JPS5335436B2 - - Google Patents
Info
- Publication number
- JPS5335436B2 JPS5335436B2 JP3413076A JP3413076A JPS5335436B2 JP S5335436 B2 JPS5335436 B2 JP S5335436B2 JP 3413076 A JP3413076 A JP 3413076A JP 3413076 A JP3413076 A JP 3413076A JP S5335436 B2 JPS5335436 B2 JP S5335436B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Weting (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US56310475A | 1975-03-28 | 1975-03-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51121254A JPS51121254A (en) | 1976-10-23 |
| JPS5335436B2 true JPS5335436B2 (cg-RX-API-DMAC10.html) | 1978-09-27 |
Family
ID=24249133
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3413076A Granted JPS51121254A (en) | 1975-03-28 | 1976-03-26 | Method of removing impurities from silicon wafer |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS51121254A (cg-RX-API-DMAC10.html) |
| BE (1) | BE840112A (cg-RX-API-DMAC10.html) |
| IT (1) | IT1074452B (cg-RX-API-DMAC10.html) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002020200A (ja) * | 2000-07-03 | 2002-01-23 | Sumitomo Metal Ind Ltd | エピタキシャルシリコンウェーハの製造方法 |
| WO2020130016A1 (ja) | 2018-12-21 | 2020-06-25 | サカタインクス株式会社 | 活性エネルギー線硬化型フレキソ印刷インキ組成物 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS546466A (en) * | 1977-06-17 | 1979-01-18 | Hitachi Ltd | Surface cleaning method |
| JPS58146696U (ja) * | 1982-03-25 | 1983-10-03 | アロン化成株式会社 | 連続切断具 |
| US5000795A (en) * | 1989-06-16 | 1991-03-19 | At&T Bell Laboratories | Semiconductor wafer cleaning method and apparatus |
| JPH0521411A (ja) * | 1991-07-12 | 1993-01-29 | Fujitsu Ltd | 表面処理方法及び表面処理装置 |
| WO1997050019A1 (en) * | 1996-06-25 | 1997-12-31 | Cfm Technologies, Inc. | Improved method for sulfuric acid resist stripping |
-
1976
- 1976-03-01 IT IT4833676A patent/IT1074452B/it active
- 1976-03-26 BE BE165631A patent/BE840112A/fr unknown
- 1976-03-26 JP JP3413076A patent/JPS51121254A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002020200A (ja) * | 2000-07-03 | 2002-01-23 | Sumitomo Metal Ind Ltd | エピタキシャルシリコンウェーハの製造方法 |
| WO2020130016A1 (ja) | 2018-12-21 | 2020-06-25 | サカタインクス株式会社 | 活性エネルギー線硬化型フレキソ印刷インキ組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS51121254A (en) | 1976-10-23 |
| BE840112A (fr) | 1976-07-16 |
| IT1074452B (it) | 1985-04-20 |