JP2000077005A - プラズマ発生装置及びそのためのフィラメント - Google Patents

プラズマ発生装置及びそのためのフィラメント

Info

Publication number
JP2000077005A
JP2000077005A JP11220978A JP22097899A JP2000077005A JP 2000077005 A JP2000077005 A JP 2000077005A JP 11220978 A JP11220978 A JP 11220978A JP 22097899 A JP22097899 A JP 22097899A JP 2000077005 A JP2000077005 A JP 2000077005A
Authority
JP
Japan
Prior art keywords
central portion
filament
coil
plasma
closed loop
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP11220978A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000077005A5 (https=
Inventor
Jiong Chen
チェン ジオング
Ronald Anthony Capodilupo
アンソニー カポディルポ ロナルド
Scott Barusso
バルソー スコット
Philip John Ring
ジョン リング フィリップ
Kui Jin
ジン クイ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eaton Corp
Original Assignee
Eaton Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eaton Corp filed Critical Eaton Corp
Publication of JP2000077005A publication Critical patent/JP2000077005A/ja
Publication of JP2000077005A5 publication Critical patent/JP2000077005A5/ja
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/20—Ohmic heating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/15—Cathodes heated directly by an electric current
    • H01J1/16—Cathodes heated directly by an electric current characterised by the shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP11220978A 1998-08-07 1999-08-04 プラズマ発生装置及びそのためのフィラメント Ceased JP2000077005A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/130,662 US6204508B1 (en) 1998-08-07 1998-08-07 Toroidal filament for plasma generation
US130662 1998-08-07

Publications (2)

Publication Number Publication Date
JP2000077005A true JP2000077005A (ja) 2000-03-14
JP2000077005A5 JP2000077005A5 (https=) 2006-07-20

Family

ID=22445746

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11220978A Ceased JP2000077005A (ja) 1998-08-07 1999-08-04 プラズマ発生装置及びそのためのフィラメント

Country Status (7)

Country Link
US (1) US6204508B1 (https=)
EP (1) EP0980088B1 (https=)
JP (1) JP2000077005A (https=)
KR (1) KR100479372B1 (https=)
DE (1) DE69911869T2 (https=)
SG (1) SG74159A1 (https=)
TW (1) TW430853B (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7026764B2 (en) 2002-03-26 2006-04-11 Semiconductor Energy Laboratory Co., Ltd. Plasma producing apparatus and doping apparatus
JP2014224285A (ja) * 2013-05-15 2014-12-04 Hoya株式会社 薄膜形成装置、及び薄膜形成方法
CN105304448A (zh) * 2014-07-25 2016-02-03 布鲁克·道尔顿公司 用于质谱电子轰击离子源的灯丝

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100672835B1 (ko) * 2001-05-21 2007-01-22 삼성전자주식회사 이온 임플랜터의 이온 발생 장치
KR100505040B1 (ko) * 2003-12-19 2005-07-29 삼성전자주식회사 이온 소스 및 이를 갖는 이온 주입 장치
US7446326B2 (en) * 2005-08-31 2008-11-04 Varian Semiconductor Equipment Associates, Inc. Technique for improving ion implanter productivity
KR100706799B1 (ko) * 2005-10-07 2007-04-12 삼성전자주식회사 필라멘트 부재 및 이를 가지는 이온 주입 장치의 이온 소스
JP2010153095A (ja) * 2008-12-24 2010-07-08 Showa Shinku:Kk イオンガン
US9070538B2 (en) * 2013-10-25 2015-06-30 Varian Semiconductor Equipment Associates, Inc. Pinched plasma bridge flood gun for substrate charge neutralization
CN217933703U (zh) * 2022-09-05 2022-11-29 台湾积体电路制造股份有限公司 离子源灯丝结构、离子源装置及离子注入设备

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR777482A (fr) * 1933-09-14 1935-02-21 Philips Nv Cathode à oxyde plus particulièrement destinée aux tubes à décharges à atmosphère gazeuse
US2479193A (en) * 1946-07-08 1949-08-16 Gen Electric Articulated cathode
FR1175593A (fr) * 1957-05-21 1959-03-27 Radio Electr Soc Fr Perfectionnements aux filaments des tubes électroniques
US4176293A (en) * 1978-02-17 1979-11-27 Varian Associates, Inc. Thermionic cathode heater having reduced magnetic field
GB2192751B (en) * 1986-07-14 1991-02-13 Denki Kagaku Kogyo Kk Method of making a thermionic cathode structure.
JPH0697603B2 (ja) 1987-04-02 1994-11-30 東芝ライテック株式会社 希ガス放電灯
US4918354A (en) 1987-12-18 1990-04-17 Gte Products Corporation Compact coiled coil incandescent filament with supports and pitch control
US4804837A (en) 1988-01-11 1989-02-14 Eaton Corporation Ion implantation surface charge control method and apparatus
US4935662A (en) 1988-08-31 1990-06-19 Gte Products Corporation Electric lamp having a coiled incandescent filament and filament movement restraint means
GB2246854B (en) * 1990-08-09 1993-07-21 Strand Lighting Ltd Lamps
US5256947A (en) * 1990-10-10 1993-10-26 Nec Electronics, Inc. Multiple filament enhanced ion source
US5262652A (en) * 1991-05-14 1993-11-16 Applied Materials, Inc. Ion implantation apparatus having increased source lifetime
GB9304462D0 (en) * 1993-03-04 1993-04-21 Kore Tech Ltd Mass spectrometer
US5497006A (en) 1994-11-15 1996-03-05 Eaton Corporation Ion generating source for use in an ion implanter
US5680003A (en) 1995-05-19 1997-10-21 General Electric Company Coiled-coil filament design for an incandescent lamp
US5808308A (en) * 1996-05-03 1998-09-15 Leybold Inficon Inc. Dual ion source
US5856674A (en) * 1997-09-16 1999-01-05 Eaton Corporation Filament for ion implanter plasma shower

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7026764B2 (en) 2002-03-26 2006-04-11 Semiconductor Energy Laboratory Co., Ltd. Plasma producing apparatus and doping apparatus
US7382098B2 (en) 2002-03-26 2008-06-03 Semiconductor Energy Laboratory Co., Ltd. Plasma producing apparatus and doping apparatus
JP2014224285A (ja) * 2013-05-15 2014-12-04 Hoya株式会社 薄膜形成装置、及び薄膜形成方法
CN105304448A (zh) * 2014-07-25 2016-02-03 布鲁克·道尔顿公司 用于质谱电子轰击离子源的灯丝

Also Published As

Publication number Publication date
DE69911869T2 (de) 2004-08-19
US6204508B1 (en) 2001-03-20
SG74159A1 (en) 2000-07-18
EP0980088B1 (en) 2003-10-08
KR100479372B1 (ko) 2005-03-28
EP0980088A1 (en) 2000-02-16
KR20000017070A (ko) 2000-03-25
DE69911869D1 (de) 2003-11-13
TW430853B (en) 2001-04-21

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