KR100479372B1 - 플라즈마 발생용 토로이드형 필라멘트 - Google Patents

플라즈마 발생용 토로이드형 필라멘트 Download PDF

Info

Publication number
KR100479372B1
KR100479372B1 KR10-1999-0031960A KR19990031960A KR100479372B1 KR 100479372 B1 KR100479372 B1 KR 100479372B1 KR 19990031960 A KR19990031960 A KR 19990031960A KR 100479372 B1 KR100479372 B1 KR 100479372B1
Authority
KR
South Korea
Prior art keywords
heat radiating
filament
radiating portion
ion source
legs
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR10-1999-0031960A
Other languages
English (en)
Korean (ko)
Other versions
KR20000017070A (ko
Inventor
첸지옹
카포디루포로날드안토니
바루소스코트
링필립존
진퀴
Original Assignee
액셀리스 테크놀로지스, 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 액셀리스 테크놀로지스, 인크. filed Critical 액셀리스 테크놀로지스, 인크.
Publication of KR20000017070A publication Critical patent/KR20000017070A/ko
Application granted granted Critical
Publication of KR100479372B1 publication Critical patent/KR100479372B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/20—Ohmic heating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/15—Cathodes heated directly by an electric current
    • H01J1/16—Cathodes heated directly by an electric current characterised by the shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR10-1999-0031960A 1998-08-07 1999-08-04 플라즈마 발생용 토로이드형 필라멘트 Expired - Fee Related KR100479372B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/130,662 US6204508B1 (en) 1998-08-07 1998-08-07 Toroidal filament for plasma generation
US9/130,662 1998-08-07
US09/130,662 1998-08-07

Publications (2)

Publication Number Publication Date
KR20000017070A KR20000017070A (ko) 2000-03-25
KR100479372B1 true KR100479372B1 (ko) 2005-03-28

Family

ID=22445746

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-1999-0031960A Expired - Fee Related KR100479372B1 (ko) 1998-08-07 1999-08-04 플라즈마 발생용 토로이드형 필라멘트

Country Status (7)

Country Link
US (1) US6204508B1 (https=)
EP (1) EP0980088B1 (https=)
JP (1) JP2000077005A (https=)
KR (1) KR100479372B1 (https=)
DE (1) DE69911869T2 (https=)
SG (1) SG74159A1 (https=)
TW (1) TW430853B (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100672835B1 (ko) * 2001-05-21 2007-01-22 삼성전자주식회사 이온 임플랜터의 이온 발생 장치
JP3842159B2 (ja) 2002-03-26 2006-11-08 株式会社半導体エネルギー研究所 ドーピング装置
KR100505040B1 (ko) * 2003-12-19 2005-07-29 삼성전자주식회사 이온 소스 및 이를 갖는 이온 주입 장치
US7446326B2 (en) * 2005-08-31 2008-11-04 Varian Semiconductor Equipment Associates, Inc. Technique for improving ion implanter productivity
KR100706799B1 (ko) * 2005-10-07 2007-04-12 삼성전자주식회사 필라멘트 부재 및 이를 가지는 이온 주입 장치의 이온 소스
JP2010153095A (ja) * 2008-12-24 2010-07-08 Showa Shinku:Kk イオンガン
JP6219594B2 (ja) * 2013-05-15 2017-10-25 Hoya株式会社 薄膜形成装置、及び薄膜形成方法
US9070538B2 (en) * 2013-10-25 2015-06-30 Varian Semiconductor Equipment Associates, Inc. Pinched plasma bridge flood gun for substrate charge neutralization
US9401266B2 (en) * 2014-07-25 2016-07-26 Bruker Daltonics, Inc. Filament for mass spectrometric electron impact ion source
CN217933703U (zh) * 2022-09-05 2022-11-29 台湾积体电路制造股份有限公司 离子源灯丝结构、离子源装置及离子注入设备

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR777482A (fr) * 1933-09-14 1935-02-21 Philips Nv Cathode à oxyde plus particulièrement destinée aux tubes à décharges à atmosphère gazeuse
US2479193A (en) * 1946-07-08 1949-08-16 Gen Electric Articulated cathode
FR1175593A (fr) * 1957-05-21 1959-03-27 Radio Electr Soc Fr Perfectionnements aux filaments des tubes électroniques
US4176293A (en) * 1978-02-17 1979-11-27 Varian Associates, Inc. Thermionic cathode heater having reduced magnetic field
GB2192751B (en) * 1986-07-14 1991-02-13 Denki Kagaku Kogyo Kk Method of making a thermionic cathode structure.
JPH0697603B2 (ja) 1987-04-02 1994-11-30 東芝ライテック株式会社 希ガス放電灯
US4918354A (en) 1987-12-18 1990-04-17 Gte Products Corporation Compact coiled coil incandescent filament with supports and pitch control
US4804837A (en) 1988-01-11 1989-02-14 Eaton Corporation Ion implantation surface charge control method and apparatus
US4935662A (en) 1988-08-31 1990-06-19 Gte Products Corporation Electric lamp having a coiled incandescent filament and filament movement restraint means
GB2246854B (en) * 1990-08-09 1993-07-21 Strand Lighting Ltd Lamps
US5256947A (en) * 1990-10-10 1993-10-26 Nec Electronics, Inc. Multiple filament enhanced ion source
US5262652A (en) * 1991-05-14 1993-11-16 Applied Materials, Inc. Ion implantation apparatus having increased source lifetime
GB9304462D0 (en) * 1993-03-04 1993-04-21 Kore Tech Ltd Mass spectrometer
US5497006A (en) 1994-11-15 1996-03-05 Eaton Corporation Ion generating source for use in an ion implanter
US5680003A (en) 1995-05-19 1997-10-21 General Electric Company Coiled-coil filament design for an incandescent lamp
US5808308A (en) * 1996-05-03 1998-09-15 Leybold Inficon Inc. Dual ion source
US5856674A (en) * 1997-09-16 1999-01-05 Eaton Corporation Filament for ion implanter plasma shower

Also Published As

Publication number Publication date
DE69911869T2 (de) 2004-08-19
US6204508B1 (en) 2001-03-20
SG74159A1 (en) 2000-07-18
JP2000077005A (ja) 2000-03-14
EP0980088B1 (en) 2003-10-08
EP0980088A1 (en) 2000-02-16
KR20000017070A (ko) 2000-03-25
DE69911869D1 (de) 2003-11-13
TW430853B (en) 2001-04-21

Similar Documents

Publication Publication Date Title
US6271529B1 (en) Ion implantation with charge neutralization
JP4239116B2 (ja) イオンビーム中和器及びその中和方法
JP5847184B2 (ja) 浸漬低インダクタンスｒｆコイル及びマルチカスプ磁気配列を用いた誘導結合型プラズマフラッドガン
TWI648761B (zh) 用於製造帶狀離子束的改良的離子源組件
US6819053B2 (en) Hall effect ion source at high current density
KR101464484B1 (ko) 이온 비임 임플란터를 위한 플라즈마 전자 플러드
US5296272A (en) Method of implanting ions from a plasma into an object
US6016036A (en) Magnetic filter for ion source
US6294862B1 (en) Multi-cusp ion source
JP2007500430A (ja) イオン注入装置およびシステム
WO2001043160A1 (en) Ionizer for gas cluster ion beam formation
US8760054B2 (en) Microwave plasma electron flood
KR100479372B1 (ko) 플라즈마 발생용 토로이드형 필라멘트
US5620522A (en) Microwave plasma generator
US5856674A (en) Filament for ion implanter plasma shower
GB2326971A (en) Electron flood apparatus for neutralising charge build up on a substrate during ion implantation
KR102334205B1 (ko) 기판 전하 중성화를 위한 핀치된 플라즈마 브리지 플러드 건
JP2009283459A (ja) マルチモードイオン源
JPH09106778A (ja) 粒子線照射装置
US4841556A (en) Plasma X-ray source
JPH10172448A (ja) イオン源、その電子放出装置、及びフィラメントの製造方法
JP2002056786A (ja) イオン注入装置用のイオン源
JP3504290B2 (ja) 低エネルギー中性粒子線発生方法及び装置
JP6752449B2 (ja) イオンビーム中和方法と装置
JP3341497B2 (ja) 高周波型荷電粒子加速器

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

N231 Notification of change of applicant
PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R13-asn-PN2301

St.27 status event code: A-3-3-R10-R11-asn-PN2301

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

FPAY Annual fee payment

Payment date: 20080117

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

R17-X000 Change to representative recorded

St.27 status event code: A-5-5-R10-R17-oth-X000

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20090319

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20090319