IL138540A0 - Mass spectrometer, mass spectrometry, and monitoring system - Google Patents
Mass spectrometer, mass spectrometry, and monitoring systemInfo
- Publication number
- IL138540A0 IL138540A0 IL13854000A IL13854000A IL138540A0 IL 138540 A0 IL138540 A0 IL 138540A0 IL 13854000 A IL13854000 A IL 13854000A IL 13854000 A IL13854000 A IL 13854000A IL 138540 A0 IL138540 A0 IL 138540A0
- Authority
- IL
- Israel
- Prior art keywords
- mass
- monitoring system
- mass spectrometry
- mass spectrometer
- spectrometer
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/16—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission
- H01J49/168—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission field ionisation, e.g. corona discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
- H01J49/0422—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for gaseous samples
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
- G01N30/02—Column chromatography
- G01N30/62—Detectors specially adapted therefor
- G01N30/72—Mass spectrometers
- G01N30/7233—Mass spectrometers interfaced to liquid or supercritical fluid chromatograph
- G01N30/724—Nebulising, aerosol formation or ionisation
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Electron Tubes For Measurement (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26604499A JP4054493B2 (ja) | 1999-09-20 | 1999-09-20 | イオン源 |
JP2000247937A JP4126150B2 (ja) | 2000-08-10 | 2000-08-10 | 質量分析装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
IL138540A0 true IL138540A0 (en) | 2001-10-31 |
Family
ID=26547283
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL13854000A IL138540A0 (en) | 1999-09-20 | 2000-09-18 | Mass spectrometer, mass spectrometry, and monitoring system |
Country Status (4)
Country | Link |
---|---|
US (2) | US6686592B1 (de) |
EP (2) | EP1093151B1 (de) |
DE (1) | DE60044892D1 (de) |
IL (1) | IL138540A0 (de) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE60044892D1 (de) * | 1999-09-20 | 2010-10-14 | Hitachi Ltd | Ionenquelle, Massenspektrometer, Massenspektrometrie und Überwachungssystem |
JP3701182B2 (ja) * | 2000-08-24 | 2005-09-28 | 株式会社日立製作所 | 出入管理方法及び出入管理システム |
JP3855153B2 (ja) | 2001-07-05 | 2006-12-06 | 株式会社日立製作所 | セキュリティシステム |
JP2004028675A (ja) * | 2002-06-24 | 2004-01-29 | Hitachi Ltd | 危険物検知システム |
CA2507834C (en) * | 2002-12-02 | 2009-09-29 | Griffin Analytical Technologies, Inc. | Processes for designing mass separators and ion traps, methods for producing mass separators and ion traps, mass spectrometers, ion traps, and methods for analyzing samples |
JP4337584B2 (ja) * | 2004-03-10 | 2009-09-30 | 株式会社日立製作所 | 質量分析装置及びイオン源 |
WO2006002027A2 (en) * | 2004-06-15 | 2006-01-05 | Griffin Analytical Technologies, Inc. | Portable mass spectrometer configured to perform multidimensional mass analysis |
JP4492267B2 (ja) * | 2004-09-16 | 2010-06-30 | 株式会社日立製作所 | 質量分析装置 |
US8680461B2 (en) | 2005-04-25 | 2014-03-25 | Griffin Analytical Technologies, L.L.C. | Analytical instrumentation, apparatuses, and methods |
US8469700B2 (en) * | 2005-09-29 | 2013-06-25 | Rosemount Inc. | Fouling and corrosion detector for burner tips in fired equipment |
JP4507281B2 (ja) | 2006-03-30 | 2010-07-21 | 富士フイルム株式会社 | 画像表示装置、撮像装置および画像表示方法 |
US7804076B2 (en) * | 2006-05-10 | 2010-09-28 | Taiwan Semiconductor Manufacturing Co., Ltd | Insulator for high current ion implanters |
US7992424B1 (en) | 2006-09-14 | 2011-08-09 | Griffin Analytical Technologies, L.L.C. | Analytical instrumentation and sample analysis methods |
US8017919B2 (en) * | 2007-12-28 | 2011-09-13 | Newaire, Inc. | Multi-electrode negative ion generator |
EP2387791A1 (de) * | 2009-01-14 | 2011-11-23 | Sociedad Europea De Analisis Diferencial De Movilidad S.L. | Verbesster ionisator für dampfanalyse mittels entkopplung des ionisationsbereichs vom analysator |
GB2472638B (en) * | 2009-08-14 | 2014-03-19 | Edwards Ltd | Vacuum system |
JP5041495B2 (ja) * | 2010-11-01 | 2012-10-03 | シャープ株式会社 | イオン発生装置 |
JPWO2012090914A1 (ja) * | 2010-12-27 | 2014-06-05 | 株式会社 資生堂 | 質量分析方法、質量分析計及び質量分析システム |
US10026600B2 (en) | 2011-11-16 | 2018-07-17 | Owlstone Medical Limited | Corona ionization apparatus and method |
US9443709B2 (en) * | 2011-11-16 | 2016-09-13 | Owlstone Limited | Corona ionization device and method |
JP5992715B2 (ja) * | 2012-04-05 | 2016-09-14 | シャープ株式会社 | イオン発生装置 |
EP2927930B8 (de) * | 2012-11-29 | 2019-08-21 | Hitachi High-Technologies Corporation | Hybride ionenquelle, massenspektrometer und ionenmobilitätsvorrichtung |
WO2015040383A1 (en) * | 2013-09-20 | 2015-03-26 | Micromass Uk Limited | Interface for ion source and vacuum housing |
EP3047509B1 (de) | 2013-09-20 | 2023-02-22 | Micromass UK Limited | Ioneneinlassanordnung |
GB201317774D0 (en) * | 2013-10-08 | 2013-11-20 | Micromass Ltd | An ion inlet assembly |
US10060838B2 (en) | 2015-04-09 | 2018-08-28 | Ut-Battelle, Llc | Capture probe |
US9632066B2 (en) | 2015-04-09 | 2017-04-25 | Ut-Battelle, Llc | Open port sampling interface |
CN106480436B (zh) * | 2015-08-31 | 2021-02-19 | 中国科学院大连化学物理研究所 | 一种镀层电喷针的制备方法 |
US20190193193A1 (en) * | 2017-12-22 | 2019-06-27 | Arcam Ab | Electron beam source and the use of the same |
US11125657B2 (en) * | 2018-01-30 | 2021-09-21 | Ut-Battelle, Llc | Sampling probe |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4023398A (en) | 1975-03-03 | 1977-05-17 | John Barry French | Apparatus for analyzing trace components |
JPS5725944B2 (de) | 1975-05-12 | 1982-06-01 | ||
US4531056A (en) * | 1983-04-20 | 1985-07-23 | Yale University | Method and apparatus for the mass spectrometric analysis of solutions |
JPS59230244A (ja) | 1984-05-17 | 1984-12-24 | ザ・ガバ−ニング・カウンセル・オブ・ザ・ユニバ−シテイ・オブ・トロント | 痕跡成分を真空室内で分析する方法 |
JPH07118295B2 (ja) * | 1985-10-30 | 1995-12-18 | 株式会社日立製作所 | 質量分析計 |
JPH02135655A (ja) * | 1988-11-16 | 1990-05-24 | Hitachi Ltd | 大気圧イオン化質量分析計 |
JP2756581B2 (ja) | 1989-05-15 | 1998-05-25 | 日本真空技術株式会社 | 液体クロマトグラフィ質量分析計用イオン源 |
JP2872746B2 (ja) | 1990-05-02 | 1999-03-24 | 賢三 平岡 | エレクトロスプレー式質量分析装置 |
US5218203A (en) * | 1991-03-22 | 1993-06-08 | Georgia Tech Research Corporation | Ion source and sample introduction method and apparatus using two stage ionization for producing sample gas ions |
US5331218A (en) | 1992-07-13 | 1994-07-19 | Allegro Microsystems, Inc. | Switched-capacitor notch filter with programmable notch width and depth |
JP3324810B2 (ja) | 1993-01-19 | 2002-09-17 | ブラザー工業株式会社 | ミシン |
JPH06310091A (ja) * | 1993-04-26 | 1994-11-04 | Hitachi Ltd | 大気圧イオン化質量分析計 |
JP3367719B2 (ja) | 1993-09-20 | 2003-01-20 | 株式会社日立製作所 | 質量分析計および静電レンズ |
JP2774774B2 (ja) * | 1994-06-14 | 1998-07-09 | 東京都 | 高速液体クロマトグラフィーと質量分析計を組み合わせた定量分析装置、およびその試料イオン化用コロナ放電電極針 |
JPH08261989A (ja) | 1995-03-24 | 1996-10-11 | Osaka Oxygen Ind Ltd | シラン系ガス中のシロキサンの計測方法 |
KR100341187B1 (ko) * | 1996-12-06 | 2002-08-22 | 닛폰 고칸 가부시키가이샤 | 다이옥신류의발생을억제하는소각장치및방법 |
US6032513A (en) * | 1997-06-30 | 2000-03-07 | Texas Instruments Incorporated | Apparatus and method for measuring contaminants in semiconductor processing chemicals |
JP2941763B2 (ja) * | 1998-02-02 | 1999-08-30 | 三菱重工業株式会社 | ダイオキシン分析装置及びダイオキシン計測システム |
JP3904322B2 (ja) | 1998-04-20 | 2007-04-11 | 株式会社日立製作所 | 分析装置 |
JP3819146B2 (ja) | 1998-04-20 | 2006-09-06 | 株式会社日立製作所 | モニタ装置 |
JP2000028579A (ja) | 1998-07-08 | 2000-01-28 | Hitachi Ltd | 試料ガス採取装置及び危険物探知装置 |
DE60044892D1 (de) * | 1999-09-20 | 2010-10-14 | Hitachi Ltd | Ionenquelle, Massenspektrometer, Massenspektrometrie und Überwachungssystem |
-
2000
- 2000-09-15 DE DE60044892T patent/DE60044892D1/de not_active Expired - Lifetime
- 2000-09-15 EP EP00120100A patent/EP1093151B1/de not_active Expired - Lifetime
- 2000-09-15 EP EP10009000A patent/EP2296167B1/de not_active Expired - Lifetime
- 2000-09-18 US US09/663,796 patent/US6686592B1/en not_active Expired - Lifetime
- 2000-09-18 IL IL13854000A patent/IL138540A0/xx unknown
-
2003
- 2003-09-02 US US10/651,997 patent/US6838664B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP2296167B1 (de) | 2012-11-07 |
EP1093151A2 (de) | 2001-04-18 |
DE60044892D1 (de) | 2010-10-14 |
US6838664B2 (en) | 2005-01-04 |
EP1093151A3 (de) | 2006-05-03 |
EP2296167A1 (de) | 2011-03-16 |
EP1093151B1 (de) | 2010-09-01 |
US20040036020A1 (en) | 2004-02-26 |
US6686592B1 (en) | 2004-02-03 |
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