IN2012DN06283A - - Google Patents

Info

Publication number
IN2012DN06283A
IN2012DN06283A IN6283DEN2012A IN2012DN06283A IN 2012DN06283 A IN2012DN06283 A IN 2012DN06283A IN 6283DEN2012 A IN6283DEN2012 A IN 6283DEN2012A IN 2012DN06283 A IN2012DN06283 A IN 2012DN06283A
Authority
IN
India
Prior art keywords
vessel
zone
receptacle
orifice
heating
Prior art date
Application number
Other languages
English (en)
Inventor
Vidalet Bruno Dussert
Cédric Guerard
Original Assignee
Astron Fiamm Safety
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Astron Fiamm Safety filed Critical Astron Fiamm Safety
Publication of IN2012DN06283A publication Critical patent/IN2012DN06283A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4557—Heated nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
IN6283DEN2012 2010-02-16 2011-02-15 IN2012DN06283A (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1051098A FR2956411B1 (fr) 2010-02-16 2010-02-16 Systeme de chauffage d'une source de depot en phase vapeur
US30559710P 2010-02-18 2010-02-18
PCT/EP2011/052172 WO2011101325A1 (en) 2010-02-16 2011-02-15 Heating system for a vapor-phase deposition source

Publications (1)

Publication Number Publication Date
IN2012DN06283A true IN2012DN06283A (pl) 2015-09-25

Family

ID=42272607

Family Applications (1)

Application Number Title Priority Date Filing Date
IN6283DEN2012 IN2012DN06283A (pl) 2010-02-16 2011-02-15

Country Status (8)

Country Link
US (1) US20120285381A1 (pl)
EP (1) EP2536868B1 (pl)
JP (1) JP5766720B2 (pl)
CN (1) CN102762766B (pl)
CA (1) CA2786249A1 (pl)
FR (1) FR2956411B1 (pl)
IN (1) IN2012DN06283A (pl)
WO (1) WO2011101325A1 (pl)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5953280B2 (ja) * 2012-10-17 2016-07-20 富士フイルム株式会社 有機材料の蒸着装置
CN104099571A (zh) * 2013-04-01 2014-10-15 上海和辉光电有限公司 蒸发源组件和薄膜沉积装置和薄膜沉积方法
JP6093251B2 (ja) * 2013-06-10 2017-03-08 長州産業株式会社 蒸着源
US20150024538A1 (en) * 2013-07-19 2015-01-22 Tsmc Solar Ltd. Vapor dispensing apparatus and method for solar panel
CN103695848B (zh) * 2013-12-30 2015-10-14 京东方科技集团股份有限公司 蒸镀设备及其蒸镀方法
CN104762600B (zh) * 2015-04-20 2017-05-10 京东方科技集团股份有限公司 蒸镀坩埚和蒸镀装置
CN104762601A (zh) * 2015-04-30 2015-07-08 京东方科技集团股份有限公司 一种蒸发源、蒸镀装置、蒸镀方法
CN105483620B (zh) * 2015-11-27 2018-03-30 京东方科技集团股份有限公司 喷嘴部件、蒸镀装置及制作有机发光二极管器件的方法
US20180037981A1 (en) * 2016-08-03 2018-02-08 Beijing Apollo Ding Rong Solar Technology Co., Ltd. Temperature-controlled chalcogen vapor distribution apparatus and method for uniform cigs deposition
DE102017003516A1 (de) * 2017-04-11 2018-10-11 Creaphys Gmbh Beschichtungsvorrichtung und Verfahren zur reaktiven Dampfphasenabscheidung unter Vakuum auf einem Substrat
CN107190237A (zh) * 2017-06-26 2017-09-22 深圳市华星光电技术有限公司 蒸发源加热系统
CN108457132A (zh) * 2018-04-10 2018-08-28 浙江舒康科技有限公司 铝氨热管纸浆模塑热压干燥模具及干燥方法

Family Cites Families (25)

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JPS5219184A (en) * 1975-08-06 1977-02-14 Osaka Kouon Denki Kk Vapor source
US4325986A (en) * 1979-05-29 1982-04-20 University Of Delaware Method for continuous deposition by vacuum evaporation
JPH0774433B2 (ja) * 1987-04-27 1995-08-09 日本電信電話株式会社 薄膜成長用蒸着装置
JPH0949072A (ja) * 1995-08-10 1997-02-18 Ulvac Japan Ltd 有機化合物用蒸発源
JP3691615B2 (ja) * 1996-12-06 2005-09-07 株式会社アルバック 有機材料用蒸発源
KR100302609B1 (ko) * 1999-05-10 2001-09-13 김영환 온도가변 가스 분사 장치
US6830626B1 (en) * 1999-10-22 2004-12-14 Kurt J. Lesker Company Method and apparatus for coating a substrate in a vacuum
US20030111014A1 (en) * 2001-12-18 2003-06-19 Donatucci Matthew B. Vaporizer/delivery vessel for volatile/thermally sensitive solid and liquid compounds
JP2004027252A (ja) * 2002-06-21 2004-01-29 Samsung Nec Mobile Display Co Ltd 有機薄膜形成装置の加熱容器
JP4041005B2 (ja) * 2003-04-02 2008-01-30 長州産業株式会社 薄膜堆積用分子線源とそれを使用した薄膜堆積方法
KR20050004379A (ko) * 2003-07-02 2005-01-12 삼성전자주식회사 원자층 증착용 가스 공급 장치
JP4344631B2 (ja) * 2004-03-02 2009-10-14 長州産業株式会社 有機物薄膜堆積用分子線源
ATE376078T1 (de) * 2005-07-28 2007-11-15 Applied Materials Gmbh & Co Kg Bedampfervorrichtung
EP1752555A1 (de) * 2005-07-28 2007-02-14 Applied Materials GmbH & Co. KG Verdampfervorrichtung
US20070178225A1 (en) * 2005-12-14 2007-08-02 Keiji Takanosu Vapor deposition crucible, thin-film forming apparatus comprising the same, and method of producing display device
JP2007186787A (ja) * 2005-12-14 2007-07-26 Hitachi Displays Ltd 蒸着坩堝並びにこれを備えた薄膜形成装置、及び表示装置の製造方法
JP4768584B2 (ja) * 2006-11-16 2011-09-07 財団法人山形県産業技術振興機構 蒸発源およびこれを用いた真空蒸着装置
DE102007012370A1 (de) * 2007-03-14 2008-09-18 Createc Fischer & Co. Gmbh Bedampfungseinrichtung und Bedampfungsverfahren zur Molekularstrahlbedampfung und Molekularstrahlepitaxie
JP2008274322A (ja) * 2007-04-26 2008-11-13 Sony Corp 蒸着装置
JP2009228091A (ja) * 2008-03-25 2009-10-08 Canon Inc 蒸着装置
JP5226773B2 (ja) * 2008-04-11 2013-07-03 東芝三菱電機産業システム株式会社 均熱装置
JP2010065282A (ja) * 2008-09-11 2010-03-25 Canon Inc 蒸発源
WO2010080109A1 (en) * 2008-12-18 2010-07-15 Veeco Instruments Inc. Vacuum deposition sources having heated effusion orifices
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
JP4827953B2 (ja) * 2009-07-24 2011-11-30 日立造船株式会社 蒸着装置

Also Published As

Publication number Publication date
FR2956411B1 (fr) 2012-04-06
FR2956411A1 (fr) 2011-08-19
JP5766720B2 (ja) 2015-08-19
CN102762766B (zh) 2014-12-03
US20120285381A1 (en) 2012-11-15
CA2786249A1 (en) 2011-08-25
WO2011101325A1 (en) 2011-08-25
CN102762766A (zh) 2012-10-31
EP2536868A1 (en) 2012-12-26
EP2536868B1 (en) 2017-12-13
JP2013519787A (ja) 2013-05-30

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