MX9704312A - Metodo para la deposicion de peliculas de carbon tipo diamante. - Google Patents

Metodo para la deposicion de peliculas de carbon tipo diamante.

Info

Publication number
MX9704312A
MX9704312A MX9704312A MX9704312A MX9704312A MX 9704312 A MX9704312 A MX 9704312A MX 9704312 A MX9704312 A MX 9704312A MX 9704312 A MX9704312 A MX 9704312A MX 9704312 A MX9704312 A MX 9704312A
Authority
MX
Mexico
Prior art keywords
deposition
substrate
carbonaceous gas
chamber
filament
Prior art date
Application number
MX9704312A
Other languages
English (en)
Other versions
MXPA97004312A (es
Inventor
Ronghuar R Wei
Jesse N Matossian
Original Assignee
He Holdings Inc Hughes Electro
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by He Holdings Inc Hughes Electro filed Critical He Holdings Inc Hughes Electro
Publication of MX9704312A publication Critical patent/MX9704312A/es
Publication of MXPA97004312A publication Critical patent/MXPA97004312A/es

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32697—Electrostatic control
    • H01J37/32706—Polarising the substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S427/00—Coating processes
    • Y10S427/103—Diamond-like carbon coating, i.e. DLC

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Analytical Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

El carbon tipo diamante se deposita sobre un substrato de deposicion (46) en un aparato de deposicion (40) que puede evacuarse y volverse a llenar con un gas carbonáceo. Se genera un plasma (68) en el gas al calentar un filamento (62) dentro de la cámara (42) para producir electrones, y derivar positivamente los filamentos (62) con respecto a la pared de cámara de deposicion (44) para acelerar los electrones hacia el gas carbonáceo. El gas carbonáceo se disocia e ioniza en el plasma resultante (68) para producir iones de carbon cargados de manera positiva. El substrato de deposicion (46) dentro de la cámara (42) se deriva negativamente con respecto a la pared de cámara de deposicion (44), acelerando los iones de carbon a fin de que se depositan sobre la superficie del substrato (46).
MXPA/A/1997/004312A 1995-10-12 1997-06-11 Metodo para la deposicion de peliculas de carbon tipo diamante MXPA97004312A (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08542468 1995-10-12
US08/542,468 US5712000A (en) 1995-10-12 1995-10-12 Large-scale, low pressure plasma-ion deposition of diamondlike carbon films
PCT/US1996/016146 WO1997013886A1 (en) 1995-10-12 1996-10-09 Method for deposition of diamondlike carbon films

Publications (2)

Publication Number Publication Date
MX9704312A true MX9704312A (es) 1997-09-30
MXPA97004312A MXPA97004312A (es) 1998-07-03

Family

ID=

Also Published As

Publication number Publication date
WO1997013886A1 (en) 1997-04-17
IL121019A0 (en) 1997-11-20
EP0797688B1 (en) 1999-11-24
DE69605280T2 (de) 2000-03-23
DE69605280D1 (de) 1999-12-30
EP0797688A1 (en) 1997-10-01
CA2207235C (en) 2001-04-24
US5712000A (en) 1998-01-27
KR980700451A (ko) 1998-03-30
CA2207235A1 (en) 1997-04-17
JPH10500391A (ja) 1998-01-13

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