IN2014KN02415A - - Google Patents
Info
- Publication number
- IN2014KN02415A IN2014KN02415A IN2415KON2014A IN2014KN02415A IN 2014KN02415 A IN2014KN02415 A IN 2014KN02415A IN 2415KON2014 A IN2415KON2014 A IN 2415KON2014A IN 2014KN02415 A IN2014KN02415 A IN 2014KN02415A
- Authority
- IN
- India
- Prior art keywords
- reflected wave
- wave power
- power
- control
- frequency
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32146—Amplitude modulation, includes pulsing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
- H01J37/32944—Arc detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/3299—Feedback systems
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M1/00—Details of apparatus for conversion
- H02M1/08—Circuits specially adapted for the generation of control voltages for semiconductor devices incorporated in static converters
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M7/00—Conversion of ac power input into dc power output; Conversion of dc power input into ac power output
- H02M7/42—Conversion of dc power input into ac power output without possibility of reversal
- H02M7/44—Conversion of dc power input into ac power output without possibility of reversal by static converters
- H02M7/48—Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
- H02M7/53—Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal
- H02M7/537—Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters
- H02M7/539—Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters with automatic control of output wave form or frequency
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2242/00—Auxiliary systems
- H05H2242/20—Power circuits
- H05H2242/26—Matching networks
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Power Engineering (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012136942A JP5534365B2 (ja) | 2012-06-18 | 2012-06-18 | 高周波電力供給装置、及び反射波電力制御方法 |
| PCT/JP2013/065339 WO2013190987A1 (ja) | 2012-06-18 | 2013-06-03 | 高周波電力供給装置、及び反射波電力制御方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IN2014KN02415A true IN2014KN02415A (es) | 2015-05-01 |
Family
ID=49768589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IN2415KON2014 IN2014KN02415A (es) | 2012-06-18 | 2013-06-03 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US9070537B2 (es) |
| EP (1) | EP2833703B1 (es) |
| JP (1) | JP5534365B2 (es) |
| KR (1) | KR101523484B1 (es) |
| CN (1) | CN104322154B (es) |
| DE (1) | DE13807713T1 (es) |
| IN (1) | IN2014KN02415A (es) |
| PL (1) | PL2833703T3 (es) |
| TW (1) | TWI472270B (es) |
| WO (1) | WO2013190987A1 (es) |
Families Citing this family (64)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9714960B2 (en) * | 2009-10-09 | 2017-07-25 | Dh Technologies Development Pte. Ltd. | Apparatus for measuring RF voltage from a quadrupole in a mass spectrometer |
| EP2936542B1 (de) * | 2012-12-18 | 2018-02-28 | TRUMPF Hüttinger GmbH + Co. KG | Arclöschverfahren und leistungsversorgungssystem mit einem leistungswandler |
| DE102013205936B4 (de) * | 2013-04-04 | 2016-07-14 | TRUMPF Hüttinger GmbH + Co. KG | Verfahren zur Regelung einer Regelstrecke mit normierter Auswahlgröße |
| DE102013110883B3 (de) | 2013-10-01 | 2015-01-15 | TRUMPF Hüttinger GmbH + Co. KG | Vorrichtung und Verfahren zur Überwachung einer Entladung in einem Plasmaprozess |
| US11539352B2 (en) | 2013-11-14 | 2022-12-27 | Eagle Harbor Technologies, Inc. | Transformer resonant converter |
| US10020800B2 (en) | 2013-11-14 | 2018-07-10 | Eagle Harbor Technologies, Inc. | High voltage nanosecond pulser with variable pulse width and pulse repetition frequency |
| US10892140B2 (en) | 2018-07-27 | 2021-01-12 | Eagle Harbor Technologies, Inc. | Nanosecond pulser bias compensation |
| US10978955B2 (en) | 2014-02-28 | 2021-04-13 | Eagle Harbor Technologies, Inc. | Nanosecond pulser bias compensation |
| CN109873621B (zh) | 2013-11-14 | 2023-06-16 | 鹰港科技有限公司 | 高压纳秒脉冲发生器 |
| US9706630B2 (en) | 2014-02-28 | 2017-07-11 | Eagle Harbor Technologies, Inc. | Galvanically isolated output variable pulse generator disclosure |
| JP5704772B1 (ja) * | 2014-02-04 | 2015-04-22 | 株式会社京三製作所 | 高周波電源装置およびプラズマ着火方法 |
| EP2905801B1 (en) * | 2014-02-07 | 2019-05-22 | TRUMPF Huettinger Sp. Z o. o. | Method of monitoring the discharge in a plasma process and monitoring device for monitoring the discharge in a plasma |
| US10483089B2 (en) * | 2014-02-28 | 2019-11-19 | Eagle Harbor Technologies, Inc. | High voltage resistive output stage circuit |
| JP6362931B2 (ja) * | 2014-06-19 | 2018-07-25 | 株式会社ダイヘン | 高周波電源 |
| JP5797313B1 (ja) * | 2014-08-25 | 2015-10-21 | 株式会社京三製作所 | 回生サーキュレータ、高周波電源装置、及び高周波電力の回生方法 |
| JP6474985B2 (ja) * | 2014-09-30 | 2019-02-27 | 株式会社ダイヘン | 高周波電源 |
| JP6524753B2 (ja) * | 2015-03-30 | 2019-06-05 | 東京エレクトロン株式会社 | プラズマ処理装置、プラズマ処理方法及び記憶媒体 |
| US9577516B1 (en) * | 2016-02-18 | 2017-02-21 | Advanced Energy Industries, Inc. | Apparatus for controlled overshoot in a RF generator |
| US10903047B2 (en) | 2018-07-27 | 2021-01-26 | Eagle Harbor Technologies, Inc. | Precise plasma control system |
| US11004660B2 (en) | 2018-11-30 | 2021-05-11 | Eagle Harbor Technologies, Inc. | Variable output impedance RF generator |
| US11430635B2 (en) | 2018-07-27 | 2022-08-30 | Eagle Harbor Technologies, Inc. | Precise plasma control system |
| US10026592B2 (en) * | 2016-07-01 | 2018-07-17 | Lam Research Corporation | Systems and methods for tailoring ion energy distribution function by odd harmonic mixing |
| JP6157036B1 (ja) * | 2016-07-08 | 2017-07-05 | 株式会社京三製作所 | 高周波電源装置、及び高周波電源装置の制御方法 |
| WO2018148182A1 (en) | 2017-02-07 | 2018-08-16 | Eagle Harbor Technologies, Inc. | Transformer resonant converter |
| EP3813259B1 (en) * | 2017-03-31 | 2022-10-26 | Eagle Harbor Technologies, Inc. | High voltage resistive output stage circuit |
| US11094505B2 (en) * | 2017-07-07 | 2021-08-17 | Asm Ip Holding B.V. | Substrate processing apparatus, storage medium and substrate processing method |
| JP7027720B2 (ja) * | 2017-08-07 | 2022-03-02 | 富士電機株式会社 | 電力変換装置 |
| JP6902167B2 (ja) | 2017-08-25 | 2021-07-14 | イーグル ハーバー テクノロジーズ, インク.Eagle Harbor Technologies, Inc. | ナノ秒パルスを使用する任意波形の発生 |
| US10510575B2 (en) | 2017-09-20 | 2019-12-17 | Applied Materials, Inc. | Substrate support with multiple embedded electrodes |
| US10622191B2 (en) | 2018-02-09 | 2020-04-14 | Asm Ip Holding B.V. | Substrate processing method |
| US10555412B2 (en) | 2018-05-10 | 2020-02-04 | Applied Materials, Inc. | Method of controlling ion energy distribution using a pulse generator with a current-return output stage |
| CN110504149B (zh) * | 2018-05-17 | 2022-04-22 | 北京北方华创微电子装备有限公司 | 射频电源的脉冲调制系统及方法 |
| US11532457B2 (en) | 2018-07-27 | 2022-12-20 | Eagle Harbor Technologies, Inc. | Precise plasma control system |
| US11302518B2 (en) | 2018-07-27 | 2022-04-12 | Eagle Harbor Technologies, Inc. | Efficient energy recovery in a nanosecond pulser circuit |
| US11222767B2 (en) | 2018-07-27 | 2022-01-11 | Eagle Harbor Technologies, Inc. | Nanosecond pulser bias compensation |
| US10607814B2 (en) | 2018-08-10 | 2020-03-31 | Eagle Harbor Technologies, Inc. | High voltage switch with isolated power |
| CN112805920A (zh) | 2018-08-10 | 2021-05-14 | 鹰港科技有限公司 | 用于rf等离子体反应器的等离子体鞘控制 |
| US11476145B2 (en) | 2018-11-20 | 2022-10-18 | Applied Materials, Inc. | Automatic ESC bias compensation when using pulsed DC bias |
| CN113906677A (zh) | 2019-01-08 | 2022-01-07 | 鹰港科技有限公司 | 纳秒脉冲发生器电路中的高效能量恢复 |
| WO2020154310A1 (en) | 2019-01-22 | 2020-07-30 | Applied Materials, Inc. | Feedback loop for controlling a pulsed voltage waveform |
| US11508554B2 (en) | 2019-01-24 | 2022-11-22 | Applied Materials, Inc. | High voltage filter assembly |
| CN111725091A (zh) * | 2019-03-22 | 2020-09-29 | 北京北方华创微电子装备有限公司 | 优化工艺流程的方法及装置、存储介质和半导体处理设备 |
| KR102223876B1 (ko) * | 2019-10-28 | 2021-03-05 | 주식회사 뉴파워 프라즈마 | 불안정 매칭 현상을 해소하기 위한 다중 전압 제어 방법 및 다중 전압 제어 방식의 고주파 전원 장치 |
| TWI778449B (zh) | 2019-11-15 | 2022-09-21 | 美商鷹港科技股份有限公司 | 高電壓脈衝電路 |
| KR20230150396A (ko) | 2019-12-24 | 2023-10-30 | 이글 하버 테크놀로지스, 인코포레이티드 | 플라즈마 시스템을 위한 나노초 펄서 rf 절연 |
| US11670488B2 (en) * | 2020-01-10 | 2023-06-06 | COMET Technologies USA, Inc. | Fast arc detecting match network |
| US11462389B2 (en) | 2020-07-31 | 2022-10-04 | Applied Materials, Inc. | Pulsed-voltage hardware assembly for use in a plasma processing system |
| CN112034377A (zh) * | 2020-08-27 | 2020-12-04 | 国家电网有限公司 | 一种用于高频电源的反射波电力的检测装置及其使用方法 |
| CN114446752B (zh) * | 2020-11-04 | 2024-04-05 | 中微半导体设备(上海)股份有限公司 | 一种等离子体处理腔内的电弧的检测方法及检测装置 |
| US11798790B2 (en) | 2020-11-16 | 2023-10-24 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
| US11901157B2 (en) | 2020-11-16 | 2024-02-13 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
| US11587765B2 (en) | 2020-11-22 | 2023-02-21 | Applied Materials, Inc. | Plasma ignition optimization in semiconductor processing chambers |
| US11495470B1 (en) | 2021-04-16 | 2022-11-08 | Applied Materials, Inc. | Method of enhancing etching selectivity using a pulsed plasma |
| US11791138B2 (en) | 2021-05-12 | 2023-10-17 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
| US11948780B2 (en) | 2021-05-12 | 2024-04-02 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
| US11967483B2 (en) | 2021-06-02 | 2024-04-23 | Applied Materials, Inc. | Plasma excitation with ion energy control |
| US20220399185A1 (en) | 2021-06-09 | 2022-12-15 | Applied Materials, Inc. | Plasma chamber and chamber component cleaning methods |
| US11810760B2 (en) | 2021-06-16 | 2023-11-07 | Applied Materials, Inc. | Apparatus and method of ion current compensation |
| US11569066B2 (en) | 2021-06-23 | 2023-01-31 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
| US11476090B1 (en) | 2021-08-24 | 2022-10-18 | Applied Materials, Inc. | Voltage pulse time-domain multiplexing |
| US12106938B2 (en) | 2021-09-14 | 2024-10-01 | Applied Materials, Inc. | Distortion current mitigation in a radio frequency plasma processing chamber |
| TW202410119A (zh) * | 2022-04-25 | 2024-03-01 | 日商東京威力科創股份有限公司 | 電漿處理裝置、電源系統及電漿處理方法 |
| US11972924B2 (en) | 2022-06-08 | 2024-04-30 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
| US12111341B2 (en) | 2022-10-05 | 2024-10-08 | Applied Materials, Inc. | In-situ electric field detection method and apparatus |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5195045A (en) * | 1991-02-27 | 1993-03-16 | Astec America, Inc. | Automatic impedance matching apparatus and method |
| JPH0732078B2 (ja) | 1993-01-14 | 1995-04-10 | 株式会社アドテック | 高周波プラズマ用電源及びインピーダンス整合装置 |
| JPH10257774A (ja) | 1997-03-07 | 1998-09-25 | Horiba Ltd | 高周波電源装置 |
| JP4772232B2 (ja) * | 2001-08-29 | 2011-09-14 | アジレント・テクノロジーズ・インク | 高周波増幅回路及び高周波増幅回路の駆動方法 |
| JP2003143861A (ja) * | 2001-10-31 | 2003-05-16 | Daihen Corp | 高周波電源装置 |
| JP3893276B2 (ja) | 2001-12-04 | 2007-03-14 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
| JP3998986B2 (ja) * | 2002-01-22 | 2007-10-31 | 株式会社ダイヘン | 高周波電源の進行波電力制御方法及び高周波電源装置 |
| JP4332322B2 (ja) | 2002-06-05 | 2009-09-16 | パール工業株式会社 | 排ガス分解処理用プラズマ発生装置 |
| JP3962297B2 (ja) | 2002-08-05 | 2007-08-22 | 株式会社ダイヘン | マイクロ波電力供給システム |
| JP3641785B2 (ja) | 2002-08-09 | 2005-04-27 | 株式会社京三製作所 | プラズマ発生用電源装置 |
| JP2004205328A (ja) * | 2002-12-25 | 2004-07-22 | Daihen Corp | 高周波電源装置 |
| US7115185B1 (en) * | 2003-09-16 | 2006-10-03 | Advanced Energy Industries, Inc. | Pulsed excitation of inductively coupled plasma sources |
| JP2005136933A (ja) | 2003-10-31 | 2005-05-26 | Hitachi Hybrid Network Co Ltd | 自動利得制御装置 |
| JP4624686B2 (ja) * | 2004-01-15 | 2011-02-02 | 株式会社ダイヘン | 高周波電源装置 |
| KR100710509B1 (ko) * | 2006-04-11 | 2007-04-25 | 남상욱 | 펄스면적변조를 이용한 고효율 선형 전력증폭기 시스템 |
| CN101772992B (zh) * | 2008-03-26 | 2012-08-29 | 株式会社京三制作所 | 真空装置用异常放电抑制装置 |
| KR101124419B1 (ko) * | 2009-02-18 | 2012-03-20 | 포항공과대학교 산학협력단 | 마이크로파 플라즈마 생성을 위한 휴대용 전력 공급 장치 |
| KR101322539B1 (ko) * | 2009-08-07 | 2013-10-28 | 가부시끼가이샤교산세이사꾸쇼 | 펄스 변조 고주파 전력 제어 방법 및 펄스 변조 고주파 전원 장치 |
| JP5691081B2 (ja) * | 2010-04-02 | 2015-04-01 | 株式会社アルバック | 成膜装置 |
-
2012
- 2012-06-18 JP JP2012136942A patent/JP5534365B2/ja active Active
-
2013
- 2013-01-07 TW TW102100411A patent/TWI472270B/zh active
- 2013-06-03 EP EP13807713.6A patent/EP2833703B1/en active Active
- 2013-06-03 DE DE13807713.6T patent/DE13807713T1/de active Pending
- 2013-06-03 PL PL13807713T patent/PL2833703T3/pl unknown
- 2013-06-03 US US14/394,341 patent/US9070537B2/en active Active
- 2013-06-03 IN IN2415KON2014 patent/IN2014KN02415A/en unknown
- 2013-06-03 CN CN201380028359.3A patent/CN104322154B/zh active Active
- 2013-06-03 KR KR1020147034773A patent/KR101523484B1/ko active IP Right Grant
- 2013-06-03 WO PCT/JP2013/065339 patent/WO2013190987A1/ja active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| TWI472270B (zh) | 2015-02-01 |
| TW201401937A (zh) | 2014-01-01 |
| US9070537B2 (en) | 2015-06-30 |
| WO2013190987A1 (ja) | 2013-12-27 |
| EP2833703A1 (en) | 2015-02-04 |
| CN104322154B (zh) | 2015-11-25 |
| KR101523484B1 (ko) | 2015-05-27 |
| CN104322154A (zh) | 2015-01-28 |
| EP2833703A4 (en) | 2015-09-23 |
| KR20140147158A (ko) | 2014-12-29 |
| DE13807713T1 (de) | 2015-05-21 |
| US20150084509A1 (en) | 2015-03-26 |
| PL2833703T3 (pl) | 2017-09-29 |
| EP2833703B1 (en) | 2017-04-19 |
| JP2014002898A (ja) | 2014-01-09 |
| JP5534365B2 (ja) | 2014-06-25 |
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