IL161550A0 - Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces - Google Patents

Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces

Info

Publication number
IL161550A0
IL161550A0 IL16155003A IL16155003A IL161550A0 IL 161550 A0 IL161550 A0 IL 161550A0 IL 16155003 A IL16155003 A IL 16155003A IL 16155003 A IL16155003 A IL 16155003A IL 161550 A0 IL161550 A0 IL 161550A0
Authority
IL
Israel
Prior art keywords
substrate
fluid
wafer surfaces
conduit
head
Prior art date
Application number
IL16155003A
Other languages
English (en)
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/261,839 external-priority patent/US7234477B2/en
Priority claimed from US10/611,140 external-priority patent/US7264007B2/en
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of IL161550A0 publication Critical patent/IL161550A0/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Solid Materials (AREA)
IL16155003A 2002-09-30 2003-09-30 Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces IL161550A0 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/261,839 US7234477B2 (en) 2000-06-30 2002-09-30 Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces
US10/611,140 US7264007B2 (en) 2002-09-30 2003-06-30 Method and apparatus for cleaning a substrate using megasonic power
PCT/US2003/031136 WO2004030052A2 (en) 2002-09-30 2003-09-30 Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces

Publications (1)

Publication Number Publication Date
IL161550A0 true IL161550A0 (en) 2004-09-27

Family

ID=32044980

Family Applications (1)

Application Number Title Priority Date Filing Date
IL16155003A IL161550A0 (en) 2002-09-30 2003-09-30 Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces

Country Status (12)

Country Link
EP (1) EP1500128B1 (de)
JP (1) JP4559226B2 (de)
KR (1) KR101055997B1 (de)
CN (1) CN100431092C (de)
AT (1) ATE365375T1 (de)
AU (1) AU2003277212A1 (de)
DE (1) DE60314508T2 (de)
IL (1) IL161550A0 (de)
PL (1) PL208012B1 (de)
RU (1) RU2338296C2 (de)
TW (1) TWI230397B (de)
WO (1) WO2004030052A2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6954993B1 (en) 2002-09-30 2005-10-18 Lam Research Corporation Concentric proximity processing head
US7520285B2 (en) * 2002-09-30 2009-04-21 Lam Research Corporation Apparatus and method for processing a substrate
US6988326B2 (en) * 2002-09-30 2006-01-24 Lam Research Corporation Phobic barrier meniscus separation and containment
US7093375B2 (en) * 2002-09-30 2006-08-22 Lam Research Corporation Apparatus and method for utilizing a meniscus in substrate processing
JP5043021B2 (ja) 2005-10-04 2012-10-10 アプライド マテリアルズ インコーポレイテッド 基板を乾燥するための方法及び装置
KR100687504B1 (ko) * 2005-10-27 2007-02-27 세메스 주식회사 매엽식 기판 세정 방법
DE102013220252A1 (de) * 2013-10-08 2015-04-09 Rudolph Technologies Germany Gmbh Halte- und Drehvorrichtung für flache Objekte
DE102017111618B4 (de) * 2017-05-29 2021-03-11 CURO GmbH Vorrichtung, System und Verfahren zur Trocknung einer Halbleiterscheibe
US11352711B2 (en) * 2019-07-16 2022-06-07 Applied Materials, Inc. Fluid recovery in semiconductor processing
CN111312580B (zh) * 2020-02-27 2022-07-15 至微半导体(上海)有限公司 一种用于高深宽比图形晶圆的微幅震动方法
CN111211043B (zh) * 2020-02-27 2022-10-18 至微半导体(上海)有限公司 一种用于提升晶圆干燥效率的干燥方法
CN111312581B (zh) * 2020-02-27 2022-07-15 至微半导体(上海)有限公司 一种可提升晶圆干燥效率的排气方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08264626A (ja) * 1994-04-28 1996-10-11 Hitachi Ltd 試料保持方法及び試料表面の流体処理方法並びにそれらの装置
US5975098A (en) * 1995-12-21 1999-11-02 Dainippon Screen Mfg. Co., Ltd. Apparatus for and method of cleaning substrate
JPH1092784A (ja) * 1996-09-10 1998-04-10 Toshiba Microelectron Corp ウェーハ処理装置およびウェーハ処理方法
US6039059A (en) 1996-09-30 2000-03-21 Verteq, Inc. Wafer cleaning system
ATE311665T1 (de) * 1997-09-24 2005-12-15 Imec Inter Uni Micro Electr Verfahren und vorrichtung zum entfernen von einer flüssigkeit von der oberfläche eines rotierenden substrats
EP0905746A1 (de) * 1997-09-24 1999-03-31 Interuniversitair Micro-Elektronica Centrum Vzw Verfahren zum Entfernen einer Flüssigkeit von einer Oberfläche einer umlaufenden Substrat
DE69828592T8 (de) * 1997-09-24 2006-06-08 Interuniversitair Micro-Elektronica Centrum Vzw Verfahren zum entfernen einer flüssigkeit von einer oberfläche einer substrat
US6398975B1 (en) * 1997-09-24 2002-06-04 Interuniversitair Microelektronica Centrum (Imec) Method and apparatus for localized liquid treatment of the surface of a substrate
ATE320661T1 (de) * 1997-09-24 2006-04-15 Imec Inter Uni Micro Electr Verfahren zum entfernen von teilchen und flüssigkeit von der oberfläche eines substrats
JP2000015159A (ja) * 1998-07-02 2000-01-18 Dainippon Screen Mfg Co Ltd 処理液供給装置
JP3873099B2 (ja) * 2000-01-13 2007-01-24 アルプス電気株式会社 基板ガイド装置ならびにこれを用いた洗浄装置
JP2004515053A (ja) * 2000-06-26 2004-05-20 アプライド　マテリアルズ　インコーポレイテッド ウェーハ洗浄方法及び装置
US6555017B1 (en) * 2000-10-13 2003-04-29 The Regents Of The University Of Caliofornia Surface contouring by controlled application of processing fluid using Marangoni effect

Also Published As

Publication number Publication date
JP4559226B2 (ja) 2010-10-06
PL374502A1 (en) 2005-10-31
EP1500128B1 (de) 2007-06-20
CN1579005A (zh) 2005-02-09
EP1500128A2 (de) 2005-01-26
KR20050063748A (ko) 2005-06-28
ATE365375T1 (de) 2007-07-15
WO2004030052A2 (en) 2004-04-08
DE60314508D1 (de) 2007-08-02
WO2004030052A3 (en) 2004-07-29
KR101055997B1 (ko) 2011-08-11
DE60314508T2 (de) 2008-02-21
PL208012B1 (pl) 2011-03-31
RU2004113416A (ru) 2006-07-20
RU2338296C2 (ru) 2008-11-10
TW200411722A (en) 2004-07-01
CN100431092C (zh) 2008-11-05
TWI230397B (en) 2005-04-01
AU2003277212A1 (en) 2004-04-19
JP2006501655A (ja) 2006-01-12

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