HK51595A - Plasma extraction reactor and its use for vapor extraction from gases. - Google Patents

Plasma extraction reactor and its use for vapor extraction from gases.

Info

Publication number
HK51595A
HK51595A HK51595A HK51595A HK51595A HK 51595 A HK51595 A HK 51595A HK 51595 A HK51595 A HK 51595A HK 51595 A HK51595 A HK 51595A HK 51595 A HK51595 A HK 51595A
Authority
HK
Hong Kong
Prior art keywords
extraction
gases
plasma
reactor
vapor
Prior art date
Application number
HK51595A
Other languages
English (en)
Inventor
Kin-Chung Ray Chiu
Original Assignee
Chiu Kin Chung Ray
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chiu Kin Chung Ray filed Critical Chiu Kin Chung Ray
Publication of HK51595A publication Critical patent/HK51595A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
    • B03C3/34—Constructional details or accessories or operation thereof
    • B03C3/38—Particle charging or ionising stations, e.g. using electric discharge, radioactive radiation or flames
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma
HK51595A 1987-06-23 1995-04-06 Plasma extraction reactor and its use for vapor extraction from gases. HK51595A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/065,532 US4735633A (en) 1987-06-23 1987-06-23 Method and system for vapor extraction from gases

Publications (1)

Publication Number Publication Date
HK51595A true HK51595A (en) 1995-04-13

Family

ID=22063372

Family Applications (1)

Application Number Title Priority Date Filing Date
HK51595A HK51595A (en) 1987-06-23 1995-04-06 Plasma extraction reactor and its use for vapor extraction from gases.

Country Status (8)

Country Link
US (1) US4735633A (zh)
EP (1) EP0296720B1 (zh)
JP (1) JPH0659384B2 (zh)
KR (1) KR940007057B1 (zh)
CN (1) CN1021886C (zh)
DE (1) DE3850816T2 (zh)
HK (1) HK51595A (zh)
SG (1) SG11695G (zh)

Families Citing this family (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01297126A (ja) * 1988-05-26 1989-11-30 Mitsui Toatsu Chem Inc 排ガス処理装置
US5007373A (en) * 1989-05-24 1991-04-16 Ionic Atlanta, Inc. Spiral hollow cathode
US5028452A (en) * 1989-09-15 1991-07-02 Creative Systems Engineering, Inc. Closed loop system and process for conversion of gaseous or vaporizable organic and/or organo-metallic compounds to inert solid matrix resistant to solvent extraction
US5039376A (en) * 1989-09-19 1991-08-13 Stefan Zukotynski Method and apparatus for the plasma etching, substrate cleaning, or deposition of materials by D.C. glow discharge
US5200043A (en) * 1989-11-08 1993-04-06 Mitsui Toatsu Chemicals, Inc. Method for treating waste gas
JPH084708B2 (ja) * 1989-11-08 1996-01-24 三井東圧化学株式会社 排ガス処理装置
NL9200076A (nl) * 1992-01-16 1993-08-16 Leybold B V Werkwijze, droge meertrapspomp en plasmascrubber voor het omvormen van reactieve gassen.
US5534069A (en) * 1992-07-23 1996-07-09 Canon Kabushiki Kaisha Method of treating active material
US5271963A (en) * 1992-11-16 1993-12-21 Materials Research Corporation Elimination of low temperature ammonia salt in TiCl4 NH3 CVD reaction
US5453125A (en) * 1994-02-17 1995-09-26 Krogh; Ole D. ECR plasma source for gas abatement
DE9407861U1 (de) * 1994-05-11 1995-10-19 Siemens Ag Vorrichtung zur Entgiftung von Abgasen aus mobilen Anlagen
US5549795A (en) * 1994-08-25 1996-08-27 Hughes Aircraft Company Corona source for producing corona discharge and fluid waste treatment with corona discharge
WO1996013621A1 (en) * 1994-10-31 1996-05-09 Krogh Ole D An ecr plasma source
US5591253A (en) * 1995-03-07 1997-01-07 Electric Power Research Institute, Inc. Electrostatically enhanced separator (EES)
US5874014A (en) * 1995-06-07 1999-02-23 Berkeley Scholars, Inc. Durable plasma treatment apparatus and method
US6045618A (en) * 1995-09-25 2000-04-04 Applied Materials, Inc. Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment
US6194628B1 (en) 1995-09-25 2001-02-27 Applied Materials, Inc. Method and apparatus for cleaning a vacuum line in a CVD system
US6187072B1 (en) 1995-09-25 2001-02-13 Applied Materials, Inc. Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions
US6193802B1 (en) * 1995-09-25 2001-02-27 Applied Materials, Inc. Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment
DE19601436A1 (de) * 1996-01-17 1997-07-24 Siegfried Dr Ing Straemke Verfahren und Vorrichtung zur Oberflächenbehandlung von Werkstücken
JP2985762B2 (ja) * 1996-03-18 1999-12-06 日本電気株式会社 排気ガスの処理方法及び処理装置
GB9615859D0 (en) * 1996-07-29 1996-09-11 Boc Group Plc Processes and apparatus for the scrubbing of exhaust gas streams
US5928426A (en) * 1996-08-08 1999-07-27 Novellus Systems, Inc. Method and apparatus for treating exhaust gases from CVD, PECVD or plasma etch reactors
US5779991A (en) * 1996-11-12 1998-07-14 Eastern Digital Inc. Apparatus for destroying hazardous compounds in a gas stream
US6120640A (en) * 1996-12-19 2000-09-19 Applied Materials, Inc. Boron carbide parts and coatings in a plasma reactor
GB9812497D0 (en) * 1998-06-10 1998-08-05 Boc Group Plc Metal-organic gas scrubber
US6354241B1 (en) 1999-07-15 2002-03-12 Applied Materials, Inc. Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing
US6689252B1 (en) * 1999-07-28 2004-02-10 Applied Materials, Inc. Abatement of hazardous gases in effluent
US6255222B1 (en) 1999-08-24 2001-07-03 Applied Materials, Inc. Method for removing residue from substrate processing chamber exhaust line for silicon-oxygen-carbon deposition process
US6471925B1 (en) 2000-01-21 2002-10-29 Agere Systems Guardian Corp. Method for treating an effluent gas during semiconductor processing
US6391146B1 (en) 2000-04-11 2002-05-21 Applied Materials, Inc. Erosion resistant gas energizer
US6673323B1 (en) 2000-03-24 2004-01-06 Applied Materials, Inc. Treatment of hazardous gases in effluent
JP2001284267A (ja) * 2000-04-03 2001-10-12 Canon Inc 排気処理方法、プラズマ処理方法及びプラズマ処理装置
US6576202B1 (en) * 2000-04-21 2003-06-10 Kin-Chung Ray Chiu Highly efficient compact capacitance coupled plasma reactor/generator and method
US6436170B1 (en) * 2000-06-23 2002-08-20 Air Products And Chemical, Inc. Process and apparatus for removing particles from high purity gas systems
US6428609B1 (en) 2000-09-08 2002-08-06 Moore Epitaxial, Inc. Exhaust particulate controller and method
US6821489B1 (en) * 2000-10-10 2004-11-23 International Business Machines Corporation System and method for abating the simultaneous flow of silane and arsine
DE10055362C1 (de) * 2000-11-08 2002-01-24 Heraeus Quarzglas Verfahren zur Herstellung eines SiO¶2¶-Rohlings und Vorrichtung zur Durchführung des Verfahrens
DE10055357C1 (de) * 2000-11-08 2002-08-14 Heraeus Quarzglas Verfahren und Vorrichtung zur Herstellung eines SiO¶2¶-Rohlings
US6750104B2 (en) * 2001-12-31 2004-06-15 General Semiconductor, Inc. High voltage power MOSFET having a voltage sustaining region that includes doped columns formed by trench etching using an etchant gas that is also a doping source
US6936086B2 (en) * 2002-09-11 2005-08-30 Planar Systems, Inc. High conductivity particle filter
KR100506506B1 (ko) * 2003-07-11 2005-08-05 위순임 플라즈마 건식 세정기
JPWO2007139019A1 (ja) * 2006-05-26 2009-10-08 ダイハツ工業株式会社 プラズマ反応器用電極
US20080047578A1 (en) * 2006-08-24 2008-02-28 Taiwan Semiconductor Manufacturing Co., Ltd. Method for preventing clogging of reaction chamber exhaust lines
DE102007016026A1 (de) * 2007-03-30 2008-10-02 Sig Technology Ag Vakuumbeschichtungsanlage mit Abscheidevorrichtung im Restgasstrang
CN102015053B (zh) * 2007-12-10 2014-08-13 阮兆德 增压静电空气过滤装置
CN101468281B (zh) * 2008-01-23 2010-12-15 邵光震 低温等离子体放电净化高温废气的装置
US9997325B2 (en) 2008-07-17 2018-06-12 Verity Instruments, Inc. Electron beam exciter for use in chemical analysis in processing systems
US20100186189A1 (en) * 2009-01-26 2010-07-29 Ruben Brian K Vacuum cleaner having dirt collection vessel with a labyrinthine air flow path
JP5332916B2 (ja) * 2009-06-03 2013-11-06 株式会社デンソー 炭化珪素単結晶の製造装置
WO2011156408A2 (en) * 2010-06-07 2011-12-15 University Of Florida Research Foundation, Inc. Plasma induced fluid mixing
US8404028B2 (en) * 2011-01-18 2013-03-26 International Business Machines Corporation Vacuum trap labyrinth
HK1150374A2 (en) * 2011-06-07 2011-12-16 Yiu Ming Chan An air purification device and method
WO2013165889A1 (en) * 2012-05-04 2013-11-07 Synos Technology, Inc. Radical reactor with inverted orientation
US9440218B2 (en) * 2013-06-13 2016-09-13 Clariant Corporation Methods and active materials for reducing halide concentration in gas streams
JP6316047B2 (ja) * 2014-03-24 2018-04-25 株式会社東芝 ガス処理装置
CN104069721B (zh) * 2014-06-10 2016-06-01 上海交通大学 处理挥发性有机污染物的变径式介质阻挡反应器
JP6479080B2 (ja) * 2017-03-30 2019-03-06 本田技研工業株式会社 ブリーザ装置
CN108533363B (zh) * 2018-06-04 2023-08-18 江苏大学 一种车载dpf在线再生系统及控制方法
CN112334599B (zh) * 2018-06-25 2023-09-29 东芝三菱电机产业系统株式会社 活性气体生成装置及成膜处理装置

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE215706C (zh) *
US387286A (en) * 1888-08-07 Haetlet fewson
US1056026A (en) * 1912-05-06 1913-03-18 William T Hoofnagle Means for separating mixed gases.
US1846365A (en) * 1929-03-27 1932-02-23 Int Precipitation Co Apparatus for separating suspended material from gases
CH217221A (de) * 1941-02-11 1941-10-15 Strehler & Jauch Gasfilter, insbesondere für Holz- und Holzkohlen-Gas.
US3976448A (en) * 1972-04-20 1976-08-24 Lin Eng Corporation Electrostatic and sonic gas processing apparatus
US3805492A (en) * 1972-04-28 1974-04-23 A King Method and apparatus for treating carbureted mixtures
US3948625A (en) * 1972-07-24 1976-04-06 Environmental Master Systems, Inc. Irradiation and electrostatic separator
US3853512A (en) * 1972-11-29 1974-12-10 Nissan Motor Air purifier
JPS5713326B2 (zh) 1975-02-18 1982-03-16
JPS51129868A (en) * 1975-05-07 1976-11-11 Fujitsu Ltd A process for treatment of waste gas
JPS5278176A (en) 1975-12-25 1977-07-01 Chiyoda R & D Discharge reactor for gases
JPS56108514A (en) 1980-01-30 1981-08-28 Fujitsu Ltd Waste gas treatment
FR2490246A1 (fr) * 1980-09-17 1982-03-19 Cit Alcatel Dispositif de deposition chimique activee sous plasma
JPS584518A (ja) * 1981-06-29 1983-01-11 株式会社東芝 珈琲抽出器
JPS586231A (ja) * 1981-07-03 1983-01-13 Nippon Telegr & Teleph Corp <Ntt> 廃ガス処理装置
US4491606A (en) * 1981-11-12 1985-01-01 Advanced Semiconductor Materials Of America, Inc. Spacer for preventing shorting between conductive plates
US4483883A (en) * 1982-12-22 1984-11-20 Energy Conversion Devices, Inc. Upstream cathode assembly
JPS59135730A (ja) * 1983-01-24 1984-08-04 Hitachi Ltd 表面改質装置
US4472174A (en) * 1983-04-25 1984-09-18 Raymond L. Chuan Method and apparatus for providing and using RF generated plasma for particle charging in electrostatic precipitation
DD215706A1 (de) 1983-05-30 1984-11-21 Mikroelektronik Zt Forsch Tech Verfahren und vorrichtung zum reinigen von gasen und daempfen aus plasmaanlagen
DD230790A1 (de) 1983-09-12 1985-12-11 Univ Schiller Jena Verfahren und vorrichtung zur beseitigung ungesaettigter halogenkohlenstoffe
JPS60137421A (ja) * 1983-12-22 1985-07-22 Michio Nakanishi 燃焼排ガス中のΝＯｘ低減法
JPS60193522A (ja) * 1984-03-15 1985-10-02 Unitika Ltd 低温プラズマ処理方法
DE3414121A1 (de) * 1984-04-14 1985-10-24 Brown, Boveri & Cie Ag, 6800 Mannheim Verfahren und vorrichtung zur reinigung von abgasen
IL74856A (en) * 1984-04-30 1988-07-31 Westinghouse Electric Corp Method for controlling gaseous pollution in stack gas emissions
DD237951A3 (de) * 1984-06-06 1986-08-06 Mikroelektronik Zt Forsch Tech Vorrichtung zum reinigen halogenhaltiger schadstoffe
US5137701A (en) * 1984-09-17 1992-08-11 Mundt Randall S Apparatus and method for eliminating unwanted materials from a gas flow line
US4664938A (en) * 1985-05-06 1987-05-12 Phillips Petroleum Company Method for deposition of silicon
US4626448A (en) * 1985-07-18 1986-12-02 The United States Of America As Represented By The United States Department Of Energy Plasma deposition of amorphous metal alloys
US4675089A (en) * 1985-11-25 1987-06-23 At&T Technologies, Inc. Low temperature deposition method for high quality aluminum oxide films
FR2591509B1 (fr) * 1985-12-17 1989-10-27 Labo Electronique Physique Dispositif antipollution pour l'elimination des gaz toxiques utilises dans l'elaboration des materiaux semiconducteurs du groupe iii-v.
DE3609698A1 (de) * 1986-03-19 1987-09-24 Dumitru Dr Ing Cucu Vorrichtung und verfahren zur ionisierung oder neutralisation eines gasstroms und der in ihm enthaltenen partikel
JPS6331523A (ja) * 1986-07-25 1988-02-10 Oyo Kagaku Kenkyusho 廃ガス処理装置
JP3161078B2 (ja) * 1992-09-24 2001-04-25 アイシン精機株式会社 人体局部洗浄装置

Also Published As

Publication number Publication date
EP0296720A2 (en) 1988-12-28
CN1021886C (zh) 1993-08-25
EP0296720B1 (en) 1994-07-27
KR940007057B1 (ko) 1994-08-04
EP0296720A3 (en) 1989-08-02
US4735633A (en) 1988-04-05
DE3850816T2 (de) 1995-02-09
SG11695G (en) 1995-06-16
DE3850816D1 (de) 1994-09-01
KR890001152A (ko) 1989-03-18
JPH01307429A (ja) 1989-12-12
JPH0659384B2 (ja) 1994-08-10
CN1030192A (zh) 1989-01-11

Similar Documents

Publication Publication Date Title
HK51595A (en) Plasma extraction reactor and its use for vapor extraction from gases.
GB2225964B (en) Gas component extraction
EG20400A (en) Hydrocarbon gas processing
GB2225631B (en) Hydrocarbon gas processing
KR960001465B1 (en) Plasma vapor reaction apparatus and the treatment thereof
AU545156B2 (en) Recovering condensables from natural gas
EP0326405A3 (en) Plasma chemical vapour reaction apparatus
EP0277246A4 (en) WET METHOD AND DEVICE FOR CLEANING THE FLUE GAS.
GB8808825D0 (en) Vapor deposition apparatus
EP0367289A3 (en) Plasma chemical vapor deposition apparatus
ZA868198B (en) Gas treatment process
GB8818547D0 (en) Heat processing apparatus using liquified gas
EP0280074A3 (en) Plasma reactor
DE3760379D1 (en) Gas treatment process
KR960015377B1 (en) Chemical vapor deposition reactor
GB2203532B (en) Gas fires
GB2200739B (en) Gas oven
GB8700937D0 (en) Extraction system for gas fire
GB8823151D0 (en) Gas lighter
GB8617528D0 (en) Gas treatment
GB2254561B (en) Gas extraction
KR890009054Y1 (en) Gas gun
GB8804803D0 (en) Gas operated firearm
OA08363A (en) Metallic vapor.
GB8704781D0 (en) Random gas extractor

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)