TW430853B - Toroidal filament for plasma generation - Google Patents

Toroidal filament for plasma generation

Info

Publication number
TW430853B
TW430853B TW088113509A TW88113509A TW430853B TW 430853 B TW430853 B TW 430853B TW 088113509 A TW088113509 A TW 088113509A TW 88113509 A TW88113509 A TW 88113509A TW 430853 B TW430853 B TW 430853B
Authority
TW
Taiwan
Prior art keywords
toroid
thermally emissive
legs
constructed
closed loop
Prior art date
Application number
TW088113509A
Other languages
English (en)
Chinese (zh)
Inventor
Jiong Chen
Ronald Anthony Capodilupo
Scott Barusso
Philip John Ring
Kui Jin
Original Assignee
Axcelis Tech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Axcelis Tech Inc filed Critical Axcelis Tech Inc
Application granted granted Critical
Publication of TW430853B publication Critical patent/TW430853B/zh

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/20—Ohmic heating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/15—Cathodes heated directly by an electric current
    • H01J1/16—Cathodes heated directly by an electric current characterised by the shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
TW088113509A 1998-08-07 1999-08-07 Toroidal filament for plasma generation TW430853B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/130,662 US6204508B1 (en) 1998-08-07 1998-08-07 Toroidal filament for plasma generation

Publications (1)

Publication Number Publication Date
TW430853B true TW430853B (en) 2001-04-21

Family

ID=22445746

Family Applications (1)

Application Number Title Priority Date Filing Date
TW088113509A TW430853B (en) 1998-08-07 1999-08-07 Toroidal filament for plasma generation

Country Status (7)

Country Link
US (1) US6204508B1 (https=)
EP (1) EP0980088B1 (https=)
JP (1) JP2000077005A (https=)
KR (1) KR100479372B1 (https=)
DE (1) DE69911869T2 (https=)
SG (1) SG74159A1 (https=)
TW (1) TW430853B (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100672835B1 (ko) * 2001-05-21 2007-01-22 삼성전자주식회사 이온 임플랜터의 이온 발생 장치
JP3842159B2 (ja) 2002-03-26 2006-11-08 株式会社半導体エネルギー研究所 ドーピング装置
KR100505040B1 (ko) * 2003-12-19 2005-07-29 삼성전자주식회사 이온 소스 및 이를 갖는 이온 주입 장치
US7446326B2 (en) * 2005-08-31 2008-11-04 Varian Semiconductor Equipment Associates, Inc. Technique for improving ion implanter productivity
KR100706799B1 (ko) * 2005-10-07 2007-04-12 삼성전자주식회사 필라멘트 부재 및 이를 가지는 이온 주입 장치의 이온 소스
JP2010153095A (ja) * 2008-12-24 2010-07-08 Showa Shinku:Kk イオンガン
JP6219594B2 (ja) * 2013-05-15 2017-10-25 Hoya株式会社 薄膜形成装置、及び薄膜形成方法
US9070538B2 (en) * 2013-10-25 2015-06-30 Varian Semiconductor Equipment Associates, Inc. Pinched plasma bridge flood gun for substrate charge neutralization
US9401266B2 (en) * 2014-07-25 2016-07-26 Bruker Daltonics, Inc. Filament for mass spectrometric electron impact ion source
CN217933703U (zh) * 2022-09-05 2022-11-29 台湾积体电路制造股份有限公司 离子源灯丝结构、离子源装置及离子注入设备

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR777482A (fr) * 1933-09-14 1935-02-21 Philips Nv Cathode à oxyde plus particulièrement destinée aux tubes à décharges à atmosphère gazeuse
US2479193A (en) * 1946-07-08 1949-08-16 Gen Electric Articulated cathode
FR1175593A (fr) * 1957-05-21 1959-03-27 Radio Electr Soc Fr Perfectionnements aux filaments des tubes électroniques
US4176293A (en) * 1978-02-17 1979-11-27 Varian Associates, Inc. Thermionic cathode heater having reduced magnetic field
GB2192751B (en) * 1986-07-14 1991-02-13 Denki Kagaku Kogyo Kk Method of making a thermionic cathode structure.
JPH0697603B2 (ja) 1987-04-02 1994-11-30 東芝ライテック株式会社 希ガス放電灯
US4918354A (en) 1987-12-18 1990-04-17 Gte Products Corporation Compact coiled coil incandescent filament with supports and pitch control
US4804837A (en) 1988-01-11 1989-02-14 Eaton Corporation Ion implantation surface charge control method and apparatus
US4935662A (en) 1988-08-31 1990-06-19 Gte Products Corporation Electric lamp having a coiled incandescent filament and filament movement restraint means
GB2246854B (en) * 1990-08-09 1993-07-21 Strand Lighting Ltd Lamps
US5256947A (en) * 1990-10-10 1993-10-26 Nec Electronics, Inc. Multiple filament enhanced ion source
US5262652A (en) * 1991-05-14 1993-11-16 Applied Materials, Inc. Ion implantation apparatus having increased source lifetime
GB9304462D0 (en) * 1993-03-04 1993-04-21 Kore Tech Ltd Mass spectrometer
US5497006A (en) 1994-11-15 1996-03-05 Eaton Corporation Ion generating source for use in an ion implanter
US5680003A (en) 1995-05-19 1997-10-21 General Electric Company Coiled-coil filament design for an incandescent lamp
US5808308A (en) * 1996-05-03 1998-09-15 Leybold Inficon Inc. Dual ion source
US5856674A (en) * 1997-09-16 1999-01-05 Eaton Corporation Filament for ion implanter plasma shower

Also Published As

Publication number Publication date
DE69911869T2 (de) 2004-08-19
US6204508B1 (en) 2001-03-20
SG74159A1 (en) 2000-07-18
JP2000077005A (ja) 2000-03-14
EP0980088B1 (en) 2003-10-08
KR100479372B1 (ko) 2005-03-28
EP0980088A1 (en) 2000-02-16
KR20000017070A (ko) 2000-03-25
DE69911869D1 (de) 2003-11-13

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Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees