IL121019A0 - Large-scale low pressure plasma-ion deposition of diamond-like carbon films - Google Patents

Large-scale low pressure plasma-ion deposition of diamond-like carbon films

Info

Publication number
IL121019A0
IL121019A0 IL12101996A IL12101996A IL121019A0 IL 121019 A0 IL121019 A0 IL 121019A0 IL 12101996 A IL12101996 A IL 12101996A IL 12101996 A IL12101996 A IL 12101996A IL 121019 A0 IL121019 A0 IL 121019A0
Authority
IL
Israel
Prior art keywords
diamond
low pressure
pressure plasma
carbon films
ion deposition
Prior art date
Application number
IL12101996A
Other languages
English (en)
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of IL121019A0 publication Critical patent/IL121019A0/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32697Electrostatic control
    • H01J37/32706Polarising the substrate
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S427/00Coating processes
    • Y10S427/103Diamond-like carbon coating, i.e. DLC

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
IL12101996A 1995-10-12 1996-10-09 Large-scale low pressure plasma-ion deposition of diamond-like carbon films IL121019A0 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/542,468 US5712000A (en) 1995-10-12 1995-10-12 Large-scale, low pressure plasma-ion deposition of diamondlike carbon films
PCT/US1996/016146 WO1997013886A1 (en) 1995-10-12 1996-10-09 Method for deposition of diamondlike carbon films

Publications (1)

Publication Number Publication Date
IL121019A0 true IL121019A0 (en) 1997-11-20

Family

ID=24163958

Family Applications (1)

Application Number Title Priority Date Filing Date
IL12101996A IL121019A0 (en) 1995-10-12 1996-10-09 Large-scale low pressure plasma-ion deposition of diamond-like carbon films

Country Status (8)

Country Link
US (1) US5712000A (de)
EP (1) EP0797688B1 (de)
JP (1) JPH10500391A (de)
KR (1) KR980700451A (de)
CA (1) CA2207235C (de)
DE (1) DE69605280T2 (de)
IL (1) IL121019A0 (de)
WO (1) WO1997013886A1 (de)

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JPH09501612A (ja) * 1994-04-08 1997-02-18 マーク エー. レイ, 選択的プラズマ成長
JP3547098B2 (ja) * 1994-06-06 2004-07-28 トヨタ自動車株式会社 溶射方法、溶射層を摺動面とする摺動部材の製造方法、ピストンおよびピストンの製造方法
JP2000120870A (ja) * 1998-10-15 2000-04-28 Teikoku Piston Ring Co Ltd ピストンリング
US6572935B1 (en) * 1999-03-13 2003-06-03 The Regents Of The University Of California Optically transparent, scratch-resistant, diamond-like carbon coatings
JP2000272156A (ja) * 1999-03-26 2000-10-03 Fuji Photo Film Co Ltd カーボン膜の成膜方法
US6335086B1 (en) * 1999-05-03 2002-01-01 Guardian Industries Corporation Hydrophobic coating including DLC on substrate
JP2003501555A (ja) * 1999-06-08 2003-01-14 ナムローゼ・フェンノートシャップ・ベーカート・ソシエテ・アノニム ドープダイヤモンド状カーボン皮膜
AU2905901A (en) * 1999-11-30 2001-06-12 Regents Of The University Of California, The Method for producing fluorinated diamond-like carbon films
US20010044028A1 (en) * 1999-12-30 2001-11-22 Anderson Jerrel Charles Diamond-like carbon coated pet film and pet film glass laminate glazing structures for added hardness and abrasion resistance
US20040028906A1 (en) * 2000-01-04 2004-02-12 Anderson Jerrel Charles Diamond-like carbon coating on glass and plastic for added hardness and abrasion resistance
DE10018143C5 (de) 2000-04-12 2012-09-06 Oerlikon Trading Ag, Trübbach DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems
KR20030001707A (ko) * 2001-06-27 2003-01-08 주식회사 바이오테크이십일 칼날에 대한 다이아몬드성 카본 코팅 방법 및 그에 의해제조된 코팅칼날
EP1361437A1 (de) * 2002-05-07 2003-11-12 Centre National De La Recherche Scientifique (Cnrs) Ein neuer biologischer Tumormarker und Methoden für die Detektion des krebsartigen oder nicht krebsartigen Phenotyps von Zellen
US20060057016A1 (en) * 2002-05-08 2006-03-16 Devendra Kumar Plasma-assisted sintering
US20050233091A1 (en) * 2002-05-08 2005-10-20 Devendra Kumar Plasma-assisted coating
US7560657B2 (en) * 2002-05-08 2009-07-14 Btu International Inc. Plasma-assisted processing in a manufacturing line
US7445817B2 (en) * 2002-05-08 2008-11-04 Btu International Inc. Plasma-assisted formation of carbon structures
US20060233682A1 (en) * 2002-05-08 2006-10-19 Cherian Kuruvilla A Plasma-assisted engine exhaust treatment
US7465362B2 (en) * 2002-05-08 2008-12-16 Btu International, Inc. Plasma-assisted nitrogen surface-treatment
US7498066B2 (en) * 2002-05-08 2009-03-03 Btu International Inc. Plasma-assisted enhanced coating
WO2003095090A1 (en) * 2002-05-08 2003-11-20 Dana Corporation Plasma-assisted carburizing
US7497922B2 (en) * 2002-05-08 2009-03-03 Btu International, Inc. Plasma-assisted gas production
US7638727B2 (en) * 2002-05-08 2009-12-29 Btu International Inc. Plasma-assisted heat treatment
US20060237398A1 (en) * 2002-05-08 2006-10-26 Dougherty Mike L Sr Plasma-assisted processing in a manufacturing line
US7494904B2 (en) * 2002-05-08 2009-02-24 Btu International, Inc. Plasma-assisted doping
US7504061B2 (en) * 2002-05-08 2009-03-17 Leonhard Kurz Gmbh & Co., Kg Method of decorating large plastic 3D objects
US20060062930A1 (en) * 2002-05-08 2006-03-23 Devendra Kumar Plasma-assisted carburizing
US20060228497A1 (en) * 2002-05-08 2006-10-12 Satyendra Kumar Plasma-assisted coating
US7189940B2 (en) 2002-12-04 2007-03-13 Btu International Inc. Plasma-assisted melting
DE102004004177B4 (de) * 2004-01-28 2006-03-02 AxynTeC Dünnschichttechnik GmbH Verfahren zur Herstellung dünner Schichten sowie dessen Verwendung
US7300684B2 (en) * 2004-07-15 2007-11-27 Sub-One Technology, Inc. Method and system for coating internal surfaces of prefabricated process piping in the field
US20080129208A1 (en) * 2004-11-05 2008-06-05 Satyendra Kumar Atmospheric Processing Using Microwave-Generated Plasmas
US20080014466A1 (en) * 2006-07-11 2008-01-17 Ronghua Wei Glass with scratch-resistant coating
US7722748B2 (en) * 2007-03-06 2010-05-25 Southwest Research Institute Apparatus for measuring electrochemical corrosion
JP5904537B2 (ja) * 2011-04-20 2016-04-13 Ntn株式会社 非晶質炭素膜の成膜方法
DE102013206801A1 (de) * 2013-04-16 2014-10-16 Federal-Mogul Nürnberg GmbH Verfahren zur Herstellung eines beschichteten Kolbens
WO2016008687A1 (en) * 2014-07-16 2016-01-21 Biotronik Ag A method and a device forcoating a base body
JP2016053204A (ja) * 2014-09-04 2016-04-14 三井造船株式会社 皮膜形成方法、皮膜形成装置、および皮膜付き部材
US10669635B2 (en) 2014-09-18 2020-06-02 Baker Hughes, A Ge Company, Llc Methods of coating substrates with composite coatings of diamond nanoparticles and metal
US9873827B2 (en) 2014-10-21 2018-01-23 Baker Hughes Incorporated Methods of recovering hydrocarbons using suspensions for enhanced hydrocarbon recovery
US10167392B2 (en) 2014-10-31 2019-01-01 Baker Hughes Incorporated Compositions of coated diamond nanoparticles, methods of forming coated diamond nanoparticles, and methods of forming coatings
US10155899B2 (en) 2015-06-19 2018-12-18 Baker Hughes Incorporated Methods of forming suspensions and methods for recovery of hydrocarbon material from subterranean formations
WO2018018149A1 (en) * 2016-07-29 2018-02-01 Industries Mailhot Inc. A cylinder piston rod and method of fabrication thereof
WO2021150549A1 (en) * 2020-01-20 2021-07-29 Devendra Kumar Process and systems for rapid surface treatment
DE102021208630A1 (de) * 2021-08-09 2023-02-09 Mahle International Gmbh Verfahren zur Herstellung eines Hybridbauteils

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DE3316693A1 (de) * 1983-05-06 1984-11-08 Leybold-Heraeus GmbH, 5000 Köln Verfahren zum herstellen von amorphen kohlenstoffschichten auf substraten und durch das verfahren beschichtete substrate
JPS6065796A (ja) * 1983-09-20 1985-04-15 Nippon Telegr & Teleph Corp <Ntt> 硬質カ−ボン膜及びその製造方法
US4764394A (en) * 1987-01-20 1988-08-16 Wisconsin Alumni Research Foundation Method and apparatus for plasma source ion implantation
JPS63286576A (ja) * 1987-05-19 1988-11-24 Idemitsu Petrochem Co Ltd 硬質炭素膜の製造方法
JP2623611B2 (ja) * 1987-11-17 1997-06-25 株式会社ニコン 硬質炭素膜被覆を施した金属基体
JP2610469B2 (ja) * 1988-02-26 1997-05-14 株式会社 半導体エネルギー研究所 炭素または炭素を主成分とする被膜を形成する方法
JP2572438B2 (ja) * 1989-01-30 1997-01-16 ホーヤ株式会社 ガラスプレス成形型の製造方法
US5112458A (en) * 1989-12-27 1992-05-12 Tdk Corporation Process for producing diamond-like films and apparatus therefor
JPH0625856A (ja) * 1991-05-31 1994-02-01 Tonen Corp ダイヤモンドライクカーボン膜の製膜法
JPH06320636A (ja) * 1993-05-12 1994-11-22 Canon Inc 光学素子成形用型の製造方法
US5401543A (en) * 1993-11-09 1995-03-28 Minnesota Mining And Manufacturing Company Method for forming macroparticle-free DLC films by cathodic arc discharge

Also Published As

Publication number Publication date
WO1997013886A1 (en) 1997-04-17
KR980700451A (ko) 1998-03-30
JPH10500391A (ja) 1998-01-13
DE69605280D1 (de) 1999-12-30
EP0797688B1 (de) 1999-11-24
DE69605280T2 (de) 2000-03-23
EP0797688A1 (de) 1997-10-01
MX9704312A (es) 1997-09-30
US5712000A (en) 1998-01-27
CA2207235C (en) 2001-04-24
CA2207235A1 (en) 1997-04-17

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