IT1008170B - Polimero fotoreticolabile procedi mento per la sua produzione e com posizione fotosensibile contenente detto polimero utile in particolare per produrre immagini - Google Patents

Polimero fotoreticolabile procedi mento per la sua produzione e com posizione fotosensibile contenente detto polimero utile in particolare per produrre immagini

Info

Publication number
IT1008170B
IT1008170B IT4801274A IT4801274A IT1008170B IT 1008170 B IT1008170 B IT 1008170B IT 4801274 A IT4801274 A IT 4801274A IT 4801274 A IT4801274 A IT 4801274A IT 1008170 B IT1008170 B IT 1008170B
Authority
IT
Italy
Prior art keywords
polymer
photoreticulating
com
useful
production
Prior art date
Application number
IT4801274A
Other languages
English (en)
Italian (it)
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Application granted granted Critical
Publication of IT1008170B publication Critical patent/IT1008170B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0952—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer comprising silver halide or silver salt based image forming systems, e.g. for camera speed exposure

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Engineering & Computer Science (AREA)
  • Medicinal Chemistry (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
IT4801274A 1973-02-01 1974-01-29 Polimero fotoreticolabile procedi mento per la sua produzione e com posizione fotosensibile contenente detto polimero utile in particolare per produrre immagini IT1008170B (it)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US32855073A 1973-02-01 1973-02-01
US32867873A 1973-02-01 1973-02-01

Publications (1)

Publication Number Publication Date
IT1008170B true IT1008170B (it) 1976-11-10

Family

ID=26986423

Family Applications (1)

Application Number Title Priority Date Filing Date
IT4801274A IT1008170B (it) 1973-02-01 1974-01-29 Polimero fotoreticolabile procedi mento per la sua produzione e com posizione fotosensibile contenente detto polimero utile in particolare per produrre immagini

Country Status (7)

Country Link
JP (2) JPS575804B2 (ja)
BR (1) BR7400704D0 (ja)
DE (1) DE2404239A1 (ja)
FR (1) FR2288757A1 (ja)
GB (1) GB1464942A (ja)
IT (1) IT1008170B (ja)
NL (1) NL7401438A (ja)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5290304A (en) * 1976-01-24 1977-07-29 Asahi Chemical Ind Photoosensitive resin composition for making flexo graphic printing plate
GB1583033A (en) * 1976-05-14 1981-01-21 Gaf Corp Method of exposing and developing a photographic element
US4108840A (en) * 1977-04-15 1978-08-22 Ppg Industries, Inc. Urea-urethane-acrylate radiation curable coating compositions and methods of making same
USRE30772E (en) 1978-03-28 1981-10-13 Ppg Industries, Inc. Amide-modified urethane acrylate radiation curable compounds and coating compositions and methods of making same
US4153776A (en) * 1978-03-28 1979-05-08 Ppg Industries, Inc. Amide-modified urethane acrylate radiation curable compounds and coating compositions and methods of making same
DE2822189A1 (de) * 1978-05-20 1980-04-17 Hoechst Ag Photopolymerisierbares gemisch
DE2822190A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
US4555551A (en) * 1981-12-31 1985-11-26 Ppg Industries, Inc. Method of molding
US4425468A (en) 1981-12-31 1984-01-10 Ppg Industries, Inc. Polyurea-polyurethane acrylate polymer dispersions
GB8416230D0 (en) * 1984-06-26 1984-08-01 Btr Plc Polyurethanes
JPH0341770Y2 (ja) * 1986-08-12 1991-09-02
US4721751A (en) * 1987-03-26 1988-01-26 Ppg Industries, Inc. Polyurea-polyurethane acrylate dispersions
JPH01229025A (ja) * 1988-03-09 1989-09-12 Sanyo Chem Ind Ltd 重合体ポリオールおよび遮音性ポリウレタンフォームの製法
DE3841025A1 (de) * 1988-12-06 1990-06-07 Hoechst Ag Durch strahlung polymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3927628A1 (de) * 1989-08-22 1991-02-28 Basf Ag Strahlungsempfindliches gemisch
DE3927629A1 (de) * 1989-08-22 1991-02-28 Basf Ag Strahlungsempfindliches, positiv arbeitendes gemisch
DE3927631A1 (de) * 1989-08-22 1991-02-28 Basf Ag Umsetzungsprodukt, verfahren zu dessen herstellung und damit herstellbares strahlungsempfindliches gemisch
JP2682211B2 (ja) * 1990-08-09 1997-11-26 東洋紡績株式会社 感光性樹脂組成物
JP5444933B2 (ja) * 2008-08-29 2014-03-19 富士フイルム株式会社 ネガ型平版印刷版原版及びそれを用いる平版印刷方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE592278A (ja) * 1959-06-26
FR1360082A (fr) * 1962-06-07 1964-04-30 Du Pont Fabrication d'élastomères linéaires segmentaires du type polyuréthanes
FR1546169A (fr) * 1966-12-02 1968-11-15 Glanzstoff Ag Procédé de préparation de polyuréthanes linéaires
GB1251232A (ja) * 1967-10-12 1971-10-27
DE2102382B2 (de) * 1970-01-19 1973-02-01 Dainippon Ink and Chemicals, Ine , Tokio Photopolymerisierbare, polyurethanformmassen einschliesslich ueberzugsmassen und klebemittel
CA920296A (en) * 1970-01-29 1973-01-30 J. Trecker David Acrylates and coating compositions thereof
JPS5217630B2 (ja) * 1972-05-31 1977-05-17
JPS5037701A (ja) * 1973-08-10 1975-04-08

Also Published As

Publication number Publication date
GB1464942A (en) 1977-02-16
FR2288757B1 (ja) 1978-06-16
BR7400704D0 (pt) 1974-09-10
FR2288757A1 (fr) 1976-05-21
JPS5052195A (ja) 1975-05-09
JPS575804B2 (ja) 1982-02-02
JPS50114455A (ja) 1975-09-08
DE2404239A1 (de) 1974-08-08
NL7401438A (ja) 1974-08-05
AU6478074A (en) 1975-07-24
JPS5829801B2 (ja) 1983-06-24

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