IL116540A0 - Cylindrical magnetron shield structure - Google Patents

Cylindrical magnetron shield structure

Info

Publication number
IL116540A0
IL116540A0 IL11654095A IL11654095A IL116540A0 IL 116540 A0 IL116540 A0 IL 116540A0 IL 11654095 A IL11654095 A IL 11654095A IL 11654095 A IL11654095 A IL 11654095A IL 116540 A0 IL116540 A0 IL 116540A0
Authority
IL
Israel
Prior art keywords
shield structure
cylindrical magnetron
magnetron shield
cylindrical
shield
Prior art date
Application number
IL11654095A
Other languages
English (en)
Original Assignee
Boc Group Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Boc Group Inc filed Critical Boc Group Inc
Publication of IL116540A0 publication Critical patent/IL116540A0/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32651—Shields, e.g. dark space shields, Faraday shields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3441—Dark space shields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32669—Particular magnets or magnet arrangements for controlling the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3423—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H01J2237/0206—Extinguishing, preventing or controlling unwanted discharges

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
IL11654095A 1995-01-23 1995-12-25 Cylindrical magnetron shield structure IL116540A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/376,859 US5527439A (en) 1995-01-23 1995-01-23 Cylindrical magnetron shield structure

Publications (1)

Publication Number Publication Date
IL116540A0 true IL116540A0 (en) 1996-03-31

Family

ID=23486805

Family Applications (1)

Application Number Title Priority Date Filing Date
IL11654095A IL116540A0 (en) 1995-01-23 1995-12-25 Cylindrical magnetron shield structure

Country Status (10)

Country Link
US (1) US5527439A (xx)
EP (1) EP0724025B1 (xx)
JP (1) JPH08239758A (xx)
KR (1) KR960029488A (xx)
CN (1) CN1134469A (xx)
AU (1) AU690388B2 (xx)
CA (1) CA2165884A1 (xx)
DE (1) DE69620489T2 (xx)
IL (1) IL116540A0 (xx)
ZA (1) ZA96172B (xx)

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US5985102A (en) * 1996-01-29 1999-11-16 Micron Technology, Inc. Kit for electrically isolating collimator of PVD chamber, chamber so modified, and method of using
WO1997032672A1 (en) * 1996-03-04 1997-09-12 Polar Materials, Inc. Method for bulk coating using a plasma process
US5736021A (en) * 1996-07-10 1998-04-07 Applied Materials, Inc. Electrically floating shield in a plasma reactor
EP0969238A1 (en) * 1998-06-29 2000-01-05 Sinvaco N.V. Vacuum tight coupling for tube sections
US6328858B1 (en) * 1998-10-01 2001-12-11 Nexx Systems Packaging, Llc Multi-layer sputter deposition apparatus
US6736948B2 (en) 2002-01-18 2004-05-18 Von Ardenne Anlagentechnik Gmbh Cylindrical AC/DC magnetron with compliant drive system and improved electrical and thermal isolation
US20040129561A1 (en) * 2003-01-07 2004-07-08 Von Ardenne Anlagentechnik Gmbh Cylindrical magnetron magnetic array mid span support
US20050051422A1 (en) * 2003-02-21 2005-03-10 Rietzel James G. Cylindrical magnetron with self cleaning target
US7014741B2 (en) 2003-02-21 2006-03-21 Von Ardenne Anlagentechnik Gmbh Cylindrical magnetron with self cleaning target
US6878242B2 (en) * 2003-04-08 2005-04-12 Guardian Industries Corp. Segmented sputtering target and method/apparatus for using same
US20050224343A1 (en) * 2004-04-08 2005-10-13 Richard Newcomb Power coupling for high-power sputtering
US20060065524A1 (en) * 2004-09-30 2006-03-30 Richard Newcomb Non-bonded rotatable targets for sputtering
US20060096855A1 (en) * 2004-11-05 2006-05-11 Richard Newcomb Cathode arrangement for atomizing a rotatable target pipe
US20060260938A1 (en) * 2005-05-20 2006-11-23 Petrach Philip M Module for Coating System and Associated Technology
US20060278519A1 (en) * 2005-06-10 2006-12-14 Leszek Malaszewski Adaptable fixation for cylindrical magnetrons
US20060278521A1 (en) * 2005-06-14 2006-12-14 Stowell Michael W System and method for controlling ion density and energy using modulated power signals
US20060278524A1 (en) * 2005-06-14 2006-12-14 Stowell Michael W System and method for modulating power signals to control sputtering
US7560011B2 (en) 2005-10-24 2009-07-14 Guardian Industries Corp. Sputtering target and method/apparatus for cooling the target
US20070089982A1 (en) 2005-10-24 2007-04-26 Hendryk Richert Sputtering target and method/apparatus for cooling the target
US7504011B2 (en) * 2005-10-24 2009-03-17 Guardian Industries Corp. Sputtering target and method/apparatus for cooling the target
US20070095281A1 (en) * 2005-11-01 2007-05-03 Stowell Michael W System and method for power function ramping of microwave liner discharge sources
US7842355B2 (en) * 2005-11-01 2010-11-30 Applied Materials, Inc. System and method for modulation of power and power related functions of PECVD discharge sources to achieve new film properties
BE1018645A5 (fr) 2007-09-24 2011-06-07 Ardenne Anlagentech Gmbh Systeme de magnetron avec support de cible blinde.
DE102007063362B3 (de) * 2007-12-28 2009-08-27 Von Ardenne Anlagentechnik Gmbh Abschirmeinrichtung für ein Rohrtarget
WO2009100985A1 (en) * 2008-02-15 2009-08-20 Bekaert Advanced Coatings Nv Multiple grooved vacuum coupling
US20100025229A1 (en) * 2008-07-30 2010-02-04 Guardian Industries Corp. Apparatus and method for sputtering target debris reduction
US20100044222A1 (en) * 2008-08-21 2010-02-25 Guardian Industries Corp., Sputtering target including magnetic field uniformity enhancing sputtering target backing tube
DE102008058528B4 (de) * 2008-11-21 2011-03-03 Von Ardenne Anlagentechnik Gmbh Endblock für eine Magnetronanordnung mit einem rotierenden Target
JP5289035B2 (ja) * 2008-12-24 2013-09-11 キヤノンアネルバ株式会社 スパッタリング装置
US9567666B2 (en) 2009-01-12 2017-02-14 Guardian Industries Corp Apparatus and method for making sputtered films with reduced stress asymmetry
US20100200395A1 (en) 2009-02-06 2010-08-12 Anton Dietrich Techniques for depositing transparent conductive oxide coatings using dual C-MAG sputter apparatuses
US10586689B2 (en) 2009-07-31 2020-03-10 Guardian Europe S.A.R.L. Sputtering apparatus including cathode with rotatable targets, and related methods
US20120067717A1 (en) 2010-09-17 2012-03-22 Guardian Industries Corp. Method of co-sputtering alloys and compounds using a dual C-MAG cathode arrangement and corresponding apparatus
JP2014074188A (ja) * 2010-12-27 2014-04-24 Canon Anelva Corp スパッタリング装置およびスパッタリング方法
JP6244103B2 (ja) 2012-05-04 2017-12-06 ヴァイアヴィ・ソリューションズ・インコーポレイテッドＶｉａｖｉ Ｓｏｌｕｔｉｏｎｓ Ｉｎｃ． 反応性スパッタ堆積のための方法および反応性スパッタ堆積システム
DE102012207930A1 (de) * 2012-05-11 2013-11-14 Siemens Aktiengesellschaft Verfahren zum Betreiben eines Geräts zum Erzeugen einer Mikrowellenstrahlung
US9255323B2 (en) * 2012-06-18 2016-02-09 Apollo Precision Fujian Limited Sputtering target including a feature to reduce chalcogen build up and arcing on a backing tube
DE102012110284B3 (de) * 2012-10-26 2013-11-14 Von Ardenne Anlagentechnik Gmbh Sputterbeschichtungseinrichtung und Vakuumbeschichtungsanlage
CN106011766B (zh) * 2016-07-15 2018-09-04 森科五金(深圳)有限公司 一种真空炉体及其使用的辅助阳极
CN110612363B (zh) 2017-03-31 2021-12-21 Agm集装箱控制公司 用于涂覆表面的系统及方法
US11339464B2 (en) 2017-03-31 2022-05-24 Agm Container Controls, Inc. Plasma nitriding with PECVD coatings using hollow cathode ion immersion technology
KR102067820B1 (ko) * 2018-07-24 2020-01-17 (주)선익시스템 가변형 아크억제수단이 마련된 증착장비
CN112334591B (zh) * 2018-12-27 2023-07-18 株式会社爱发科 防附着构件和真空处理装置
CA3111730C (en) * 2020-03-16 2023-09-26 Vapor Technologies, Inc. Convertible magnetics for rotary cathode

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US3514391A (en) * 1967-05-05 1970-05-26 Nat Res Corp Sputtering apparatus with finned anode
JPS5512732A (en) * 1978-07-14 1980-01-29 Anelva Corp Sputtering apparatus for making thin magnetic film
US4356073A (en) * 1981-02-12 1982-10-26 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
US4422916A (en) * 1981-02-12 1983-12-27 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
US4362611A (en) * 1981-07-27 1982-12-07 International Business Machines Corporation Quadrupole R.F. sputtering system having an anode/cathode shield and a floating target shield
US4407708A (en) * 1981-08-06 1983-10-04 Eaton Corporation Method for operating a magnetron sputtering apparatus
DD217964A3 (de) * 1981-10-02 1985-01-23 Ardenne Manfred Einrichtung zum hochratezerstaeuben nach dem plasmatronprinzip
GB2109010B (en) * 1981-11-12 1985-11-20 Advanced Semiconductor Mat Spacer for conductive plase in rf plasma reactor used in chemical vapour deposition
US4525264A (en) * 1981-12-07 1985-06-25 Ford Motor Company Cylindrical post magnetron sputtering system
US4410407A (en) * 1981-12-22 1983-10-18 Raytheon Company Sputtering apparatus and methods
US4417968A (en) * 1983-03-21 1983-11-29 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
US4443318A (en) * 1983-08-17 1984-04-17 Shatterproof Glass Corporation Cathodic sputtering apparatus
US4466877A (en) * 1983-10-11 1984-08-21 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
DD222900A1 (de) * 1984-04-09 1985-05-29 Fi Manfred V Ardenne Einrichtung zum reaktiven ionengestuetzten beschichten mit plasmatronquellen
DE3427587A1 (de) * 1984-07-26 1986-02-06 Leybold-Heraeus GmbH, 5000 Köln Zerstaeubungseinrichtung fuer katodenzerstaeubungsanlagen
JP2693960B2 (ja) * 1988-02-24 1997-12-24 プロメトロンテクニクス株式会社 マグネトロンスパッタリングカソード装置
JP3516949B2 (ja) * 1990-08-10 2004-04-05 バイラテック・シン・フィルムズ・インコーポレイテッド 回転マグネトロンスパッタリングシステムにおけるアーク抑制のためのシールディング
US5108574A (en) * 1991-01-29 1992-04-28 The Boc Group, Inc. Cylindrical magnetron shield structure
DE4109018C2 (de) * 1991-03-20 2002-02-28 Unaxis Deutschland Holding Vorrichtung zum Beschichten eines Substrats
DE4117518C2 (de) * 1991-05-29 2000-06-21 Leybold Ag Vorrichtung zum Sputtern mit bewegtem, insbesondere rotierendem Target
EP0681616B1 (en) * 1993-01-15 2002-11-13 The Boc Group, Inc. Cylindrical magnetron shield structure

Also Published As

Publication number Publication date
CN1134469A (zh) 1996-10-30
DE69620489D1 (de) 2002-05-16
ZA96172B (en) 1996-07-15
KR960029488A (ko) 1996-08-17
US5527439A (en) 1996-06-18
JPH08239758A (ja) 1996-09-17
CA2165884A1 (en) 1996-07-24
AU690388B2 (en) 1998-04-23
EP0724025B1 (en) 2002-04-10
AU4071395A (en) 1996-08-01
EP0724025A3 (en) 1998-03-18
DE69620489T2 (de) 2002-10-31
EP0724025A2 (en) 1996-07-31

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