IL310429A - Focusing device having an image plane extending parallel or congruent to a target plane - Google Patents

Focusing device having an image plane extending parallel or congruent to a target plane

Info

Publication number
IL310429A
IL310429A IL310429A IL31042924A IL310429A IL 310429 A IL310429 A IL 310429A IL 310429 A IL310429 A IL 310429A IL 31042924 A IL31042924 A IL 31042924A IL 310429 A IL310429 A IL 310429A
Authority
IL
Israel
Prior art keywords
focusing
laser beam
respect
target material
optical axis
Prior art date
Application number
IL310429A
Other languages
English (en)
Hebrew (he)
Inventor
Boris Regaard
Original Assignee
Trumpf Lasersystems Semiconductor Mfg Gmbh
Boris Regaard
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Trumpf Lasersystems Semiconductor Mfg Gmbh, Boris Regaard filed Critical Trumpf Lasersystems Semiconductor Mfg Gmbh
Publication of IL310429A publication Critical patent/IL310429A/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/16—Beam splitting or combining systems used as aids for focusing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
IL310429A 2021-07-28 2022-07-27 Focusing device having an image plane extending parallel or congruent to a target plane IL310429A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP21188167.7A EP4125165B1 (de) 2021-07-28 2021-07-28 Fokussiereinrichtung mit einer parallel oder deckungsgleich zu einer targetebene verlaufenden bildebene
PCT/EP2022/071088 WO2023006821A1 (de) 2021-07-28 2022-07-27 Fokussiereinrichtung mit einer parallel oder deckungsgleich zu einer targetebene verlaufenden bildebene

Publications (1)

Publication Number Publication Date
IL310429A true IL310429A (en) 2024-03-01

Family

ID=77103962

Family Applications (1)

Application Number Title Priority Date Filing Date
IL310429A IL310429A (en) 2021-07-28 2022-07-27 Focusing device having an image plane extending parallel or congruent to a target plane

Country Status (8)

Country Link
US (1) US20240168306A1 (enExample)
EP (1) EP4125165B1 (enExample)
JP (1) JP2024530617A (enExample)
KR (1) KR20240037266A (enExample)
CN (1) CN117769793A (enExample)
IL (1) IL310429A (enExample)
TW (1) TWI845996B (enExample)
WO (1) WO2023006821A1 (enExample)

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI426295B (zh) * 2007-03-05 2014-02-11 尼康股份有限公司 反射折射投影光學系統、投影光學裝置以及掃描型曝光裝置
JP5458243B2 (ja) * 2007-10-25 2014-04-02 国立大学法人大阪大学 Ｅｕｖ光の放射方法、および前記ｅｕｖ光を用いた感応基板の露光方法
US8436328B2 (en) * 2008-12-16 2013-05-07 Gigaphoton Inc. Extreme ultraviolet light source apparatus
JP5722061B2 (ja) * 2010-02-19 2015-05-20 ギガフォトン株式会社 極端紫外光源装置及び極端紫外光の発生方法
US9265136B2 (en) * 2010-02-19 2016-02-16 Gigaphoton Inc. System and method for generating extreme ultraviolet light
JP5758662B2 (ja) * 2011-03-23 2015-08-05 国立大学法人大阪大学 極端紫外光生成装置及び極端紫外光生成方法
WO2013161760A1 (ja) * 2012-04-27 2013-10-31 ギガフォトン株式会社 レーザシステム及び極端紫外光生成システム
JP6374481B2 (ja) * 2013-03-15 2018-08-15 エーエスエムエル ネザーランズ ビー．ブイ． 極端紫外線光源のビーム位置制御を行うシステム又は方法
WO2014192872A1 (ja) * 2013-05-31 2014-12-04 ギガフォトン株式会社 極端紫外光生成システム
WO2015036024A1 (de) 2013-09-12 2015-03-19 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung mit einer überlagerungseinrichtung
WO2015036025A1 (de) 2013-09-12 2015-03-19 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung mit einer überlagerungseinrichtung
US9360600B2 (en) * 2013-11-20 2016-06-07 Asml Netherlands B.V. System and method for correcting the focus of a laser beam
JP6556250B2 (ja) * 2015-11-06 2019-08-07 ギガフォトン株式会社 極端紫外光生成装置
WO2017137074A1 (de) * 2016-02-10 2017-08-17 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Treiberlaseranordnung mit einem optischen isolator und euv-strahlungserzeugungsvorrichtung damit
KR102718115B1 (ko) * 2018-04-03 2024-10-15 에이에스엠엘 네델란즈 비.브이. 광빔의 공간적 변조

Also Published As

Publication number Publication date
US20240168306A1 (en) 2024-05-23
EP4125165A1 (de) 2023-02-01
KR20240037266A (ko) 2024-03-21
JP2024530617A (ja) 2024-08-23
CN117769793A (zh) 2024-03-26
TW202321756A (zh) 2023-06-01
TWI845996B (zh) 2024-06-21
EP4125165B1 (de) 2023-11-01
WO2023006821A1 (de) 2023-02-02

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