IT1118308B - Procedimento e dispositivo per il posizionamento e mantenimento in condizione spianata di un wafer semiconduttore nel corso di fabbricazione - Google Patents
Procedimento e dispositivo per il posizionamento e mantenimento in condizione spianata di un wafer semiconduttore nel corso di fabbricazioneInfo
- Publication number
- IT1118308B IT1118308B IT67112/79A IT6711279A IT1118308B IT 1118308 B IT1118308 B IT 1118308B IT 67112/79 A IT67112/79 A IT 67112/79A IT 6711279 A IT6711279 A IT 6711279A IT 1118308 B IT1118308 B IT 1118308B
- Authority
- IT
- Italy
- Prior art keywords
- maintenance
- positioning
- procedure
- semiconductive wafer
- manufacturing course
- Prior art date
Links
- 238000012423 maintenance Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
- B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
- B25B11/005—Vacuum work holders
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
- B28D5/0094—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US87147778A | 1978-01-23 | 1978-01-23 | |
US05/965,304 US4213698A (en) | 1978-12-01 | 1978-12-01 | Apparatus and method for holding and planarizing thin workpieces |
Publications (2)
Publication Number | Publication Date |
---|---|
IT7967112A0 IT7967112A0 (it) | 1979-01-18 |
IT1118308B true IT1118308B (it) | 1986-02-24 |
Family
ID=27128208
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT67112/79A IT1118308B (it) | 1978-01-23 | 1979-01-18 | Procedimento e dispositivo per il posizionamento e mantenimento in condizione spianata di un wafer semiconduttore nel corso di fabbricazione |
Country Status (7)
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5754341A (ja) * | 1980-09-19 | 1982-03-31 | Hitachi Ltd | Usuitahojisochi |
US4433835A (en) * | 1981-11-30 | 1984-02-28 | Tencor Instruments | Wafer chuck with wafer cleaning feature |
JPS58153344A (ja) * | 1982-03-05 | 1983-09-12 | Hitachi Ltd | リテ−ナ式ウエハチヤツク |
JPS59106118A (ja) * | 1982-12-10 | 1984-06-19 | Hitachi Ltd | 薄板変形装置 |
JPS6099538A (ja) * | 1983-11-01 | 1985-06-03 | 横河・ヒュ−レット・パッカ−ド株式会社 | ピンチヤツク |
US4656791A (en) * | 1984-09-27 | 1987-04-14 | Libbey-Owens-Ford Company | Abrasive fluid jet cutting support |
GB2189329B (en) * | 1986-03-03 | 1990-10-24 | Canon Kk | Camera |
US4903681A (en) * | 1987-02-24 | 1990-02-27 | Tokyo Seimitus Co., Ltd. | Method and apparatus for cutting a cylindrical material |
NL8701603A (nl) * | 1987-07-08 | 1989-02-01 | Philips & Du Pont Optical | Vacuuminrichting voor het vastzuigen van werkstukken. |
US6228438B1 (en) * | 1999-08-10 | 2001-05-08 | Unakis Balzers Aktiengesellschaft | Plasma reactor for the treatment of large size substrates |
JP2003142566A (ja) * | 2001-11-07 | 2003-05-16 | New Creation Co Ltd | 真空吸着器及びその製造方法 |
DE20206490U1 (de) * | 2002-04-24 | 2002-07-18 | J. Schmalz GmbH, 72293 Glatten | Blocksauger |
JP5810517B2 (ja) * | 2010-12-02 | 2015-11-11 | 富士電機株式会社 | 吸着装置および吸着方法 |
DE102011001879A1 (de) | 2011-04-07 | 2012-10-11 | Jenoptik Automatisierungstechnik Gmbh | Vorrichtung zum Spannen verformter Wafer |
JP6178683B2 (ja) * | 2013-09-25 | 2017-08-09 | 芝浦メカトロニクス株式会社 | 吸着ステージ、貼合装置、および貼合方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB280154A (en) * | 1926-11-02 | 1928-03-28 | Wesel Mfg Company F | Improvements in photo-engravers' printing frame |
FR1517154A (fr) * | 1967-03-02 | 1968-03-15 | Elektromat Veb | Procédé et dispositif pour le prélèvement de petits corps à surfaces adhérentes |
DE1646147A1 (de) * | 1967-05-13 | 1971-01-07 | Telefunken Patent | Vorrichtung zur Halterung einer Halbleiterscheibe bei der UEbertragung eines Musters durch Kontaktkopie oder durch Projektionsmaskierung |
US3627338A (en) * | 1969-10-09 | 1971-12-14 | Sheldon Thompson | Vacuum chuck |
US3747282A (en) * | 1971-11-29 | 1973-07-24 | E Katzke | Apparatus for polishing wafers |
-
1979
- 1979-01-10 SE SE7900230A patent/SE444526B/sv not_active IP Right Cessation
- 1979-01-18 IT IT67112/79A patent/IT1118308B/it active
- 1979-01-19 DE DE19792901968 patent/DE2901968A1/de active Granted
- 1979-01-22 FR FR7901510A patent/FR2415368A1/fr active Granted
- 1979-01-22 NL NL7900497A patent/NL7900497A/xx not_active Application Discontinuation
- 1979-01-23 GB GB7902425A patent/GB2016166B/en not_active Expired
- 1979-01-23 JP JP54005656A patent/JPS6015147B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS6015147B2 (ja) | 1985-04-17 |
JPS54120585A (en) | 1979-09-19 |
SE7900230L (sv) | 1979-07-24 |
DE2901968A1 (de) | 1979-07-26 |
SE444526B (sv) | 1986-04-21 |
FR2415368B1 (US20030204162A1-20031030-M00001.png) | 1984-05-04 |
GB2016166A (en) | 1979-09-19 |
DE2901968C2 (US20030204162A1-20031030-M00001.png) | 1988-08-11 |
IT7967112A0 (it) | 1979-01-18 |
GB2016166B (en) | 1982-06-09 |
NL7900497A (nl) | 1979-07-25 |
FR2415368A1 (fr) | 1979-08-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19960125 |