IL147278A - Atmospheric wafer transfer module with nest for wafer transport robot and method of implementing same - Google Patents

Atmospheric wafer transfer module with nest for wafer transport robot and method of implementing same

Info

Publication number
IL147278A
IL147278A IL14727800A IL14727800A IL147278A IL 147278 A IL147278 A IL 147278A IL 14727800 A IL14727800 A IL 14727800A IL 14727800 A IL14727800 A IL 14727800A IL 147278 A IL147278 A IL 147278A
Authority
IL
Israel
Prior art keywords
nest
transfer module
wafer
transport robot
atmospheric
Prior art date
Application number
IL14727800A
Other languages
English (en)
Other versions
IL147278A0 (en
Inventor
Tony R Kroeker
Larry Cook
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of IL147278A0 publication Critical patent/IL147278A0/xx
Publication of IL147278A publication Critical patent/IL147278A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67167—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers surrounding a central transfer chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67766—Mechanical parts of transfer devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
IL14727800A 1999-06-29 2000-06-08 Atmospheric wafer transfer module with nest for wafer transport robot and method of implementing same IL147278A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/342,669 US6244811B1 (en) 1999-06-29 1999-06-29 Atmospheric wafer transfer module with nest for wafer transport robot
PCT/US2000/040191 WO2001001454A2 (en) 1999-06-29 2000-06-08 Atmospheric wafer transfer module with nest for wafer transport robot and method of implementing same

Publications (2)

Publication Number Publication Date
IL147278A0 IL147278A0 (en) 2002-08-14
IL147278A true IL147278A (en) 2005-09-25

Family

ID=23342780

Family Applications (1)

Application Number Title Priority Date Filing Date
IL14727800A IL147278A (en) 1999-06-29 2000-06-08 Atmospheric wafer transfer module with nest for wafer transport robot and method of implementing same

Country Status (10)

Country Link
US (1) US6244811B1 (zh)
EP (1) EP1192645A2 (zh)
JP (1) JP2003503843A (zh)
KR (1) KR100699207B1 (zh)
CN (1) CN1209790C (zh)
AU (1) AU6802200A (zh)
IL (1) IL147278A (zh)
MY (1) MY117518A (zh)
TW (1) TW508625B (zh)
WO (1) WO2001001454A2 (zh)

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JP4937459B2 (ja) * 2001-04-06 2012-05-23 東京エレクトロン株式会社 クラスタツールおよび搬送制御方法
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US6729824B2 (en) * 2001-12-14 2004-05-04 Applied Materials, Inc. Dual robot processing system
US7010388B2 (en) * 2003-05-22 2006-03-07 Axcelis Technologies, Inc. Work-piece treatment system having load lock and buffer
KR100909993B1 (ko) * 2004-07-09 2009-07-29 로제 가부시키가이샤 구동원 및 반송 로보트
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US20070020066A1 (en) * 2005-07-12 2007-01-25 Lkt Automation Sdn Bhd Centering and orientation apparatus
US8794896B2 (en) * 2005-12-14 2014-08-05 Tokyo Electron Limited Vacuum processing apparatus and zonal airflow generating unit
JP4098338B2 (ja) 2006-07-20 2008-06-11 川崎重工業株式会社 ウェハ移載装置および基板移載装置
TWI398335B (zh) 2006-11-27 2013-06-11 Nidec Sankyo Corp Workpiece conveying system
US20080242108A1 (en) * 2007-04-02 2008-10-02 Taiwan Semiconductor Manufacturing Co., Ltd. Method for fabricating semiconductor device
GB2482264B (en) * 2007-09-14 2012-04-18 Doo Technologies Fzco Method and system for processing of images
US8992153B2 (en) * 2008-06-30 2015-03-31 Intevac, Inc. System and method for substrate transport
US9157145B2 (en) 2008-07-29 2015-10-13 Intevac, Inc. Processing tool with combined sputter and evaporation deposition sources
WO2010105967A2 (en) * 2009-03-18 2010-09-23 Oc Oerlikon Balzers Ag Vacuum treatment apparatus
JP6271322B2 (ja) * 2014-03-31 2018-01-31 東京エレクトロン株式会社 基板処理システム
CN105826227A (zh) * 2015-01-06 2016-08-03 沈阳新松机器人自动化股份有限公司 一种真空传输装置
US10249521B2 (en) 2016-03-17 2019-04-02 Lam Research Ag Wet-dry integrated wafer processing system
CN107665829B (zh) 2017-08-24 2019-12-17 长江存储科技有限责任公司 晶圆混合键合中提高金属引线制程安全性的方法
CN116435246B (zh) * 2023-06-15 2023-09-08 上海果纳半导体技术有限公司 晶圆盒夹持装置

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Also Published As

Publication number Publication date
AU6802200A (en) 2001-01-31
MY117518A (en) 2004-07-31
JP2003503843A (ja) 2003-01-28
WO2001001454A9 (en) 2002-02-07
CN1209790C (zh) 2005-07-06
WO2001001454A2 (en) 2001-01-04
IL147278A0 (en) 2002-08-14
KR100699207B1 (ko) 2007-03-27
TW508625B (en) 2002-11-01
CN1409867A (zh) 2003-04-09
US6244811B1 (en) 2001-06-12
EP1192645A2 (en) 2002-04-03
KR20020063109A (ko) 2002-08-01
WO2001001454A3 (en) 2001-07-12

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Legal Events

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MM9K Patent not in force due to non-payment of renewal fees