IL102349A - Indigenous and infrared photoglossary light visible and infrared with a non-flickering culture surface - Google Patents

Indigenous and infrared photoglossary light visible and infrared with a non-flickering culture surface

Info

Publication number
IL102349A
IL102349A IL10234992A IL10234992A IL102349A IL 102349 A IL102349 A IL 102349A IL 10234992 A IL10234992 A IL 10234992A IL 10234992 A IL10234992 A IL 10234992A IL 102349 A IL102349 A IL 102349A
Authority
IL
Israel
Prior art keywords
light receiving
receiving surface
substrate
insb
visible
Prior art date
Application number
IL10234992A
Other languages
English (en)
Hebrew (he)
Other versions
IL102349A0 (en
Original Assignee
Santa Barbara Res Center
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24984060&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=IL102349(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Santa Barbara Res Center filed Critical Santa Barbara Res Center
Publication of IL102349A0 publication Critical patent/IL102349A0/xx
Publication of IL102349A publication Critical patent/IL102349A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264—Inorganic materials
    • H01L31/0304—Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0216—Coatings
    • H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
    • H01L31/103—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PN homojunction type
    • H01L31/1035—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PN homojunction type the devices comprising active layers formed only by AIIIBV compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/544—Solar cells from Group III-V materials

Landscapes

  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Light Receiving Elements (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Radiation Pyrometers (AREA)
  • Luminescent Compositions (AREA)
IL10234992A 1991-08-08 1992-06-29 Indigenous and infrared photoglossary light visible and infrared with a non-flickering culture surface IL102349A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US74224891A 1991-08-08 1991-08-08

Publications (2)

Publication Number Publication Date
IL102349A0 IL102349A0 (en) 1993-01-14
IL102349A true IL102349A (en) 1996-11-14

Family

ID=24984060

Family Applications (1)

Application Number Title Priority Date Filing Date
IL10234992A IL102349A (en) 1991-08-08 1992-06-29 Indigenous and infrared photoglossary light visible and infrared with a non-flickering culture surface

Country Status (6)

Country Link
US (1) US5449943A (fr)
JP (1) JP2912093B2 (fr)
CA (1) CA2070708C (fr)
FR (1) FR2680280B1 (fr)
GB (1) GB2258565B (fr)
IL (1) IL102349A (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1994028587A1 (fr) * 1993-05-28 1994-12-08 Santa Barbara Research Center DISPOSITIF ET STRUCTURE PHOTODETECTEURS A L'ANTIMONIURE D'INDIUM (InSb) POUR LES RAYONNENENTS INFRAROUGE, VISIBLE ET ULTRAVIOLET
US5444801A (en) * 1994-05-27 1995-08-22 Laughlin; Richard H. Apparatus for switching optical signals and method of operation
US6198118B1 (en) * 1998-03-09 2001-03-06 Integration Associates, Inc. Distributed photodiode structure
US6548878B1 (en) 1998-02-05 2003-04-15 Integration Associates, Inc. Method for producing a thin distributed photodiode structure
US6753586B1 (en) 1998-03-09 2004-06-22 Integration Associates Inc. Distributed photodiode structure having majority dopant gradient and method for making same
AU2001244586A1 (en) * 2000-04-04 2001-10-15 Hamamatsu Photonics K.K. Semiconductor energy detector
IES20010616A2 (en) * 2001-06-28 2002-05-15 Nat Microelectronics Res Ct Microelectronic device and method of its manufacture
US6762473B1 (en) * 2003-06-25 2004-07-13 Semicoa Semiconductors Ultra thin back-illuminated photodiode array structures and fabrication methods
JP5063875B2 (ja) * 2005-07-27 2012-10-31 パナソニック株式会社 光半導体装置の製造方法
IT1392502B1 (it) * 2008-12-31 2012-03-09 St Microelectronics Srl Sensore comprendente almeno un fotodiodo a doppia giunzione verticale integrato su substrato semiconduttore e relativo processo di integrazione
US20100163759A1 (en) * 2008-12-31 2010-07-01 Stmicroelectronics S.R.L. Radiation sensor with photodiodes being integrated on a semiconductor substrate and corresponding integration process
US8247881B2 (en) * 2009-04-27 2012-08-21 University Of Seoul Industry Cooperation Foundation Photodiodes with surface plasmon couplers
US8552479B2 (en) 2010-03-12 2013-10-08 Flir Systems, Inc. Aluminum indium antimonide focal plane array
US8552480B2 (en) * 2010-03-12 2013-10-08 Flir Systems, Inc. Aluminum indium antimonide focal plane array
US8513587B2 (en) * 2011-01-24 2013-08-20 Taiwan Semiconductor Manufacturing Company, Ltd. Image sensor with anti-reflection layer and method of manufacturing the same

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3371213A (en) * 1964-06-26 1968-02-27 Texas Instruments Inc Epitaxially immersed lens and photodetectors and methods of making same
US3483096A (en) * 1968-04-25 1969-12-09 Avco Corp Process for making an indium antimonide infrared detector contact
DE1789046B1 (de) * 1968-09-27 1972-02-03 Siemens Ag Strahlungsdetektor mit einem halbleiterkoerper mit photo thermomagnetischen effekt
US3723831A (en) * 1970-12-04 1973-03-27 Arco Corp Indium antimonide infrared ray detector
JPS5060966U (fr) * 1973-10-02 1975-06-05
FR2376513A1 (fr) * 1976-12-31 1978-07-28 Radiotechnique Compelec Dispositif semiconducteur muni d'un film protecteur
US4286277A (en) * 1977-11-22 1981-08-25 The United States Of America As Represented By The Secretary Of The Army Planar indium antimonide diode array and method of manufacture
US4228365A (en) * 1978-10-03 1980-10-14 The United States Of America As Represented By The Secretary Of The Army Monolithic infrared focal plane charge coupled device imager
JPS5629379A (en) * 1979-08-20 1981-03-24 Toshiba Corp Manufacture of infrared ray detector of indium antimony
US4371587A (en) * 1979-12-17 1983-02-01 Hughes Aircraft Company Low temperature process for depositing oxide layers by photochemical vapor deposition
JPS56116673A (en) * 1980-02-19 1981-09-12 Sharp Corp Amorphous thin film solar cell
US4369458A (en) * 1980-07-01 1983-01-18 Westinghouse Electric Corp. Self-aligned, flip-chip focal plane array configuration
FR2517864A1 (fr) * 1981-12-07 1983-06-10 Telecommunications Sa Dispositif d'enregistrement et de lecture d'images
GB2132017B (en) * 1982-12-16 1986-12-03 Secr Defence Semiconductor device array
JPS6021588A (ja) * 1983-07-16 1985-02-02 Univ Kyoto 磁気電気光効果光増幅器
FR2556135B1 (fr) * 1983-12-02 1986-09-19 Thomson Csf Photo-diode a l'antimoniure d'indium et procede de fabrication
JPS60130274A (ja) * 1983-12-19 1985-07-11 Toshiba Corp 固体撮像装置
US4547622A (en) * 1984-04-27 1985-10-15 Massachusetts Institute Of Technology Solar cells and photodetectors
DE3576099D1 (de) * 1984-07-10 1990-03-29 Industrieorientierte Forsch Infrarot-opto-elektronischer bauteil.
JPS61271844A (ja) * 1985-05-27 1986-12-02 Nec Corp 化合物半導体表面の不活性化方法
DE3617229C2 (de) * 1986-05-22 1997-04-30 Aeg Infrarot Module Gmbh Strahlungsdetektor
US4734583A (en) * 1986-10-16 1988-03-29 General Electric Company Readout circuit for dual-gate CID imagers with charge sharing corrected for subtractive error
JPS63150976A (ja) * 1986-12-12 1988-06-23 Fujitsu Ltd 赤外線検出装置
US4881234A (en) * 1987-03-18 1989-11-14 The United States Of America As Represented By The Secretary Of The Navy Method for forming copious (F2+)A centers in certain stable, broadly tunable laser-active materials
JPS63268278A (ja) * 1987-04-24 1988-11-04 Matsushita Electric Ind Co Ltd 半導体放射線検出器
US5086328A (en) * 1988-02-08 1992-02-04 Santa Barbara Research Center Photo-anodic oxide surface passivation for semiconductors
JPH03273688A (ja) * 1990-03-22 1991-12-04 Eastman Kodak Japan Kk 発光装置
US5262633A (en) * 1992-08-21 1993-11-16 Santa Barbara Research Center Wideband anti-reflection coating for indium antimonide photodetector device and method of forming the same

Also Published As

Publication number Publication date
GB9216349D0 (en) 1992-09-16
FR2680280A1 (fr) 1993-02-12
CA2070708C (fr) 1997-04-29
FR2680280B1 (fr) 1993-12-31
GB2258565A (en) 1993-02-10
GB2258565B (en) 1995-05-10
JP2912093B2 (ja) 1999-06-28
CA2070708A1 (fr) 1993-02-09
US5449943A (en) 1995-09-12
IL102349A0 (en) 1993-01-14
JPH05206499A (ja) 1993-08-13

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Legal Events

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RH Patent void
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MM9K Patent not in force due to non-payment of renewal fees