HK90997A - Positive-working radiation-sensitive mixture and recording material prepared therefrom - Google Patents

Positive-working radiation-sensitive mixture and recording material prepared therefrom

Info

Publication number
HK90997A
HK90997A HK90997A HK90997A HK90997A HK 90997 A HK90997 A HK 90997A HK 90997 A HK90997 A HK 90997A HK 90997 A HK90997 A HK 90997A HK 90997 A HK90997 A HK 90997A
Authority
HK
Hong Kong
Prior art keywords
positive
recording material
material prepared
prepared therefrom
sensitive mixture
Prior art date
Application number
HK90997A
Other languages
English (en)
Inventor
Georg Dr Dipl-Chem Pawlowski
Hans-Joachim Dr Dipl-Ch Merrem
Juergen Dr Dipl-Chem Lingnau
Ralph Dr Dipl-Chem Dammel
Horst Dr Dipl-Chem Roeschert
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of HK90997A publication Critical patent/HK90997A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
HK90997A 1989-09-09 1997-06-26 Positive-working radiation-sensitive mixture and recording material prepared therefrom HK90997A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3930087A DE3930087A1 (de) 1989-09-09 1989-09-09 Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial

Publications (1)

Publication Number Publication Date
HK90997A true HK90997A (en) 1997-08-01

Family

ID=6389039

Family Applications (1)

Application Number Title Priority Date Filing Date
HK90997A HK90997A (en) 1989-09-09 1997-06-26 Positive-working radiation-sensitive mixture and recording material prepared therefrom

Country Status (6)

Country Link
US (1) US5340682A (ko)
EP (1) EP0417556B1 (ko)
JP (1) JP2839678B2 (ko)
KR (1) KR910006777A (ko)
DE (2) DE3930087A1 (ko)
HK (1) HK90997A (ko)

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EP1757635B1 (en) 2005-08-23 2008-10-08 FUJIFILM Corporation Curable ink comprising modified oxetane compound
JP4757574B2 (ja) 2005-09-07 2011-08-24 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
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JP2008189776A (ja) 2007-02-02 2008-08-21 Fujifilm Corp 活性放射線硬化型重合性組成物、インク組成物、インクジェット記録方法、印刷物、平版印刷版の作製方法、及び平版印刷版
JP2008208266A (ja) 2007-02-27 2008-09-11 Fujifilm Corp インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、および平版印刷版
JP5159141B2 (ja) 2007-03-30 2013-03-06 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の作製方法及び平版印刷版
JP5111039B2 (ja) 2007-09-27 2012-12-26 富士フイルム株式会社 重合性化合物、重合開始剤、および染料を含有する光硬化性組成物
US8088548B2 (en) 2007-10-23 2012-01-03 Az Electronic Materials Usa Corp. Bottom antireflective coating compositions
US8240838B2 (en) 2007-11-29 2012-08-14 Fujifilm Corporation Ink composition for inkjet recording, inkjet recording method, and printed material
JP5383133B2 (ja) 2008-09-19 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット記録方法及び印刷物成形体の製造方法
EP2169018B1 (en) 2008-09-26 2012-01-18 Fujifilm Corporation Ink composition and inkjet recording method
JP5461809B2 (ja) 2008-09-29 2014-04-02 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
US8455176B2 (en) * 2008-11-12 2013-06-04 Az Electronic Materials Usa Corp. Coating composition
US8632948B2 (en) * 2009-09-30 2014-01-21 Az Electronic Materials Usa Corp. Positive-working photoimageable bottom antireflective coating
US20110086312A1 (en) * 2009-10-09 2011-04-14 Dammel Ralph R Positive-Working Photoimageable Bottom Antireflective Coating
JP6025600B2 (ja) * 2013-02-19 2016-11-16 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜及びパターン形成方法
US9063420B2 (en) * 2013-07-16 2015-06-23 Rohm And Haas Electronic Materials Llc Photoresist composition, coated substrate, and method of forming electronic device
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Also Published As

Publication number Publication date
KR910006777A (ko) 1991-04-30
JPH03103856A (ja) 1991-04-30
EP0417556A3 (en) 1991-10-16
EP0417556B1 (de) 1996-12-11
DE59010598D1 (de) 1997-01-23
DE3930087A1 (de) 1991-03-14
EP0417556A2 (de) 1991-03-20
JP2839678B2 (ja) 1998-12-16
US5340682A (en) 1994-08-23

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