IL141595A0 - Method of removing organic materials from substrates - Google Patents

Method of removing organic materials from substrates

Info

Publication number
IL141595A0
IL141595A0 IL14159599A IL14159599A IL141595A0 IL 141595 A0 IL141595 A0 IL 141595A0 IL 14159599 A IL14159599 A IL 14159599A IL 14159599 A IL14159599 A IL 14159599A IL 141595 A0 IL141595 A0 IL 141595A0
Authority
IL
Israel
Prior art keywords
substrates
organic materials
removing organic
residues
films
Prior art date
Application number
IL14159599A
Other languages
English (en)
Original Assignee
Anon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anon Inc filed Critical Anon Inc
Publication of IL141595A0 publication Critical patent/IL141595A0/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02054—Cleaning before device manufacture, i.e. Begin-Of-Line process combining dry and wet cleaning steps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/427—Stripping or agents therefor using plasma means only

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Plasma & Fusion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Treating Waste Gases (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Drying Of Semiconductors (AREA)
  • Liquid Crystal (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Magnetic Heads (AREA)
  • Control And Other Processes For Unpacking Of Materials (AREA)
IL14159599A 1998-08-27 1999-08-20 Method of removing organic materials from substrates IL141595A0 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14144398A 1998-08-27 1998-08-27
PCT/US1999/019018 WO2000012231A1 (en) 1998-08-27 1999-08-20 Method of removing organic materials from substrates

Publications (1)

Publication Number Publication Date
IL141595A0 true IL141595A0 (en) 2002-03-10

Family

ID=22495715

Family Applications (1)

Application Number Title Priority Date Filing Date
IL14159599A IL141595A0 (en) 1998-08-27 1999-08-20 Method of removing organic materials from substrates

Country Status (10)

Country Link
EP (1) EP1123166B1 (de)
JP (1) JP3611196B2 (de)
KR (1) KR100391526B1 (de)
CN (1) CN1234472C (de)
AT (1) ATE347454T1 (de)
CA (1) CA2341548C (de)
DE (1) DE69934326T2 (de)
IL (1) IL141595A0 (de)
MY (1) MY125913A (de)
WO (1) WO2000012231A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6554004B1 (en) 2000-11-07 2003-04-29 Motorola, Inc. Method for removing etch residue resulting from a process for forming a via
US6756187B2 (en) 2002-01-04 2004-06-29 Nec Lcd Technologies, Ltd. Method for removing patterned layer from lower layer through reflow
JP4979941B2 (ja) * 2005-03-30 2012-07-18 Ｈｏｙａ株式会社 マスクブランクス用ガラス基板の製造方法、マスクブランクスの製造方法
US8034189B2 (en) * 2005-05-02 2011-10-11 Nalco Company Processes for surface cleaning
KR20080051961A (ko) 2006-12-07 2008-06-11 한국전자통신연구원 플렉시블 기판의 세정 방법
JP5151297B2 (ja) * 2007-07-27 2013-02-27 宇部興産株式会社 樹脂フィルムの製造方法、導電層積層樹脂フィルムの製造方法
EP2185298B1 (de) * 2007-07-31 2012-07-04 Corning Incorporated Reinigungsverfahren für optische duv-elemente zur verlängerung ihrer lebenszeit
KR100912704B1 (ko) * 2008-04-22 2009-08-19 세메스 주식회사 기판 처리 장치 및 그의 포토레지스트 제거 방법
CN104779178B (zh) * 2014-01-13 2018-10-16 中芯国际集成电路制造(上海)有限公司 底部防反射层形成方法
TWI528070B (zh) * 2014-04-18 2016-04-01 遠東科技大學 微波加熱分離液晶玻璃的高分子膜之方法
CN104117501A (zh) * 2014-06-26 2014-10-29 苏州一合光学有限公司 超声波清洗机的槽体布局结构
KR102134261B1 (ko) * 2018-10-25 2020-07-16 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
CN109898089A (zh) * 2019-04-26 2019-06-18 宁德阿李科技有限公司 一种铝板表面处理方法
KR20220147617A (ko) * 2020-03-02 2022-11-03 인프리아 코포레이션 무기 레지스트 패터닝을 위한 공정 환경

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4363673A (en) * 1981-05-22 1982-12-14 The Dow Chemical Company Process for the removal of carbon from solid surfaces
WO1989000895A1 (en) * 1987-07-29 1989-02-09 Purusar Corporation Surface treatment to remove impurities in microrecesses
US5037506A (en) * 1990-09-06 1991-08-06 Subhash Gupta Method of stripping layers of organic materials
US5227001A (en) * 1990-10-19 1993-07-13 Integrated Process Equipment Corporation Integrated dry-wet semiconductor layer removal apparatus and method
US5763016A (en) * 1996-12-19 1998-06-09 Anon, Incorporated Method of forming patterns in organic coatings films and layers

Also Published As

Publication number Publication date
EP1123166A1 (de) 2001-08-16
ATE347454T1 (de) 2006-12-15
WO2000012231A1 (en) 2000-03-09
KR100391526B1 (ko) 2003-07-12
EP1123166A4 (de) 2003-08-06
CA2341548A1 (en) 2000-03-09
JP3611196B2 (ja) 2005-01-19
CA2341548C (en) 2006-12-19
KR20010109267A (ko) 2001-12-08
CN1359316A (zh) 2002-07-17
EP1123166B1 (de) 2006-12-06
CN1234472C (zh) 2006-01-04
DE69934326D1 (de) 2007-01-18
JP2002523906A (ja) 2002-07-30
DE69934326T2 (de) 2007-06-21
MY125913A (en) 2006-08-30

Similar Documents

Publication Publication Date Title
IL141595A0 (en) Method of removing organic materials from substrates
MY122745A (en) Method for removing an aluminide coating from a substrate
GB2277095A (en) Finish coating composition and method of forming its coating film
MXPA03011185A (es) Componentes beneficiosos en sustratos desviados a la parte superior.
AU4183596A (en) Copper coating
EP0809283A3 (de) Verfahren zur Behandlung von Scheiben
BR9814289A (pt) Processo e aparelho de revestimento por spin para sistemas de dióxido de carbono lìquido
BR0206296A (pt) Método e dispositivo para melhorar a uniformidade de um revestimento úmido em um substrato, e, aparelho de revestimento
BR9810241A (pt) Agente de limpeza para limpar a superfìcie de um substrato, composição de sub-revestimento para formar um sub-revestimento sobre a superfìcie de um substrato, processo para formar um revestimento fotocataliticamente hidrofilicável sobre a superfìcie de um substrato, conjunto, e, membro
BR9407254A (pt) Solução de enxaguamento para o tratamento de substratos de metal revestidos por conversão processo para tratamento de substratos de metal revestido por conversão e para preparação de uma solução de enxaguamento e uso de uma composição
BR0116726A (pt) Método e aparelho para remover pelìcula adesiva de um substrato
DE59812719D1 (de) Verfahren und vorrichtung zur oberflächenbehandlung von substraten
JPS5271386A (en) Method of removing membrane contaminants
CA2021315A1 (en) Plasma removal of unwanted material
HUP0100008A2 (hu) A gázok kezelésére szolgáló oldatok okozta korrózió gátlása
ATE24941T1 (de) Verfahren und vorrichtung zur herstellung einer polymerisierten schicht auf einem substrat.
HU9602568D0 (en) Protective polysaccharide film
KR960026316A (ko) 반도체 기판의 세정방법
SE7701645L (sv) Koaguleringsoverdragningsforfarande
JPS5524923A (en) Manufacture of transparent titanium oxide film
JPH0351732B2 (de)
CA2123349A1 (en) Surface Treatment Process for Liquid Crystal Cell Substrates
JPS5275183A (en) Method and apparatus for washing of treating objects
GB1081359A (en) Polymer coating removal process
JPH0788969A (ja) ポリオレフィン樹脂成形物の表面改質方法

Legal Events

Date Code Title Description
FF Patent granted
KB Patent renewed
KB Patent renewed
MM9K Patent not in force due to non-payment of renewal fees