ITMI20012284A1 - Metodo per il perfezionamento della connessione elettrica tra un dispositivo elettronico di potenza ed il suo package - Google Patents

Metodo per il perfezionamento della connessione elettrica tra un dispositivo elettronico di potenza ed il suo package Download PDF

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Publication number
ITMI20012284A1
ITMI20012284A1 IT2001MI002284A ITMI20012284A ITMI20012284A1 IT MI20012284 A1 ITMI20012284 A1 IT MI20012284A1 IT 2001MI002284 A IT2001MI002284 A IT 2001MI002284A IT MI20012284 A ITMI20012284 A IT MI20012284A IT MI20012284 A1 ITMI20012284 A1 IT MI20012284A1
Authority
IT
Italy
Prior art keywords
layer
metallization
wettable
gate region
level
Prior art date
Application number
IT2001MI002284A
Other languages
English (en)
Italian (it)
Inventor
Ferruccio Frisina
Antonio Pinto
Angelo Magri
Original Assignee
St Microelectronics Srl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by St Microelectronics Srl filed Critical St Microelectronics Srl
Priority to IT2001MI002284A priority Critical patent/ITMI20012284A1/it
Priority to EP02024185A priority patent/EP1310993A3/en
Priority to US10/285,363 priority patent/US7126173B2/en
Priority to JP2002316673A priority patent/JP2003152160A/ja
Publication of ITMI20012284A1 publication Critical patent/ITMI20012284A1/it

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/23Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
    • H10D64/251Source or drain electrodes for field-effect devices
    • H10D64/252Source or drain electrodes for field-effect devices for vertical or pseudo-vertical devices
    • H10D64/2527Source or drain electrodes for field-effect devices for vertical or pseudo-vertical devices for vertical devices wherein the source or drain electrodes are recessed in semiconductor bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/40Leadframes
    • H10W70/481Leadframes for devices being provided for in groups H10D8/00 - H10D48/00
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/60Strap connectors, e.g. thick copper clips for grounding of power devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/23Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
    • H10D64/251Source or drain electrodes for field-effect devices
    • H10D64/252Source or drain electrodes for field-effect devices for vertical or pseudo-vertical devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/076Connecting or disconnecting of strap connectors
    • H10W72/07631Techniques
    • H10W72/07636Soldering or alloying
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/251Materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/60Strap connectors, e.g. thick copper clips for grounding of power devices
    • H10W72/621Structures or relative sizes of strap connectors
    • H10W72/622Multilayered strap connectors, e.g. having a coating on a lowermost surface of a core
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/60Strap connectors, e.g. thick copper clips for grounding of power devices
    • H10W72/651Materials of strap connectors
    • H10W72/652Materials of strap connectors comprising metals or metalloids, e.g. silver
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/853On the same surface
    • H10W72/871Bond wires and strap connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/921Structures or relative sizes of bond pads
    • H10W72/926Multiple bond pads having different sizes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/756Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Coupling Device And Connection With Printed Circuit (AREA)
  • Junction Field-Effect Transistors (AREA)
IT2001MI002284A 2001-10-30 2001-10-30 Metodo per il perfezionamento della connessione elettrica tra un dispositivo elettronico di potenza ed il suo package ITMI20012284A1 (it)

Priority Applications (4)

Application Number Priority Date Filing Date Title
IT2001MI002284A ITMI20012284A1 (it) 2001-10-30 2001-10-30 Metodo per il perfezionamento della connessione elettrica tra un dispositivo elettronico di potenza ed il suo package
EP02024185A EP1310993A3 (en) 2001-10-30 2002-10-30 Method for enhancing the electric connection between a power electronic device and its package
US10/285,363 US7126173B2 (en) 2001-10-30 2002-10-30 Method for enhancing the electric connection between a power electronic device and its package
JP2002316673A JP2003152160A (ja) 2001-10-30 2002-10-30 電子パワーデバイス及びその製作方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT2001MI002284A ITMI20012284A1 (it) 2001-10-30 2001-10-30 Metodo per il perfezionamento della connessione elettrica tra un dispositivo elettronico di potenza ed il suo package

Publications (1)

Publication Number Publication Date
ITMI20012284A1 true ITMI20012284A1 (it) 2003-04-30

Family

ID=11448561

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2001MI002284A ITMI20012284A1 (it) 2001-10-30 2001-10-30 Metodo per il perfezionamento della connessione elettrica tra un dispositivo elettronico di potenza ed il suo package

Country Status (4)

Country Link
US (1) US7126173B2 (https=)
EP (1) EP1310993A3 (https=)
JP (1) JP2003152160A (https=)
IT (1) ITMI20012284A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006025959B4 (de) * 2006-06-02 2010-03-04 Infineon Technologies Ag Leistungshalbleiteranordnung mit vorderseitig aufgelötetem Clip und Verfahren zur Herstellung einer solchen
US9589937B2 (en) * 2014-08-08 2017-03-07 Wuhan Xinxin Semiconductor Manufacturing Co., Ltd Semiconductor cooling method and method of heat dissipation

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4067041A (en) 1975-09-29 1978-01-03 Hutson Jearld L Semiconductor device package and method of making same
US4561468A (en) * 1982-04-19 1985-12-31 Valcor Engineering Corporation Valve for use in jet engine systems and the like
DE3224642A1 (de) * 1982-07-01 1984-01-05 Siemens AG, 1000 Berlin und 8000 München Igfet mit injektorzone
US4561168A (en) * 1982-11-22 1985-12-31 Siliconix Incorporated Method of making shadow isolated metal DMOS FET device
EP0255970B1 (en) * 1986-08-08 1993-12-15 Philips Electronics Uk Limited A method of manufacturing an insulated gate field effect transistor
US4959705A (en) * 1988-10-17 1990-09-25 Ford Microelectronics, Inc. Three metal personalization of application specific monolithic microwave integrated circuit
US5404040A (en) * 1990-12-21 1995-04-04 Siliconix Incorporated Structure and fabrication of power MOSFETs, including termination structures
EP0693773B1 (en) * 1994-07-14 2005-02-09 STMicroelectronics S.r.l. VDMOS power device and manufacturing process thereof
US5767546A (en) 1994-12-30 1998-06-16 Siliconix Incorporated Laternal power mosfet having metal strap layer to reduce distributed resistance
US5597765A (en) * 1995-01-10 1997-01-28 Siliconix Incorporated Method for making termination structure for power MOSFET
US5681761A (en) * 1995-12-28 1997-10-28 Philips Electronics North America Corporation Microwave power SOI-MOSFET with high conductivity metal gate
US6342715B1 (en) * 1997-06-27 2002-01-29 Kabushiki Kaisha Toshiba Nonvolatile semiconductor memory device
DE69832359T2 (de) * 1997-07-19 2006-08-03 Koninklijke Philips Electronics N.V. Halbleitervorrichtung -anordnung und -schaltungen
US6040626A (en) * 1998-09-25 2000-03-21 International Rectifier Corp. Semiconductor package
US6940142B2 (en) * 2001-07-02 2005-09-06 Xerox Corporation Low data line capacitance image sensor array using air-gap metal crossover
JP2004055812A (ja) * 2002-07-19 2004-02-19 Renesas Technology Corp 半導体装置
JP2006049341A (ja) * 2004-07-30 2006-02-16 Renesas Technology Corp 半導体装置およびその製造方法
US7274092B2 (en) * 2005-09-13 2007-09-25 Infineon Technologies, Ag Semiconductor component and method of assembling the same

Also Published As

Publication number Publication date
EP1310993A3 (en) 2003-07-16
US20030100154A1 (en) 2003-05-29
JP2003152160A (ja) 2003-05-23
US7126173B2 (en) 2006-10-24
EP1310993A2 (en) 2003-05-14

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