HK1252379A1 - 矽鍺基光學濾波器 - Google Patents

矽鍺基光學濾波器

Info

Publication number
HK1252379A1
HK1252379A1 HK18111675.9A HK18111675A HK1252379A1 HK 1252379 A1 HK1252379 A1 HK 1252379A1 HK 18111675 A HK18111675 A HK 18111675A HK 1252379 A1 HK1252379 A1 HK 1252379A1
Authority
HK
Hong Kong
Prior art keywords
optical filter
silicon germanium
based optical
germanium based
silicon
Prior art date
Application number
HK18111675.9A
Other languages
English (en)
Inventor
G‧J‧奧肯福斯
Original Assignee
唯亞威通訊技術有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 唯亞威通訊技術有限公司 filed Critical 唯亞威通訊技術有限公司
Publication of HK1252379A1 publication Critical patent/HK1252379A1/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/207—Filters comprising semiconducting materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/281—Interference filters designed for the infrared light
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3417—Arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Optical Filters (AREA)
  • Polarising Elements (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Light Receiving Elements (AREA)
HK18111675.9A 2016-11-30 2018-09-11 矽鍺基光學濾波器 HK1252379A1 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15/365,540 US10168459B2 (en) 2016-11-30 2016-11-30 Silicon-germanium based optical filter

Publications (1)

Publication Number Publication Date
HK1252379A1 true HK1252379A1 (zh) 2019-05-24

Family

ID=60543371

Family Applications (2)

Application Number Title Priority Date Filing Date
HK18108677.3A HK1249188A1 (zh) 2016-11-30 2018-07-04 矽鍺基光學濾波器
HK18111675.9A HK1252379A1 (zh) 2016-11-30 2018-09-11 矽鍺基光學濾波器

Family Applications Before (1)

Application Number Title Priority Date Filing Date
HK18108677.3A HK1249188A1 (zh) 2016-11-30 2018-07-04 矽鍺基光學濾波器

Country Status (9)

Country Link
US (3) US10168459B2 (zh)
EP (1) EP3330753A1 (zh)
JP (2) JP7027420B2 (zh)
KR (4) KR102144038B1 (zh)
CN (2) CN108121026B (zh)
CA (1) CA3043972A1 (zh)
HK (2) HK1249188A1 (zh)
TW (3) TWI786783B (zh)
WO (1) WO2018102219A1 (zh)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109313296B (zh) * 2016-06-08 2021-05-11 Jsr株式会社 光学滤波器及光学传感装置
US10168459B2 (en) 2016-11-30 2019-01-01 Viavi Solutions Inc. Silicon-germanium based optical filter
US10914961B2 (en) * 2017-02-13 2021-02-09 Viavi Solutions Inc. Optical polarizing filter
WO2019039386A1 (ja) * 2017-08-25 2019-02-28 富士フイルム株式会社 光学フィルタおよび光センサ
US10948640B2 (en) 2018-03-13 2021-03-16 Viavi Solutions Inc. Sensor window with a set of layers configured to a particular color and associated with a threshold opacity in a visible spectral range wherein the color is a color-matched to a surface adjacent to the sensor window
US11009636B2 (en) 2018-03-13 2021-05-18 Viavi Solutions Inc. Sensor window to provide different opacity and transmissivity at different spectral ranges
US20200004036A1 (en) * 2018-06-28 2020-01-02 Viavi Solutions Inc. Diffractive optical device providing structured light
US11143803B2 (en) * 2018-07-30 2021-10-12 Viavi Solutions Inc. Multispectral filter
CN108897085B (zh) 2018-08-06 2024-07-16 信阳舜宇光学有限公司 滤光片及包含该滤光片的红外图像传感系统
US11131018B2 (en) * 2018-08-14 2021-09-28 Viavi Solutions Inc. Coating material sputtered in presence of argon-helium based coating
CN110824599B (zh) 2018-08-14 2021-09-03 白金科技股份有限公司 一种红外带通滤波器
US10651225B2 (en) * 2018-09-27 2020-05-12 Taiwan Semiconductor Manufacturing Co., Ltd. Band-pass filter for stacked sensor
DE102018126421A1 (de) 2018-09-27 2020-04-02 Taiwan Semiconductor Manufacturing Co. Ltd. Bandpassfilter für gestapelten sensor
WO2020073252A1 (en) * 2018-10-10 2020-04-16 Schott Glass Technologies (Suzhou) Co. Ltd. Band-pass near-infrared (nir) filter, method of production of band-pass nir filter and uses thereof
US11650361B2 (en) 2018-12-27 2023-05-16 Viavi Solutions Inc. Optical filter
US11366011B2 (en) * 2019-02-13 2022-06-21 Viavi Solutions Inc. Optical device
US11314004B2 (en) * 2019-04-08 2022-04-26 Visera Technologies Company Limited Optical filters and methods for forming the same
US11505866B2 (en) * 2019-04-25 2022-11-22 Shibaura Mechatronics Corporation Film formation apparatus and film formation method
CN110109210B (zh) * 2019-06-05 2024-06-18 信阳舜宇光学有限公司 滤光片
KR102288217B1 (ko) * 2019-09-09 2021-08-10 킹레이 테크놀로지 컴퍼니 리미티드 적외선 협대역 통과 필터링 구조 및 이를 이용한 적외선 협대역 통과 여파기
CN111638572B (zh) * 2019-11-29 2021-03-05 苏州京浜光电科技股份有限公司 一种3D结构光940nm窄带滤光片及其制备方法
US20210238733A1 (en) * 2020-01-30 2021-08-05 Viavi Solutions Inc. Photonic integrated circuit with sputtered semiconductor material
US11983327B2 (en) * 2021-10-06 2024-05-14 Fotonation Limited Method for identifying a gesture
KR102429470B1 (ko) 2021-12-09 2022-08-04 고등기술연구원연구조합 식품산업의 단위공정에 따른 제품생산을 위한 열에너지 예측방법
US20240125995A1 (en) * 2022-10-12 2024-04-18 Visera Technologies Company Limited Image sensor

Family Cites Families (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2175016B (en) * 1985-05-11 1990-01-24 Barr & Stroud Ltd Optical coating
JPS61296304A (ja) * 1985-06-25 1986-12-27 Horiba Ltd 多層膜干渉フイルタ
JPH02106702A (ja) * 1988-10-15 1990-04-18 Minolta Camera Co Ltd 複写機用干渉膜フィルタ
JP2724563B2 (ja) * 1990-01-14 1998-03-09 株式会社堀場製作所 多層膜干渉フィルタ
US5233464A (en) * 1991-03-20 1993-08-03 Costich Verne R Multilayer infrared filter
US5296961A (en) * 1991-04-23 1994-03-22 Coherent, Inc. Dichroic optical filter
JP3005971B2 (ja) * 1992-05-09 2000-02-07 株式会社堀場製作所 多層膜光学フイルタ
JP3043956B2 (ja) * 1993-09-02 2000-05-22 松下電器産業株式会社 空間光変調素子、その製造方法及び投射型ディスプレイ
JPH07104288A (ja) * 1993-10-06 1995-04-21 Fuji Xerox Co Ltd 反射型表示素子
US5726798A (en) * 1994-08-19 1998-03-10 Lockheed Corporation Method and apparatus for filter infrared emission
JPH0915571A (ja) 1995-06-28 1997-01-17 Sharp Corp 光書き込み型液晶ライトバルブ
DE19601987A1 (de) 1996-01-20 1997-07-24 Teves Gmbh Alfred Überlackierbarer Stoßfänger mit Ultraschallwandler
JP3717307B2 (ja) * 1998-05-12 2005-11-16 古河電気工業株式会社 光ファイバ型光部品
US5999321A (en) * 1998-06-19 1999-12-07 Philips Electronics North America Corporation Dichroic filters with low nm per degree sensitivity
DE19830223C1 (de) * 1998-07-07 1999-11-04 Techno Coat Oberflaechentechni Vorrichtung und Verfahren zum mehrlagigen PVD - Beschichten von Substraten
JP4544662B2 (ja) * 1999-04-30 2010-09-15 日本真空光学株式会社 可視光線遮断赤外線透過フィルター
ITCZ20000007A1 (it) * 2000-11-17 2002-05-17 Consorzio Per Le Tecnologie Biomedi Che Avanzate T Specchio con banda di riflessione altamente selettiva.
US7049004B2 (en) * 2001-06-18 2006-05-23 Aegis Semiconductor, Inc. Index tunable thin film interference coatings
US20030087121A1 (en) * 2001-06-18 2003-05-08 Lawrence Domash Index tunable thin film interference coatings
US7002697B2 (en) * 2001-08-02 2006-02-21 Aegis Semiconductor, Inc. Tunable optical instruments
US6572975B2 (en) 2001-08-24 2003-06-03 General Electric Company Optically coated article and method for its preparation
JP3910824B2 (ja) * 2001-10-31 2007-04-25 日立マクセル株式会社 光学フィルター
JP2003147519A (ja) * 2001-11-05 2003-05-21 Anelva Corp スパッタリング装置
JP4088864B2 (ja) * 2002-02-13 2008-05-21 ソニー株式会社 光学多層構造体、これを用いた光スイッチング素子および画像表示装置
JP2004317701A (ja) * 2003-04-15 2004-11-11 Alps Electric Co Ltd 多層膜光フィルタ及び光学部品
JP2004354705A (ja) * 2003-05-29 2004-12-16 Hitachi Maxell Ltd 光学バンドパスフィルタ
DE102004013851B4 (de) 2004-03-20 2021-06-17 Robert Bosch Gmbh Verfahren zur Herstellung eines Interferenzfilter aus alternierenden Luft-Halbleiter-Schichtsystemen sowie ein mit dem Verfahren hergestellter Infrarotfilter
US7247546B2 (en) * 2004-08-05 2007-07-24 International Business Machines Corporation Method of forming strained silicon materials with improved thermal conductivity
JP2006053200A (ja) 2004-08-10 2006-02-23 Hitachi Maxell Ltd エッジフィルタ
US7879209B2 (en) * 2004-08-20 2011-02-01 Jds Uniphase Corporation Cathode for sputter coating
DE102005019101A1 (de) * 2005-04-25 2006-10-26 Steag Hama Tech Ag Verfahren und Vorrichtung zum Beschichten von Substraten
US7801406B2 (en) 2005-08-01 2010-09-21 Massachusetts Institute Of Technology Method of fabricating Ge or SiGe/Si waveguide or photonic crystal structures by selective growth
DK1970465T3 (da) * 2007-03-13 2013-10-07 Jds Uniphase Corp Fremgangsmåde og system til katodeforstøvning til aflejring af et lag, der består af en blanding af materialer og har et på forhånd defineret brydningsindeks
JP2008276074A (ja) 2007-05-02 2008-11-13 Hitachi Maxell Ltd 光通信用フィルタ及びこれを用いた光通信用モジュール
US20090032098A1 (en) * 2007-08-03 2009-02-05 Guardian Industries Corp. Photovoltaic device having multilayer antireflective layer supported by front substrate
KR101458569B1 (ko) * 2008-03-13 2014-11-12 삼성디스플레이 주식회사 표시 장치
JP5540477B2 (ja) * 2008-08-15 2014-07-02 Ｊｓｒ株式会社 近赤外線カットフィルターの製造方法および該方法により得られる近赤外線カットフィルター
JP2010231172A (ja) * 2009-03-04 2010-10-14 Seiko Epson Corp 光学物品およびその製造方法
JP5625707B2 (ja) 2010-10-04 2014-11-19 ソニー株式会社 半導体装置、電子機器、および半導体装置の製造方法
CN102208473B (zh) * 2011-05-30 2014-06-18 武汉凹伟能源科技有限公司 一种太阳能发电低倍聚光发电组件
WO2012169447A1 (ja) * 2011-06-06 2012-12-13 旭硝子株式会社 光学フィルタ、固体撮像素子、撮像装置用レンズおよび撮像装置
CN103498128B (zh) * 2012-04-29 2017-10-03 江苏中能硅业科技发展有限公司 磁控溅射镀膜装置及镀膜方法
JP6244103B2 (ja) * 2012-05-04 2017-12-06 ヴァイアヴィ・ソリューションズ・インコーポレイテッドＶｉａｖｉ Ｓｏｌｕｔｉｏｎｓ Ｉｎｃ． 反応性スパッタ堆積のための方法および反応性スパッタ堆積システム
TWI684031B (zh) 2012-07-16 2020-02-01 美商唯亞威方案公司 光學濾波器及感測器系統
KR101938648B1 (ko) 2012-10-23 2019-01-15 삼성전자주식회사 이미지 센서를 포함하는 모바일 기기, 이미지 센서의 구동 방법 및 모바일 기기의 구동 방법
JP6272627B2 (ja) * 2013-01-29 2018-01-31 ヴァイアヴィ・ソリューションズ・インコーポレイテッドＶｉａｖｉ Ｓｏｌｕｔｉｏｎｓ Ｉｎｃ． 可変光学フィルターおよびそれに基づく波長選択型センサー
BR112016005618B1 (pt) * 2013-09-18 2021-06-01 Guardian Europe S.A.R.L. Espelho dielétrico
WO2015155356A1 (en) 2014-04-10 2015-10-15 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Solar photovoltaic module
TWI743031B (zh) 2015-02-18 2021-10-21 美商麥提利恩公司 具有傳輸改良之近紅外線光干擾濾波器
JP6504874B2 (ja) 2015-03-27 2019-04-24 株式会社豊田中央研究所 光学フィルタおよび光学測定装置
US10168459B2 (en) 2016-11-30 2019-01-01 Viavi Solutions Inc. Silicon-germanium based optical filter

Also Published As

Publication number Publication date
TW202144603A (zh) 2021-12-01
TWI740691B (zh) 2021-09-21
EP3330753A1 (en) 2018-06-06
US11041982B2 (en) 2021-06-22
KR102392653B1 (ko) 2022-04-29
KR20180062389A (ko) 2018-06-08
TWI786783B (zh) 2022-12-11
CA3043972A1 (en) 2018-06-07
CN108121026A (zh) 2018-06-05
US20190146131A1 (en) 2019-05-16
KR20220059457A (ko) 2022-05-10
HK1249188A1 (zh) 2018-10-26
JP2022078105A (ja) 2022-05-24
JP2020501182A (ja) 2020-01-16
KR20240026172A (ko) 2024-02-27
US10168459B2 (en) 2019-01-01
KR20200096892A (ko) 2020-08-14
CN113376726A (zh) 2021-09-10
CN108121026B (zh) 2021-07-02
TW202120972A (zh) 2021-06-01
US20210325583A1 (en) 2021-10-21
TWI711844B (zh) 2020-12-01
KR102144038B1 (ko) 2020-08-12
TW201827867A (zh) 2018-08-01
WO2018102219A1 (en) 2018-06-07
US20180149781A1 (en) 2018-05-31
JP7027420B2 (ja) 2022-03-01

Similar Documents

Publication Publication Date Title
HK1252379A1 (zh) 矽鍺基光學濾波器
HK1217044A1 (zh) 光學裝置
EP3469407A4 (en) OPTICAL FILTER
SG11201704276TA (en) Substrate-guided optical device
EP3379306A4 (en) OPTICAL CIRCUIT BASED ON SILICON
GB201518371D0 (en) Optical Device
EP3499299C0 (en) OPTICAL DEVICE
HK1254078A1 (zh) 光學裝置
SG10201504400XA (en) Diffractive lens and optical device using the same
GB201512914D0 (en) Optical device
EP3339938A4 (en) OPTICAL DEVICE
SG10201501238UA (en) Optical device
GB201619574D0 (en) Optical device
EP3425434A4 (en) OPTICAL DEVICE
ZA201604493B (en) Optical pyrometer
HK1249585A1 (zh) 光學裝置
EP3285115A4 (en) Optical device
EP3553836A4 (en) OPTICAL SEMICONDUCTOR COMPONENT
EP3188327A4 (en) Optical fiber device
GB2550602B (en) Optical device
HK1252012A1 (zh) 光學元件
EP3356289A4 (en) SIMPLIFIED MANUFACTURING METHOD FOR MEMS DEVICE
TWI563307B (en) Optical fiber fixing device
GB2551355B (en) Optical communication device
EP3153900A4 (en) Optical comb filter