ITMI20111238A1 - Procedimento per la produzione di un transistor a effetto di campo chemiosensibile - Google Patents

Procedimento per la produzione di un transistor a effetto di campo chemiosensibile

Info

Publication number
ITMI20111238A1
ITMI20111238A1 ITMI20111238A ITMI20111238A1 IT MI20111238 A1 ITMI20111238 A1 IT MI20111238A1 IT MI20111238 A ITMI20111238 A IT MI20111238A IT MI20111238 A1 ITMI20111238 A1 IT MI20111238A1
Authority
IT
Italy
Prior art keywords
transistor
procedure
chemical
production
sensitive field
Prior art date
Application number
Other languages
English (en)
Italian (it)
Inventor
Richard Fix
Andreas Krauss
Alexsander Martin
Original Assignee
Bosch Gmbh Robert
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bosch Gmbh Robert filed Critical Bosch Gmbh Robert
Publication of ITMI20111238A1 publication Critical patent/ITMI20111238A1/it

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/403—Cells and electrode assemblies
    • G01N27/414—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
    • G01N27/4141—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS specially adapted for gases

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Molecular Biology (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Thin Film Transistor (AREA)
ITMI20111238 2010-07-09 2011-07-04 Procedimento per la produzione di un transistor a effetto di campo chemiosensibile ITMI20111238A1 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE201010031167 DE102010031167A1 (de) 2010-07-09 2010-07-09 Herstellungsverfahren für einen chemosensitiven Feldeffekttransistor

Publications (1)

Publication Number Publication Date
ITMI20111238A1 true ITMI20111238A1 (it) 2012-01-10

Family

ID=44898765

Family Applications (1)

Application Number Title Priority Date Filing Date
ITMI20111238 ITMI20111238A1 (it) 2010-07-09 2011-07-04 Procedimento per la produzione di un transistor a effetto di campo chemiosensibile

Country Status (4)

Country Link
JP (1) JP6004614B2 (de)
DE (1) DE102010031167A1 (de)
FR (1) FR2962592B1 (de)
IT (1) ITMI20111238A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012211460A1 (de) * 2012-07-03 2014-01-09 Robert Bosch Gmbh Gassensor und Verfahren zum Herstellen eines solchen
JP6659283B2 (ja) 2015-09-14 2020-03-04 株式会社東芝 半導体装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63129666A (ja) * 1986-11-20 1988-06-02 Oki Electric Ind Co Ltd 半導体装置の製造方法
JPH03123082A (ja) * 1989-10-05 1991-05-24 Oki Electric Ind Co Ltd 半導体装置の製造方法
JPH07263684A (ja) * 1994-03-25 1995-10-13 Mitsubishi Electric Corp 電界効果トランジスタの製造方法
JPH09318569A (ja) * 1996-05-30 1997-12-12 Tokyo Gas Co Ltd ガスセンサおよびその製造方法
US6218311B1 (en) * 1998-06-30 2001-04-17 Texas Instruments Incorporated Post-etch treatment of a semiconductor device
JP2001116718A (ja) * 1999-10-18 2001-04-27 Ngk Spark Plug Co Ltd センサ用電界効果型トランジスタ及びその製造方法
JP3774682B2 (ja) * 2001-06-29 2006-05-17 キヤノン株式会社 電子放出素子、電子源および画像形成装置
JP4552973B2 (ja) * 2007-06-08 2010-09-29 セイコーエプソン株式会社 半導体装置の製造方法

Also Published As

Publication number Publication date
FR2962592A1 (fr) 2012-01-13
FR2962592B1 (fr) 2014-03-14
CN102315128A (zh) 2012-01-11
JP2012018166A (ja) 2012-01-26
JP6004614B2 (ja) 2016-10-12
DE102010031167A1 (de) 2012-01-12

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