IL150254A0 - Linear drive system for use in a plasma processing system - Google Patents

Linear drive system for use in a plasma processing system

Info

Publication number
IL150254A0
IL150254A0 IL15025401A IL15025401A IL150254A0 IL 150254 A0 IL150254 A0 IL 150254A0 IL 15025401 A IL15025401 A IL 15025401A IL 15025401 A IL15025401 A IL 15025401A IL 150254 A0 IL150254 A0 IL 150254A0
Authority
IL
Israel
Prior art keywords
plasma processing
linear drive
processing system
drive system
linear
Prior art date
Application number
IL15025401A
Other languages
English (en)
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of IL150254A0 publication Critical patent/IL150254A0/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
IL15025401A 1999-12-30 2001-01-02 Linear drive system for use in a plasma processing system IL150254A0 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/474,843 US6350317B1 (en) 1999-12-30 1999-12-30 Linear drive system for use in a plasma processing system
PCT/US2001/000057 WO2001050498A1 (en) 1999-12-30 2001-01-02 Linear drive system for use in a plasma processing system

Publications (1)

Publication Number Publication Date
IL150254A0 true IL150254A0 (en) 2002-12-01

Family

ID=23885169

Family Applications (1)

Application Number Title Priority Date Filing Date
IL15025401A IL150254A0 (en) 1999-12-30 2001-01-02 Linear drive system for use in a plasma processing system

Country Status (9)

Country Link
US (3) US6350317B1 (ja)
EP (1) EP1243017B1 (ja)
JP (1) JP4991069B2 (ja)
KR (1) KR100751748B1 (ja)
CN (1) CN100392792C (ja)
AU (1) AU2925701A (ja)
DE (1) DE60127232T2 (ja)
IL (1) IL150254A0 (ja)
WO (1) WO2001050498A1 (ja)

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CN113035680A (zh) * 2019-12-24 2021-06-25 中微半导体设备(上海)股份有限公司 用于真空设备的调平机构和等离子体处理装置
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Also Published As

Publication number Publication date
WO2001050498A1 (en) 2001-07-12
US6669811B2 (en) 2003-12-30
US6863784B2 (en) 2005-03-08
KR100751748B1 (ko) 2007-08-27
WO2001050498A9 (en) 2002-12-05
DE60127232D1 (de) 2007-04-26
JP2003519908A (ja) 2003-06-24
CN1429398A (zh) 2003-07-09
US20020100555A1 (en) 2002-08-01
DE60127232T2 (de) 2007-11-15
EP1243017B1 (en) 2007-03-14
AU2925701A (en) 2001-07-16
KR20020063599A (ko) 2002-08-03
JP4991069B2 (ja) 2012-08-01
CN100392792C (zh) 2008-06-04
US6350317B1 (en) 2002-02-26
EP1243017A1 (en) 2002-09-25
US20040108301A1 (en) 2004-06-10

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