TWI845996B - 具有與靶面平行或重合地延伸的像平面的聚焦裝置 - Google Patents

具有與靶面平行或重合地延伸的像平面的聚焦裝置 Download PDF

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Publication number
TWI845996B
TWI845996B TW111128178A TW111128178A TWI845996B TW I845996 B TWI845996 B TW I845996B TW 111128178 A TW111128178 A TW 111128178A TW 111128178 A TW111128178 A TW 111128178A TW I845996 B TWI845996 B TW I845996B
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TW
Taiwan
Prior art keywords
focusing
laser beam
focusing element
target
optical axis
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TW111128178A
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English (en)
Chinese (zh)
Other versions
TW202321756A (zh
Inventor
包里斯 雷加德
Original Assignee
德商創浦半導體製造雷射系統公司
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Application filed by 德商創浦半導體製造雷射系統公司 filed Critical 德商創浦半導體製造雷射系統公司
Publication of TW202321756A publication Critical patent/TW202321756A/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/16—Beam splitting or combining systems used as aids for focusing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW111128178A 2021-07-28 2022-07-27 具有與靶面平行或重合地延伸的像平面的聚焦裝置 TWI845996B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP21188167.7A EP4125165B1 (de) 2021-07-28 2021-07-28 Fokussiereinrichtung mit einer parallel oder deckungsgleich zu einer targetebene verlaufenden bildebene
EP21188167.7 2021-07-28

Publications (2)

Publication Number Publication Date
TW202321756A TW202321756A (zh) 2023-06-01
TWI845996B true TWI845996B (zh) 2024-06-21

Family

ID=77103962

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111128178A TWI845996B (zh) 2021-07-28 2022-07-27 具有與靶面平行或重合地延伸的像平面的聚焦裝置

Country Status (8)

Country Link
US (1) US20240168306A1 (enExample)
EP (1) EP4125165B1 (enExample)
JP (1) JP2024530617A (enExample)
KR (1) KR20240037266A (enExample)
CN (1) CN117769793A (enExample)
IL (1) IL310429A (enExample)
TW (1) TWI845996B (enExample)
WO (1) WO2023006821A1 (enExample)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120307851A1 (en) * 2010-02-19 2012-12-06 Tsukasa Hori System and method for generating extreme ultraviolet light
TWI609248B (zh) * 2013-11-20 2017-12-21 Ａｓｍｌ荷蘭公司 用於校準雷射光束之聚焦的系統及方法
US10268119B2 (en) * 2015-11-06 2019-04-23 Gigaphoton Inc. Extreme ultraviolet light generating device
US10644473B2 (en) * 2016-02-10 2020-05-05 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Exteme ultraviolet radiation producing systems with driver laser systems having optical isolators
CN111955058A (zh) * 2018-04-03 2020-11-17 Asml荷兰有限公司 光束的空间调制

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI426295B (zh) * 2007-03-05 2014-02-11 尼康股份有限公司 反射折射投影光學系統、投影光學裝置以及掃描型曝光裝置
JP5458243B2 (ja) * 2007-10-25 2014-04-02 国立大学法人大阪大学 Ｅｕｖ光の放射方法、および前記ｅｕｖ光を用いた感応基板の露光方法
US8436328B2 (en) * 2008-12-16 2013-05-07 Gigaphoton Inc. Extreme ultraviolet light source apparatus
JP5722061B2 (ja) * 2010-02-19 2015-05-20 ギガフォトン株式会社 極端紫外光源装置及び極端紫外光の発生方法
JP5758662B2 (ja) * 2011-03-23 2015-08-05 国立大学法人大阪大学 極端紫外光生成装置及び極端紫外光生成方法
WO2013161760A1 (ja) * 2012-04-27 2013-10-31 ギガフォトン株式会社 レーザシステム及び極端紫外光生成システム
JP6374481B2 (ja) * 2013-03-15 2018-08-15 エーエスエムエル ネザーランズ ビー．ブイ． 極端紫外線光源のビーム位置制御を行うシステム又は方法
WO2014192872A1 (ja) * 2013-05-31 2014-12-04 ギガフォトン株式会社 極端紫外光生成システム
WO2015036024A1 (de) 2013-09-12 2015-03-19 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung mit einer überlagerungseinrichtung
WO2015036025A1 (de) 2013-09-12 2015-03-19 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung mit einer überlagerungseinrichtung

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120307851A1 (en) * 2010-02-19 2012-12-06 Tsukasa Hori System and method for generating extreme ultraviolet light
TWI609248B (zh) * 2013-11-20 2017-12-21 Ａｓｍｌ荷蘭公司 用於校準雷射光束之聚焦的系統及方法
US10268119B2 (en) * 2015-11-06 2019-04-23 Gigaphoton Inc. Extreme ultraviolet light generating device
US10644473B2 (en) * 2016-02-10 2020-05-05 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Exteme ultraviolet radiation producing systems with driver laser systems having optical isolators
CN111955058A (zh) * 2018-04-03 2020-11-17 Asml荷兰有限公司 光束的空间调制

Also Published As

Publication number Publication date
US20240168306A1 (en) 2024-05-23
EP4125165A1 (de) 2023-02-01
KR20240037266A (ko) 2024-03-21
JP2024530617A (ja) 2024-08-23
CN117769793A (zh) 2024-03-26
TW202321756A (zh) 2023-06-01
IL310429A (en) 2024-03-01
EP4125165B1 (de) 2023-11-01
WO2023006821A1 (de) 2023-02-02

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