IT1118102B - Perfezionamento negli apparecchi di allineamento in particolare per la produzione di dispositivi a semiconduttore - Google Patents

Perfezionamento negli apparecchi di allineamento in particolare per la produzione di dispositivi a semiconduttore

Info

Publication number
IT1118102B
IT1118102B IT49289/79A IT4928979A IT1118102B IT 1118102 B IT1118102 B IT 1118102B IT 49289/79 A IT49289/79 A IT 49289/79A IT 4928979 A IT4928979 A IT 4928979A IT 1118102 B IT1118102 B IT 1118102B
Authority
IT
Italy
Prior art keywords
devices
improvement
production
alignment
semiconductor devices
Prior art date
Application number
IT49289/79A
Other languages
English (en)
Other versions
IT7949289A0 (it
Original Assignee
Rockwell International Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rockwell International Corp filed Critical Rockwell International Corp
Publication of IT7949289A0 publication Critical patent/IT7949289A0/it
Application granted granted Critical
Publication of IT1118102B publication Critical patent/IT1118102B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/975—Substrate or mask aligning feature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
IT49289/79A 1978-06-05 1979-06-04 Perfezionamento negli apparecchi di allineamento in particolare per la produzione di dispositivi a semiconduttore IT1118102B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/912,612 US4193687A (en) 1978-06-05 1978-06-05 High resolution alignment technique and apparatus

Publications (2)

Publication Number Publication Date
IT7949289A0 IT7949289A0 (it) 1979-06-04
IT1118102B true IT1118102B (it) 1986-02-24

Family

ID=25432186

Family Applications (1)

Application Number Title Priority Date Filing Date
IT49289/79A IT1118102B (it) 1978-06-05 1979-06-04 Perfezionamento negli apparecchi di allineamento in particolare per la produzione di dispositivi a semiconduttore

Country Status (8)

Country Link
US (1) US4193687A (it)
JP (1) JPS598058B2 (it)
CA (1) CA1119396A (it)
DE (1) DE2922017A1 (it)
FR (1) FR2428274A1 (it)
GB (1) GB2022289B (it)
IT (1) IT1118102B (it)
NL (1) NL7903676A (it)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5612172A (en) * 1979-07-11 1981-02-06 Ricoh Co Ltd Mark for adjusting degree of balance of installation of solid scanning element
US4691434A (en) * 1982-02-19 1987-09-08 Lasarray Holding Ag Method of making electrically conductive regions in monolithic semiconductor devices as applied to a semiconductor device
US4388386A (en) * 1982-06-07 1983-06-14 International Business Machines Corporation Mask set mismatch
US4536239A (en) * 1983-07-18 1985-08-20 Nicolet Instrument Corporation Multi-layer circuit board inspection system
US4568189A (en) * 1983-09-26 1986-02-04 The United States Of America As Represented By The Secretary Of The Navy Apparatus and method for aligning a mask and wafer in the fabrication of integrated circuits
DE3336901A1 (de) * 1983-10-11 1985-04-18 Deutsche Itt Industries Gmbh, 7800 Freiburg Maskenmarkierung und substratmarkierung fuer ein verfahren zum justieren einer eine maskenmarkierung enthaltenden photomaske auf einer substratmarkierung
JPH0732242B2 (ja) * 1984-12-24 1995-04-10 株式会社日立製作所 固体撮像装置の製造方法
DE3530439A1 (de) * 1985-08-26 1987-02-26 Siemens Ag Vorrichtung zum justieren einer mit mindestens einer justiermarke versehenen maske bezueglich eines mit mindestens einer gitterstruktur versehenen halbleiterwafers
GB8528826D0 (en) * 1985-11-22 1985-12-24 Gen Electric Co Plc Alignment techniques
US4814626A (en) * 1985-12-13 1989-03-21 Siemens Aktiengesellschaft Method for high precision position measurement of two-dimensional structures
JP3200894B2 (ja) * 1991-03-05 2001-08-20 株式会社日立製作所 露光方法及びその装置
KR0144082B1 (ko) * 1994-04-01 1998-08-17 김주용 레티클 및 그 레티클을 사용한 가림막 세팅 방법
US6150231A (en) * 1998-06-15 2000-11-21 Siemens Aktiengesellschaft Overlay measurement technique using moire patterns
DE10142318C1 (de) * 2001-08-30 2003-01-30 Advanced Micro Devices Inc Halbleiterstruktur und Verfahren zur Bestimmung kritischer Dimensionen und Überlagerungsfehler

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3688570A (en) * 1970-06-05 1972-09-05 Polaroid Corp Angular deflection meter
US3690881A (en) * 1970-09-28 1972-09-12 Bell Telephone Labor Inc Moire pattern aligning of photolithographic mask
US3783520A (en) * 1970-09-28 1974-01-08 Bell Telephone Labor Inc High accuracy alignment procedure utilizing moire patterns
US3806254A (en) * 1971-12-08 1974-04-23 Information Storage Systems Agc servo system having error signal responsive to a non-extinguishable intensity light energy signal
DE2521618B1 (de) * 1975-05-15 1976-03-11 Zeiss Carl Fa Vorrichtung zum Messen oder Einstellen von zweidimensionalen Lagekoordinaten
JPS5212064A (en) * 1975-07-15 1977-01-29 Seiko Epson Corp Blade exchangeable razor
JPS5215510A (en) * 1975-07-28 1977-02-05 Nippon Chemical Ind Optical glass
US4047585A (en) * 1976-03-08 1977-09-13 Pitney-Bowes, Inc. Scale optical detector with spring constant variation compensator

Also Published As

Publication number Publication date
GB2022289B (en) 1983-04-27
US4193687A (en) 1980-03-18
NL7903676A (nl) 1979-12-07
FR2428274A1 (fr) 1980-01-04
GB2022289A (en) 1979-12-12
IT7949289A0 (it) 1979-06-04
DE2922017A1 (de) 1979-12-06
JPS54159878A (en) 1979-12-18
JPS598058B2 (ja) 1984-02-22
CA1119396A (en) 1982-03-09

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