IT8620793A1 - Procedimento per il rivestimento di substrati in una camera a vuoto - Google Patents

Procedimento per il rivestimento di substrati in una camera a vuoto

Info

Publication number
IT8620793A1
IT8620793A1 IT1986A20793A IT2079386A IT8620793A1 IT 8620793 A1 IT8620793 A1 IT 8620793A1 IT 1986A20793 A IT1986A20793 A IT 1986A20793A IT 2079386 A IT2079386 A IT 2079386A IT 8620793 A1 IT8620793 A1 IT 8620793A1
Authority
IT
Italy
Prior art keywords
procedure
vacuum chamber
coating substrates
substrates
coating
Prior art date
Application number
IT1986A20793A
Other languages
English (en)
Other versions
IT8620793A0 (it
IT1189560B (it
Original Assignee
Balzers Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Ag filed Critical Balzers Ag
Publication of IT8620793A0 publication Critical patent/IT8620793A0/it
Publication of IT8620793A1 publication Critical patent/IT8620793A1/it
Application granted granted Critical
Publication of IT1189560B publication Critical patent/IT1189560B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
IT20793/86A 1985-06-20 1986-06-16 Procedimento per il rivestimento di substrati in una camera a vuoto IT1189560B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH2610/85A CH664768A5 (de) 1985-06-20 1985-06-20 Verfahren zur beschichtung von substraten in einer vakuumkammer.

Publications (3)

Publication Number Publication Date
IT8620793A0 IT8620793A0 (it) 1986-06-16
IT8620793A1 true IT8620793A1 (it) 1987-12-16
IT1189560B IT1189560B (it) 1988-02-04

Family

ID=4237637

Family Applications (1)

Application Number Title Priority Date Filing Date
IT20793/86A IT1189560B (it) 1985-06-20 1986-06-16 Procedimento per il rivestimento di substrati in una camera a vuoto

Country Status (9)

Country Link
US (1) US4749587A (it)
JP (1) JPH0791654B2 (it)
CH (1) CH664768A5 (it)
DE (1) DE3614384A1 (it)
ES (1) ES8707311A1 (it)
FR (1) FR2583780B1 (it)
GB (1) GB2176808B (it)
IT (1) IT1189560B (it)
SE (1) SE463461B (it)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2162207B (en) * 1984-07-26 1989-05-10 Japan Res Dev Corp Semiconductor crystal growth apparatus
FR2604188B1 (fr) * 1986-09-18 1992-11-27 Framatome Sa Element tubulaire en acier inoxydable presentant une resistance a l'usure amelioree
JPS6395200A (ja) * 1986-10-09 1988-04-26 Sumitomo Electric Ind Ltd 硬質窒化ホウ素膜の製造方法
EP0286306B1 (en) * 1987-04-03 1993-10-06 Fujitsu Limited Method and apparatus for vapor deposition of diamond
JPH089519B2 (ja) * 1987-05-11 1996-01-31 富士通株式会社 高圧相窒化ホウ素の気相合成法
US4854263B1 (en) * 1987-08-14 1997-06-17 Applied Materials Inc Inlet manifold and methods for increasing gas dissociation and for PECVD of dielectric films
JP2657810B2 (ja) * 1988-01-11 1997-09-30 フラマトメ 改良された耐摩耗性を有するステンレス鋼製管状要素
GB2215739A (en) * 1988-03-26 1989-09-27 Univ Hull Ionisation assisted chemical vapour deposition
JPH0244738A (ja) * 1988-08-05 1990-02-14 Semiconductor Energy Lab Co Ltd 電子装置作製方法
US4992153A (en) * 1989-04-26 1991-02-12 Balzers Aktiengesellschaft Sputter-CVD process for at least partially coating a workpiece
US5061513A (en) * 1990-03-30 1991-10-29 Flynn Paul L Process for depositing hard coating in a nozzle orifice
US5360479A (en) * 1990-07-02 1994-11-01 General Electric Company Isotopically pure single crystal epitaxial diamond films and their preparation
DE4029268C2 (de) * 1990-09-14 1995-07-06 Balzers Hochvakuum Verfahren zur gleichspannungs-bogenentladungs-unterstützten, reaktiven Behandlung von Gut und Vakuumbehandlungsanlage zur Durchführung
DE4029270C1 (it) * 1990-09-14 1992-04-09 Balzers Ag, Balzers, Li
CA2065581C (en) 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
JPH04326725A (ja) * 1991-04-26 1992-11-16 Tokyo Electron Ltd プラズマ装置
CA2077773A1 (en) * 1991-10-25 1993-04-26 Thomas R. Anthony Microwave, rf, or ac/dc discharge assisted flame deposition of cvd diamond
US5175929A (en) * 1992-03-04 1993-01-05 General Electric Company Method for producing articles by chemical vapor deposition
GB2267733A (en) * 1992-05-13 1993-12-15 Gen Electric Abrasion protective and thermal dissipative coating for jet engine component leading edges.
CH687111A5 (de) * 1992-05-26 1996-09-13 Balzers Hochvakuum Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens.
ES2060539B1 (es) * 1993-01-22 1995-06-16 Tekniker Proceso para la obtencion de recubrimientos de carbono y carbono-metal mediante deposicion fisica en fase vapor por arco metalico con catodo de grafito.
DE19526387C2 (de) * 1994-07-19 1998-12-10 Sumitomo Metal Mining Co Doppelt beschichteter Stahlverbundgegenstand und Verfahren zu dessen Herstellung
US5753045A (en) * 1995-01-25 1998-05-19 Balzers Aktiengesellschaft Vacuum treatment system for homogeneous workpiece processing
EP0724026B1 (de) * 1995-01-25 1999-10-13 Balzers Aktiengesellschaft Verfahren zur reaktiven Schichtabscheidung
CH690857A5 (de) * 1995-07-04 2001-02-15 Erich Bergmann Anlage zur plasmaunterstützten physikalischen Hochvakuumbedampfung von Werkstücken mit verschleissfesten Schichten und Verfahren zur Durchführung in dieser Anlage
DE19621855C2 (de) * 1996-05-31 2003-03-27 Univ Dresden Tech Verfahren zur Herstellung von Metallisierungen auf Halbleiterkörpern unter Verwendung eines gepulsten Vakuumbogenverdampfers
CH691717A5 (de) * 1997-03-08 2001-09-14 Comet Technik Ag Kondensator mit kaltfliessgepressten Elektroden.
JP4906169B2 (ja) * 1997-06-13 2012-03-28 エリコン・トレーディング・アクチェンゲゼルシャフト，トリュープバッハ 被覆工作物を製造するための方法、その方法の利用およびそのための装置
US6110544A (en) 1997-06-26 2000-08-29 General Electric Company Protective coating by high rate arc plasma deposition
IL127236A0 (en) * 1997-11-26 1999-09-22 Vapor Technologies Inc Apparatus for sputtering or arc evaporation
US5997705A (en) * 1999-04-14 1999-12-07 Vapor Technologies, Inc. Rectangular filtered arc plasma source
CH694699A5 (de) * 1999-04-29 2005-06-15 Balzers Hochvakuum Verfahren zur Herstellung von Silizium.
WO2001004379A1 (de) * 1999-07-13 2001-01-18 Unaxis Balzers Aktiengesellschaft Anlage und verfahren zur vakuumbehandlung bzw. zur pulverherstellung
DE10018143C5 (de) * 2000-04-12 2012-09-06 Oerlikon Trading Ag, Trübbach DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems
US20020160620A1 (en) * 2001-02-26 2002-10-31 Rudolf Wagner Method for producing coated workpieces, uses and installation for the method
US7465210B2 (en) * 2004-02-25 2008-12-16 The Regents Of The University Of California Method of fabricating carbide and nitride nano electron emitters
US7498587B2 (en) * 2006-05-01 2009-03-03 Vapor Technologies, Inc. Bi-directional filtered arc plasma source
CN101743338B (zh) 2007-05-25 2013-10-16 奥尔利康贸易股份公司（特吕巴赫） 真空处理设备和真空处理方法
CN111647879A (zh) * 2020-04-20 2020-09-11 中国科学技术大学 一种化学气相沉积装置与方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US679926A (en) * 1900-07-30 1901-08-06 Theron Clark Crawford Manufacture of filaments for incandescing electric lamps.
US3573098A (en) * 1968-05-09 1971-03-30 Boeing Co Ion beam deposition unit
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
CH624817B (de) * 1979-09-04 Balzers Hochvakuum Verfahren zur herstellung goldfarbener ueberzuege.
SU1040631A1 (ru) * 1980-06-25 1983-09-07 Предприятие П/Я В-8851 Вакуумно-дуговое устройство
JPS57188670A (en) * 1981-05-13 1982-11-19 Hitachi Ltd Treatment of electrically conductive member
JPS57201527A (en) * 1981-06-01 1982-12-10 Toshiba Corp Ion implantation method
US4443488A (en) * 1981-10-19 1984-04-17 Spire Corporation Plasma ion deposition process
US4512867A (en) * 1981-11-24 1985-04-23 Andreev Anatoly A Method and apparatus for controlling plasma generation in vapor deposition
IN160089B (it) * 1982-07-14 1987-06-27 Standard Oil Co Ohio
US4540596A (en) * 1983-05-06 1985-09-10 Smith International, Inc. Method of producing thin, hard coating
US4559121A (en) * 1983-09-12 1985-12-17 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization for permeable targets
US4622452A (en) * 1983-07-21 1986-11-11 Multi-Arc Vacuum Systems, Inc. Electric arc vapor deposition electrode apparatus

Also Published As

Publication number Publication date
GB2176808B (en) 1990-03-21
FR2583780A1 (fr) 1986-12-26
SE8602715L (it) 1986-12-21
IT8620793A0 (it) 1986-06-16
ES554902A0 (es) 1987-07-16
JPS61295377A (ja) 1986-12-26
GB8615066D0 (en) 1986-07-23
GB2176808A (en) 1987-01-07
JPH0791654B2 (ja) 1995-10-04
US4749587A (en) 1988-06-07
ES8707311A1 (es) 1987-07-16
CH664768A5 (de) 1988-03-31
FR2583780B1 (fr) 1991-08-23
SE8602715D0 (sv) 1986-06-18
IT1189560B (it) 1988-02-04
SE463461B (sv) 1990-11-26
DE3614384A1 (de) 1987-01-02

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Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970627