IT1074452B - Procedimento per pulire pistrine di silicio - Google Patents
Procedimento per pulire pistrine di silicioInfo
- Publication number
- IT1074452B IT1074452B IT4833676A IT4833676A IT1074452B IT 1074452 B IT1074452 B IT 1074452B IT 4833676 A IT4833676 A IT 4833676A IT 4833676 A IT4833676 A IT 4833676A IT 1074452 B IT1074452 B IT 1074452B
- Authority
- IT
- Italy
- Prior art keywords
- chips
- h2so4
- degrees
- hydrogen peroxide
- heated
- Prior art date
Links
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 title abstract 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 title abstract 5
- 235000011149 sulphuric acid Nutrition 0.000 title abstract 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title abstract 3
- 229910052710 silicon Inorganic materials 0.000 title abstract 3
- 239000010703 silicon Substances 0.000 title abstract 3
- 238000004140 cleaning Methods 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title 1
- 239000001117 sulphuric acid Substances 0.000 title 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 abstract 2
- 239000012535 impurity Substances 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- 150000001342 alkaline earth metals Chemical class 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 239000003153 chemical reaction reagent Substances 0.000 abstract 1
- 230000003749 cleanliness Effects 0.000 abstract 1
- HRKQOINLCJTGBK-UHFFFAOYSA-N dihydroxidosulfur Chemical compound OSO HRKQOINLCJTGBK-UHFFFAOYSA-N 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 abstract 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Weting (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US56310475A | 1975-03-28 | 1975-03-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IT1074452B true IT1074452B (it) | 1985-04-20 |
Family
ID=24249133
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT4833676A IT1074452B (it) | 1975-03-28 | 1976-03-01 | Procedimento per pulire pistrine di silicio |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS51121254A (cg-RX-API-DMAC10.html) |
| BE (1) | BE840112A (cg-RX-API-DMAC10.html) |
| IT (1) | IT1074452B (cg-RX-API-DMAC10.html) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS546466A (en) * | 1977-06-17 | 1979-01-18 | Hitachi Ltd | Surface cleaning method |
| JPS58146696U (ja) * | 1982-03-25 | 1983-10-03 | アロン化成株式会社 | 連続切断具 |
| US5000795A (en) * | 1989-06-16 | 1991-03-19 | At&T Bell Laboratories | Semiconductor wafer cleaning method and apparatus |
| JPH0521411A (ja) * | 1991-07-12 | 1993-01-29 | Fujitsu Ltd | 表面処理方法及び表面処理装置 |
| WO1997050019A1 (en) * | 1996-06-25 | 1997-12-31 | Cfm Technologies, Inc. | Improved method for sulfuric acid resist stripping |
| JP4573282B2 (ja) * | 2000-07-03 | 2010-11-04 | 株式会社Ｓｕｍｃｏ | エピタキシャルシリコンウェーハの製造方法 |
| JP7201422B2 (ja) | 2018-12-21 | 2023-01-10 | サカタインクス株式会社 | 活性エネルギー線硬化型フレキソ印刷インキ組成物 |
-
1976
- 1976-03-01 IT IT4833676A patent/IT1074452B/it active
- 1976-03-26 BE BE165631A patent/BE840112A/fr unknown
- 1976-03-26 JP JP3413076A patent/JPS51121254A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5335436B2 (cg-RX-API-DMAC10.html) | 1978-09-27 |
| JPS51121254A (en) | 1976-10-23 |
| BE840112A (fr) | 1976-07-16 |
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