IN2012DN01482A - - Google Patents

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Publication number
IN2012DN01482A
IN2012DN01482A IN1482DEN2012A IN2012DN01482A IN 2012DN01482 A IN2012DN01482 A IN 2012DN01482A IN 1482DEN2012 A IN1482DEN2012 A IN 1482DEN2012A IN 2012DN01482 A IN2012DN01482 A IN 2012DN01482A
Authority
IN
India
Prior art keywords
substrate
dust
substrate holder
flow
semiconductor substrates
Prior art date
Application number
Other languages
English (en)
Inventor
Isao Sugaya
Junichi Chonan
Hidehiro Maeda
Keiichi Tanaka
Tomoyuki Yasuda
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of IN2012DN01482A publication Critical patent/IN2012DN01482A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10—Bump connectors ; Manufacturing methods related thereto
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
IN1482DEN2012 2009-07-21 2010-07-21 IN2012DN01482A (enrdf_load_stackoverflow)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2009170513 2009-07-21
JP2009253440 2009-11-04
JP2009253439 2009-11-04
JP2010023510 2010-02-04
PCT/JP2010/004675 WO2011010460A1 (ja) 2009-07-21 2010-07-21 基板処理システム、基板ホルダ、基板ホルダ対、基板接合装置およびデバイスの製造方法

Publications (1)

Publication Number Publication Date
IN2012DN01482A true IN2012DN01482A (enrdf_load_stackoverflow) 2015-06-05

Family

ID=43498942

Family Applications (1)

Application Number Title Priority Date Filing Date
IN1482DEN2012 IN2012DN01482A (enrdf_load_stackoverflow) 2009-07-21 2010-07-21

Country Status (8)

Country Link
US (1) US20120214290A1 (enrdf_load_stackoverflow)
EP (1) EP2458629B1 (enrdf_load_stackoverflow)
JP (1) JP5686097B2 (enrdf_load_stackoverflow)
KR (1) KR101746241B1 (enrdf_load_stackoverflow)
CN (1) CN102576689B (enrdf_load_stackoverflow)
IN (1) IN2012DN01482A (enrdf_load_stackoverflow)
TW (1) TWI593048B (enrdf_load_stackoverflow)
WO (1) WO2011010460A1 (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5485958B2 (ja) * 2011-09-16 2014-05-07 東京エレクトロン株式会社 接合方法、プログラム、コンピュータ記憶媒体、接合装置及び接合システム
US10115862B2 (en) 2011-12-27 2018-10-30 eLux Inc. Fluidic assembly top-contact LED disk
JP5521066B1 (ja) * 2013-01-25 2014-06-11 東京エレクトロン株式会社 接合装置及び接合システム
US9921490B2 (en) * 2013-10-30 2018-03-20 Nikon Corporation Substrate holding device, exposure apparatus, and device manufacturing method
CN104733366B (zh) * 2015-03-27 2017-07-25 北京七星华创电子股份有限公司 一种支撑脚装置
US20180130705A1 (en) * 2016-11-07 2018-05-10 Corning Incorporated Delayed Via Formation in Electronic Devices
CN107146768B (zh) * 2017-06-16 2018-03-23 英特尔产品（成都）有限公司 用于安放物品的装置和对准装置
KR20200134708A (ko) 2019-05-23 2020-12-02 삼성전자주식회사 웨이퍼 본딩 장치
KR20220093150A (ko) * 2019-11-01 2022-07-05 도쿄엘렉트론가부시키가이샤 기판 세정 장치 및 기판 세정 방법
JP7579092B2 (ja) 2020-09-11 2024-11-07 キヤノン株式会社 異物除去装置、リソグラフィ装置、および物品製造方法
CN116995024A (zh) * 2022-04-26 2023-11-03 重庆康佳光电科技有限公司 晶圆取放装置及刻蚀设备、晶圆拾取方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4038599A (en) * 1974-12-30 1977-07-26 International Business Machines Corporation High density wafer contacting and test system
JPH0359189U (enrdf_load_stackoverflow) * 1989-10-11 1991-06-11
JPH05217973A (ja) * 1992-02-06 1993-08-27 Nippon Steel Corp 半導体基板貼付装置
JP3191139B2 (ja) * 1994-12-14 2001-07-23 株式会社日立製作所 試料保持装置
JP3137080B2 (ja) * 1998-06-24 2001-02-19 日本電気株式会社 レチクル収納容器
JP2000091247A (ja) * 1998-09-14 2000-03-31 Tokyo Electron Ltd プラズマ処理装置
JP2003273187A (ja) * 2002-03-12 2003-09-26 Matsushita Electric Ind Co Ltd 薄板材の移載方法及び装置
JP3693972B2 (ja) * 2002-03-19 2005-09-14 富士通株式会社 貼合せ基板製造装置及び基板貼合せ方法
US7040525B2 (en) * 2002-03-20 2006-05-09 Lg.Philips Lcd Co., Ltd. Stage structure in bonding machine and method for controlling the same
JP2006344613A (ja) * 2003-06-24 2006-12-21 Shin-Etsu Engineering Co Ltd 基板貼り合わせ装置
JP2005032553A (ja) * 2003-07-14 2005-02-03 Renesas Technology Corp Ｉｃソケットおよび半導体装置の検査方法
JP2005203645A (ja) * 2004-01-19 2005-07-28 Nitto Denko Corp 基板貼り合わせ方法及び基板貼り合わせ装置
JP4107316B2 (ja) * 2005-09-02 2008-06-25 株式会社日立プラントテクノロジー 基板貼合装置
TWI471971B (zh) * 2007-10-30 2015-02-01 尼康股份有限公司 Substrate holding member, substrate bonding apparatus, laminated substrate manufacturing apparatus, substrate bonding method, laminated substrate manufacturing method, and laminated semiconductor device manufacturing method

Also Published As

Publication number Publication date
TWI593048B (zh) 2017-07-21
TW201126639A (en) 2011-08-01
KR101746241B1 (ko) 2017-06-12
EP2458629B1 (en) 2019-05-15
KR20120048640A (ko) 2012-05-15
CN102576689B (zh) 2015-06-03
US20120214290A1 (en) 2012-08-23
EP2458629A4 (en) 2017-04-12
JPWO2011010460A1 (ja) 2012-12-27
EP2458629A1 (en) 2012-05-30
CN102576689A (zh) 2012-07-11
JP5686097B2 (ja) 2015-03-18
WO2011010460A1 (ja) 2011-01-27

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