HUP0303965A2 - Integrált áramköri csomag és eljárás integrált áramköri elemek összekapcsolására funkcionális áramköri egységgé - Google Patents

Integrált áramköri csomag és eljárás integrált áramköri elemek összekapcsolására funkcionális áramköri egységgé

Info

Publication number
HUP0303965A2
HUP0303965A2 HU0303965A HUP0303965A HUP0303965A2 HU P0303965 A2 HUP0303965 A2 HU P0303965A2 HU 0303965 A HU0303965 A HU 0303965A HU P0303965 A HUP0303965 A HU P0303965A HU P0303965 A2 HUP0303965 A2 HU P0303965A2
Authority
HU
Hungary
Prior art keywords
base plate
integrated circuit
semiconductor
silicon
chips
Prior art date
Application number
HU0303965A
Other languages
English (en)
Inventor
George Liang-Tai Chiu
John Harold Magerlein
Original Assignee
International Business Machines Corp.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25277894&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=HUP0303965(A2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by International Business Machines Corp. filed Critical International Business Machines Corp.
Publication of HUP0303965A2 publication Critical patent/HUP0303965A2/hu
Publication of HUP0303965A3 publication Critical patent/HUP0303965A3/hu

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49827—Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10—Bump connectors; Manufacturing methods related thereto
    • H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/102—Material of the semiconductor or solid state bodies
    • H01L2924/1025—Semiconducting materials
    • H01L2924/10251—Elemental semiconductors, i.e. Group IV
    • H01L2924/10253—Silicon [Si]

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Wire Bonding (AREA)

Abstract

A találmány tárgya integrált áramköri csomag és eljárás integráltáramköri elemek összekapcsolására funkcionális áramköri egységgé.Integrált áramkör csomagolási struktúrájában alaplemezként (3) vezetőátvezetésekkel (4) ellátott, félvezető vagy dielektromos lapkátalkalmaznak. Csipek közötti és csipeken belüli nagy sűrűségűérintkezők és huzalozás van elhelyezve az alaplemeznek (3) azon azoldalán, amelyre az integrált áramkör rá van szerelve, továbbáösszekötés van a külső jelfeszültség- és tápfeszültség-hálózathoz azátellenes oldalon át. A szilícium alaplemez (3) használata lehetővéteszi az adott szakterületen rendelkezésre álló hagyományos szilícium-feldolgozási folyamatok alkalmazását nagy huzalozási sűrűséglétrehozására, és ezzel együtt lehetővé teszi az integráltáramkörökben lévő bármilyen szilíciumcsip hőtágulási együtthatójánakillesztését. Az alaplemezen (3) átmenő átvezetések (4) alkalmazásalehetővé teszi a szilícium alaplemezt (3) elhagyó összekötések nagysűrűségét, és rövid utakat biztosít a tápfeszültség és a jelfeszültségcsatlakozásai számára. Ó
HU0303965A 2001-04-19 2002-04-17 Multichip module fabricated on a semiconductor or dielectric wafer and method for manufacturing same HUP0303965A3 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/838,725 US6593644B2 (en) 2001-04-19 2001-04-19 System of a package fabricated on a semiconductor or dielectric wafer with wiring on one face, vias extending through the wafer, and external connections on the opposing face
PCT/US2002/012207 WO2002086971A2 (en) 2001-04-19 2002-04-17 Multichip module fabricated on a semiconductor or dielectric wafer and method for manufacturing same

Publications (2)

Publication Number Publication Date
HUP0303965A2 true HUP0303965A2 (hu) 2004-03-01
HUP0303965A3 HUP0303965A3 (en) 2006-01-30

Family

ID=25277894

Family Applications (1)

Application Number Title Priority Date Filing Date
HU0303965A HUP0303965A3 (en) 2001-04-19 2002-04-17 Multichip module fabricated on a semiconductor or dielectric wafer and method for manufacturing same

Country Status (11)

Country Link
US (1) US6593644B2 (hu)
EP (1) EP1405343A2 (hu)
JP (1) JP2004536449A (hu)
KR (1) KR100656218B1 (hu)
CN (1) CN1314117C (hu)
AU (1) AU2002256271A1 (hu)
CZ (1) CZ20032834A3 (hu)
HU (1) HUP0303965A3 (hu)
PL (1) PL368078A1 (hu)
TW (1) TW586196B (hu)
WO (1) WO2002086971A2 (hu)

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JP3788268B2 (ja) * 2001-05-14 2006-06-21 ソニー株式会社 半導体装置の製造方法
US20030057544A1 (en) * 2001-09-13 2003-03-27 Nathan Richard J. Integrated assembly protocol
US20030059976A1 (en) * 2001-09-24 2003-03-27 Nathan Richard J. Integrated package and methods for making same
US20030153119A1 (en) * 2002-02-14 2003-08-14 Nathan Richard J. Integrated circuit package and method for fabrication
US6821347B2 (en) * 2002-07-08 2004-11-23 Micron Technology, Inc. Apparatus and method for depositing materials onto microelectronic workpieces
US7422635B2 (en) * 2003-08-28 2008-09-09 Micron Technology, Inc. Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces
US7449067B2 (en) * 2003-11-03 2008-11-11 International Business Machines Corporation Method and apparatus for filling vias
US8084866B2 (en) 2003-12-10 2011-12-27 Micron Technology, Inc. Microelectronic devices and methods for filling vias in microelectronic devices
US7091124B2 (en) 2003-11-13 2006-08-15 Micron Technology, Inc. Methods for forming vias in microelectronic devices, and methods for packaging microelectronic devices
US20050247894A1 (en) 2004-05-05 2005-11-10 Watkins Charles M Systems and methods for forming apertures in microfeature workpieces
US7232754B2 (en) 2004-06-29 2007-06-19 Micron Technology, Inc. Microelectronic devices and methods for forming interconnects in microelectronic devices
US7083425B2 (en) 2004-08-27 2006-08-01 Micron Technology, Inc. Slanted vias for electrical circuits on circuit boards and other substrates
US7300857B2 (en) 2004-09-02 2007-11-27 Micron Technology, Inc. Through-wafer interconnects for photoimager and memory wafers
US7230334B2 (en) 2004-11-12 2007-06-12 International Business Machines Corporation Semiconductor integrated circuit chip packages having integrated microchannel cooling modules
US7271482B2 (en) 2004-12-30 2007-09-18 Micron Technology, Inc. Methods for forming interconnects in microelectronic workpieces and microelectronic workpieces formed using such methods
US7199450B2 (en) * 2005-05-13 2007-04-03 International Business Machines Corporation Materials and method to seal vias in silicon substrates
US20060290001A1 (en) * 2005-06-28 2006-12-28 Micron Technology, Inc. Interconnect vias and associated methods of formation
US7795134B2 (en) 2005-06-28 2010-09-14 Micron Technology, Inc. Conductive interconnect structures and formation methods using supercritical fluids
US7932182B2 (en) * 2005-08-19 2011-04-26 Honeywell International Inc. Creating novel structures using deep trenching of oriented silicon substrates
US20070042563A1 (en) * 2005-08-19 2007-02-22 Honeywell International Inc. Single crystal based through the wafer connections technical field
US7262134B2 (en) 2005-09-01 2007-08-28 Micron Technology, Inc. Microfeature workpieces and methods for forming interconnects in microfeature workpieces
US7863187B2 (en) 2005-09-01 2011-01-04 Micron Technology, Inc. Microfeature workpieces and methods for forming interconnects in microfeature workpieces
US7749899B2 (en) 2006-06-01 2010-07-06 Micron Technology, Inc. Microelectronic workpieces and methods and systems for forming interconnects in microelectronic workpieces
US7629249B2 (en) 2006-08-28 2009-12-08 Micron Technology, Inc. Microfeature workpieces having conductive interconnect structures formed by chemically reactive processes, and associated systems and methods
US7902643B2 (en) 2006-08-31 2011-03-08 Micron Technology, Inc. Microfeature workpieces having interconnects and conductive backplanes, and associated systems and methods
US8110899B2 (en) * 2006-12-20 2012-02-07 Intel Corporation Method for incorporating existing silicon die into 3D integrated stack
US7838420B2 (en) * 2007-08-29 2010-11-23 Freescale Semiconductor, Inc. Method for forming a packaged semiconductor device
SG150410A1 (en) 2007-08-31 2009-03-30 Micron Technology Inc Partitioned through-layer via and associated systems and methods
US7884015B2 (en) 2007-12-06 2011-02-08 Micron Technology, Inc. Methods for forming interconnects in microelectronic workpieces and microelectronic workpieces formed using such methods
DE102008035901A1 (de) * 2008-07-31 2010-02-18 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung von optoelektronischen Bauelementen und optoelektronisches Bauelement
US7872332B2 (en) 2008-09-11 2011-01-18 Micron Technology, Inc. Interconnect structures for stacked dies, including penetrating structures for through-silicon vias, and associated systems and methods
KR20100037300A (ko) * 2008-10-01 2010-04-09 삼성전자주식회사 내장형 인터포저를 갖는 반도체장치의 형성방법
US8169055B2 (en) * 2009-03-18 2012-05-01 International Business Machines Corporation Chip guard ring including a through-substrate via
US8367475B2 (en) * 2011-03-25 2013-02-05 Broadcom Corporation Chip scale package assembly in reconstitution panel process format
CN106373938B (zh) * 2016-11-18 2019-02-26 江阴长电先进封装有限公司 一种混合密度封装基板的结构及其封装方法
CN106373939B (zh) * 2016-11-18 2019-04-19 江阴长电先进封装有限公司 一种封装基板的结构及其封装方法

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Also Published As

Publication number Publication date
WO2002086971A2 (en) 2002-10-31
WO2002086971A3 (en) 2003-02-27
AU2002256271A1 (en) 2002-11-05
KR20040030542A (ko) 2004-04-09
TW586196B (en) 2004-05-01
HUP0303965A3 (en) 2006-01-30
KR100656218B1 (ko) 2006-12-13
CN1505838A (zh) 2004-06-16
CN1314117C (zh) 2007-05-02
US20020153603A1 (en) 2002-10-24
CZ20032834A3 (cs) 2004-02-18
PL368078A1 (en) 2005-03-21
US6593644B2 (en) 2003-07-15
JP2004536449A (ja) 2004-12-02
EP1405343A2 (en) 2004-04-07

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Legal Events

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FD9A Lapse of provisional protection due to non-payment of fees