IL163536A0 - Method and vessel for the delivery of precursor materials - Google Patents

Method and vessel for the delivery of precursor materials

Info

Publication number
IL163536A0
IL163536A0 IL16353604A IL16353604A IL163536A0 IL 163536 A0 IL163536 A0 IL 163536A0 IL 16353604 A IL16353604 A IL 16353604A IL 16353604 A IL16353604 A IL 16353604A IL 163536 A0 IL163536 A0 IL 163536A0
Authority
IL
Israel
Prior art keywords
volume
vessel
lid
delivery
protrusion
Prior art date
Application number
IL16353604A
Other languages
English (en)
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Publication of IL163536A0 publication Critical patent/IL163536A0/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y10T137/0391—Affecting flow by the addition of material or energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/4891—With holder for solid, flaky or pulverized material to be dissolved or entrained

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
IL16353604A 2003-08-19 2004-08-12 Method and vessel for the delivery of precursor materials IL163536A0 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US49618703P 2003-08-19 2003-08-19
US58729504P 2004-07-12 2004-07-12
US10/902,778 US7261118B2 (en) 2003-08-19 2004-08-02 Method and vessel for the delivery of precursor materials

Publications (1)

Publication Number Publication Date
IL163536A0 true IL163536A0 (en) 2005-12-18

Family

ID=34069125

Family Applications (1)

Application Number Title Priority Date Filing Date
IL16353604A IL163536A0 (en) 2003-08-19 2004-08-12 Method and vessel for the delivery of precursor materials

Country Status (10)

Country Link
US (1) US7261118B2 (de)
EP (1) EP1508631B1 (de)
JP (1) JP4012181B2 (de)
KR (1) KR100590463B1 (de)
CN (1) CN100523289C (de)
AT (1) ATE466969T1 (de)
DE (1) DE602004026968D1 (de)
IL (1) IL163536A0 (de)
SG (2) SG109618A1 (de)
TW (1) TWI257436B (de)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7601225B2 (en) * 2002-06-17 2009-10-13 Asm International N.V. System for controlling the sublimation of reactants
US7300038B2 (en) 2002-07-23 2007-11-27 Advanced Technology Materials, Inc. Method and apparatus to help promote contact of gas with vaporized material
US6921062B2 (en) * 2002-07-23 2005-07-26 Advanced Technology Materials, Inc. Vaporizer delivery ampoule
US6909839B2 (en) 2003-07-23 2005-06-21 Advanced Technology Materials, Inc. Delivery systems for efficient vaporization of precursor source material
JP4312555B2 (ja) * 2003-09-18 2009-08-12 富士フイルム株式会社 真空蒸着用ルツボおよび蛍光体シート製造装置
GB2432371B (en) * 2005-11-17 2011-06-15 Epichem Ltd Improved bubbler for the transportation of substances by a carrier gas
FI121430B (fi) * 2006-04-28 2010-11-15 Beneq Oy Kuuma lähde
DE102006022534A1 (de) * 2006-05-15 2007-11-22 Aixtron Ag Quellenbehälter einse VPE-Reaktors
DE102006023046B4 (de) * 2006-05-17 2009-02-05 Qimonda Ag Verfahren und Ausgangsmaterial zum Bereitstellen eines gasförmigen Precursors
US20080018004A1 (en) * 2006-06-09 2008-01-24 Air Products And Chemicals, Inc. High Flow GaCl3 Delivery
WO2007143743A2 (en) * 2006-06-09 2007-12-13 S.O.I.Tec Silicon On Insulator Technologies High volume delivery system for gallium trichloride
KR100840783B1 (ko) 2006-08-21 2008-06-23 삼성전자주식회사 전구체 기화 방법 및 장치, 및 이를 이용한 유전막 형성방법
US20080241805A1 (en) * 2006-08-31 2008-10-02 Q-Track Corporation System and method for simulated dosimetry using a real time locating system
KR101480971B1 (ko) * 2006-10-10 2015-01-09 에이에스엠 아메리카, 인코포레이티드 전구체 전달 시스템
US9109287B2 (en) * 2006-10-19 2015-08-18 Air Products And Chemicals, Inc. Solid source container with inlet plenum
US9481943B2 (en) * 2006-11-22 2016-11-01 Soitec Gallium trichloride injection scheme
US9481944B2 (en) 2006-11-22 2016-11-01 Soitec Gas injectors including a funnel- or wedge-shaped channel for chemical vapor deposition (CVD) systems and CVD systems with the same
EP2055804A1 (de) * 2007-10-29 2009-05-06 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Verfahren zur Herstellung einer Abscheidung aus einer Dampfphase
US8343583B2 (en) * 2008-07-10 2013-01-01 Asm International N.V. Method for vaporizing non-gaseous precursor in a fluidized bed
CN102597310B (zh) 2009-11-02 2015-02-04 西格玛-奥吉奇有限责任公司 固态前体输送组件以及相关方法
US9809711B2 (en) 2012-01-17 2017-11-07 Versum Materials Us, Llc Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process
US20130243968A1 (en) 2012-03-16 2013-09-19 Air Products And Chemicals, Inc. Catalyst synthesis for organosilane sol-gel reactions
US9598766B2 (en) 2012-05-27 2017-03-21 Air Products And Chemicals, Inc. Vessel with filter
KR20210135341A (ko) 2012-05-31 2021-11-12 엔테그리스, 아이엔씨. 배취식 침착을 위한 고 물질 플럭스를 갖는 유체의 소스 시약-기반 수송
US9279604B2 (en) * 2012-06-05 2016-03-08 Applied Materials, Inc. Compact ampoule thermal management system
WO2014018740A1 (en) * 2012-07-25 2014-01-30 William Kimmerle Chemical precursor bubbler assembly
US10170297B2 (en) 2013-08-22 2019-01-01 Versum Materials Us, Llc Compositions and methods using same for flowable oxide deposition
US10443128B2 (en) * 2015-04-18 2019-10-15 Versum Materials Us, Llc Vessel and method for delivery of precursor materials
KR101606681B1 (ko) * 2016-01-13 2016-03-28 (주)서일퍼시픽 이동식 기침 유발기
US10876205B2 (en) 2016-09-30 2020-12-29 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
US11926894B2 (en) 2016-09-30 2024-03-12 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
KR102344996B1 (ko) 2017-08-18 2021-12-30 삼성전자주식회사 전구체 공급 유닛, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법
US10597773B2 (en) * 2017-08-22 2020-03-24 Praxair Technology, Inc. Antimony-containing materials for ion implantation
SG11202011887XA (en) 2018-06-15 2020-12-30 Versum Materials Us Llc Siloxane compositions and methods for using the compositions to deposit silicon containing films
US11634812B2 (en) 2018-08-16 2023-04-25 Asm Ip Holding B.V. Solid source sublimator
CN109576675B (zh) * 2019-01-15 2021-08-13 北京北方华创微电子装备有限公司 原子层沉积装置及方法
US11624113B2 (en) 2019-09-13 2023-04-11 Asm Ip Holding B.V. Heating zone separation for reactant evaporation system
US12037684B2 (en) 2021-02-26 2024-07-16 Entegris, Inc. Solids vaporizer
US20240011160A1 (en) * 2022-07-11 2024-01-11 Taiwan Semiconductor Manufacturing Company, Ltd. Thin film deposition with improved control of precursor
WO2024166518A1 (ja) * 2023-02-08 2024-08-15 株式会社堀場エステック 液体材料気化装置、液体材料気化システム

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4723967A (en) * 1987-04-27 1988-02-09 Advanced Technology Materials, Inc. Valve block and container for semiconductor source reagent dispensing and/or purification
JPH01168331A (ja) * 1987-12-24 1989-07-03 Mitsui Toatsu Chem Inc 有機金属化合物の飽和方法
DE3801147A1 (de) * 1988-01-16 1989-07-27 Philips Patentverwaltung Vorrichtung zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms
JPH0269389A (ja) * 1988-08-31 1990-03-08 Toyo Stauffer Chem Co 有機金属気相成長法における固体有機金属化合物の飽和蒸気生成方法
US5227340A (en) * 1990-02-05 1993-07-13 Motorola, Inc. Process for fabricating semiconductor devices using a solid reactant source
JPH0632695A (ja) 1992-07-14 1994-02-08 Fujitsu Ltd バブラー
US5276585A (en) * 1992-11-16 1994-01-04 Thermalloy, Inc. Heat sink mounting apparatus
US5381605A (en) * 1993-01-08 1995-01-17 Photonics Research Incorporated Method and apparatus for delivering gas
US5377429A (en) * 1993-04-19 1995-01-03 Micron Semiconductor, Inc. Method and appartus for subliming precursors
US5607002A (en) * 1993-04-28 1997-03-04 Advanced Delivery & Chemical Systems, Inc. Chemical refill system for high purity chemicals
US5707424A (en) * 1994-10-13 1998-01-13 Advanced Technology Materials, Inc. Process system with integrated gas storage and delivery unit
JP3417751B2 (ja) * 1995-02-13 2003-06-16 株式会社東芝 半導体装置の製造方法
US5989305A (en) * 1995-03-09 1999-11-23 Shin-Etsu Chemical Co., Ltd. Feeder of a solid organometallic compound
US5674574A (en) * 1996-05-20 1997-10-07 Micron Technology, Inc. Vapor delivery system for solid precursors and method regarding same
US6058012A (en) * 1996-08-26 2000-05-02 Compaq Computer Corporation Apparatus, method and system for thermal management of an electronic system having semiconductor devices
DE69738136T2 (de) * 1996-12-17 2008-06-12 Advanced Technology Materials, Inc., Danbury Reagenzzuführbehälter für cvd
US6089184A (en) * 1997-06-11 2000-07-18 Tokyo Electron Limited CVD apparatus and CVD method
US6520218B1 (en) * 1998-09-03 2003-02-18 Advanced Technology Materials, Inc. Container chemical guard
US6202591B1 (en) * 1998-11-12 2001-03-20 Flex Products, Inc. Linear aperture deposition apparatus and coating process
JP2000345345A (ja) * 1999-06-04 2000-12-12 Mitsubishi Electric Corp Ｃｖｄ装置およびｃｖｄ装置用気化装置
US6444038B1 (en) * 1999-12-27 2002-09-03 Morton International, Inc. Dual fritted bubbler
KR100360494B1 (ko) * 1999-09-21 2002-11-13 삼성전자 주식회사 기화장치
US6244331B1 (en) * 1999-10-22 2001-06-12 Intel Corporation Heatsink with integrated blower for improved heat transfer
GB9929279D0 (en) 1999-12-11 2000-02-02 Epichem Ltd An improved method of and apparatus for the delivery of precursors in the vapour phase to a plurality of epitaxial reactor sites
EP1160355B1 (de) * 2000-05-31 2004-10-27 Shipley Company LLC Verdampfer
US6837251B1 (en) * 2000-06-21 2005-01-04 Air Products And Chemicals, Inc. Multiple contents container assembly for ultrapure solvent purging
US6581649B2 (en) * 2001-07-13 2003-06-24 L'air Liquide - Societe Anonyme A'directiore Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude Methods and apparatus for delivering high purity liquids with low vapor pressure
US7780785B2 (en) * 2001-10-26 2010-08-24 Applied Materials, Inc. Gas delivery apparatus for atomic layer deposition
US20030111014A1 (en) 2001-12-18 2003-06-19 Donatucci Matthew B. Vaporizer/delivery vessel for volatile/thermally sensitive solid and liquid compounds
JP2003318170A (ja) 2002-04-26 2003-11-07 Japan Pionics Co Ltd 気化器
JP3822135B2 (ja) 2002-05-13 2006-09-13 日本パイオニクス株式会社 気化供給装置
US7601225B2 (en) 2002-06-17 2009-10-13 Asm International N.V. System for controlling the sublimation of reactants
US7186385B2 (en) * 2002-07-17 2007-03-06 Applied Materials, Inc. Apparatus for providing gas to a processing chamber
US6921062B2 (en) * 2002-07-23 2005-07-26 Advanced Technology Materials, Inc. Vaporizer delivery ampoule
US6915592B2 (en) * 2002-07-29 2005-07-12 Applied Materials, Inc. Method and apparatus for generating gas to a processing chamber
US6797337B2 (en) * 2002-08-19 2004-09-28 Micron Technology, Inc. Method for delivering precursors
US6740586B1 (en) * 2002-11-06 2004-05-25 Advanced Technology Materials, Inc. Vapor delivery system for solid precursors and method of using same
US6909839B2 (en) * 2003-07-23 2005-06-21 Advanced Technology Materials, Inc. Delivery systems for efficient vaporization of precursor source material

Also Published As

Publication number Publication date
TW200525046A (en) 2005-08-01
DE602004026968D1 (de) 2010-06-17
SG130188A1 (en) 2007-03-20
EP1508631A1 (de) 2005-02-23
KR20050020643A (ko) 2005-03-04
ATE466969T1 (de) 2010-05-15
CN100523289C (zh) 2009-08-05
CN1611636A (zh) 2005-05-04
TWI257436B (en) 2006-07-01
JP2005101564A (ja) 2005-04-14
EP1508631B1 (de) 2010-05-05
JP4012181B2 (ja) 2007-11-21
KR100590463B1 (ko) 2006-06-19
US20050039794A1 (en) 2005-02-24
US7261118B2 (en) 2007-08-28
SG109618A1 (en) 2005-03-30

Similar Documents

Publication Publication Date Title
IL163536A0 (en) Method and vessel for the delivery of precursor materials
US5711353A (en) Powder filling method and powder filling device
SG142265A1 (en) Solid source container with inlet plenum
CN100528706C (zh) 具有密封分送阀单元的分送器
KR20110008182U (ko) 에어리스펌프를 갖는 콤팩트 용기
JP2009543742A (ja) ディスペンサー容器
WO2005095228A8 (en) Frozen aerated product in a container and a method for manufacturing such
JPH0377684A (ja) 水ろ過器カートリッジ
CA2480406A1 (en) Packaging container with contents mixing structure
WO2005007560A3 (en) Pressure regulator for a container for a carbonated drink
WO2020147845A1 (zh) 一种打气盖
CN104670635B (zh) 一种容量可调式智能真空容器
AU2002365945A1 (en) Method and apparatus for mixing pulverous material with liquid
KR200439351Y1 (ko) 디스펜서 용기
EP1359117A4 (de) Abfüllvorrichtung und verfahren
JP2006306426A (ja) ポンプ付き二剤混合容器
CA2274359A1 (en) Method and apparatus for removing trihalomethanes and dissolved oxygen from water
US20070029345A1 (en) Method and structure for mixing different materials
EP1219399A4 (de) Füllvorrichtung und füllmethode
KR20070062383A (ko) 이종물질을 수용한 배출장치
JP2789087B2 (ja) 手押しポンプ機構
KR20210064893A (ko) 이종 내용물 토출 용기
JP2984992B2 (ja) 手押しポンプ機構
KR200389425Y1 (ko) 노즐하우징이 장착된 진공포장기
JPH0425240Y2 (de)

Legal Events

Date Code Title Description
KB Patent renewed
KB Patent renewed