IT201700123399A1 - Dispositivo di memoria non volatile e non programmabile elettricamente e relativo procedimento di fabbricazione - Google Patents
Dispositivo di memoria non volatile e non programmabile elettricamente e relativo procedimento di fabbricazioneInfo
- Publication number
- IT201700123399A1 IT201700123399A1 IT102017000123399A IT201700123399A IT201700123399A1 IT 201700123399 A1 IT201700123399 A1 IT 201700123399A1 IT 102017000123399 A IT102017000123399 A IT 102017000123399A IT 201700123399 A IT201700123399 A IT 201700123399A IT 201700123399 A1 IT201700123399 A1 IT 201700123399A1
- Authority
- IT
- Italy
- Prior art keywords
- volatile
- memory device
- manufacturing procedure
- related manufacturing
- programmable electrically
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0004—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising amorphous/crystalline phase transition cells
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0023—Address circuits or decoders
- G11C13/0026—Bit-line or column circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0023—Address circuits or decoders
- G11C13/0028—Word-line or row circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/003—Cell access
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/004—Reading or sensing circuits or methods
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0069—Writing or programming circuits or methods
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C17/00—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
- G11C17/08—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards using semiconductor devices, e.g. bipolar elements
- G11C17/10—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards using semiconductor devices, e.g. bipolar elements in which contents are determined during manufacturing by a predetermined arrangement of coupling elements, e.g. mask-programmable ROM
- G11C17/12—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards using semiconductor devices, e.g. bipolar elements in which contents are determined during manufacturing by a predetermined arrangement of coupling elements, e.g. mask-programmable ROM using field-effect devices
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C5/00—Details of stores covered by group G11C11/00
- G11C5/02—Disposition of storage elements, e.g. in the form of a matrix array
- G11C5/025—Geometric lay-out considerations of storage- and peripheral-blocks in a semiconductor storage device
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C5/00—Details of stores covered by group G11C11/00
- G11C5/06—Arrangements for interconnecting storage elements electrically, e.g. by wiring
- G11C5/063—Voltage and signal distribution in integrated semi-conductor memory access lines, e.g. word-line, bit-line, cross-over resistance, propagation delay
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/30—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having three or more electrodes, e.g. transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/20—Multistable switching devices, e.g. memristors
- H10N70/231—Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/70—Resistive array aspects
- G11C2213/79—Array wherein the access device being a transistor
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Read Only Memory (AREA)
- Semiconductor Memories (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT102017000123399A IT201700123399A1 (it) | 2017-10-30 | 2017-10-30 | Dispositivo di memoria non volatile e non programmabile elettricamente e relativo procedimento di fabbricazione |
US16/169,763 US10755777B2 (en) | 2017-10-30 | 2018-10-24 | Transformed non-reprogrammable memory array devices and methods of manufacture |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT102017000123399A IT201700123399A1 (it) | 2017-10-30 | 2017-10-30 | Dispositivo di memoria non volatile e non programmabile elettricamente e relativo procedimento di fabbricazione |
Publications (1)
Publication Number | Publication Date |
---|---|
IT201700123399A1 true IT201700123399A1 (it) | 2019-04-30 |
Family
ID=61187744
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT102017000123399A IT201700123399A1 (it) | 2017-10-30 | 2017-10-30 | Dispositivo di memoria non volatile e non programmabile elettricamente e relativo procedimento di fabbricazione |
Country Status (2)
Country | Link |
---|---|
US (1) | US10755777B2 (it) |
IT (1) | IT201700123399A1 (it) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11705183B2 (en) * | 2020-08-28 | 2023-07-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Word line booster circuit and method |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6021079A (en) * | 1998-05-13 | 2000-02-01 | Richard Mann | Fast, low cost method of developing code for contact programmable ROMs |
US20090154221A1 (en) * | 2007-12-14 | 2009-06-18 | Samsung Electronics Co., Ltd. | Non-Volatile memory device using variable resistance element with an improved write performance |
US20140332749A1 (en) * | 2013-05-08 | 2014-11-13 | Sony Corporation | Semiconductor device and method of manufacturing same |
US9305977B1 (en) * | 2014-10-28 | 2016-04-05 | Powerchip Technology Corporation | Resistive random access memory and method for manufacturing the same |
CN206595294U (zh) * | 2016-06-24 | 2017-10-27 | 意法半导体股份有限公司 | 相变存储器单元、芯片及电子系统 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6594192B1 (en) * | 2000-08-31 | 2003-07-15 | Stmicroelectronics, Inc. | Integrated volatile and non-volatile memory |
US9343171B1 (en) * | 2015-02-09 | 2016-05-17 | Sandisk Technologies Inc. | Reduced erase-verify voltage for first-programmed word line in a memory device |
-
2017
- 2017-10-30 IT IT102017000123399A patent/IT201700123399A1/it unknown
-
2018
- 2018-10-24 US US16/169,763 patent/US10755777B2/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6021079A (en) * | 1998-05-13 | 2000-02-01 | Richard Mann | Fast, low cost method of developing code for contact programmable ROMs |
US20090154221A1 (en) * | 2007-12-14 | 2009-06-18 | Samsung Electronics Co., Ltd. | Non-Volatile memory device using variable resistance element with an improved write performance |
US20140332749A1 (en) * | 2013-05-08 | 2014-11-13 | Sony Corporation | Semiconductor device and method of manufacturing same |
US9305977B1 (en) * | 2014-10-28 | 2016-04-05 | Powerchip Technology Corporation | Resistive random access memory and method for manufacturing the same |
CN206595294U (zh) * | 2016-06-24 | 2017-10-27 | 意法半导体股份有限公司 | 相变存储器单元、芯片及电子系统 |
Also Published As
Publication number | Publication date |
---|---|
US10755777B2 (en) | 2020-08-25 |
US20190130970A1 (en) | 2019-05-02 |
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