IL144024A0 - Reactor for generating moisture - Google Patents
Reactor for generating moistureInfo
- Publication number
- IL144024A0 IL144024A0 IL14402400A IL14402400A IL144024A0 IL 144024 A0 IL144024 A0 IL 144024A0 IL 14402400 A IL14402400 A IL 14402400A IL 14402400 A IL14402400 A IL 14402400A IL 144024 A0 IL144024 A0 IL 144024A0
- Authority
- IL
- Israel
- Prior art keywords
- reactor
- generating moisture
- moisture
- generating
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
- B01J12/007—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor in the presence of catalytically active bodies, e.g. porous plates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B5/00—Water
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00054—Controlling or regulating the heat exchange system
- B01J2219/00056—Controlling or regulating the heat exchange system involving measured parameters
- B01J2219/00058—Temperature measurement
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
- B01J2219/00087—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
- B01J2219/00087—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
- B01J2219/00096—Plates
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Catalysts (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Gas Burners (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2000/003659 WO2001094254A1 (fr) | 2000-06-05 | 2000-06-05 | Reacteur de production d'humidite |
Publications (1)
Publication Number | Publication Date |
---|---|
IL144024A0 true IL144024A0 (en) | 2002-04-21 |
Family
ID=11736122
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL14402400A IL144024A0 (en) | 2000-06-05 | 2000-06-05 | Reactor for generating moisture |
Country Status (7)
Country | Link |
---|---|
US (2) | US6919056B2 (xx) |
EP (1) | EP1238942A4 (xx) |
KR (1) | KR100402665B1 (xx) |
CN (1) | CN1202987C (xx) |
CA (1) | CA2369047C (xx) |
IL (1) | IL144024A0 (xx) |
WO (1) | WO2001094254A1 (xx) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0398417B1 (en) * | 1989-05-18 | 1992-09-23 | Quest International B.V. | Hydroxyfuranone preparation |
SG94873A1 (en) * | 1999-08-06 | 2003-03-18 | Fujikin Kk | Reactor for generating high purity moisture |
IL144024A0 (en) * | 2000-06-05 | 2002-04-21 | Fujikin Kk | Reactor for generating moisture |
JP2002274812A (ja) * | 2001-03-23 | 2002-09-25 | Fujikin Inc | 水分発生用反応炉 |
JP4119218B2 (ja) * | 2002-10-16 | 2008-07-16 | 忠弘 大見 | 水分発生用反応炉の白金コーティング触媒層の形成方法 |
US20050252449A1 (en) * | 2004-05-12 | 2005-11-17 | Nguyen Son T | Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system |
US8323754B2 (en) | 2004-05-21 | 2012-12-04 | Applied Materials, Inc. | Stabilization of high-k dielectric materials |
JP4399326B2 (ja) * | 2004-07-20 | 2010-01-13 | 株式会社フジキン | 水分発生用反応炉とこれを用いた水分発生供給装置 |
US7786880B2 (en) * | 2007-06-01 | 2010-08-31 | Honeywell International Inc. | Smoke detector |
JP5837733B2 (ja) * | 2009-04-24 | 2015-12-24 | 国立大学法人東北大学 | 水分発生用反応炉 |
KR20240052957A (ko) * | 2022-03-14 | 2024-04-23 | 가부시키가이샤 후지킨 | 수분 발생용 반응로 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06147420A (ja) * | 1992-11-12 | 1994-05-27 | Matsushita Electric Ind Co Ltd | 触媒燃焼装置 |
EP1911722A2 (en) * | 1996-01-29 | 2008-04-16 | FUJIKIN Inc. | Method for generating moisture, reactor for generating moisture, method for controlling temperature of reactor for generating moisture, and method for forming platinum-coated catalyst layer |
WO1997048640A1 (fr) * | 1996-06-20 | 1997-12-24 | Ultraclean Technology Research Institute | Procede de generation d'humidite et generateur d'humidite |
JP3644790B2 (ja) * | 1997-04-28 | 2005-05-11 | 忠弘 大見 | 水分発生用反応炉 |
JP3808975B2 (ja) * | 1997-06-17 | 2006-08-16 | 忠弘 大見 | 半導体製造用水分の発生方法 |
JP3644810B2 (ja) * | 1997-12-10 | 2005-05-11 | 株式会社フジキン | 少流量の水分供給方法 |
JP3563950B2 (ja) * | 1998-01-06 | 2004-09-08 | 株式会社ルネサステクノロジ | 水素含有排ガス処理装置 |
JP3639440B2 (ja) * | 1998-09-02 | 2005-04-20 | 忠弘 大見 | 水分発生用反応炉 |
JP4121197B2 (ja) | 1998-10-20 | 2008-07-23 | 三洋電機株式会社 | 冷凍庫 |
JP3686762B2 (ja) * | 1998-12-04 | 2005-08-24 | 株式会社フジキン | 水分発生用反応炉 |
JP3679636B2 (ja) * | 1998-12-04 | 2005-08-03 | 株式会社フジキン | 水分発生用反応炉 |
SG94873A1 (en) * | 1999-08-06 | 2003-03-18 | Fujikin Kk | Reactor for generating high purity moisture |
IL144024A0 (en) * | 2000-06-05 | 2002-04-21 | Fujikin Kk | Reactor for generating moisture |
-
2000
- 2000-06-05 IL IL14402400A patent/IL144024A0/xx not_active IP Right Cessation
- 2000-06-05 CN CNB008012059A patent/CN1202987C/zh not_active Expired - Lifetime
- 2000-06-05 EP EP00931707A patent/EP1238942A4/en not_active Withdrawn
- 2000-06-05 CA CA002369047A patent/CA2369047C/en not_active Expired - Fee Related
- 2000-06-05 WO PCT/JP2000/003659 patent/WO2001094254A1/ja active IP Right Grant
- 2000-06-05 KR KR10-2001-7002513A patent/KR100402665B1/ko active IP Right Grant
-
2001
- 2001-07-12 US US09/905,209 patent/US6919056B2/en not_active Expired - Lifetime
-
2004
- 2004-07-07 US US10/884,917 patent/US7008598B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CA2369047A1 (en) | 2001-12-13 |
US20010048907A1 (en) | 2001-12-06 |
CN1202987C (zh) | 2005-05-25 |
CA2369047C (en) | 2006-12-19 |
CN1356961A (zh) | 2002-07-03 |
KR20020041324A (ko) | 2002-06-01 |
EP1238942A4 (en) | 2005-07-06 |
US6919056B2 (en) | 2005-07-19 |
WO2001094254A1 (fr) | 2001-12-13 |
EP1238942A1 (en) | 2002-09-11 |
KR100402665B1 (ko) | 2003-10-22 |
US20040247502A1 (en) | 2004-12-09 |
US7008598B2 (en) | 2006-03-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FF | Patent granted | ||
KB | Patent renewed | ||
KB | Patent renewed | ||
KB | Patent renewed | ||
MM9K | Patent not in force due to non-payment of renewal fees |