IL101159A - Optical thickness gauge and method of use - Google Patents

Optical thickness gauge and method of use

Info

Publication number
IL101159A
IL101159A IL10115992A IL10115992A IL101159A IL 101159 A IL101159 A IL 101159A IL 10115992 A IL10115992 A IL 10115992A IL 10115992 A IL10115992 A IL 10115992A IL 101159 A IL101159 A IL 101159A
Authority
IL
Israel
Prior art keywords
set forth
optical
interest
wavelengths
measurement
Prior art date
Application number
IL10115992A
Other languages
English (en)
Hebrew (he)
Other versions
IL101159A0 (en
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of IL101159A0 publication Critical patent/IL101159A0/xx
Publication of IL101159A publication Critical patent/IL101159A/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02062—Active error reduction, i.e. varying with time
    • G01B9/02063—Active error reduction, i.e. varying with time by particular alignment of focus position, e.g. dynamic focussing in optical coherence tomography
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02062—Active error reduction, i.e. varying with time
    • G01B9/02064—Active error reduction, i.e. varying with time by particular adjustment of coherence gate, i.e. adjusting position of zero path difference in low coherence interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
    • G01B9/02078—Caused by ambiguity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/266—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light by interferometric means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/30—Grating as beam-splitter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
IL10115992A 1991-03-27 1992-03-05 Optical thickness gauge and method of use IL101159A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/676,049 US5159408A (en) 1991-03-27 1991-03-27 Optical thickness profiler using synthetic wavelengths

Publications (2)

Publication Number Publication Date
IL101159A0 IL101159A0 (en) 1992-11-15
IL101159A true IL101159A (en) 1994-05-30

Family

ID=24713020

Family Applications (1)

Application Number Title Priority Date Filing Date
IL10115992A IL101159A (en) 1991-03-27 1992-03-05 Optical thickness gauge and method of use

Country Status (4)

Country Link
US (1) US5159408A (de)
EP (1) EP0506296A3 (de)
JP (1) JPH07111323B2 (de)
IL (1) IL101159A (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5418612A (en) * 1992-02-27 1995-05-23 Renishaw, Plc Method of and apparatus for determining surface contour of diffusely reflecting objects
JPH05302816A (ja) * 1992-04-28 1993-11-16 Jasco Corp 半導体膜厚測定装置
EP0639259B1 (de) * 1992-05-05 1999-07-28 MicroE, Inc. Apparat zum detektieren einer relativen bewegung
DE4231069A1 (de) * 1992-09-17 1994-03-24 Leica Mikroskopie & Syst Variabler Auflicht-Interferenzansatz nach Mirau
US5416587A (en) * 1993-07-09 1995-05-16 Northeast Photosciences Index interferometric instrument including both a broad band and narrow band source
US5506672A (en) * 1993-09-08 1996-04-09 Texas Instruments Incorporated System for measuring slip dislocations and film stress in semiconductor processing utilizing an adjustable height rotating beam splitter
US5637458A (en) * 1994-07-20 1997-06-10 Sios, Inc. Apparatus and method for the detection and assay of organic molecules
US5739906A (en) * 1996-06-07 1998-04-14 The United States Of America As Represented By The Secretary Of Commerce Interferometric thickness variation test method for windows and silicon wafers using a diverging wavefront
US5974019A (en) * 1997-05-05 1999-10-26 Seagate Technology, Inc. Optical system for two-dimensional positioning of light beams
US6212151B1 (en) 1997-11-12 2001-04-03 Iolon, Inc. Optical switch with coarse and fine deflectors
JP4438111B2 (ja) * 1998-07-02 2010-03-24 ソニー株式会社 計測装置及び計測方法
SE521927C2 (sv) 1998-10-01 2003-12-16 Delsing Jerker Metod och anordning för interferometrimätning
US6181430B1 (en) * 1999-03-15 2001-01-30 Ohio Aerospace Institute Optical device for measuring a surface characteristic of an object by multi-color interferometry
WO2002025643A2 (en) * 2000-09-19 2002-03-28 Microesystems, Inc. Interface component a positioning system and method for designing an interface component
AUPR086100A0 (en) * 2000-10-20 2000-11-16 Q-Vis Limited Improved surface profiling apparatus
US6657714B2 (en) * 2001-09-24 2003-12-02 Applied Materials, Inc. Defect detection with enhanced dynamic range
KR100647493B1 (ko) * 2004-04-16 2006-11-23 (주)펨트론 두께 및 형상 측정방법 및 측정장치
DE102004026193B4 (de) * 2004-05-28 2012-03-29 Carl Mahr Holding Gmbh Messverfahren zur Formmessung
GB0415766D0 (en) * 2004-07-14 2004-08-18 Taylor Hobson Ltd Apparatus for and a method of determining a characteristic of a layer or layers
JP2006053116A (ja) * 2004-08-13 2006-02-23 Sei Tsunezo 複数レーザービーム結合する光学系構造
US7630085B2 (en) * 2005-04-19 2009-12-08 Texas Instruments Incorporated Interferometers of high resolutions
US7372577B1 (en) * 2005-05-31 2008-05-13 Lockheed Martin Corporation Monolithic, spatially-separated, common path interferometer
RU2300077C1 (ru) * 2005-11-10 2007-05-27 Научно Исследовательский Институт Радиоэлектроники и лазерной техники (НИИ РЛ) Московского Государственного Технического Университета им. Н.Э. Баумана Дистанционный способ измерения толщины толстых пленок нефтепродуктов на поверхности воды
US7796267B2 (en) * 2006-09-28 2010-09-14 Si-Ware Systems System, method and apparatus for a micromachined interferometer using optical splitting
KR20130107818A (ko) * 2012-03-23 2013-10-02 삼성전자주식회사 레이저 간섭계 및 이 레이저 간섭계를 이용한 변위 측정 시스템
DE102014004697B4 (de) * 2014-03-31 2018-03-29 Baden-Württemberg Stiftung Ggmbh System und Verfahren zur Distanzmessung
CN107525465B (zh) * 2016-06-21 2021-04-02 中国计量科学研究院 一种可直接溯源的高精度齿轮误差测量方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2245932A1 (en) * 1973-06-15 1975-04-25 Orszag Alain Distance measuring interferometric instrument - has molecular laser for measuring distances of several hundred metres
US4627731A (en) * 1985-09-03 1986-12-09 United Technologies Corporation Common optical path interferometric gauge
JPS62215803A (ja) * 1986-03-18 1987-09-22 Yokogawa Electric Corp 測長器
JPS62229004A (ja) * 1986-03-31 1987-10-07 Japan Aviation Electronics Ind Ltd ヘテロダイン形光フアイバ変位計
JPS6347606A (ja) * 1986-08-13 1988-02-29 Asahi Optical Co Ltd 非球面形状測定装置
DE3841742A1 (de) * 1988-12-10 1990-06-13 Hueser Teuchert Dorothee Koordinatenmesstaster mit absolutinterferometrischem beruehrungslosem messprinzip
JP2808136B2 (ja) * 1989-06-07 1998-10-08 キヤノン株式会社 測長方法及び装置
US5054924A (en) * 1989-06-12 1991-10-08 California Institute Of Technology Method for extracting long-equivalent wavelength interferometric information

Also Published As

Publication number Publication date
EP0506296A3 (en) 1993-05-26
IL101159A0 (en) 1992-11-15
JPH07111323B2 (ja) 1995-11-29
EP0506296A2 (de) 1992-09-30
US5159408A (en) 1992-10-27
JPH0587524A (ja) 1993-04-06

Similar Documents

Publication Publication Date Title
US5159408A (en) Optical thickness profiler using synthetic wavelengths
US5153669A (en) Three wavelength optical measurement apparatus and method
US5349440A (en) Interferometric laser profilometer including a multimode laser diode emitting a range of stable wavelengths
KR100941928B1 (ko) 광위상 간섭측정법 및 그 시스템
US5341205A (en) Method for characterization of optical waveguide devices using partial coherence interferometry
JP4951189B2 (ja) 周波数変換位相シフト干渉計測法
US5995224A (en) Full-field geometrically-desensitized interferometer employing diffractive and conventional optics
JPH05503787A (ja) 表面形状の測定装置
EP0158505B1 (de) Aktiver Spiegel-Wellenfrontsensor
JP2023036027A (ja) 計測システムで用いるためのヘテロダイン光源
US6064482A (en) Interferometric measuring device for form measurement on rough surfaces
Farr et al. Beamsplitter cube for white light interferometry
JPH06194125A (ja) 対物レンズの焦点から物体のずれ又は位置変化を検出する方法及び装置
US20230069087A1 (en) Digital holography metrology system
KR100858447B1 (ko) 광위상간섭측정법 및 그 시스템
JPH0648366Y2 (ja) レーザ周波数計
JPH0648364Y2 (ja) レーザ周波数計
JPH0283422A (ja) レーザ周波数計
WO2002088629A1 (en) Phase-based wavelength measurement apparatus
JPH0774762B2 (ja) レーザ周波数計

Legal Events

Date Code Title Description
RH Patent void