JP2024530617A - ターゲット平面に対して平行にまたはターゲット平面に一致して延在する像平面を有するフォーカシング装置 - Google Patents

ターゲット平面に対して平行にまたはターゲット平面に一致して延在する像平面を有するフォーカシング装置 Download PDF

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Publication number
JP2024530617A
JP2024530617A JP2024505253A JP2024505253A JP2024530617A JP 2024530617 A JP2024530617 A JP 2024530617A JP 2024505253 A JP2024505253 A JP 2024505253A JP 2024505253 A JP2024505253 A JP 2024505253A JP 2024530617 A JP2024530617 A JP 2024530617A
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JP
Japan
Prior art keywords
focusing
laser beam
optical axis
target material
euv
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JP2024505253A
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English (en)
Japanese (ja)
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JP2024530617A5 (enExample
Inventor
レガート ボリス
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Trumpf Lasersystems for Semiconductor Manufacturing GmbH
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Trumpf Lasersystems for Semiconductor Manufacturing GmbH
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Application filed by Trumpf Lasersystems for Semiconductor Manufacturing GmbH filed Critical Trumpf Lasersystems for Semiconductor Manufacturing GmbH
Publication of JP2024530617A publication Critical patent/JP2024530617A/ja
Publication of JP2024530617A5 publication Critical patent/JP2024530617A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/16—Beam splitting or combining systems used as aids for focusing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2024505253A 2021-07-28 2022-07-27 ターゲット平面に対して平行にまたはターゲット平面に一致して延在する像平面を有するフォーカシング装置 Pending JP2024530617A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP21188167.7A EP4125165B1 (de) 2021-07-28 2021-07-28 Fokussiereinrichtung mit einer parallel oder deckungsgleich zu einer targetebene verlaufenden bildebene
EP21188167.7 2021-07-28
PCT/EP2022/071088 WO2023006821A1 (de) 2021-07-28 2022-07-27 Fokussiereinrichtung mit einer parallel oder deckungsgleich zu einer targetebene verlaufenden bildebene

Publications (2)

Publication Number Publication Date
JP2024530617A true JP2024530617A (ja) 2024-08-23
JP2024530617A5 JP2024530617A5 (enExample) 2025-08-04

Family

ID=77103962

Family Applications (1)

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JP2024505253A Pending JP2024530617A (ja) 2021-07-28 2022-07-27 ターゲット平面に対して平行にまたはターゲット平面に一致して延在する像平面を有するフォーカシング装置

Country Status (8)

Country Link
US (1) US20240168306A1 (enExample)
EP (1) EP4125165B1 (enExample)
JP (1) JP2024530617A (enExample)
KR (1) KR20240037266A (enExample)
CN (1) CN117769793A (enExample)
IL (1) IL310429A (enExample)
TW (1) TWI845996B (enExample)
WO (1) WO2023006821A1 (enExample)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008108123A1 (ja) * 2007-03-05 2008-09-12 Nikon Corporation 反射屈折投影光学系、投影光学装置、及び走査型露光装置
JP2011082473A (ja) * 2008-12-16 2011-04-21 Komatsu Ltd 極端紫外光源装置
JP2012134433A (ja) * 2010-02-19 2012-07-12 Komatsu Ltd 極端紫外光源装置及び極端紫外光の発生方法
WO2014192872A1 (ja) * 2013-05-31 2014-12-04 ギガフォトン株式会社 極端紫外光生成システム
JP2016512383A (ja) * 2013-03-15 2016-04-25 エーエスエムエル ネザーランズ ビー．ブイ． 極端紫外線光源のビーム位置制御
JP2021517662A (ja) * 2018-04-03 2021-07-26 エーエスエムエル ネザーランズ ビー．ブイ． 光ビームの空間変調

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5458243B2 (ja) * 2007-10-25 2014-04-02 国立大学法人大阪大学 Ｅｕｖ光の放射方法、および前記ｅｕｖ光を用いた感応基板の露光方法
US9265136B2 (en) * 2010-02-19 2016-02-16 Gigaphoton Inc. System and method for generating extreme ultraviolet light
JP5758662B2 (ja) * 2011-03-23 2015-08-05 国立大学法人大阪大学 極端紫外光生成装置及び極端紫外光生成方法
WO2013161760A1 (ja) * 2012-04-27 2013-10-31 ギガフォトン株式会社 レーザシステム及び極端紫外光生成システム
WO2015036024A1 (de) 2013-09-12 2015-03-19 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung mit einer überlagerungseinrichtung
WO2015036025A1 (de) 2013-09-12 2015-03-19 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung mit einer überlagerungseinrichtung
US9360600B2 (en) * 2013-11-20 2016-06-07 Asml Netherlands B.V. System and method for correcting the focus of a laser beam
JP6556250B2 (ja) * 2015-11-06 2019-08-07 ギガフォトン株式会社 極端紫外光生成装置
WO2017137074A1 (de) * 2016-02-10 2017-08-17 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Treiberlaseranordnung mit einem optischen isolator und euv-strahlungserzeugungsvorrichtung damit

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008108123A1 (ja) * 2007-03-05 2008-09-12 Nikon Corporation 反射屈折投影光学系、投影光学装置、及び走査型露光装置
JP2011082473A (ja) * 2008-12-16 2011-04-21 Komatsu Ltd 極端紫外光源装置
JP2012134433A (ja) * 2010-02-19 2012-07-12 Komatsu Ltd 極端紫外光源装置及び極端紫外光の発生方法
JP2016512383A (ja) * 2013-03-15 2016-04-25 エーエスエムエル ネザーランズ ビー．ブイ． 極端紫外線光源のビーム位置制御
WO2014192872A1 (ja) * 2013-05-31 2014-12-04 ギガフォトン株式会社 極端紫外光生成システム
JP2021517662A (ja) * 2018-04-03 2021-07-26 エーエスエムエル ネザーランズ ビー．ブイ． 光ビームの空間変調

Also Published As

Publication number Publication date
US20240168306A1 (en) 2024-05-23
EP4125165A1 (de) 2023-02-01
KR20240037266A (ko) 2024-03-21
CN117769793A (zh) 2024-03-26
TW202321756A (zh) 2023-06-01
IL310429A (en) 2024-03-01
TWI845996B (zh) 2024-06-21
EP4125165B1 (de) 2023-11-01
WO2023006821A1 (de) 2023-02-02

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