IL161550A0 - Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces - Google Patents
Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfacesInfo
- Publication number
- IL161550A0 IL161550A0 IL16155003A IL16155003A IL161550A0 IL 161550 A0 IL161550 A0 IL 161550A0 IL 16155003 A IL16155003 A IL 16155003A IL 16155003 A IL16155003 A IL 16155003A IL 161550 A0 IL161550 A0 IL 161550A0
- Authority
- IL
- Israel
- Prior art keywords
- substrate
- fluid
- wafer surfaces
- conduit
- head
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 4
- 238000001035 drying Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 239000012530 fluid Substances 0.000 abstract 9
- 239000000758 substrate Substances 0.000 abstract 9
- 230000005499 meniscus Effects 0.000 abstract 3
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Drying Of Solid Materials (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/261,839 US7234477B2 (en) | 2000-06-30 | 2002-09-30 | Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces |
US10/611,140 US7264007B2 (en) | 2002-09-30 | 2003-06-30 | Method and apparatus for cleaning a substrate using megasonic power |
PCT/US2003/031136 WO2004030052A2 (en) | 2002-09-30 | 2003-09-30 | Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces |
Publications (1)
Publication Number | Publication Date |
---|---|
IL161550A0 true IL161550A0 (en) | 2004-09-27 |
Family
ID=32044980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL16155003A IL161550A0 (en) | 2002-09-30 | 2003-09-30 | Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces |
Country Status (12)
Country | Link |
---|---|
EP (1) | EP1500128B1 (de) |
JP (1) | JP4559226B2 (de) |
KR (1) | KR101055997B1 (de) |
CN (1) | CN100431092C (de) |
AT (1) | ATE365375T1 (de) |
AU (1) | AU2003277212A1 (de) |
DE (1) | DE60314508T2 (de) |
IL (1) | IL161550A0 (de) |
PL (1) | PL208012B1 (de) |
RU (1) | RU2338296C2 (de) |
TW (1) | TWI230397B (de) |
WO (1) | WO2004030052A2 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6954993B1 (en) | 2002-09-30 | 2005-10-18 | Lam Research Corporation | Concentric proximity processing head |
US7520285B2 (en) * | 2002-09-30 | 2009-04-21 | Lam Research Corporation | Apparatus and method for processing a substrate |
US6988326B2 (en) * | 2002-09-30 | 2006-01-24 | Lam Research Corporation | Phobic barrier meniscus separation and containment |
US7093375B2 (en) * | 2002-09-30 | 2006-08-22 | Lam Research Corporation | Apparatus and method for utilizing a meniscus in substrate processing |
JP5043021B2 (ja) | 2005-10-04 | 2012-10-10 | アプライド マテリアルズ インコーポレイテッド | 基板を乾燥するための方法及び装置 |
KR100687504B1 (ko) * | 2005-10-27 | 2007-02-27 | 세메스 주식회사 | 매엽식 기판 세정 방법 |
DE102013220252A1 (de) * | 2013-10-08 | 2015-04-09 | Rudolph Technologies Germany Gmbh | Halte- und Drehvorrichtung für flache Objekte |
DE102017111618B4 (de) * | 2017-05-29 | 2021-03-11 | CURO GmbH | Vorrichtung, System und Verfahren zur Trocknung einer Halbleiterscheibe |
US11352711B2 (en) * | 2019-07-16 | 2022-06-07 | Applied Materials, Inc. | Fluid recovery in semiconductor processing |
CN111312580B (zh) * | 2020-02-27 | 2022-07-15 | 至微半导体(上海)有限公司 | 一种用于高深宽比图形晶圆的微幅震动方法 |
CN111211043B (zh) * | 2020-02-27 | 2022-10-18 | 至微半导体(上海)有限公司 | 一种用于提升晶圆干燥效率的干燥方法 |
CN111312581B (zh) * | 2020-02-27 | 2022-07-15 | 至微半导体(上海)有限公司 | 一种可提升晶圆干燥效率的排气方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08264626A (ja) * | 1994-04-28 | 1996-10-11 | Hitachi Ltd | 試料保持方法及び試料表面の流体処理方法並びにそれらの装置 |
US5975098A (en) * | 1995-12-21 | 1999-11-02 | Dainippon Screen Mfg. Co., Ltd. | Apparatus for and method of cleaning substrate |
JPH1092784A (ja) * | 1996-09-10 | 1998-04-10 | Toshiba Microelectron Corp | ウェーハ処理装置およびウェーハ処理方法 |
US6039059A (en) | 1996-09-30 | 2000-03-21 | Verteq, Inc. | Wafer cleaning system |
ATE311665T1 (de) * | 1997-09-24 | 2005-12-15 | Imec Inter Uni Micro Electr | Verfahren und vorrichtung zum entfernen von einer flüssigkeit von der oberfläche eines rotierenden substrats |
EP0905746A1 (de) * | 1997-09-24 | 1999-03-31 | Interuniversitair Micro-Elektronica Centrum Vzw | Verfahren zum Entfernen einer Flüssigkeit von einer Oberfläche einer umlaufenden Substrat |
DE69828592T8 (de) * | 1997-09-24 | 2006-06-08 | Interuniversitair Micro-Elektronica Centrum Vzw | Verfahren zum entfernen einer flüssigkeit von einer oberfläche einer substrat |
US6398975B1 (en) * | 1997-09-24 | 2002-06-04 | Interuniversitair Microelektronica Centrum (Imec) | Method and apparatus for localized liquid treatment of the surface of a substrate |
ATE320661T1 (de) * | 1997-09-24 | 2006-04-15 | Imec Inter Uni Micro Electr | Verfahren zum entfernen von teilchen und flüssigkeit von der oberfläche eines substrats |
JP2000015159A (ja) * | 1998-07-02 | 2000-01-18 | Dainippon Screen Mfg Co Ltd | 処理液供給装置 |
JP3873099B2 (ja) * | 2000-01-13 | 2007-01-24 | アルプス電気株式会社 | 基板ガイド装置ならびにこれを用いた洗浄装置 |
JP2004515053A (ja) * | 2000-06-26 | 2004-05-20 | アプライド マテリアルズ インコーポレイテッド | ウェーハ洗浄方法及び装置 |
US6555017B1 (en) * | 2000-10-13 | 2003-04-29 | The Regents Of The University Of Caliofornia | Surface contouring by controlled application of processing fluid using Marangoni effect |
-
2003
- 2003-09-30 PL PL374502A patent/PL208012B1/pl not_active IP Right Cessation
- 2003-09-30 WO PCT/US2003/031136 patent/WO2004030052A2/en active Application Filing
- 2003-09-30 DE DE60314508T patent/DE60314508T2/de not_active Expired - Lifetime
- 2003-09-30 EP EP03798815A patent/EP1500128B1/de not_active Expired - Lifetime
- 2003-09-30 AT AT03798815T patent/ATE365375T1/de active
- 2003-09-30 JP JP2004540334A patent/JP4559226B2/ja not_active Expired - Fee Related
- 2003-09-30 AU AU2003277212A patent/AU2003277212A1/en not_active Abandoned
- 2003-09-30 CN CNB03801405XA patent/CN100431092C/zh not_active Expired - Fee Related
- 2003-09-30 RU RU2004113416/28A patent/RU2338296C2/ru not_active IP Right Cessation
- 2003-09-30 TW TW092127052A patent/TWI230397B/zh not_active IP Right Cessation
- 2003-09-30 KR KR1020047006142A patent/KR101055997B1/ko not_active IP Right Cessation
- 2003-09-30 IL IL16155003A patent/IL161550A0/xx unknown
Also Published As
Publication number | Publication date |
---|---|
JP4559226B2 (ja) | 2010-10-06 |
PL374502A1 (en) | 2005-10-31 |
EP1500128B1 (de) | 2007-06-20 |
CN1579005A (zh) | 2005-02-09 |
EP1500128A2 (de) | 2005-01-26 |
KR20050063748A (ko) | 2005-06-28 |
ATE365375T1 (de) | 2007-07-15 |
WO2004030052A2 (en) | 2004-04-08 |
DE60314508D1 (de) | 2007-08-02 |
WO2004030052A3 (en) | 2004-07-29 |
KR101055997B1 (ko) | 2011-08-11 |
DE60314508T2 (de) | 2008-02-21 |
PL208012B1 (pl) | 2011-03-31 |
RU2004113416A (ru) | 2006-07-20 |
RU2338296C2 (ru) | 2008-11-10 |
TW200411722A (en) | 2004-07-01 |
CN100431092C (zh) | 2008-11-05 |
TWI230397B (en) | 2005-04-01 |
AU2003277212A1 (en) | 2004-04-19 |
JP2006501655A (ja) | 2006-01-12 |
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