IN2014KN02415A - - Google Patents

Info

Publication number
IN2014KN02415A
IN2014KN02415A IN2415KON2014A IN2014KN02415A IN 2014KN02415 A IN2014KN02415 A IN 2014KN02415A IN 2415KON2014 A IN2415KON2014 A IN 2415KON2014A IN 2014KN02415 A IN2014KN02415 A IN 2014KN02415A
Authority
IN
India
Prior art keywords
reflected wave
wave power
power
control
frequency
Prior art date
Application number
Inventor
Itsuo Yuzurihara
Satoshi Aikawa
Hiroshi Kunitama
Original Assignee
Kyosan Electric Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyosan Electric Mfg filed Critical Kyosan Electric Mfg
Publication of IN2014KN02415A publication Critical patent/IN2014KN02415A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146—Amplitude modulation, includes pulsing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32944—Arc detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M1/00—Details of apparatus for conversion
    • H02M1/08—Circuits specially adapted for the generation of control voltages for semiconductor devices incorporated in static converters
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M7/00—Conversion of AC power input into DC power output; Conversion of DC power input into AC power output
    • H02M7/42—Conversion of DC power input into AC power output without possibility of reversal
    • H02M7/44—Conversion of DC power input into AC power output without possibility of reversal by static converters
    • H02M7/48—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
    • H02M7/53—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal
    • H02M7/537—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters
    • H02M7/539—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters with automatic control of output wave form or frequency
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems
    • H05H2242/20—Power circuits
    • H05H2242/26—Matching networks

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)

Abstract

According to the present invention, during high-frequency power supply for supplying high-frequency power to a plasma load, reflected wave power control detects reflected wave power of a high-frequency power source and uses the detected reflected wave power to control the high-frequency power source. With short-term fluctuations in the reflected wave power, the control is based on a peak value fluctuation of the detected value of the reflected wave power, and with long-term fluctuations of the reflected wave power, the control is based on a smoothed value fluctuation obtained by smoothing the detected value of the reflected wave power. A reflected wave power peak value suspended loop system and an arc interruption system, for performing control based on the peak fluctuation in the reflected wave power, and a reflected wave power amount suspended loop system for performing control based on the smoothed power amount of the reflected wave power, are included as reflected wave power control loop systems. In an unignited state until the plasma ignites, the high-frequency power source performs fully reflected wave adaptation that can withstand fully reflected wave power in which traveling wave power returns toward the power source entirely as reflected wave power.
IN2415KON2014 2012-06-18 2013-06-03 IN2014KN02415A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012136942A JP5534365B2 (en) 2012-06-18 2012-06-18 High frequency power supply device and reflected wave power control method
PCT/JP2013/065339 WO2013190987A1 (en) 2012-06-18 2013-06-03 High-frequency power supply device and reflected wave power control method

Publications (1)

Publication Number Publication Date
IN2014KN02415A true IN2014KN02415A (en) 2015-05-01

Family

ID=49768589

Family Applications (1)

Application Number Title Priority Date Filing Date
IN2415KON2014 IN2014KN02415A (en) 2012-06-18 2013-06-03

Country Status (10)

Country Link
US (1) US9070537B2 (en)
EP (1) EP2833703B1 (en)
JP (1) JP5534365B2 (en)
KR (1) KR101523484B1 (en)
CN (1) CN104322154B (en)
DE (1) DE13807713T1 (en)
IN (1) IN2014KN02415A (en)
PL (1) PL2833703T3 (en)
TW (1) TWI472270B (en)
WO (1) WO2013190987A1 (en)

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Also Published As

Publication number Publication date
JP2014002898A (en) 2014-01-09
EP2833703B1 (en) 2017-04-19
KR101523484B1 (en) 2015-05-27
TW201401937A (en) 2014-01-01
PL2833703T3 (en) 2017-09-29
EP2833703A4 (en) 2015-09-23
DE13807713T1 (en) 2015-05-21
US9070537B2 (en) 2015-06-30
EP2833703A1 (en) 2015-02-04
JP5534365B2 (en) 2014-06-25
WO2013190987A1 (en) 2013-12-27
US20150084509A1 (en) 2015-03-26
CN104322154A (en) 2015-01-28
CN104322154B (en) 2015-11-25
TWI472270B (en) 2015-02-01
KR20140147158A (en) 2014-12-29

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