、离子源装置及离子注入设备

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR777482A (fr) * 1933-09-14 1935-02-21 Philips Nv Cathode à oxyde plus particulièrement destinée aux tubes à décharges à atmosphère gazeuse
US2479193A (en) * 1946-07-08 1949-08-16 Gen Electric Articulated cathode
FR1175593A (fr) * 1957-05-21 1959-03-27 Radio Electr Soc Fr Perfectionnements aux filaments des tubes électroniques
US4176293A (en) * 1978-02-17 1979-11-27 Varian Associates, Inc. Thermionic cathode heater having reduced magnetic field
GB2192751B (en) * 1986-07-14 1991-02-13 Denki Kagaku Kogyo Kk Method of making a thermionic cathode structure.
JPH0697603B2 (ja) 1987-04-02 1994-11-30 東芝ライテック株式会社 希ガス放電灯
US4918354A (en) 1987-12-18 1990-04-17 Gte Products Corporation Compact coiled coil incandescent filament with supports and pitch control
US4804837A (en) 1988-01-11 1989-02-14 Eaton Corporation Ion implantation surface charge control method and apparatus
US4935662A (en) 1988-08-31 1990-06-19 Gte Products Corporation Electric lamp having a coiled incandescent filament and filament movement restraint means
GB2246854B (en) * 1990-08-09 1993-07-21 Strand Lighting Ltd Lamps
US5256947A (en) * 1990-10-10 1993-10-26 Nec Electronics, Inc. Multiple filament enhanced ion source
US5262652A (en) * 1991-05-14 1993-11-16 Applied Materials, Inc. Ion implantation apparatus having increased source lifetime
GB9304462D0 (en) * 1993-03-04 1993-04-21 Kore Tech Ltd Mass spectrometer
US5497006A (en) 1994-11-15 1996-03-05 Eaton Corporation Ion generating source for use in an ion implanter
US5680003A (en) 1995-05-19 1997-10-21 General Electric Company Coiled-coil filament design for an incandescent lamp
US5808308A (en) * 1996-05-03 1998-09-15 Leybold Inficon Inc. Dual ion source
US5856674A (en) * 1997-09-16 1999-01-05 Eaton Corporation Filament for ion implanter plasma shower

Similar Documents

Publication Publication Date Title
JP2000077005A5 (https=)
JP3837171B2 (ja) プラズマ処理用高周波誘導プラズマ源装置
TW201143551A (en) Plasma source design
US8773020B2 (en) Apparatus for forming a magnetic field and methods of use thereof
US7163602B2 (en) Apparatus for generating planar plasma using concentric coils and ferromagnetic cores
JP2015072909A (ja) 改良型プラズマ源
US20040060517A1 (en) Process apparatus and method for improving plasma production of an inductively coupled plasma
US20140035458A1 (en) Plasma reactor with electron beam plasma source having a uniform magnetic field
JPH06142220A (ja) 間隙構造のｘ線ニードル
JP2001502468A (ja) イオン銃
CN101002508A (zh) 具有更高的羽流稳定性和加热效率的微波等离子体喷嘴
US7217337B2 (en) Plasma process chamber and system
JP2003520393A (ja) ガスクラスターイオンビーム形成用イオン化装置
CN108575042B (zh) 一种线圈、介质筒和等离子体腔室
KR20230158559A (ko) 고효율 플라즈마 생성 시스템 및 방법
TWI270939B (en) Discharge plasma processing system
TW430853B (en) Toroidal filament for plasma generation
JPH0223612A (ja) プラズマ反応装置
EP1662848B1 (en) Electromagnetic induced accelerator based on coil-turn modulation
TW202228180A (zh) 線圈結構能隨放電腔結構進行變化的離子源
Sukhinin et al. Development of a distributed ferromagnetic enhanced inductively coupled plasma source for plasma processing
Bilek et al. Magnetic system for producing uniform coatings using a filtered cathodic arc
CA1112714A (en) Core configuration for induction ionized lamps
CN101211749A (zh) 具有多个闭合环路的无电极感应灯
JPH0521391A (ja) マイクロ波プラズマ装置